Fabrication of NiO buffer film on textured Ni substrate for YBCO coated conductor

Textured Ni 기판 위에 YBCO coated conductor 모재용 NiO 완충층 제조

  • Sun, Jong-Won (Functional Materials Laboratory, Korea Atomic Energy Reserach Institute, Daejon, Korea. Department of Metallurgical Engineering, Chungnam National Uni) ;
  • Kim, Hyoung-Seop (Department of Metallurgical Engineering, Chungnam National University, Daejeon) ;
  • Jung, Choon-Ghwan (Functional Materials Laboratory, Korea Atomic Energy Reserach Institute, Daejon) ;
  • Lee, Hee-Gyoun (Functional Materials Laboratory, Korea Atomic Energy Reserach Institute, Daejon)
  • Published : 2001.01.01

Abstract

NiO buffer layers were deposited on texture Ni tapes fur YBCO coated conductors by MOCVD(metal organic chemical vapor deposition) method, using a single solution source. Variables were deposition temperature and flow rate of $0_2$carrier gas. At higher temperatures, The NiO(111) texture was well developed, but the NiO(200) texture was developed at low temperatures. The best result was obtained at the deposition temperature of$ 470^{\circ}C$ and the gas flow rate of 200 sccm. FWHM value of $\omega$-scan fur NiO(200) of the film and $\Phi$-scan for NiO(111) of the film was $4.2^{\circ}$ and $7^{\circ}$, respectively.

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