• Title/Summary/Keyword: Electrostatic field

검색결과 303건 처리시간 0.022초

수평구동형 정전반발력 마이크로액추에이터 (Laterally-Driven Electrostatic Repulsive-Force Microactuator)

  • 이기방;조영호
    • 대한기계학회논문집A
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    • 제25권3호
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    • pp.424-433
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    • 2001
  • We present a new electrostatic repulsive-force microactuator using a lateral repulsive force induced by an asymmetric distribution of electrostatic field. The lateral repulsive force has been characterized by a simple analytical equation, derived from a finite element simulation. A set of repulsive force polysilicon microactuators has been designed and fabricated by a 4-mask surface-micromachining process. Static and dynamic micromechanical behavior of the fabricated microactuators has been measured at the atmospheric pressure for a varying bias voltage. The static displacement of the fabricated microactuator, proportional to the square of the DC bias voltage, is obtained as 1.27 $\mu\textrm{m}$ for the DC bias voltage of 140V. The resonant frequency of the repulsive-force microactuator increases from 11.7 kHz to 12.7 kHz when the DC bias voltage increases from 60V to 140V. The measured quality-factor varies from 12 to 13 for the bias volatge range of 60V∼140V. The characteristics of the electrostatic repulsive-force have been discussed and compared and compared with those of the conventional electrostatic attractive-force.

Secondary resonances of a microresonator under AC-DC electrostatic and DC piezoelectric actuations

  • Zamanian, M.;Hosseini, S.A.A.
    • Structural Engineering and Mechanics
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    • 제42권5호
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    • pp.677-699
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    • 2012
  • This article studies the secondary resonances of a clamped-clamped microresonator under combined electrostatic and piezoelectric actuations. The electrostatic actuation is induced by applying the AC-DC voltage between the microbeam and the electrode plate that lies at the opposite side of the microbeam. The piezoelectric actuation is induced by applying the DC voltage between upper and lower sides of piezoelectric layer. It is assumed that the neutral axis of bending is stretched when the microbeam is deflected. The drift effect of piezoelectric layer (the phenomenon where there is a slow increase of the free strain after the application of a DC field) is neglected. The equations of motion are solved by using the multiple scale perturbation method. The system possesses a subharmonic resonance of order one-half and a superharmonic resonance of order two. It is shown that using the DC piezoelectric actuation, the sensitivity of AC-DC electrostatically actuated microresonator under subharmonic and superharmonic resonances may be tuned. In addition, it is shown that the tuning domain of the microbeam under combined electrostatic and piezoelectric actuations at subharmonic and superharmonic conditions is larger than the tuning domain of microbeam under only the electrostatic actuation.

1단 전기 집진기에서 2차 유동이 집진 효율에 미치는 영향 (Effect of Secondary Flows on the Particle Collection Efficiency in Single Stage Electrostatic Precipitator)

  • 이재복;배귀남;황정호
    • 대한기계학회논문집B
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    • 제24권2호
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    • pp.251-259
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    • 2000
  • The ionic wind formed in a nonuniform electric field has been recognized to have a significant effect on particle collection in an electrostatic precipitator(ESP). Under normal operating conditions the effect of ionic wind is not pronounced. However, as the flow velocity becomes smaller, the ionic wind becomes pronounced and induces secondary flow, which has a significant influence on the flow field and the particle collecting efficiency. In this paper, experiments for investigating the effect of secondary flow on collection efficiencies were carried out by changing the flow velocities in 0.2-0.7m/s and the applied voltages in 9-11kV/cm. The particle size distributions and concentrations are measured by DMA and CNC. To analyze the experimental results, numerical analysis of electric filed in ESP was carried out. It shows that particle collection is influenced by two independent dimensionless numbers, $Re_{ehd}\;and\;Re_{flow}$ not by $N_{ehd}$ alone. When $Re_{flow}$, decreases for constant $Re_{ehd}$, the secondary flow prohibits the particle collection. But when $Re_{ehd}$ increases for constant $Re_{flow}$, it enhances the particle collection by driving the particles into the collection region.

CoMFA Based Quantitative Structure Toxicity Relationship of Azo Dyes

  • Pasha, F.A.;Nam, Kee-Dal;Cho, Seung-Joo
    • Molecular & Cellular Toxicology
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    • 제3권2호
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    • pp.145-149
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    • 2007
  • Studies of relationship between structure and toxicity of azo dyes have been performed with comparative molecular field analysis (CoMFA) techniques. 3D QSTR analyses indicate that the steric and electrostatic interactions are important. The steric field based model gives strong correlation ($q^2$=0.57, $r^2$= 0.92). The steric field in conjunction with electrostatic field give more strong correlation ($q^2$=0.57, $r^2$=0.95). All study indicates that a bulky and electronegative group at benzene ring and a small group at position 3 of aniline ring might be significant to reduce the mutagenicity.

전장에 의한 유리와 금속의 접합 (Glass to Metal Bonding by Electric Field)

  • 정우창;김종희
    • 한국세라믹학회지
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    • 제20권1호
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    • pp.70-78
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    • 1983
  • This paper discusses the application of Si-Borosilicate glass sealing to a new sealing method which utilizes a large electrostatic field to pormote bound formation at relatively low temperature. Bonding mechanism and the effect of bonding time bonding temperature glass thickness and surface roughness on the bond strength were investigated. Application of a de voltage across bonded specimen gradually produced a layer of glass adjacent silicon which was depleted of mobile ions. As a consequence a n increasingly larger fraction of the applied voltage appeared across the depleted region and very large electric field resulted This field accompanyed by large electrostatic force acted as driving force the of strong bond. And stronger bond was formed with increasing bonding time and temperature. A low temperature preoxidation is advantageous for the Si surface having a rougher surface finish that 1 microinch.

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Analytical model for the formation of electric fields in parallel-plate capacitors

  • Taehun Jang;Jungmin Moon;Hye Jin Ha;Sang Ho Sohn
    • 과학교육연구지
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    • 제46권2호
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    • pp.212-221
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    • 2022
  • In this study, we propose an analytical model to elucidate the formation of electric fields between two parallel conducting plates. Using nine Gaussian surfaces, we investigated the charge redistributions and electric fields formed by parallel conducting plates when two charged plates get close together. The electric charges are redistributed via a new electrostatic equilibrium to create the electric field of each plates. As a result, the electric field start from + electrode plate to - electrode plate via inducing a new electrostatic equilibrium, implying that the application of Gaussian surfaces to only one of the electrodes of parallel-plate capacitors is deserved. The results will help undergraduate students understand the charge redistribution and the electric field formation in parallel-plate capacitors in a reasonable manner.

용융도금강판의 제조 공정에 있어서 2-유체 분사 액적의 운동에 미치는 정전대전력의 영향 (Effects of Electrostatic Force on Movement of Sprayed Aerosol Particles in Continuous Galvanizing Process)

  • 김상헌;김형민;정원철;정원섭
    • 한국분무공학회지
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    • 제5권3호
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    • pp.45-54
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    • 2000
  • A novel electrostatic splaying method for solidifying a galvanized coating layer was studied. Our experimental results and computer simulations showed that electric field could assist the fine droplets to attach on the steel surface and change the sprayed droplets trajectory especially in the space near the steel surface. It was necessary to apply the electric voltage higher than - 20 kV to obtain the enough electrostatic attraction force between droplets and the steel sheet.

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재해분석을 통한 정전기 안전관리 수준 향상 방안 연구 (A Study on the Improvement Plan of Electrostatic Safety Management Level through Injury Analysis)

  • 최상원;정성춘;박재석;양정열;변정환
    • 한국안전학회지
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    • 제34권5호
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    • pp.37-45
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    • 2019
  • The characteristic of fire and explosion related to electrostatic discharge is that it is difficult to reproduce the electrostatic charge and discharge phenomenon in addition to the large human and material damage. Therefore, in order to prevent accidents and disasters related to electrostatic in fire and explosion hazard areas, it is important to manage the level of electrostatic in a safe manner from the perspective of system between industrial facilities and human bodies. Rule 325 of the Occupational Safety and Health Regulations, "Prevention of Fire / Explosion due to Electrostatic", requires the use of grounding, conductive materials, humidification and electrification in order to prevent the risk of disaster caused by static explosion and electrostatic in the production process. In order to comply with these measures, related technologies, standards and systems are needed from the viewpoint of preventive measures related to electrostatic in fire and explosion hazard areas, but in Korea, it is still insufficient. Therefore, technical, institutional and managerial measures are needed as a precautionary measure to improve the level of ESD safety in fire and explosion hazard areas and prevent electrostatic related injury. In Korea, we analyzed the current status and characteristics of electrostatic related disaster by using the statistics of industrial accident and fire statistics of the Ministry of Employment and Labor. We also analyzed the current status and characteristics of electrostatic related disasters in Japan using JNIOSH accidents and disasters investigation cases and JNIOSH fire accident data of Japan Fire Bureau. The purpose of this study is to compare and analyze the current status of electrostatic related accidents and disasters in Korea and Japan in order to improve the safety management of electrostatic in fire and explosion hazard areas. In order to prevent accidents and disasters in the industrial field, The technical, institutional, and managerial measures to manage the level of electrostatic in a safe state were derived from the system point of view.

미세먼지의 집진효율 향상을 위한 전기집진기의 자계인가특성에 대한 연구 (A Study on the Effect of Magnetic Field in Electrostatic Precipitator for Improving Precipitation Efficiency of Particulate Matter)

  • 박재윤;한상보;박상현
    • 조명전기설비학회논문지
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    • 제22권12호
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    • pp.122-129
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    • 2008
  • 본 논문은 실내에 잔존하는 직경 1[${\mu}m$] 이하의 미세먼지들을 집진하기 위하여 전기집진기를 설계하였으며, 이때 집진 효율의 극대화를 위하여 전계와 동시에 자계를 수직 및 수평으로 배치함에 따른 실험실 공기중에 포함된 미세먼지의 집진특성에 대하여 논하였다. 전계에 수평으로 자계를 인가한 경우는 자계의 유무 및 자석의 수량에 관계없이 집진효율이 거의 일정하게 나타났으며, 자석을 수평으로 배치하여 전계에 수직으로 인가한 경우는 비자화 페라이트 막대를 부착한 경우보다 약 5[%] 이상 집진효율이 향상되었다. 또한, 자계를 전계에 수직으로 인가하는 방법에 있어서, 자석을 접지전극의 가운데 정렬한 경우는 인가전압 5[kV]에서의 집진효율이 $17{\sim}32[%]$로서 자석을 앞쪽에 설치한 경우와 유사하였으며, 지그재그 및 안쪽 끝에 정렬시킨 경우는 집진효율이 $17{\sim}38[%]$로서 향상되었으며, 특히 0.7 및 1[${\mu}m$]의 굵은 입자들에 대한 집진특성이 양호하였다. 따라서, 전기집진기의 집진특성을 향상시키기 위해서는 자계를 전계에 수직으로 접지전극의 중간 또는 지그재그 식으로 배치하는 것이 가장 적절한 것으로 판단된다.

10 nm 이하 초고해상도와 광폭 관측시야를 구현하기 위한 극초소형 마이크로컬럼용 정전형 디플렉터 연구 (Study on an Electrostatic Deflector for Ultra-miniaturized Microcolumn to Realize sub-10 nm Ultra-High Resolution and Wide Field of View)

  • 이형우;이영복;오태식
    • 반도체디스플레이기술학회지
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    • 제20권4호
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    • pp.29-37
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    • 2021
  • A 7 nm technology node using extreme ultraviolet lithography with a wavelength of 13.5 nm has been recently developed and applied to the semiconductor manufacturing process. Furthermore, the development of sub-3 nm technology nodes continues to be required. In this study, design factors of an electrostatic deflector for an ultra-miniaturized microcolumn system that can realize an electron wavelength of below 1.23 nm with an acceleration voltage of above 1 eV were investigated using a three-dimensional simulator. Particularly, the optimal design of the electrostatic octupole floating deflector was derived by optimizing the design elements and improving the driving method of the 1 keV low energy ultra-miniaturized microcolumn deflector. As a result, the entire wide field of view greater than 330 ㎛ at a working distance of 4 mm was realized with an ultra-high-resolution electron beam spot smaller than 10 nm. The results of this study are expected to be a basis technology for realizing a wafer-scale multi-array microcolumn system, which is expected to innovatively improve the throughput per unit time, which is the biggest drawback of electron beam lithography.