• Journal of the Semiconductor & Display Technology
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• v.9 no.1
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• pp.17-21
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• 2010

Currently miniaturized electron-optical columns find their way into electron beam lithography systems. For better lithography process, it is required to make smaller spot size and longer working distance. But, the micro-columns of the multi-beam lithography system suffer from chromatic and spherical aberration, even when the electron beam is exactly on the symmetric axis of the micro-column. The off-axis error of the electron emitting source is expected to become worse with increasing off-axis distance of the focusing spot. Especially the electron beams far from the system optical axis have a non-negligible asymmetric intensity distribution in the micro-column. In this paper, the effect of the off-axis e-beam source is analyzed. To analyze this effect is to introduce a micro-column model of which the e-beam emitting source is aligned with the center of the electron beam by shifting them perpendicular to the system optical axis. The presented solution can be used to analysis the performance of the multi-electron-beam system. The performance parameters, such as the working distances and the focusing position are obtained by the computational simulations as a function of the off-axis distance of the emitting source.

• Journal of the Korean Vacuum Society
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• v.12 no.1
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• pp.1-6
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• 2003

An axial electron beam gun system, which emits the electron beam power of 50 kW, has been manufactured. The electron beam gun consists of two parts. One is the electron beam generation part. including the filament, cathode, and anode. The maximum beam current is 2 A and the acceleration voltage is 25 kV. The other part includes the focusing-, deflection-, and scanning coils. The beam diameter and ham trajectory can be controlled by these coils. The characteristic of each part is measured ior the optimum condition of evaporation process. Moreover, Helmholtz coil is installed inside the vacuum chamber to adjust the incident angel of the beam to the melting surface for the maximum evaporation. We report on the evaporation rates for zirconium(Zr) and gadolinium(Gd) metals which have the high melting temperatures.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.149-153
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• 2005

The electron beam machining provides very high resolution up to nanometer scale, hence the E-beam writing technology is rapidly growing in MEMS and nano-engineering areas. In the optical column of the e-beam writer, there are several lenses condensing and focusing electron beams from electron gun with fringing magnetic fields. The polepieces of these lenses are usually made with high purity iron which is hard to fabricate and very expensive. In this paper, the possibility of using polepiece of object lens composed with pure iron and low carbon steel was examined to reduce cost. The magnetic field at object lens was calculated with finite element method, and practical focusing qualities of SEM pictures were observed comparing for the object lens polepieces with pure iron and two type of composed with low carbon steel.

• Journal of Korean Vacuum Science & Technology
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• v.3 no.1
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• pp.30-32
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• 1999

Electron beam trajectory simulation results on the high voltage FED with cone-type field emitters predict that the cross-talk phenomena would be seen due to the divergence of the electron beam. In this study, computer simulations with design of experiment technique and the SNU-FEAT program were carried out for five input parameters of the aperture focusing structure. The results tell that the focusing voltage is a dominant factor. And, the beam divergence index could be reduced to 10.7$\mu\textrm{m}$ with the aperture focusing structure, however, the operating voltage of the field emitter is predicted to increase by 40% maximum.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.360-360
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• 2011

In this work, SUS310S used for valve plate assembly was electron beam (EB) welded to determine the influence of the parametric conditions on the characteristics of the weld and to minimize porosity and micro-fissures among others. The evolution in the weld geometry and microstructure was examined as a function of the process conditions such as beam current and focusing current under a constant welding speed and accelerating voltage. The integrity of the EB welds in SUS310S was examined for defects (e.g. cracking, porosity, etc.), adequate penetration depth, and tolerable weld width deviation for the various welding conditions. Optical microscopy (OM), x-ray photoelectron spectroscopy analysis (XPS), scanning electron microscopy (SEM) and 3D micro-computed tomography (Micro-CT) for the cross section analysis of the electron beam welded SUS310S were utilized. The tensile strength and hardness were analyzed for the mechanical properties of the EB weld. At the 6 kV accelerating voltage, it was determined that a satisfactory penetration depth and desirable weld width deviation requires a beam current of 30 mA and a focusing current of 0.687 A at the welding speed of 25 mm/sec.

• Korean Journal of Optics and Photonics
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• v.19 no.5
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• pp.365-369
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• 2008

The optimal condition for focusing an electron beam was investigated employing an electrostatic deflector in a low voltage micro-column. At fixed voltage of the electron emission tip, the focusing electron beam with source lens showed a larger scan field size and poorer visibility than those with an Einzel lens. Theoretical 3-D simulation indicated that a focusing electron beam with a source lens should have a larger spot size and deflection than those of a focusing Einzel lens.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.401-404
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• 2004

The electron beam machining provides very high resolution up to nanometer scale, hence the E-beam writing technology is rapidly growing in MEMS and nano-engineering areas. In the optical column of the e-beam writer, there are several lenses condensing and focusing electron beams from electron gun with fringing magnetic fields. To achieve small spot size as 1-2 nm for higher power of electron beam, magnetic lenses should be designed considering their magnetic field distribution. In this paper, the magnetic field at two condenser lenses and object lens are calculated with finite element method and discussed its performances.

• Journal of the Semiconductor & Display Technology
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• v.8 no.4
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• pp.43-48
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• 2009

The aim of this paper is to describe the development of the electron-beam optic analysis algorithm for simulating the e-beam behavior concerned with electrostatic lenses and their focal properties in the micro-column of the multi-beam lithography system. The electrostatic lens consists of an array of electrodes held at different potentials. The electrostatic lens, the so-called einzel lens, which is composed of three electrodes, is used to focus the electron beam by adjusting the voltages of the electrodes. The optics of an electron beam penetrating a region of an electric field is similar to the situation in light optics. The electron is accelerated or decelerated, and the trajectory depends on the angle of incidence with respect to the equi-potential surfaces of the field. The performance parameters, such as the working distances and the beam diameters are obtained by the computational simulations as a function of the focusing voltages of the einzel lens electrodes. Based on the developed simulation algorithm, the high performance of the micro-column can be achieved through optimized control of the einzel lens.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07b
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• pp.976-979
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• 2002

A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control' writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm), To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and $0.5{\times}0.5mm^2$ area, respectively, This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolpution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.8 no.2
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• pp.100-107
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• 1999

End milling experiments are conducted to investigate characteristics of laser beam signals due to tool fracture. The laser beam signals are obtained with adapt focusing of tool. Tool states are identified wit h scanning electron microscopy and optical microscopy. It is demonstrated that the laser beam signals provide reliable informations about the cutting processes and tool states. Moreover, tool fracture can be detected successfully using coefficient of variation.