• Title/Summary/Keyword: Electron range

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Analysis of electron transport properties of $CF_4+Ar$ mixtures gas by the TOF method (TOF법에 의한 $CF_4+Ar$ 혼합기체의 전자수송특성 해석)

  • 서상현;하성철;유회영
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.06a
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    • pp.279-283
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    • 1998
  • The electron swarm parameters in the$CF_4$(O.l%, 5%)+Ar mixtures are measured by time of flight method over the E/N(Td) range from 10 to 300LTdl. A two-term approximation of the Boltzmann equation analysis and Monte Carlo simulation have been also used to study electron transport coefficients. We have calculated W, NDL, NDT, $\alpha$ and the limiting breakdown electric field to gas mixtures ratio in pure $CF_4$ gas and$CF_4+Ar$ mixtures. The measured results and the calculated results have been compared each other paper.

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Dual Gate-Controlled SOI Single Electron Transistor: Fabrication and Coulomb-Blockade

  • Lee, Byung T.;Park, Jung B.
    • Journal of Electrical Engineering and information Science
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    • v.2 no.6
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    • pp.208-211
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    • 1997
  • We have fabricated a single-electron-tunneling(SET) transistor with a dual gate geometry based on the SOI structure prepared by SIMOX wafers. The split-gate is the lower-gate is the lower-level gate and located ∼ 100${\AA}$ right above the inversion layer 2DEG active channel, which yields strong carrier confinement with fully controllable tunneling potential barrier. The transistor is operating at low temperatures and exhibits the single electron tunneling behavior through nano-size quantum dot. The Coulomb-Blockade oscillation is demonstrated at 15mK and its periodicity of 16.4mV in the upper-gate voltage corresponds to the formation of quantum dots with a capacity of 9.7aF. For non-linear transport regime, Coulomb-staircases are clearly observed up to four current steps in the range of 100mV drain-source bias. The I-V characteristics near the zero-bias displays typical Coulomb-gap due to one-electron charging effect.

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Drift Velocities and Distribution Function for Electrons $SF_6$-Ar Mixtures Gas ($SF_6$-Ar 혼합기체의 전자이동속도와 전자분포함수)

  • Kim, Sang-Nam
    • Proceedings of the KIEE Conference
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    • 2008.11b
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    • pp.85-88
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    • 2008
  • Drift velocities and Distribution Function for electrons in $SF_6$-Ar mixtures gas used by MCS-BEq algorithm has been analysed over the E/N range $30{\sim}300[Td]$ by a two term Boltzmann equation and by a Monte Carlo simulation using a set of electron cross sections determined by other authors, experimentally the electron swarm parameters for 0.2[%] and 0.5[%] $SF_6$-Ar mixtures were measured by time-of-flight method, The results show that the deduced electron drift velocities agree reasonably well with theoretical for a rang of E/N values The results simulation have been compared with present and previously obtained data and respective set of electron collision cross sections of the molecules.

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The analysis on the electron swarm parameter in $SiH_4$+Ar mixtures ($SiH_4$+Ar혼합기체의 전자군 파라미터 해석)

  • Seong, Nak-Jin;Kim, Sang-Nam
    • Proceedings of the KIEE Conference
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    • 2002.06a
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    • pp.106-109
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    • 2002
  • This paper calculates and gives the analysis of electron swarm transport coefficients as described electric conductive characteristics of pure Ar, pure $SiH_4$, Ar + $SiH_4$ mixture gases ($SiH_4$--0.5%, 2.5%, 5%) over the range of E/N =0.01${\sim}$300[Td]. P=0.1, 1, 5.0[Torr] by Monte Carlo the Backward prolongation method of the Boltzmann equation using computer simulation without using expensive equipment. The results have been obtained by using the electron collision cross sections by TOF. PT.SST sampling, compared with the experimental data determined by the other author. It also proved the reliability of the electron collision cross sections and shows the practical values of computer simulation.

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Drift Velocities for Electrons in $SF_6$-Ar Mixtures Gas by Simulation (시뮬레이션에 의한 $SF_6$-Ar혼합기체(混合氣體)의 전자(電子) 이동속도(移動速度))

  • Kim, Sang-Nam
    • Proceedings of the KIEE Conference
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    • 2006.07c
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    • pp.1566-1567
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    • 2006
  • Energy distribution function for electrons in $SF_6$-Ar mixtures gas used by MCS-BEq algorithm has been analysed over the E/N range $30{\sim}300$[Td] by a two term Boltzmann equation and by a Monte Carlo Simulation using a set of electron cross sections determined by other authors, experimentally the electron swarm parameters for 0.2[%] and 0.5[%] $SF_6$-Ar mixtures were measured by time-of-flight (TOF) method. The results show that the deduced electron drift velocities, the electron ionization or attachment coefficients, longitudinal and transverse diffusion coefficients and mean energy agree reasonably well with theoretical for a rang of E/N values.

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Drift Velocities for Electrons in $SF_6$-Ar Mixtures Gas by Simulation (시뮬레이션을 이용한 $SF_6$-Ar혼합기체의 전자 이동속도)

  • Hwang, Cheong-Ho;Kim, Sang-Nam
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.451-452
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    • 2007
  • Drift velocities for electrons in $SF_6$-Ar mixtures gas by simulation has been analysed over the EIN range 30~300[Td] by a two term Boltzmann equation and by a Monte Carlo Simulation using a set of electron cross sections determined by other authors, experimentally the electron swarm parameters for 0.2[%] and 0.5[%] $SF_6$-Ar mixtures were measured by time-of-flight (TOF) method. The results show that the deduced electron drift velocities, the electron ionization or attachment coefficients. longitudinal and transverse diffusion coefficients and mean energy agree reasonably well with theoretical for a rang of E/N values.

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Electron Transport Characteristic in $SF_6-N_2$ Mixture Gases by MCS-BEq Simulation (시뮬레이션에 의한 $SF_6-N_2$ 혼합기체의 전자수송특성)

  • Kim, Sang-Nam
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.507-508
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    • 2006
  • $SF_6$ gas is widely used in industrial of insulation field. In this paper, $N_2$ is mixed to improve pure $SF_6$ gas characteristics. Electron transport coefficients in $SF_6-N_2$ mixture gases are simulated in range of E/N values from 70 to 400 [Td] at 300K and 1 Torr by using Boltzmann equation method. The results have been obtained by using the electron collision cross sections by TOF, PT, SST sampling, compared with the experimental data determined by the other author. It also proved the reliability of the electron collision cross sections and shows the practical values of computer simulation. The result of Boltzmann equation and Monte Carlo Simulation has been compared with experimental data by Ohmori, Lucas and Carter. The swarm parameter from the swarm study are expected to sever as a critical test of current theories of low energy scattering by atoms and molecules.

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Energy Distribution Function for Electrons in SF6+Ar Mixtures Gas used by MCS-BEQ Algorithm (SF6+Ar혼합기체의 MCS-BEq에 의한 전자분포함수)

  • Kim, Sang-Nam
    • The Transactions of the Korean Institute of Electrical Engineers P
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    • v.51 no.1
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    • pp.28-32
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    • 2002
  • Energy distribution function for electrons in $SF_6+Ar$ mixtures gas used by MCS-BEq algorithm bas been analysed over the E/N range 30-300[Td] by a two term Boltzmann equation and by a Monte Carlo Simulation using a set of electron cross sections determined by other authors, experimentally the electron swarm parameters for 0.2[%] and 0.5[%] $SF_6+Ar$ mixtures were measured by time-of-flight(TOF) method. The results show that the deduced electron drift velocities, the electron ionization or attachment coefficients, longitudinal and transverse diffusion coefficients and mean energy agree reasonably well with theoretical for a rang of E/N values.

The Importance of Halogen Bonding: A Tutorial

  • Cho, Seung Joo
    • Journal of Integrative Natural Science
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    • v.5 no.3
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    • pp.195-197
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    • 2012
  • Halogen atoms in a molecule are traditionally considered as electron donors, since they have unshared electrons. Normally when they are bonded, there are three lone pair electrons. These lone pairs can function as Lewis bases. However, when they are bound to electron withdrawing groups, they can act as Lewis acids. Since the situation is similar hydrogen bonding (HB), this type of interaction is named as halogen bonding (XB). This mainly comes from the uneven distribution of electron density around the halogen atoms. Since the electron density around halogen atom opposite to ${\sigma}$-bond is depleted, its electropositive region is called ${\sigma}$-hole. This ${\sigma}$-hole can attract halogen bond acceptors, requiring more stringent directionality compared to HB. Since this interaction mainly comes from electrostatic origin, the geometry tends to be linear. Since the XB energy is comparable to corresponding HB. Still in its infancy, XB shows a broad range of applicability, with potentially more useful properties, compared to corresponding HB.

용액Ga에서 성장된 고순도 적층 GaAs의 제조와 그의 성질

  • ;P.E. Greene
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.5 no.1
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    • pp.1-5
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    • 1968
  • GaAs single crystals were grown epitaxially from Ga solution with carrier concentrations in the range and electron mobilities between 7,500 and 9,300$\textrm{cm}^2$/v-sec. at 300$^{\circ}$K, and 50,000 and 95,000 $\textrm{cm}^2$/V-sec. at 77$^{\circ}$K. A comparison of the theoretical and experimental curves for the mobility vs. temperature indicates that the significant scattering mechanisms are ionized impurities and phonons in the temperature range of 77$^{\circ}$K to 439$^{\circ}$K. This indicates that the epitaxial layers do not contain other mobility limiting imperfections to a significant degree. Photoluminescence spectra of the. epitaxial layers did not show any emission due to deep lying imperfection leve1s.

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