• KIEE International Transactions on Electrophysics and Applications
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• 제4C권1호
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• pp.10-14
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• 2004

A large area electron beam generator has been developed for industrial applications, for example, waste water cleaning, flue gas treatment, and food pasteurization. The operational principle is based on the emission of secondary electrons from the cathode when ions in the plasma contact the cathode, which are accelerated toward the exit window by the gradient of the electric potential. Conventional electron beam generators require an electron beam scanning mechanism because a small area thermal electron emitter is used. The electron beam of the large area electron beam generator does not need to be scanned over target material because the beam area is considerable. We have fabricated a large area electron beam generator with peak energy of 200keV, and a beam diameter of 200mm. The electron beam current has been investigated as a function of accelerating voltage and distance from the extracting window while its radial distribution in front of the extracting window has been also measured.

• 한국공작기계학회논문집
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• 제17권5호
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• pp.52-57
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• 2008

Most of the electrons emitted from the filament, are captured by the anode. The portion of the electron current that leaves the gun through the hole in the anode is called the beam current. Electron beam probe is called the focused beam on the specimen. Because of the lenes and aperture, the probe current becomes smaller than the beam current. It generate various signals(backscattered electron, secondary electron) in an interaction with the specimen atoms. Backscattered electron provide an useful signal for composition and local specimen surface inclination. Secondary electron is used far the formation of surface imagination. The steady electron beam probe is very important for the imagination formation and the brightness. In this paper, we show the results of developed elements that create electron beam probe and the measured beam probe in various acceleration voltages by Faraday cup. These data are used to analysis and improve the performance of the system in the development.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 춘계학술대회 논문집
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• pp.1875-1878
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• 2005

It is not efficient and scarcely out of the question to use commercial expensive electron beam lithography system widely used for semiconductor fabrication process for the manufacturing application field of various devices in the small business scope. Then scanning electron microscope based electron beam machining system is maybe regarded as a powerful model can be used for it simply. To get a complete suite of thus proper system, column unit build up with electron beam gun head unit is necessarily required more than anything else to modify scanning electron microscope. In this study, various components included ceramic isolation plate and main body which are essentially constructed for electron beam gun head unit are designed and manufactured. And this electron beam gun head unit will be used for next connected study in the development step of scanning electron microscope based electron beam machining system.

• 전기의세계
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• 제27권6호
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• pp.49-53
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• 1978

This paper investigates on the electric input characterisitcs of plasma electron beam in H$_{2}$ gas chamber with various pressures, effected by the shape and dimension of hollow screen cathode during electron beam is formed. The result are as follows: (1)Electron beam is formed in the region of positive resistance on the characteristic curve which shows the relation between the voltage and current of electron beam, independent of the shape and dimension of hollow screen cathode. (2)At a given electron beam current, electron beam voltage increases with the decreases of hollow screen cathode length and screen mesh number of it. (3)At a given electron beam current, electron beam voltage increases with the diameters of hollow screen cathode and electron beam hole of it.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2001년도 하계학술대회 논문집 C
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• pp.1609-1611
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• 2001

A large cross-section pulsed electron beam generator of cold cathode type has been developed for industrial applications, for example, waste water cleaning, flue gas cleaning, and pasteurization etc. The operational principle is based on the emission of secondary electrons from cold cathode when ions in the plasma hit the cathode, which are accelerated toward exit window by the gradient of an electric potential. The conventional electron beam generators need an electron scanning beam because the small cross section thermal electron emitter is used. The electron beam of large cross-section pulsed electron beam generator do not need to be scanned over target material because the beam cross section is large by 300$cm^2$. We have fabricated the large cross-sectional pulsed electron beam generator with the peak energy of 200keV and beam diameter of 200mm and obtained the large area electron beam in the air. The electron beam current has been investigated as a function of accelerating voltage, glow discharge current, helium pressure, distance from the exit window and radial distribution in front of the exit window.

• Journal of Welding and Joining
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• 제15권3호
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• pp.79-87
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• 1997

This study was performed to evaluate basic characteristics of electron beam welding process for a 9% Ni steel plate. The principal welding process parameters, such as working distance, accelerating voltage, beam current and welding speed were investigated. The AB (Arata Beam) test method was also applied to characterize beam size and energy density of the electron beam welding process. The electron beam size was found to decrease with the increase of accelerating voltage and the decrease of working distance. So, in case of high voltage (150kV), spot size and energy density of electron beam were revealed to be 0.9mm and $6.5\times10^5W/\textrm{cm}^2$ respectively. The accelerating voltage among the welding parameters was found to be the most important factor governing the penetration depth. When the accelerating voltage of electron beam was low ($\leq$90kV), beam current and welding speed did not affect on the penetration depth significantly. However, in case of high voltage ($\geq$120kV), the depth of penetration increased very sensitively with the increase of beam current and the decrease of welding speed.

• 한국염색가공학회지
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• 제15권2호
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• pp.102-108
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• 2003

Before studying graft polymerization of PP(polypropylene) nonwoven fabrics by electron beam preirradiation method, mechanical properties, thermal properties and degree of crystallinity of original and electron beam irradiated PP nonwoven fabrics were investigated. Morphological surface changes of electron beam irradiated PP nonwoven fabrics were not observed. And the melting temperature and crystallinity of electron beam irradiated PP nonwoven fabrics also did not change as compared with untreated PP nonwoven fabrics. But the breaking strength of electron beam irradiated PP nonwoven fabrics decreased with increasing electron beam absorbed dose due to breakdown of some parts of polymer main chain.

• Journal of Welding and Joining
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• 제14권3호
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• pp.29-40
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• 1996

Electron beam 용접은 전자총에서 발생된 electron beam을 렌즈로 집속시켜 고 에너지의 열원을 얻는 것을 기본 원리로 하고 있다. Electron beam은 렌즈에 의해 매우 작게 집속(0.1 - 1mm.PHI.)시켜 높은 에너지밀도로 만들 수 있으므로 용접을 매우 깊게(수십 - 수백 mm) 할 수 있다. 이러한 용접 특성은 모재의 열변형을 최소로 하여 용접 부위가 원래의 성질을 잃어버리는 것을 최소화한다. 그러나, deep welding 의 경우 입력 파워 밀도가 너무 큰 관계로 계면 부위가 기계적 충격에 약하다는 단점 을 갖고 있다. Electron beam 용접은 서로 다른 금속을 filler material 없이 용접할 수 있으며 복잡한 구조의 용접이 가능하다. 또한 대부분의 electron beam 용접은 진공 중에서 이루어지기 때문에 공기의 영향을 받지 않는다는(산화 방식) 특성을 갖고 있다. 즉, 공기와의 접촉이 적기 때문에 산화가 방지되고 용접 순도가 매우 높다는 장점을 갖고 있다. 이는 반면 장치가 거대해지고 비싸다는 단점으로 작용한다. 1980년대 부터 이러한 단점의 극복을 위해서 대기중에서의 electron beam 용접에 관한 연구가 수행 되어 실용화 단계에 이루고 있다. 최근 전자, computer기술의 발달로 electron beam 출력을 더욱 더 정밀하게 조절할 수 있고, computer와 sensor의 결합으로 자동용접 위치 제어와 NC(Numerical Control) 작업대의 설치로 완전 자동화 용접 공정이 가능 하다. 그 결과 높은 용접 속도를 얻을 수 있으며 무인 생산 체계에로의 응용이 가능 하다.

• 한국레이저가공학회지
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• 제18권4호
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• pp.12-16
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• 2015

The research on multi electron beam systems is being carried out by various methods. We are studying multi electron beam system using miniaturized electron beam columns. The column consists of electrostatic lenses, electrostatic deflector and tip emitter. Our operating system controls 4 column array, captures images of each column and maintains the instrument. We present the usefulness of our operating system for multi columns by capturing images of each column.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 하계학술대회 논문집 E
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• pp.2170-2172
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• 1999

A low energy large aperture(LELA) pulsed electron beam generator of a cold cathode type has been developed for environmental applications, for example, waste water cleaning, flue gas cleaning, and pasteurization etc. The operational principle is based on the emission of secondary electrons from cold cathode when ions in the plasma hit the cathode, which are accelerated toward exit window by the gradient of an electric potential. We have fabricated the LELA electron beam generator with the peak energy of 200keV and beam diameter of 200mm and obtained the large aperture electron beam in air. The electron beam current density has been investigated as a function of glow discharge current, accelerating voltage and radial distribution in front of the exit window foil. The plasma density and electron temperature have been measured in order to confirm the relation with the electron beam current density. We are going to upgrade the LELA electron beam generator in the electron energy, electron beam current and stability of operation for various applications.