• Title/Summary/Keyword: Electron-Beam Energy

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Laser Micromachining of Submicron Aperture for Electronbeam Microcolumn Application using Piezo Q-Switched Nd:YAG Laser

  • S.J. Ahn;Kim, D.W.;Park, S.S.
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.78-78
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    • 1999
  • Experimental studies of laser micromachining on Mo metal using piezo Q-switched Nd:YAG laser have been performed. Miniaturized microcolumn electron gun arrays as a potential electron beam lithography or portable mini-scanning electron microscope application have recently extensively examined. For these purpose, the electro-static electron lens and deflector system called microcolumn has to be assembled. The conventional microcolumn fabrication technique would gave a limitation on the minimization of aberration. The current technique of a 1 $\mu$m misalignment would lead to ~1.3 nm coma. In order to reduce aberration, assembling the microcolumn component followed by laser drilling should be very beneficial. In this report, we will address the preliminary report of laser micromachining on Mo substrate using piezo Q-switched Nd:YAG laser. The geometrical figures, such as the diameter and the depth of the frilled aperture are dependent upon the total energy of the laser pulse train, laser pulsewidth, and the diameter of laser beam in addition to the materials-dependent parameters.

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Development of Electron-Beam Lithography Process Simulation Tool of the T-shaped Gate Formation for the Manufacturing and Development of the Millimeter-wave HEMT Devices (밀리미터파용 HEMT 소자 개발 및 제작을 위한 T-게이트 형성 전자빔 리소그래피 공정 모의 실험기 개발)

  • 손명식;김성찬;신동훈;이진구;황호정
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.41 no.5
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    • pp.23-36
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    • 2004
  • A computationally efficient and accurate Monte Carlo (MC) simulator of electron beam lithography process has been developed for sub-0.l${\mu}{\textrm}{m}$ T-shaped gate formation in the HEMT devices for millimeter-wave frequencies. For the exposure process by electron to we newly and efficiently modeled the inner-shell electron scattering and its discrete energy loss with an incident electron for multi-layer resists and heterogeneous multi-layer targets in the MC simulation. In order to form the T-gate shape in resist layers, we usually use the different developer for each resist layer to obtain good reproducibility in the fabrication of HEMT devices. To model accurately the real fabrication process of electron beam lithography, we have applied the different developers in trilayer resist system By using this model we have simulated and analyzed 0.l${\mu}{\textrm}{m}$ T-gate fabrication process in the HEMT devices, and showed our simulation results with the SEM observations of the T-shaped gate process.

A Study on Producing Electron Beam For the lustallation of Future Energy (차세대 에너지 이용을 위한 전자빔 발생장치에 관한 연구)

  • Kim, Won-Sop
    • Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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    • 2004.05a
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    • pp.374-377
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    • 2004
  • We present a detailed design study of high power large diameter backward wave oscillator operating at 24 GHz for a beam energy of 100 keV. The ratio of the mean diameter of the slow wave structure to the wavelength of output microwaves is increased to be 4.8. Analysis is made within the scope of linear theory of absolute instability.

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Calculation of Photon Spectra from the Tungsten Target for 10 MeV Electron Beam (10 MeV의 전자선이 텅스텐 표적에 충돌하여 생성되는 광자선 스펙트럼의 계산)

  • 이정옥;정동혁;문성록;강정구;김승곤
    • Progress in Medical Physics
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    • v.10 no.1
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    • pp.55-62
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    • 1999
  • In an effort to study the characteristics of x-rays utilized in radiation therapy, we calculated the energy distribution and the mean energy of x-rays generated from a tungsten target bombarded by 6, 10, and 15 MeV electron beams, using a Monte Carlo technique. The average photon energies calculated as a function of the beam radius lied in 1.4 ∼ 1.6, 2.1 ∼ 2.5 and 2.8 ∼ 3.3 MeV ranges for 4, 10, and 15 MV electron beams, respectively, which turned out to have no strong dependence on the radius. Using the energy distributions of 6,10, and 15 MV x-rays obtained for the target distance of 100 cm, percentage depth doses were determined using Monte Carlo calculations. For the case 10 MV, a comparison was made between our calculation and measurement performed by others. The calculated percentage depth dose appeared somewhat smaller than the measured one except in the surface region. We conclude that this is due to the fact that the beam hardening effect resulting from the flattening filter was not properly allowed for in our Monte Carlo calculations.

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A Facile Pretreatment Method for Rice Straw using Electron Beam Irradiation and 4-methylmorpholine-N-oxide Solution (전자선 조사와 4-메틸모포린-N-옥사이드 용액을 이용한 볏짚의 전처리 방법)

  • Lee, Byoung-Min;Lee, Jin-Young;Kang, Phil-Hyun;Jeun, Joon-Pyo
    • Microbiology and Biotechnology Letters
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    • v.43 no.1
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    • pp.16-21
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    • 2015
  • In this study, a facile two-step pretreatment method was investigated for producing fermentable sugars. Rice straw was pretreated using electron beam irradiation (EBI) and 4-methylmorpholine-N-oxide (NMMO) prior to enzymatic hydrolysis. In the first stage, the EBI on the rice straw was carried out at various doses (100, 300, 500 kGy) and then, irradiated rice straw was stirred with NMMO solution at 120°C for 1 h for the second stage. The pretreated rice straw was hydrolyzed by cellulase 1.5 L (70 FPU/ml) and Novozyme-188 (40 CbU/ml) at 50°C for 24, 48, and 72 h. A sugar yield of 83.8% was obtained from the pretreated rice straw after 72 h of enzymatic hydrolysis. Also, FTIR and XRD results indicate that the pretreatment of the rice straw was effective due to the synergic effects of the two-step pretreatment. In conclusion, rice straw might be a potential substrate for bioethanol production by yeast fermentation.

Evaluation of Shielding Performance of Tungsten Containing 3D Printing Materials for High-energy Electron Radiation Therapy (고에너지 전자선 치료 시 텅스텐 함유 3D 프린팅 물질의 차폐 성능 평가)

  • Yong-In Cho;Jung-Hoon Kim;Sang-Il Bae
    • Journal of the Korean Society of Radiology
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    • v.17 no.5
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    • pp.641-649
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    • 2023
  • This study compares and analyzes the performance of a shield manufactured using 3D printing technology to find out its applicability as a shield in high-energy electron beam therapy. Actual measurement and monte carlo simulations were performed to evaluate the shielding performance of 3D printing materials for high-energy electron beams. First, in order to secure reliability for the simulation, a source term evaluation was conducted by referring to the IAEA's TRS-398 recommendation. Second, to analyze the shielding performance of PLA+W (93%), a specimen was manufactured using a 3D printer, and the shielding rate by thickness according to electron beam energy was evaluated. Third, the shielding thickness required for electron beam treatment was calculated through a comparative analysis of shielding performance between PLA+W (93%) and existing shielding bodies. First, as a result of the evaluation of the source term through actual measurement and simulation, the TRS-398 recommendation was satisfied with an error of less than 1%, thereby securing the reliability of the simulation. Second, as a result of the shielding performance analysis for PLA+W (93%), 6 MeV electron beams showed a shielding rate of more than 95% at 3.12 mm, and 15 MeV electron beams showed a shielding rate of more than 90% at 10 mm thickness. Third, through simulations, comparative analysis between PLA+W (93%) materials and existing shields showed high shielding rates within the same thickness in the order of tungsten, lead, copper, PLA+W (93%), and aluminum. 6 MeV electron beams showed almost similar shielding rates at 5 mm or more and 15 MeV electron beams. Through this study in the future, it is judged that it can be used as basic data for the production and application of shielding bodies using PLA+W (93%) materials in high-energy electron beam treatment.

Variation of Effective SSD According to Electron Energies and Irradiated Field Sizes (전자선 에너지 및 조사야에 따른 유효선원 피부 간 거리 변화)

  • Yang, Chil-Yong;Yum, Ha-Yong;Jung, Tae-Sik
    • Radiation Oncology Journal
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    • v.5 no.2
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    • pp.157-163
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    • 1987
  • It is known that fixed source to skin distance (SSD) cannot be used when the treatment field is sloped or larger than the size of second collimator in electron beam irradiation and inverse square law using effective ssd should be adopted. Effective SSDs were measured in different field sizes in each 6, 9, 12, 15 and 18MeV electron energy by suing NELAC 1018D linear accelerator of Kosin Medical Center. We found important parmeters of effective SSD. 1. Minimum effective SSD was 58.8cm in small field size of $6\pm6cm$ and maximum effective SSD was 94.9cm in large field size of $25\pm25cm$, with 6MeV energy. It's difference was 36.1cm. The dose rate at measuring point was quite different even with a small difference of SSD in small field $(6\times6cm)$ and low energy (6 MeV). 2. Effective SSD increased with field size in same electron energy. 3. Effective SSDs gradually increased with the electron energies and reached maximum at 12 or 15 MeV electron energy and decreased again at 18MeV electron energy in each identical field size. And so the effective SSD should be measured in each energy and field size for practical radiotherapy.

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Superhydrophilic Surface Modification of Polyvinylidene Fluoride by Low Energy and High Flux ion Beam Irradiation (저에너지 고출력 이온빔을 이용한 polyvinylidene fluoride 표면의 초친수성화)

  • Park Jong-Yong;Jung Yeon-Sik;Choi Won-Kook
    • Korean Journal of Materials Research
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    • v.15 no.6
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    • pp.382-387
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    • 2005
  • Polyvinylidene fluoride (PVDF) surface was irradiated and became superhydrophilic by low energy (180 eV) and high flux $(\~10^{15}/cm{\cdot}s)$ ion beam. As an ion source, a closed electron Hall drift thruster of $\phi=70mm$ outer channel size without grid was adopted. Ar, $O_2$ and $N_2O$ were used for source gases. When $N_2O^+$ and $O_2^+$ reactive gas ion beam were irradiated with the ion fluence of $5\times10^{15}/cm^2$, the wetting angle for deionized water was drastically dropped from $61^{\circ}\;to\;4^{\circ}\;and\;2^{\circ}$, respectively. Surface energy was also increased up to from 44 mN/m to 81 mN/m. Change of chemical component in PVDF surface was analyzed by x-ray photoelectron spectroscopy. Such a great increase of the surface energy was intimately related with the increase of hydrophilic group component in reactive ion irradiated PVDF surfaces. By using an atomic force microscopy, the root-mean-square of surface roughness of ion irradiated PVDF was not much altered compared to that of pristine PVDF.

A study on the radiation effect of silicon solar cells in a low Earth orbit satellite by using high energy electron beams (고에너지 전자빔을 이용하여 저궤도 인공위성의 실리콘 태양센서의 내방사선 특성 연구)

  • Chung, Sung-In;Lee, Jae-Jin;Lee, Heung-Ho
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.45 no.3
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    • pp.1-5
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    • 2008
  • This paper analyzes on the radiation effect of silicon solar cells in a low Earth orbit satellite by using high energy electron beams. Generally, the satellite circling round in a low orbit go through Van Allen belt, in which electronic components are easily damaged and shortened by charged particles moving in a cycle between the South Pole and the North Pole. For example, Single Event Upset (SEU) by radiation could cause electronic devices on satellite to malfunction. From the ground experiment in which we used the high energy electron beam facility at Knrea Atomic Energy Research Institute (KAERI), we tried to explain sun sensor degradations on orbit could he caused by high energy electrons. While we focused on the solar cells used for light detectors, We convince our research also contributes to understand the radiation effect of solar cells generating electric powers on satellites.

A Study on the Equipment of Neutral Beam Assisted Deposition for MgO Protective Layer of High Efficient AC PDP (고효율 AC PDP용 MgO 보호막 형성을 위한 중성빔 보조 증착 장비에 관한 연구)

  • Li, Zhao-Hui;Kwon, Sang-Jik
    • Journal of the Semiconductor & Display Technology
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    • v.7 no.2
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    • pp.63-67
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    • 2008
  • The MgO protective layer plays an important role in plasma display panels (PDPs). Our previous work demonstrated that the properties of MgO thin film could be improved, which were deposited by ion beam assisted deposition (IBAD). However arc discharge always occurs during the IBAD process. To avoid this problem, oxygen neutral beam assisted deposition (NBAD) is used to deposit MgO thin films in this paper. The energy of the oxygen neutral beam was used as the parameter to control the deposition. The experimental results showed that the oxygen neutral beam energy was effective in determining in F/$F^+$ centers, crystal orientation, surface morphology of the MgO thin film, and the discharge characteristics of AC PDP. The lowest firing voltage $(V_f)$ and the highest secondary electron emission coefficient $(\gamma)$ were obtained when the neutral beam energy was 300 eV.

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