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http://dx.doi.org/10.5757/JKVS.2008.17.2.102

Electrical and optical properties of Ag/ZnO multilayer thin film by the FTS  

Rim, Y.S. (Department of Electrical engineering, Kyungwon University)
Kim, S.M. (Department of Electrical engineering, Kyungwon University)
Son, I.H. (Department of Digital Electrical engineering, Shinsung College)
Lee, W.J. (Department of Electronic engineering, Kyungwon University)
Choi, M.K. (Department of Electrical engineering, Kyungwon University)
Kim, K.H. (Department of Electrical engineering, Kyungwon University)
Publication Information
Journal of the Korean Vacuum Society / v.17, no.2, 2008 , pp. 102-108 More about this Journal
Abstract
We have studied the properties of Ag/undoped ZnO (ZnO) multilayer thin films deposited on glass substrate by the facing targets sputtering method. In an attempt to find out the optimum conditions of the Ag thin film, which would be coated on the ZnO thin film, we investigated the changes of sheet resistance, transmittance and surface morphology as a function of deposition times and the substrate temperature. The electrical and optical characteristics of Ag/ZnO multilayers were evaluated by a four-point probe, a UV/VIS spectrometer with a spectral range of 390-770 nm, a X-ray Diffractometer (XRD), an atomic force microscope (AFM) and a Field Emission Scanning Electron Microscope (SEM), respectively. We were able to prepare the Ag/ZnO multilayer thin film with sheet resistance of 9.25 $\Omega/sq.$ and transmittance of over 80% at 550nm.
Keywords
ZnO; Facing targets sputtering; Multilayer;
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