• Title/Summary/Keyword: Electron Optical System

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Twin-Image Noise Effects in Optical scanning Holography

  • Doh, Kyu-Bong;Lee, Hwang-Suk
    • Journal of the Optical Society of Korea
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    • v.4 no.1
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    • pp.48-53
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    • 2000
  • In Optical Scanning Holography(OSH), 3-D holographic information of an object is generated by 2-D active optical scanning. The optical scanning beam can be a time-dependent Gaussian apodized Fresnel zone plate. In this technique, the holographic information manifests itself as an electric signal which can be sent to an electron-beam-addressed spatial light modulator for coherent image reconstruction. In this paper, we briefly review optical scanning holography and analyze the resolution achievable with the system. We also present mathmatical expressions of real and virtual images which are responsible for holographic image reconstruction. We then show the twin-image noise effect on the reconstruction in conjunction with the size of the Fresnel zone pattern through computer simulation.

Electron Emission Property of Carbon Nanotubes Grown Using Different Source Gases

  • Han, Jae-Hee;Lee, Tae-Young;Yoo, Ji-Beom;Park, Chong-Yun;Jung, Tae-Won;Yu, Se-Gi;Yi, Whi-Kun;Kim, Jong-Min
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.658-661
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    • 2002
  • Chemical species during growth of carbon nanotubes (CNTs) in direct current-plasma enhanced chemical vapor deposition were studied in details using $C_3H_4-NH_3$ and $CO-NH_3$ mixtures through optical emission spectroscopy (OES). In the $C_3H_4-NH_3$ system, the relative intensities of CN (388.3 nm) and CH (431.4 nm) decreased and that of $C_2$ (436 nm) increased, leading to $sp^2$-graphization into the CNT structure, leading to improvement of field emission property of CNTs. In the $CO-NH_3$ system, the trend is completely reversed. Attributing to the atomic oxygen for helping the graphitization of carbon, CNTs could be grown under the flow rate of CO (180 sccm)-$NH_3$ (10 sccm). Through these results, we suggest the growth mechanism in our system.

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Fabrication and Characterization of a One-dimensional Fiber-optic Dosimeter for Electron Beam Therapy Dosimetry (치료용 전자선 계측을 위한 1차원 광섬유 방사선량계의 제작 및 특성분석)

  • Jang, Kyoung-Won;Cho, Dong-Hyun;Shin, Sang-Hun;Yoo, Wook-Jae;Jun, Jae-Hun;Lee, Bong-Soo;Moon, Joo-Hyun;Park, Byung-Gi
    • Progress in Medical Physics
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    • v.19 no.4
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    • pp.285-290
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    • 2008
  • In this study, we have fabricated a one-dimensional fiber-optic dosimeter for electron beam therapy dosimetry. Each fiber-optic dosimeter has an organic scintillator with a plastic optical fiber and it is embedded and arrayed in the plastic phantom to measure one-dimensional high energy electron beam profile of clinical linear accelerator. The scintillating lights generated from each sensor probe are guided by plastic optical fibers to the multi-channel photodiode amplifier system. We have measured one-dimensional electron beam profiles in a PMMA phantom according to different field sizes and energies of electron beam. Also, the isodose and three-dimensional percent depth dose curves in a PMMA phantom are obtained using a one-dimensional fiber-optic dosimeter with different electron beam energies.

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Analysis of Intramolecular Electron Transfer in A Mixed-Valence Cu(Ⅰ)-Cu(Ⅱ) Complex Using the PKS Model

  • So Hyunsoo
    • Bulletin of the Korean Chemical Society
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    • v.13 no.4
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    • pp.385-388
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    • 1992
  • The transition probabilities for the thermal intramolecular electron transfer and the optical intervalence transfer band for a symmetric mixed-valence Cu(I)-Cu(II) compound were used to extract the PKS parameters $\varepsilon$ = -1.15, ${\lambda}$ = 2.839, and ${\nu}g$- = 923 $cm^{-1}$. These parameters determine the potential energy surfaces and vibronic energy levels. Three pairs of vibrational levels are below the top of the energy barrier in the lower potential surface. The contribution of each vibrational state to the intramolecular electron transfer was calculated. It is shown that the three pairs of vibrational states below the top of the barrier are responsible for most of the electron transfer at 261-306 K. So the intramolecular electron transfer in this system is a tunneling process. The transition probability exhibits the usual high-temperature Arrhenius behavior, but at lower temperature falls off to a temperature-independent value as tunneling from the lowest levels becomes the limiting process.

Effects of Electron Beam Irradiation on Tribological and Physico-chemical Properties of Polyoxymethylene (POM-C) copolymer

  • Rahman, Md. Shahinur;Yang, Jong-Keun;Shaislamov, Ulugbek;Lyakhov, Konstantin;Kim, Min-Seok;Lee, Heon-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.153-153
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    • 2016
  • Polyoxymethylene copolymer (POM-C) is an attractive and widely used engineering thermoplastic across many industrial sectors owing to outstanding physical, mechanical, self-lubricating and chemical properties. In this research work, the POM-C blocks were irradiated with 1 MeV electron beam energy in five doses (100, 200, 300, 500 and 700 KGy) in vacuum condition at room temperature. The tribological and physico-chemical properties of electron beam irradiated POM-C blocks have been analyzed using Pin on disk tribometer, Raman spectroscopy, SEM-EDS, Optical microscopy, 3D Nano surface profiler system and Contact angle analyzer. Electron beam irradiation at a dose of 100 kGy resulted in a decrease of the friction coefficient and wear loss of POM-C block due to well suited cross-linking, carbonization, free radicals formation and energetic electrons-atoms collisions (physical interaction). It also shows lowest surface roughness and highest water contact angle among all unirradiated and irradiated POM-C blocks. The irradiation doses at 200, 300, 500 and 700 kGy resulted in increase of the friction coefficient as compared to unirradiated POM-C block due to severe chain scission, chemical and physical structural degradation. The electron beam irradiation transferred the wear of unirradiated POM-C block from the abrasive wear, adhesive wear and scraping to mild scraping for the 1 MeV, 100 kGy irradiated POM-C block which is concluded from SEM-EDS and Optical microscopic observations. The degree of improvement for tribological attribute relies on the electron beam irradiation condition (energy and dose rate).

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A Development of Electron Optics System of Mini-Sized SEM (소형주사전자현미경용 전자공학계의 개발)

  • Park, Man-Jin;Kim, Il-Hae;Kim, Dong-Hwan;Jang, Dong-Young;Han, Dong-Chul
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.16 no.5
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    • pp.140-144
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    • 2007
  • As an electron scanning microscopes has traditionally required a considerably large room equipped with several service and pipe lines due to its inherent size. As an alternative, a small sized SEM, simply called a mini-SEM, is introduced even if the performance in terms of magnification and resolution is a little inferior to a classical thermal SEM. However, the size and fabrication cost is dramatically reduced, dedicating to opening a new market. The optical system in the mini-SEM is redesigned and specimen stage is quitely reduced and vertical axis is excluded. The design tools and calibration techniques to develope the mini-SEM are introduced and its performance is verified through numerical analysis experiments.

Automatic Inspection of Assembly Tolerances of Cathod Ray Electron Guns by Vision Probe (비젼프로브를 이용한 CRT 전자총의 자동치수 검사)

  • Park, H.G.;Park, M.C.;Kim, S.W.
    • Journal of the Korean Society for Precision Engineering
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    • v.14 no.10
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    • pp.28-34
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    • 1997
  • This paper describes an automatic measurement method for the in-line inspection of assembly tolerances of cathod ray electron guns. The method uses an optical microscope with a CCD camera as a probe. An automatic gap recognition algorthm with digital image processing and a new software autofocus algorithm based on using an optimal edge detector have been developed to improve the measuring accuracy. An inspection system has been proposed and practically implemented for in-line inspection to a real factory automation line. The inspection system consists of a gap inspection part and an eyelet. Total time consumed for inspecting all measuring items is about 10 seconds and the repeatability is below .+-. 5 .mu. m

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Quantum Chemical Designing of Novel Organic Non-Linear Optical Compounds

  • Mahmood, Asif;Abdullah, Muhammad Imran;Nazar, Muhammad Faizan
    • Bulletin of the Korean Chemical Society
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    • v.35 no.5
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    • pp.1391-1396
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    • 2014
  • In the present study, ten metal free non-linear optical (NLO) compounds have been designed. These compounds have designed by structural modification of (2-cyano-5-(4-(phenyl(4-vinylphenyl)amino)phenyl) penta-2,4-dienoic acid (TC4). Density functional theory was used for structure optimization and determination of photo-physical properties. These compounds contain triphenylamine as electron-donor and cyanoacrylic acid as acceptor. Five ${\pi}$-spacers are used to connect the donor and acceptor. Two auxiliary donors are also used to assist the donor. Results of this study indicate that stronger electron-donating auxiliary groups and longer ${\pi}$-conjugation enhance NLO response. Major absorption peaks of all systems were in the visible region. These absorption peaks are associated with the ${\pi}-{\pi}^*$ transitions of the entire molecule. From calculations it is clear that all system will be good NLO material. The present calculations will provide new ways for experimentalists to synthesize high-performance NLO material.

Fabrication of the grating array using computer generated phase mask (Computer generated phase mask를 이용한 격자 array 제작)

  • 원형식;김상인;박선택;송석호;오차환;김필수
    • Proceedings of the Optical Society of Korea Conference
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    • 2001.02a
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    • pp.158-159
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    • 2001
  • 파장분할다중 방식에서 필요로 하는 격자들 간의 격자주기 차이는 1nm이하를 요구한다. 따라서, 하나의 위상형 마스크로 서로 다른 주기의 격자를 동시에 제작하려면 하나의 위상형 마스크 패턴들 간에도 nm 정도의 차이를 갖는 미세한 패턴이 있어야 한다. 그러나, 일반적으로 마스크를 제작하는데 이용되는 장비인 전자빔 묘화장치(electron-beam lithographic system)의 분해능은 수십 nm이므로, 그러한 nm 정도의 정확도로서 조합된 마스크 패턴들을 만드는 것은 매우 어렵다. (중략)

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Applications of the Scanning Electron Microscope (주사형(走査型) 전자현미경(電子顯微鏡)의 응용분야(應用分野))

  • Kim, Yong-Nak
    • Applied Microscopy
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    • v.2 no.1
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    • pp.39-46
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    • 1972
  • There are many kinds of microscopes suitable for general studies; optical microscopes(OM), conventional transmission electron microscopes (TEM), and scanning electron microscopes(SEM). The optical microscopes and the conventional transmission electron microscopes are very familiar. The images of these microscopes are directly formed on an image plane with one or more image forming lenses. On the other hand, the image of the scanning electron microscope is formed on a fluorescent screen of a cathode ray tube using a scanning system similar to television technique. In this paper, the features and some applications of the scanning electron microscope will be discussed briefly. The recently available scanning electron microscope, combining a resolution of about $200{\AA}$ with great depth of field, is favorable when compared to the replica technique. It avoids the problem of specimen damage and the introduction of artifacts. In addition, it permits the examination of many samples that can not be replicated, and provides a broader range of information. The scanning electron microscope has found application in diverse fields of study including biology, chemistry, materials science, semiconductor technology, and many others. In scanning electron microscopy, the secondary electron method. the backscattererd electron method, and the electromotive force method are most widely used, and the transmitted electron method will become more useful. Change-over of magnification can be easily done by controlling the scanning width of the electron probe. It is possible. to continuously vary the magnification over the range from 100 times to 1.00,000 times without readjustment of focusing. Conclusion: With the development of a scanning. electron microscope, it is now possible to observe almost all-information produced through interactions between substances and electrons in the form of image. When the probe is properly focused on the specimen, changing magnification of specimen orientation does not require any change in focus. This is quite different from the conventional transmission electron microscope. It is worthwhile to note that the typical probe currents of $10^{-10}$ to $10^{-12}\;{\AA}$ are for below the $10^{-5}$ to $10^{-7}\;{\AA}$ of a conventional. transmission microscope. This reduces specimen contamination and specimen damage due to heatings. Outstanding features of the scanning electron microscope include the 'stereoscopic observation of a bulky or fiber specimen in high resolution' and 'observation of potential distribution and electromotive force in semiconductor devices'.

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