• 마이크로전자및패키징학회지
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• 제13권4호
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• pp.71-75
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• 2006

GDI602:Rubrene(10%) 형광 시스템을 이용하여 황색 발광 OLED를 제작하고 그 특성을 평가하였다. 소자 제작에서 ITO/glass 위에 정공 주입층으로 2-TNATA[4,4',4'-tris(2-naphthylphenyl-phenyl-amino)-triphenylamine]를, 정공 수송층으로 NPB[N,N'-bis(1-naphthyl)-N,N'-diphenyl-1,1'-biphenyl-4,4-diamine]를 진공 증착하였다. 황색 발광층으로는 GDI602를 호스트로, Rubrene를 도펀트로 사용하였다. 또한, 전자 수송층으로는 $Alq_{3}$를, 전자 주입층으로는 LiF를 사용하여 $ITO/2-TNATA/NPB/GDI602:Rubrene(10%)/Alq_{3}/LiF/Al$ 구조의 저분자 OLED를 제작하였다. 본 실험에서 제작된 황색 OLED는 562nm의 중심 발광 파장을 가지며, CIE(0.50, 0.49) 색순도, 그리고 10V의 동작전압에서 $2300\;Cd/m^{2}$ 휘도와 0.7 lm/W의 전력 효율을 나타내었다.

• 반도체디스플레이기술학회지
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• 제6권2호
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• pp.19-23
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• 2007

The blue emitting OLEDs using TMP-BiP[(4'-Benzoylferphenyl-4-yl)phenyl-methanone-Diethyl(biphenyl-4-ymethyl) phosphonate] host and DJNBD-1 dopant have been fabricated and characterized. In the device fabrication, 2-TNATA [4,4',4"-tris(2-naphthylphenyl-phenylamino)-triphenylamine] as a hole injection material and NPB [N,N'-bis(1-naphthyl)N,N'-diphenyl-1,1'-biphenyl-4,4'-diamine] as a hole transport material were deposited on the ITO(indium tin oxide)/glass substrate by vacuum thermal evaporation method. Followed by the deposition, blue color emission layer was deposited using TMP-BiP as a host material and DJNBD-1 as a dopant. Finally, small molecule OLEDs with structure of $ITO/2-TNATA/NPB/TMP-BiP:DJNBD-l/Alq_3/LiF/Al$ were obtained by in-situ deposition of $Alq_3$, LiF and Al as the electron transport material, electron injection material and cathode, respectively. The effect of dopant into host material of the blue OLEDs was studied. The blue OLEDs with DJNBD-1 dopant showed that the maximum current and luminance were found to be about 34 mA and $8110\;cd/m^2$ at 11 V, respectively. In addition, the color coordinate was x=0.17, y=0.17 in CIE color chart, and the peak emission wavelength was 440 nm. The maximum current efficiency of 2.15 cd/A at 7 V was obtained in this experiment.

• 대한전자공학회논문지SD
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• 제37권8호
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• pp.42-47
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• 2000

분자선결정성장법을 이용하여 자기구성 양자점들을 high electron mobility transistor (HEMT)의 체널 영역에 삽입하여, 양자점내의 inter-subband transition을 이용한 전파장 적외선 수광소자를 제작하였다. 제작된 소자는 180 K 이상의 온도에서 InAs 양자점의 전자에 대한 강한 구속력으로 인해 낮은 암전류 특성을 보이며 7${\mu}m$에서 11${\mu}m$까지의 넓은 수광영역을 나타내었다. 9.4${\mu}m$에서 peak 광전류가 검출되었으며 이때의 검출율은 $1.93{\times}10^{10}cmHz^{1/2}/W$ 였다. 장파장 적외선 검출에 따른 광전류는 가해진 전압에 대하여 전계효과트랜지스터와 같은 전류-전압 특성을 가지며, 인가된 전압이 증가함에 따라 증가된 암전류에 의하여 광전류가 감소하는 특성을 보여주고 있다.

• 한국전기전자재료학회논문지
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• 제27권12호
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• pp.820-824
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• 2014

TiNOx multi-layer thin films on aluminum substrates were prepared by DC reactive magnetron sputtering method. 4 multi-layers of $TiO_2$/TiNOx(LMVF)/TiNOx(HMVF)/Ti/substrate have been prepared with ratio of Ar and ($N_2+O_2$) gas mixture. $TiO_2$ of top layer is anti-reflection layer on double TiNOx(LMVF)/TiNOx(HMVF) layers and Ti metal of infrared reflection layer. In this study, the crystallinity and surface properties of TiNOx thin films were estimated by X-ray diffraction(XRD) and field emission scanning electron microscopy(FE-SEM), respectively. The grain size of TiNOx thin films shows to increase with increasing sputtering power. The composition of thin films has been investigated using electron probe microanalysis(EPMA). The optical properties with wavelength spectrum were recorded by UV-Vis-NIR spectrophotometry at a range of 200~1,500 nm. The TiNOx multi-layer films show the excellent optical performance beyond 9% of reflectance in those ranges wavelength.

• 대한금속재료학회지
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• 제50권11호
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• pp.847-854
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• 2012

Al-doped ZnO (AZO) thin films were grown on quartz substrates by the sol-gel method. The effects of the Al mole fraction on the structural and optical properties of the AZO thin films were investigated by scanning electron microscopy (SEM), X-ray diffraction (XRD), and UV-VIS spectroscopy. The particle size of the AZO thin films decreased with an increase in Al concentrations. The optical parameters, the optical band gap, absorption coefficient, refractive index, dispersion parameter, and optical conductivity, were studied in order to investigate the effects of Al concentration on the optical properties of AZO thin films. The dispersion energy, single-oscillator energy, average oscillator wavelength, average oscillator strength, and refractive index at an infinite wavelength of the AZO thin films were affected by the Al incorporation. The optical conductivity of the AZO thin films also increased with increasing photon energy.

• 한국광학회지
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• 제28권6호
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• pp.356-360
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• 2017

ITO는 높은 전기 전도도와 가시광선, 근적외선 영역에서 투명성을 가진다. LCD, OLED 등을 포함한 광학에 적용되는 부품들의 제조에 투명전극으로 ITO가 사용되고 있다. 가시광선 영역에서의 투명성과 높은 전도도 때문에 다양한 전기, 디스플레이 센서의 전극으로 이용되었다. 한 가지 사안은 기판의 특성에 충격없이 ITO, 금속 필름같은 특정한 영역의 층을 제거하는 부분이다. 레이저를 사용한 유리 위의 ITO 제거는 기존 방법에 비해 친환경적이다. 본 연구는 펨토초 레이저와 나노초 레이저를 사용하여 ITO를 제거하는 비교분석이다.

• 대한화학회지
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• 제37권11호
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• pp.929-936
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• 1993

몇 가지의 전자주개와 하나의 전자받개와의 전하이동 착물에 관한 연구는 세 종류의 용매 즉, 염화에틸렌, 염화메틸렌 그리고 클로로포름하에서 그리고 16, 19, 22, 25$^{\circ}$C의 온도범위에서 자외선 분광광도계로서 최대흡수파장 및 흡광도를 측정하였다. 그리고 이 연구는 전자주개로서는 1,2,3,4-테트라하이드로카바졸, 2-메틸, 3-메틸 그리고 3-에킬사수소카바졸을 선택하였으며 전자받개로는 클로라닐을 이용하였다. 이 전하이동 착물은 1:1 몰비로 형성되었으며, 최대흡광도 및 형성상수는 용매의 극성과 온도에 따라 감소하였다. 열역학적 양으로서 용매의 극성과 온도가 형성상수에 미치는 영향을 논하였으며, 또한 몇 가지의 전자주개들의 전자 및 입체효과가 형성상수에 미치는 효과를 고찰하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.247-247
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• 2012

Plasmon subwavelength nanostructures enable the structurally modulated color due to the resonance conditions for the specific wavelength range of light with the nanoscale hole arrays on a metal layer. While the unique properties offered from a single layer of metal may open up the potential applications of integrated devices to displays and sensors, fabrication requirements in nanoscale, typically on the order of or smaller than the wavelength of light in a corresponding medium can limit the cost-effective implementation of the plasmonic nanostructures. Simpler nanoscale replication technologies based on the soft lithography or roll-to-roll nanoimprinting can introduce economically feasible manufacturing process for these devices. Such replication requires an optimal design of a master template to produce a stamp that can be applied for a roll-to-roll nanoimprinting. In this paper, a master mold with subwavelength nanostructures is fabricated and optimized using focused ion beam for the applications to nanoimprinting process. Au thin film layer is deposited by sputtering on a glass that serves as a dielectric substrate. Focused ion beam milling (FIB, JEOL JIB-4601F) is used to fabricate surface plasmon subwavelength nanostructures made of periodic hole arrays. The light spectrum of the fabricated nanostructures is characterized by using UV-Vis-NIR spectrophotometer (Agilent, Cary 5000) and the surface morphology is measured by using atomic force microscope (AFM, Park System XE-100) and scanning electron microscope (SEM, JEOL JSM-7100F). Relationship between the parameters of the hole arrays and the corresponding spectral characteristics and their potential applications are also discussed.

• 천문학회지
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• 제28권1호
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• pp.97-107
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• 1995

The stability of the geometrically thin, two-temperature hot accretion disk is studied. The general criterion for thermal instability is derived from the linear local analyses, allowing for advective cooling and dynamics in the vertical direction. Specifically, classic unsaturated Comptonization disk is analysed in detail. We find five eigen-modes: (1) Heating mode grows in thermal time scale, $(5/3)({\alpha}{\omega})^{-1}$, where alpha is the viscosity parameter and w the Keplerian frequency. (2) Cooling mode decays in time scale, $(2/5)(T_e/T_i)({\alpha}{\omega})^{-1}$, where $T_e\;and\;T_i$ are the electron and ion temperatures, respectively. (3) Lightman-Eardley viscous mode decays in time scale, $(4/3)(\Lambda/H)^2({\alpha}{\omega})^{-1}$, where $\Lambda$ is the wavelength of the perturbation and H the unperturbed disk height. (4) Two vertically oscillating modes oscillate in Keplerian time scale, $(3/8)^{1/2}\omega^{-1}$ with growth rate $\propto\;(H/\Lambda)^2$. The inclusion of dynamics in the vertical direction does not affect the thermal instability, adding only the oscillatory modes which gradually grow for short wavelength modes. Also, the advective cooling is not strong enough to suppress the growth of heating modes, at least for geometrically thin disk. Non-linear development of the perturbation is followed for simple unsaturated Compton disk: depending on the initial proton temperature perturbation, the disk can evolve to decoupled state with hot protons and cool electrons, or to one-temperature state with very cool protons and electrons.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제50권9호
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• pp.444-449
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• 2001

In this paper, a novel ultraviolet sensor is presented based on a photoluminescent porous silicon. Porous silicon layer was formed by chemical etching of surface of pn junction in a $HF(48%)-HNO_3(60%)-H_20$ solution. Incident ultraviolet(UV) light is converted to visible light by photoluminescent porous silicon layer, and then this visible light generates electron-hole pairs in the pn junction, which produces a photocurrent flow through the device. In order to maximize detection efficiency, the peak sensitivity wavelength of the pn junction diode was matched with the peak wavelength of Photoluminescence from porous silicon layer. The porous silicon ultraviolet sensor showed a large output current as UV intensity increases and but very low sensitivity to visible light. The detection sensitivity of porous silicon sensor was calculated as 2.91mA/mW. These results are expected to open up a possibility that the present porous silicon sensor can be used for detecting UV light in a visible background, compared to silicon UV detectors which have an undesirable response to visible light.