• Journal of Radiation Protection and Research
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• 제44권1호
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• pp.8-14
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• 2019

Background: Management of an agricultural food product system following a nuclear accident is indispensable for reducing radiation exposure due to ingestion of contaminated food. The present study analyzes the effect of agricultural countermeasures on ingestion dose following a nuclear accident. Materials and Methods: Agricultural countermeasures suitable for domestic farming environments were selected by referring to the countermeasures applied after the Fukushima accident in Japan. The avertable ingestion doses that could be obtained by implementing the selected countermeasures were calculated using the Korean Agricultural Countermeasure Analysis Program (K-ACAP) to investigate the efficiency of each countermeasure. Results and Discussion: Of the selected countermeasures, the management of crops was effective when radionuclide deposition occurred during the growing season of plants. Treatment by soil additive and topsoil removal was effective when deposition occurred during the nongrowing season of plants. The disposal of milk was not effective owing to the small contribution of milk to the overall ingestion dose. Clean feeding of livestock was effective when deposition occurred during the growing season of fodder plants such as pasture and rice-straw. Finally, the effect of food restriction increased with the soil deposition density of radionuclide. The practical effect of countermeasures was very small when the avertable ingestion dose was absolutely low. Conclusion: The agricultural countermeasures selected to reduce the radionuclide ingestion dose after a nuclear accident must be made appropriate by considering the accident situation, such as the soil deposition density of the radionuclide and the deposition date in relation to farming cycles.

• 한국전기전자재료학회논문지
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• 제15권6호
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• pp.518-523
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• 2002

The influences of ion beam energy and reactive oxygen partial pressure on the physical and crystallographic characteristics of transition metal oxide compound(CrOx) film were studied in this paper. Chromium oxide films were deposited onto a cover-glass using ion Beam Sputter Deposition(IBSD) technique according to the various processing parameters. Crystallinity and grain size of as-deposited films were analyzed using XRD analysis. Thickness and Resistivity of the films were measured by $\alpha$-step and 4-point probe measurement. According to the XRD, XPS and resistivity results, the deposited films were the cermet type films which had crystal structure including amorphous oxide(a-oxide) phase and metal Cr phase simultaneously. The increment of the ion beam energy during the deposition process led to decreasing of metal Cr grain size and the rapid change of resistivity above the critical $O_2$ partial pressure.

• Progress in Superconductivity
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• 제3권1호
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• pp.125-129
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• 2001

NiO buffer layers were deposited on texture Ni tapes fur YBCO coated conductors by MOCVD(metal organic chemical vapor deposition) method, using a single solution source. Variables were deposition temperature and flow rate of $0_2$carrier gas. At higher temperatures, The NiO(111) texture was well developed, but the NiO(200) texture was developed at low temperatures. The best result was obtained at the deposition temperature of$ 470^{\circ}C$ and the gas flow rate of 200 sccm. FWHM value of $\omega$-scan fur NiO(200) of the film and $\Phi$-scan for NiO(111) of the film was $4.2^{\circ}$ and $7^{\circ}$, respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 제5회 영호남 학술대회 논문집
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• pp.89-92
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• 2003

ITO thin films were deposited by RF-magnetron sputtering method and crystallization behavior of the films with and without external heating as a function of deposition time was examined. X-ray diffraction results indicated an amorphous state of the film when the deposition time is short about 10 min. When the deposition time was increased over 20 min development of crystallization of the films is observed. Because RF-sputtering transfers the high-energy to the growing film by energetic bombardment, it is believed that considerable activation energy for the crystallization of the film has transferred during deposition, which resulted in the crystallization of ITO thin films without external energy supply.

• 전기화학회지
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• 제25권4호
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• pp.134-153
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• 2022

리튬이온전지의 에너지밀도가 지속적으로 높아지고 사용환경이 가혹해지고 있지만, 전지의 안전성은 타협할 수 있는 특성이 아니다. 특히, 더 높은 에너지밀도 확보를 위해 고용량 전극 소재 개발과 함께 분리막 원단 뿐만 아니라 세라믹 코팅층의 두께 및 무게의 박막화와 경량화가 동시에 요구되고 있다. 그 중, 기존 슬러리 코팅 방식을 증착 방식으로 대체하는 기술이 주목받고 있으며, 분리막의 내열성 확보를 위해 도입된 수 ㎛ 수준의 세라믹 코팅층을 nm 수준으로 박막/경량화 하면서도 동등의 내열성을 확보하는 시도가 진행되고 있다. 증착법으로 제조된 세라믹 코팅 분리막은 리튬이온전지 에너지밀도를 크게 증가시킬 수 있는 효율적인 방법이지만, 균일한 물성의 세라믹 코팅 분리막을 제작하기 위해서는 증착 공정 중 온도를 제어해야 하며, 생산속도와 공정비용을 기존 슬러리 코팅 수준으로 떨어뜨려야 하는 현실적 문제가 존재한다. 그럼에도 불구하고, 분리막 원단 대비 두께 및 무게 증가가 거의 없다는 점에서는 전지의 고에너지밀도 달성에 필요한 매력적인 접근법임은 분명하다. 본 총설에서는 세라믹 증착 코팅에 사용되고 있는 세 가지 방법인 1) 화학적 기상 증착법, 2) 원자층 증착법, 그리고 3) 물리적 기상 증착법으로 제조된 세라믹 코팅 분리막을 소개하고자 한다. 각 증착법의 원리와 장/단점을 설명하고, 제조된 세라믹 코팅 분리막의 물리적, 전기화학적 특성 및 전지의 성능 변화를 비교 분석하였다. 또한, 소재 관점에서 금속 또는 유기물질이 코팅된 초박막 코팅 분리막의 기술 동향도 소개하였다.

• 한국세라믹학회지
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• 제31권2호
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• pp.206-212
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• 1994

Effects of the film deposition process parameters on the properties such as deposition rate, etch rate, refractive index, stress and step coverage of plasma enhanced chemical vapor deposited (PECVD) tetraethylorthosilicate glass (TEOS) SiO2 film were investigated and analysed using SEM, FTIR and SIMS techniques. Increasing TEOS flow or decreasing O2 flow increased the deposition rate and the compressive stress of the oxide film but produced a less denser film. The deposition rate decreased owing to the decrease in the sticking coefficient of the TEOS and the O2 molecules onto the substrate Si with increasing the substrate temperature. Increasing the substrate temperature produced a denser film with a lower etch rate and the higher refractive index by lowering SiOH and moisture contents. Increasing the rf power increases the ion bombardment energy. This increase in energy, in turn, increases the deposition rate and tends to make the film denser. No appreciable changes were found in the deposition rate but the refractive index and the stress of the film decreased with increasing the deposition pressure. The carbon content in the plasma TEOS CVD oxide film prepared under our standard deposition conditions were very low according to the SIMS analysis results.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2001년도 하계종합학술대회 논문집(2)
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• pp.21-24
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• 2001

We studied aluminum cluster deposition using molecular dynamics simulation. We investigated the variations of the cluster momentum and the impulse force during collisions, and found that the close-packed cluster impact has some of properties of the single particle collision and the linear chain collisions. We also simulated the series of energetic cluster deposition with energy Per atom. When energy Per atom in cluster has some eV rather than very low, the intermixing occurred easily in growth film and we can obtain a good film without subsequent annealing process.

• Korean Chemical Engineering Research
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• 제59권2호
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• pp.232-238
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• 2021

The development of a low cost catalyst with high performance and small amount of carbon deposition on catalyst from toluene steam reforming were investigated by using coal ash as a support material. Ni-loaded coal ash catalyst showed similar catalytic activity for toluene steam reforming compared with the Ni/Al2O3. At 800 ℃, the toluene conversion was 77% for Ni/TAL, 68% for Ni/KPU and 78% for Ni/Al2O3. Ni/TAL showed similar toluene conversion to Ni/Al2O3. However, Ni/KPU produced higher hydrogen yield at relatively lower toluene conversion. Ni/KPU catalyst showed a remarkable ability of suppressing the carbon deposition. The difference in coke deposition and hydrogen yield is due to the composition of KPU ash (Ca and Fe) which increase coke resistance and water gas shift reaction. This study suggests that coal ash catalysts have great potential for the application in the steam reforming of biomass tar.

• Journal of Radiation Protection and Research
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• 제29권3호
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• pp.165-172
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• 2004

피폭상자 내에서 벼를 생육단계별로 80 분 간 $I_2$ 증기에 피폭시키고 작물체 직접오염 관련 인자를 조사하였다. $I_2$ 증기의 경엽부 침적속도$(m\;s^{-1})$는 피폭시기에 따라 $1.4{\times}10^{-5}-1.3{\times}10^{-4}$의 범위로 생육 전반기 피폭시 비교적 낮았다. 이삭 침적속도는 $2.5{\times}10^{-5}-6.7{\times}10^{-5}$의 범위였다. 전체 작물체에 대한 침적속도는 $1.4{\times}10^{-5}-1.8{\times}10^{-4}$의 범위로 8월 18일(출수 시작후 7일) 피폭시 가장 높았다. 침적속도를 생육밀도 기준으로 나타내면 시기에 따른 변이 정도가 대체로 감소하였다. 기온, 일광 및 습도에 대한 이렇다할 침적속도의 경향성은 관찰되지 않았다. 요오드의 현미 전류계수는 $3.3{\times}10^{-5}-4.7{\times}10^{-4}$의 범위로 8월 23일 피폭에서 가장 높았다. 출수전 경엽부에 침적한 요오드도 상당량 현미로 전류하는 것으로 나타났다.

• 한국초전도학회:학술대회논문집
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• 한국초전도학회 2004년도 High Temperature Superconductivity Vol.XIV
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• pp.72-72
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• 2004