Measurement of secondary electron emission coefficient(${\gamma}$) with oblique low energy ion and work function ${\phi}_{\omega}$ of theMgO thin film in AC-PDPs

  • Park, W.B. (Charged Particle Beam and Plasma Laboratory / PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
  • Lim, J.Y. (Charged Particle Beam and Plasma Laboratory / PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
  • Oh, J.S. (Electronic engineering Dept., Kyoto University) ;
  • Jeong, H.S. (Charged Particle Beam and Plasma Laboratory / PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
  • Jung, K.B. (Charged Particle Beam and Plasma Laboratory / PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
  • Jeon, W. (Charged Particle Beam and Plasma Laboratory / PDP Research Center, Department of Electrophysics, Kwangwoon University) ;
  • Cho, G.S. (Charged Particle Beam and Plasma Laboratory / PDP Research Center, Department of Electrophysics, Kwangwoon University)
  • Published : 2004.08.23

Abstract

Oblique ion-induced secondary electron emission coefficient(${\gamma}$) with low energy ..and work function ${\phi}_{\omega}$(${\theta}$ = 0 and ${\theta}$ = 20) of the MgO thin film in AC-PDPs has been measured by ${\gamma}$-FIB system. The MgO thin film has been deposited from sintered material under electron beam evaporation method. The energy of $He^+$ ions used has been ranged from 50eV to 150eV. Oblique ion beam has been chosen to be 10 degree, 20 degree and 30 degree. It is found that the higher secondary electron emission coefficient(${\gamma}$) has been achieved by the higher oblique ion beam up to inclination angle of 30 degree than the perpendicular incident ion beam.

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