• Title/Summary/Keyword: Electron Probe

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Electrical Behavior of the Circuit Screen-printed on Polyimide Substrate with Infrared Radiation Sintering Energy Source (열소결로 제작된 유연기판 인쇄회로의 전기적 거동)

  • Kim, Sang-Woo;Gam, Dong-Gun;Jung, Seung-Boo
    • Journal of the Microelectronics and Packaging Society
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    • v.24 no.3
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    • pp.71-76
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    • 2017
  • The electrical behavior and flexibility of the screen printed Ag circuits were investigated with infrared radiation sintering times and sintering temperatures. Electrical resistivity and radio frequency characteristics were evaluated by using the 4 point probe measurement and the network analyzer by using cascade's probe system, respectively. Electrical resistivity and radio frequency characteristics means that the direct current resistance and signal transmission properties of the printed Ag circuit. Flexibility of the screen printed Ag circuit was evaluated by measuring of electrical behavior during IPC sliding test. Failure mode of the Ag printed circuits was observed by using field emission scanning electron microscope and optical microscope. Electrical resistivity of the Ag circuits screen printed on Pl substrate was rapidly decreased with increasing sintering temperature and durations. The lowest electrical resistivity of Ag printed circuit was up to $3.8{\mu}{\Omega}{\cdot}cm$ at $250^{\circ}C$ for 45 min. The crack length arisen within the printed Ag circuit after $10{\times}10^4$ sliding numbers was 10 times longer than that of after $2.5{\times}10^4$ sliding numbers. Measured insertion loss and calculated insertion loss were in good agreements each other. Insertion loss of the printed Ag circuit was increased with increasing the number of sliding cycle.

Removal Behavior of Biological Nitrogen and Phosphorus and Prediction of Microbial Community Composition with Its Function, in an Anaerobic-Anoxic System form Weak Sewage

  • LEE, JIN WOO;EUI SO CHOI;KYUNG IK GIL;HAN WOONG LEE;SANG HYON LEE;SOO YOOUN LEE;YONG KEUN PARK
    • Journal of Microbiology and Biotechnology
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    • v.11 no.6
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    • pp.994-1001
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    • 2001
  • An easier way of understanding the BNR system was proposed from the study on substrate, nutrient removal tendency, microbial community and its metabolic function by applying the municipal settled sewage. During the anaerobic period, the phosphorus release rate per VFACOD we varied depending on the phosphorus content in the sludge. When the phosphorus content in the sludge was $6\%$ VSS, according to influent VFACOD, the phosphorus release rate and PHA production were $0.35 gPO_4P/gVFACOD$ and 1.0 gPHA/gVFACOD, respectively. The $NO_3N$ requirement for the phosphorus uptake as an electron acceptor was about $0.5 gNO_3N/gPO_4P_{uptake}$ based on the proposed equation with PHA, biomass, production, and the concentration of phosphorus release/uptake. Bacterial-community analysis of the sludge, as determined by FISH and 16SrDNA characterization FISH, revealed that the beta-subclass proteobacteria were the most abundant group ($27.9\%$ of the proteobacteria-specific probe EUB338), and it was likely that representative of the beta-subclass played key roles in activated sludge. The next dominant group found was the gamma-protebacteria ($15.4\%$ of probe EUB338). 16S rDNA clone library analysis showed that the members of${\beta}$- and ${\gamma}$-proteobacteria were also the most abundant groups, and $21.5\%$ (PN2 and PN4) and $15.4\%$ (PN1 and PN5) of total clones were the genera of denitrifying bacteria and PAO, respectively. Prediction of the microbial community composition was made with phosphorus content (Pv, $\%$ P/VSS) in wasted sludge and profiles of COD, PHA, $PO_4P,\;and\;NO_3N$ in an anaerobic-anoxic SBR unit. Generally, the predicted microbial composition based upon metabolic function, i.e., as measured by stoichiometry, is fairly similar to that measure by the unculturable dependent method. In this study, a proposal was made on he microbial community composition that was more easily approached to analyze the reactor behavior.

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Evaluation of Transparent Amorphous $V_2O_5$ Thin Film Prepared by Thermal Evaporation (진공증착법으로 제조한 투명 비정질 $V_2O_5$박막의 특성평가)

  • Hwang, Kyu-Seog;Jeong, Seol-Hee;Jeong, Ju-Hyun
    • Journal of Korean Ophthalmic Optics Society
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    • v.13 no.1
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    • pp.27-30
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    • 2008
  • Purpose: This research is that $V_2O_5$ cathode's composition is possible in low temperature. Methods: Transparent in visible spectra range and crystallographically amorphous $V_2O_5$ thin films were prepared by simple vacuum thermal evaporation on soda-lime-silica slide glass substrate. After annealing at 100$^{\circ}C$, 150$^{\circ}C$ and 200$^{\circ}C$ for 10 minutes in air, the surface morphology and the fracture-cross section of the films were investigated by field emission - scanning electron microscope. Transmittance in visible spectra range and surface roughness of the films were analyzed by ultra violet - visible spectrophotometer and scanning probe microscope, respectively. Results: As the increase of annealing temperature from 100$^{\circ}C$ to 150$^{\circ}C$ and 200$^{\circ}C$, transmittance of the $V_2O_5$ films decreased. Optical properties will be fully discussed on the basis of the surface morphological results. Conclusions: Optical transmissivity was superior in case of 100$^{\circ}C$, and could make amorphous $V_2O_5$ thin film that surface quality of thin film did homogeneity.

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Electrochemical properties of heat-treated multi-walled carbon nanotubes (열처리된 탄소나노튜브 상대전극의 전기화학적 특성 연구)

  • Lee, S.K.;Moon, J.H.;Hwang, S.H.;Kim, G.C.;Lee, D.Y.;Kim, D.H.;Jeon, M.H.
    • Journal of the Korean Vacuum Society
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    • v.17 no.1
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    • pp.67-72
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    • 2008
  • We have studied the effect of heat treatment of multi-walled carbon nanotubes (MWNTs) as a counter electrode on the electro-chemical properties of dye-snsitized solar cells. MWNTs on the p-type Si substrate were synthesized by thermal chemical vapor deposition (CVD) using Fe catalysts. We prepared the two types of MWNTs samples with the different diameters. The rapid thermal annealing (RTA) treatment for the MWNTs was carried out at the growth temperature ($900^{\circ}C$) for 1 minute with $N_2$ gas atmosphere. The structural, electrical and electrochemical properties of MWNTs were investigated by field-emission scanning electron microscopy (FE-SEM), Raman spectroscopy, 2-point probe station and electrochemical impedance spectroscopy (EIS). The I(D)/I(G) ratio of heat-treated MWNTs in Raman spectra was considerably decreased. It was also found that the heat-treated MWNTs showed better redox reaction of iodide at the interface between MWNTs surface and electrolyte than that of as-grown MWNTs. The redox resistance value of heat-treated electrodes was measured to be much lower than that of as-grown electrode at the interface. As a result, the counter electrode using the heat-treated MWNTs showed better electrochemical properties.

Magnetized inductively coupled plasma etching of GaN in $Cl_2/BCl_3$ plasmas

  • Lee, Y.H.;Sung, Y.J.;Yeom, G.Y.
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 1999.10a
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    • pp.49-49
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    • 1999
  • In this study, $Cl_2/BCI_3$ magnetized inductively coupled plasmas (MICP) were used to etch GaN and the effects of magnetic confinements of inductively coupled plasmas on the GaN etch characteristics were investigated as a function of $Cl_2/BCI_3$. Also, the effects of Kr addition to the magnetized $Cl_2/BCI_3$ plasmas on the GaN etch rates were investigated. The characteristics of the plasmas were estimated using a Langmuir probe and quadrupole ma~s spectrometry (QMS). Etched GaN profiles were observed using scanning electron microscopy (SEM). The small addition of $Cl_2/BCI_3$ (10-20%) in $Cl_2$ increased GaN etch rates for both with and without the magnetic confinements. The application of magnetic confinements to the $Cl_2/BCI_3$ inductively coupled plasmas (ICP) increased GaN etch rates and changed the $Cl_2/BCI_3$ gas composition of the peak GaN etch rate from 10% $BCI_3$ to 20% $BCI_3$. It also increased the etch selectivity over photoresist, while slightly reducing the selectivity over $Si0_2$. The application of the magnetic field significantly increased positive $BCI_2{\;}^+$ measured by QMS and total ion saturation current measured by the Langmuir probe. Other species such as CI, BCI, and CI+ were increased while species such as $BCl_2$ and $BCI_3$ were decreased with the application of the magnetic field. Therefore, it appears that the increase of GaN etch rate in our experiment is related to the increased dissociative ionization of $BCI_3$ by the application of the magnetic field. The addition of 10% Kr in an optimized $Cl_2/BCI_3$ condition (80% $Cl_2/$ 20% $BCI_3$) with the magnets increased the GaN etch rate about 60%. More anisotropic GaN etch profile was obtained with the application of the magnetic field and a vertical GaN etch profile could be obtained with the addition of 10% Kr in an optimized $Cl_2/BCI_3$ condition with the magnets.

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Electrical and optical properties of Ag/ZnO multilayer thin film by the FTS (FTS법으로 제작한 Ag/ZnO 박막의 전기적, 광학적 특성)

  • Rim, Y.S.;Kim, S.M.;Son, I.H.;Lee, W.J.;Choi, M.K.;Kim, K.H.
    • Journal of the Korean Vacuum Society
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    • v.17 no.2
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    • pp.102-108
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    • 2008
  • We have studied the properties of Ag/undoped ZnO (ZnO) multilayer thin films deposited on glass substrate by the facing targets sputtering method. In an attempt to find out the optimum conditions of the Ag thin film, which would be coated on the ZnO thin film, we investigated the changes of sheet resistance, transmittance and surface morphology as a function of deposition times and the substrate temperature. The electrical and optical characteristics of Ag/ZnO multilayers were evaluated by a four-point probe, a UV/VIS spectrometer with a spectral range of 390-770 nm, a X-ray Diffractometer (XRD), an atomic force microscope (AFM) and a Field Emission Scanning Electron Microscope (SEM), respectively. We were able to prepare the Ag/ZnO multilayer thin film with sheet resistance of 9.25 $\Omega/sq.$ and transmittance of over 80% at 550nm.

A study on the oxide etching using multi-dipole type magnetically enhanced inductively coupled plasmas (자장강화된 유도결합형 플라즈마를 이용한 산화막 식각에 대한 연구)

  • 안경준;김현수;우형철;유지범;염근영
    • Journal of the Korean Vacuum Society
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    • v.7 no.4
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    • pp.403-409
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    • 1998
  • In this study, the effects of multi-dipole type of magnets on the characteristics of the inductively coupled plasmas and $SiO_2$ etch properties were investigated. As the magnets, 4 pairs of permanent magnets were used and, to etch $SiO_2, C_2F_6, CHF_3, C_4F_8, H_2$, and their combinations were used. The characteristics of the magnetized inductively coupled plasmas were investigated using a Langmuir probe and an optical emission spectrometer, and $SiO_2$ etch rates and the etch selectivity over photoresist were measured using a stylus profilometer. The use of multi-dipole magnets increased the uniformity of the ion density over the substrate location even though no significant increase of ion density was observed with the magnets. The use of the magnets also increased the electron temperature and radical densities while reducing the plasma potential. When $SiO_2$ was etched using the fluorocarbon gases, the significant increase of $SiO_2$ etch rates and also the increase of etch uniformity over the substrate were obtained using the magnets. In case of gas combinations with hydrogen, $C_4F_8/H_2$ showed the highest etch rates and etch selectivities over photoresist among the gas combinations with hydrogen used in the experiment. By optimizing process parameters at 1000 Watts of inductive power with the magnets, the highest $SiO_2$ etch rate of 8000 $\AA$/min could be obtained for 50% $C_4F_8/50% H_2$.

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Behavior of Implanted Dopants and Formation of Molybdenum Siliclde by Composite Sputtering (Composite target으로 증착된 Mo-silicide의 형성 및 불순물의 거동)

  • Cho, Hyun-Choon;Paek, Su-Hyon;Choi, Jin-Seog;Hwang, Yu-Sang;Kim, Ho-Suk;Kim, Dong-Won;Shim, Tae-Earn;Jung, Jae-Kyoung;Lee, Jong-Gil
    • Korean Journal of Materials Research
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    • v.2 no.5
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    • pp.375-382
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    • 1992
  • Molybdenum silicide films have been prepared by sputtering from a single composite MoS$i_2$ source on both P, B$F_2$respectively implanted (5${\times}10^{15}ions/cm^2$ single crystal and P implanted (5${\times}10^{15}ions/cm^2$) polycrystalline silicon substrates followed by rapid thermal annealing in the ambient of argon. The heat treatment temperatures have been varied in the range of 600-l20$0^{\circ}C$ for 20 seconds. The properties of Mo-silicide and the diffusion behaviors of dopant after the heat treatment are investigated using X-ray diffraction, scanning electron microscopy(SEM) , secondary ions mass spectrometry(SIMS), four-point probe and $\alpha-step.$ Annealing at 80$0^{\circ}C$ or higher resulted in conversion of the amorphous phase into predominantly MoS$i_2$and a lower sheet resistance. There was no significant out-diffusion of dopants from both single crystal and polycrystalline silicon substrate into molybdenum silicide layers during annealing.

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RF 플라즈마 아킹의 PM-tube를 이용한 광량 측정

  • Kim, Yong-Hun;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.125-126
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    • 2010
  • 플라즈마 아킹은 PECVD, 플라즈마 식각 그리고 토카막과 같은 플라즈마를 이용하는 여러 공정과 연구 분야에서 문제점을 야기시켜왔다. 하지만, 이에 대한 연구는 아킹 현상의 불규칙성과 과도적인 행동으로 인해 미비한 상태이다. 특히, RF 방전에서의 아킹 연구는 DC 방전에서의 아킹 연구에 비해 많이 부족한 것이 현실이다. 플라즈마 아킹은 집단전자방출(collective electron emission)에 의한 스파크 방전(spark discharge)현상이다. 집단전자방출은 전계방출(field emission)이나 플라즈마와 쉬스를 두고 인접한 표면위에서의 유전분극(dielec emission)에 의해 발생한다. 이렇게 방출된 집단 전자들은 쉬스에서 가속되어 에너지를 얻게 되고 원자와의 충돌로 전자 아발란체를 일으킨다. 이렇게 배가된 전자들은 아킹 스트리머(arcing streamer)를 형성하게 되고 아킹 발생 시 높은 전류와 공정 실패의 원인이 된다. 우리는 $30cm{\times}20cm$ 크기의 사각 전극을 위 아래로 가진 챔버에서 Ar 가스를 RF(13.56 MHz)파워를 이용해 방전시켰다. 방전 전압과 전류는 파워 전극 압단에서 High voltage probe (Tektronix P6015A)와 Current probe (TCPA300 + TCP312)를 이용해 측정했다. 플라즈마 아킹시 변하는 플라즈마 플로팅 포텐셜은 챔버 중앙에 위치한 랑뮈프 프로브에 의해 측정되고 챔버 옆의 뷰포트 앞에 위치한 PM-tube를 이용해 아킹시 변하는 광량을 측정한다. RF 방전에서의 플라즈마 아킹은 아킹시 플로팅 포텐셜의 변화에 의해 크게 세부분으로 나눌 수 있다. 아킹 발생과 동시에 급격히 감소하는 감소부분 (약 2us) 그리고 감소한 포텐셜이 유지되는 유지부분 (약 0~10ms) 그리고 감소했던 포텐셜이 서서히 원래 상태로 회복되는 회복부분(약 100 us)이다. 아킹 초기시 방출된 집단 전자들과 원자들간의 충돌에 의해 형성된 아킹 스트리머는 플라즈마 전체를 단락시키게 되고 이로 인해 플로팅 포텐셜은 급격히 감소하게 된다. 이렇게 감소한 플로팅 포텐셜은 아킹 스트리머가 유지되는 한 계속 감소한 상태를 유지하게 된다. 그리고 플라즈마를 섭동했던 아킹 스트리머가 중단되면 플라즈마는 섭동전의 원래 상태로 돌아가려 하기 때문에 플로팅 포텐셜은 서서히 증가하면서 원래 상태로 회복된다. 플라즈마 아킹 발생시 생성되는 아킹 스트리머는 순간적으로 많은 전자들을 국소적으로 생성하게 되고 이 전자들에 의해 광량이 순간적으로 증가하게 된다. PM-tube (750.4 nm)에 의해 측정된 아킹시 광량은 정상방전 상태의 두배 가량이 된다. 그리고 이 순간적으로 증가된 광량은 시간이 지남에 따라 감소하게 되고 정상방전 일때의 광량이 된다. 광량이 증가한 후 정상방전 상태의 광량에 이르는 부분은 플로팅 포텐셜이 감소한 상태에서 유지되는 부분과 일치하고 이는 플로팅 포텐셜의 유지부분동안 아킹 스트리머가 발생하고 있다는 간접적인 증거가 된다. 그리고 정상 방전 상태 일때의 광량이 되면 아킹 스트리머가 중단되었다는 것이므로 그 시점부터 플로팅 포텐셜은 정산 방전상태 일 때의 포텐셜로 복구되기 시작한다. 이처럼 PM-tube를 이용한 아킹 광량 측정은 아킹 스트리머를 간접적으로 측정하게 하고 아킹 스트리머를 이용해 아킹시의 플로팅 포텐셜의 변화를 설명하게 해 준다. 응용적인 측면에서 아킹 광량 측정을 이용한 아킹 판독은 방전 전류와 방전 전압과 같은 전기적 신호를 이용한 아킹 판독에 비해 여러가지 장점을 가진다. 우선, 전기적 신호를 이용한 아킹 판독처럼 매칭 회로나 플라즈마를 섭동시키지 않는다. 그리고 원하는 부분의 아킹만을 판독하는 것도 가능하며 photo-diode를 이용할 경우 전기적 신호를 이용하는 것에 비해 경제적으로 유리하다.

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Surface Milling for the Study of Pore Structure in Shale Reservoirs (셰일 저류층 내 공극 구조 연구를 위한 표면 밀링)

  • Park, Sun Young;Choi, Jiyoung;Lee, Hyun Suk
    • Korean Journal of Mineralogy and Petrology
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    • v.33 no.4
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    • pp.419-426
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    • 2020
  • Understanding the pore structure including pore shape and connectivity in unconventional reservoirs is essential to increase the recovery rate of unconventional energy resources such as shale gas and oil. In this study, we found analysis condition to probe the nanoscale pore structure in shale reservoirs using Focused Ion Beam (FIB) and Ion Milling System (IMS). A-068 core samples from Liard Basin are used to probe the pore structure in shale reservoirs. The pore structure is analyzed with different pretreatment methods and analysis condition because each sample has different characteristics. The results show that surface milling by FIB is effective to obtain pore images of several micrometers local area while milling a large-area by IMS is efficient to observe various pore structure in a short time. Especially, it was confirmed that the pore structure of rocks with high content of carbonate minerals and high strength can be observed with milling by IMS. In this study, the analysis condition and process for observing the pore structure in the shale reservoirs is established. Further studies are needed to perform for probing the effect of pore size and shape on the enhancement of shale gas recovery.