Dry etching properties of PZT thin films in $BCl_3/N_2$ plasma
($BCl_3/N_2$ 유도결합 플라즈마로 식각된 PZT 박막의 식각 특성)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2004.11a
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- pp.183-186
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- 2004