• 제목/요약/키워드: Electron beam system

검색결과 407건 처리시간 0.037초

전자빔 가공기의 제어기 구성 (Controller Design for Electron Beam Manufacturing System)

  • 임선종;강재훈;이찬홍
    • 한국정밀공학회:학술대회논문집
    • /
    • 한국정밀공학회 2005년도 춘계학술대회 논문집
    • /
    • pp.1862-1865
    • /
    • 2005
  • We have a plan to design a controller for electron beam manufacturing system. At first, we designed a controller for SEM. The controller consists of five parts (power source, beam controller, scanning controller, optic controller and main controller). Beam controller supplies pulse wave for generating high voltage and can monitor the status of high voltage instrument through emission current. Optic controller controls focus, spot size and image shift. Main controller transmits variables from operating program to each part and monitors the status of peripheral device.

  • PDF

40keV 저에너지 전자빔을 이용한 단결정 Si 태양전지의 변환 효율에 관한 연구 (Study about Conversion Efficiency of c-Si Solar Cells Using Low energy(40keV) Electron Beam)

  • 윤정필;강병복;박세준;윤필현;차인수
    • 전력전자학회:학술대회논문집
    • /
    • 전력전자학회 2003년도 춘계전력전자학술대회 논문집(2)
    • /
    • pp.942-948
    • /
    • 2003
  • This paper about the small electron beam irradiator for solar cell's efficiency. Many things are studied by method to increase conversion efficiency of solar cell. We selected electron beam by method for conversion efficiency of solar cell. Energy bands of this electron beam irradiator is 80keV(max.). And, solar cells that apply in this paper are crystal Si. Average efficiency of solar cell that applies in this experiment is 10$\%$. This system manufactured low energy electron beam irradiator. And, electron beam irradiation to solar cell in vacuum chamber of this irradiator. Irradiation area is 20*20 [mm2] by 40[keV].

  • PDF

Secondary Electron Emission Characteristics of Functional Layer in AC-PDP

  • Son, Chang-Gil;Han, Young-Gyu;Kim, Yong-Hee;Cho, Byeong-Seong;Hong, Young-Jun;Song, Ki-Baek;Bae, Young-Joo;Kim, In-Tae;Choi, Eun-Ha
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
    • /
    • pp.736-739
    • /
    • 2009
  • We have studied that the secondary electron emission characteristics of functional layers which have different kinds of MgO sub-micrometer size powder in AC-PDP. We used cathodoluminescence(CL) and gamma focused ion beam (${\gamma}$-FIB) system for measurement of secondary electron emission characteristics. Also we made 6 inch test panel which applied functional layers for evaluation of discharge characteristics.

  • PDF

Measurement of secondary electron emission coefficient(${\gamma}$) with oblique low energy ion and work function ${\phi}_{\omega}$ of theMgO thin film in AC-PDPs

  • Park, W.B.;Lim, J.Y.;Oh, J.S.;Jeong, H.S.;Jung, K.B.;Jeon, W.;Cho, G.S.
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
    • /
    • pp.507-510
    • /
    • 2004
  • Oblique ion-induced secondary electron emission coefficient(${\gamma}$) with low energy ..and work function ${\phi}_{\omega}$(${\theta}$ = 0 and ${\theta}$ = 20) of the MgO thin film in AC-PDPs has been measured by ${\gamma}$-FIB system. The MgO thin film has been deposited from sintered material under electron beam evaporation method. The energy of $He^+$ ions used has been ranged from 50eV to 150eV. Oblique ion beam has been chosen to be 10 degree, 20 degree and 30 degree. It is found that the higher secondary electron emission coefficient(${\gamma}$) has been achieved by the higher oblique ion beam up to inclination angle of 30 degree than the perpendicular incident ion beam.

  • PDF

E-beam과 R.F. 마그네트론 스퍼터링을 사용한 double MgO박막의 전기-광학적 특성 (Electro - Optical Characteristics of MgO Double Layer prepared by E-beam and Sputtering Method)

  • 옥정우;김현종;최정훈;최준영;김동현;이해준;유수복;박정후
    • 대한전기학회:학술대회논문집
    • /
    • 대한전기학회 2005년도 제36회 하계학술대회 논문집 C
    • /
    • pp.2172-2174
    • /
    • 2005
  • MgO has been used as the material of the protecting layer for AC PDP. AC PDP is influenced by characteristics of the surface glow discharge on the MgO thin film. Because MgO thin film is practically discharge electrodes, the discharge characteristics of MgO thin film should be varied with the method of deposition. In this study, changing order and time of deposition, we use electron beam evaporation system and R.F reactive magnetron sputtering system in the MgO deposition. Particularly, after using electron beam evaporation system, we use R.F. reactive magnetron sputtering system in the MgO deposition, then we could get lower amount of charge and higher luminance efficiency than only using electron beam evaporation system.

  • PDF

Upgrade of gamma electron vertex imaging system for high-performance range verification in pencil beam scanning proton therapy

  • Kim, Sung Hun;Jeong, Jong Hwi;Ku, Youngmo;Jung, Jaerin;Cho, Sungkoo;Jo, Kwanghyun;Kim, Chan Hyeong
    • Nuclear Engineering and Technology
    • /
    • 제54권3호
    • /
    • pp.1016-1023
    • /
    • 2022
  • In proton therapy, a highly conformal proton dose can be delivered to the tumor by means of the steep distal dose penumbra at the end of the beam range. The proton beam range, however, is highly sensitive to range uncertainty, which makes accurately locating the proton range in the patient difficult. In-vivo range verification is a method to manage range uncertainty, one of the promising techniques being prompt gamma imaging (PGI). In earlier studies, we proposed gamma electron vertex imaging (GEVI), and constructed a proof-of-principle system. The system successfully demonstrated the GEVI imaging principle for therapeutic proton pencil beams without scanning, but showed some limitations under clinical conditions, particularly for pencil beam scanning proton therapy. In the present study, we upgraded the GEVI system in several aspects and tested the performance improvements such as for range-shift verification in the context of line scanning proton treatment. Specifically, the system showed better performance in obtaining accurate prompt gamma (PG) distributions in the clinical environment. Furthermore, high shift-detection sensitivity and accuracy were shown under various range-shift conditions using line scanning proton beams.

PLS-II 전자총 진공이원화와 빔 전류 인출시험 (PLS-II separator the vacuum electron gun beam current emission test)

  • 손윤규
    • 대한전기학회:학술대회논문집
    • /
    • 대한전기학회 2011년도 제42회 하계학술대회
    • /
    • pp.1580-1581
    • /
    • 2011
  • The linear accelerator of Pohang Accelerator Laboratory(PAL) will drive a top-up mode operation in PLS-II(Pohang Light Source-II). Due to this kind of the operation mode, the electron gun is expected to have shorter life time of the cathode. Further in the PLS-II, two gate valves will be installed in front of the electron gun. The distance between the pre-bunching section and the electron gun will increase by 400 mm compared to the existing system due to the insertion of these gate valves. As a result the incident electron beam. One of the goals to improve the beam pulse width is by incorporating suitable biased voltage. In this paper, we will present test results of beam pulse width as a function of different biased voltage and focusing solenoid coil.

  • PDF

미세접합을 위한 전자빔 용접장치의 개조 (Modification of Electron beam welding system for Micro joining)

  • 서정;이제훈;김정오;강희신
    • 대한용접접합학회:학술대회논문집
    • /
    • 대한용접접합학회 2003년도 추계학술발표대회 개요집
    • /
    • pp.24-26
    • /
    • 2003
  • In this study EB(Electron Beam) welder was modified to apply EB welder to micro-joining with solder ball and Pt wire. The power and beam current of EB welder is 6kW, 100mA and the minimum current was 1mA. The minimum current of EB welder was modified to decrease the amount of beam current to 0.0lmA and the monitoring system to observe materials was made up. The control system and CAD/CAM software for e-beam direct writing was developed and the deflection beam was controlled without moving workpieces. the possibility of applying EB welder to micro-joining with solder ball and Pt wire was studied through this experiments.

  • PDF

전자빔 용접장치를 이용한 미세접합 (Micro joining using electron beam welding system)

  • 서정;이제훈;김정오;강희신
    • 대한용접접합학회:학술대회논문집
    • /
    • 대한용접접합학회 2004년도 추계학술발표대회 개요집
    • /
    • pp.79-81
    • /
    • 2004
  • In this study EB(Electron Beam) welder was modified to apply Ef welder to micro-joining for soldering and micro-brazing. The power and beam current of EB welder is 6kW, 100mA(60kV) and the minimum current was 1mA. The minimum current of EB welder was modified to decrease the amount of beam current to 0.0lmA and the monitoring system to observe materials was made up. The system is developed including teaching function for generating patterns. The control system and CAD/CAM software for EB direct writing was developed and the deflection beam was controlled without moving workpieces. the possibility of applying EB welder to micro-joining for soldering and brazing was studied through this experiments.

  • PDF

Measurement of Defect Energy Level in MgO Layer

  • Son, Chang-Gil;Song, K.B.;Jeoung, S.J.;Park, E.Y.;Kim, J.S.;Choi, E.H.;J, S.
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
    • /
    • pp.1380-1383
    • /
    • 2007
  • The secondary electron emission coefficient (${\gamma}$) of the cathode is an important factor for improving the discharge characteristics of AC-PDP, because of its close relationship to discharge voltage. In this experiment, we have investigated the electronic structure of the energy band in the MgO layer responsible for the high ${\gamma}$. We used three kinds of MgO pellet that have another component, and each MgO layers have been deposited by electron beam evaporation method. The work-functions of MgO layer have been investigated from their ion-induced secondary electron emission coefficient (${\gamma}$), respectively, using various ions with different ionization energies in a ${\gamma}-FIB$ (Focused Ion Beam) system. We have compared work-function with ${\gamma}-FIB$ system current signal for measurement defect energy level in MgO layer. MgO-A in the three types has lowest work-function value (4.12eV) and there are two defect energy levels.

  • PDF