• Journal of Welding and Joining
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• 제21권4호
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• pp.63-68
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• 2003

Scanning electron microscopy (SEM) has been used as a surface measurement instrument and a tool for lithography in semiconductor process due to its high density localized beam. For those purposes, however, the maximum current of SEM Is less than 100pA, which is not enough fo material processing. In this paper SEM was modified to increase the amount of current reaching a specimen from gun part where current is generated, the possibility of applying SEM to material processing, especially microjoining, was investigated. The maximum current of SEM after modifications was measured up to 10$\mu$A, which is about 10$^{5}$ times greater than before modifications. Through experiments such as eutectic solder wetting on thin 304 stainless steel foil and microjoining of 10$\mu$m thick 304 stainless steel, the intensity of electron beam of SEM proved to be great enough fur material processing as heat source. And a tight jig system was found necessary to hold materials close enough fur successful microloining.

• 전자공학회논문지 IE
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• 제47권2호
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• pp.8-12
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• 2010

TEM(Transmission Electrion microsopy) 투과전자현미경은 재료의 기초 구조 분석과 반도체 또는 생물시편의 미세 구조분석에 널리 사용되는 장비이다. TEM 분석은 필수적으로 목적에 부합되는 적절한 시편제작이 수반되어야 한다. 다양한 전자 현미경 시편 제작 방법 중 본 논문에서는 FIB(Focus Ion Beam)를 이용한 시편 제작법 중 시편에 입사되는 에너지와 이온 Gun과 시편과의 상호 각도, 이온 밀링 깊이 조절 등의 실험을 통하여 표면 손상 최소화를 벌크 웨이퍼와 패턴화된 시편에서 실험하였다. 최소화된 표면 영향성(약 5nm)을 패턴화된 시편에 구현하였다.

• 한국광물학회지
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• 제22권4호
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• pp.407-415
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• 2009

전자빔 조사를 조사량에 따라 단계별로 수행하면서 전자빔을 조사하는 동안 다이아몬드 내에서 일어나는 질소관련 결함의 변화와 색상의 변화를 분광학적 방법으로 측정 분석하였다. 일반적으로 질소의 양이 적을수록 공공이 쉽게 생성되며 A집합체보다 B집합체가 많은 시료에서 공공이 빠르게 생성된다는 결과를 보였다. 그 이유로 공공의 생성 정도가 전자빔에 의해 파괴될 수 있는 크기를 가진 결함의 양 즉, platelets에 비례한다는 결론을 추론할 수 있었다. 그리고 조사량이 증가할수록 옅은 녹색을 지닌 청색에서 짙은 청색으로 변화한다. 이러한 청색의 발현은 GR1센터의 점진적인 증가로 GR1센터 흡수포논에 의한 흡수띠의 영역은 더욱 확장되어 가시광선이 투과하는 최고 파장대가 530 nm에서 500 nm로 이동하면서 나타나는 현상이다.

• 한국산학기술학회논문지
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• 제12권4호
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• pp.1803-1811
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• 2011

TFT-LCD용 TFT기판 상에서 저에너지 마이크로 컬럼을 이용하는 전기적인 결함 검출 메카니즘을 분석하였다. 본 연구에서는 고진공 챔버 내에서 7인치 TFT 기판에 저에너지 전자빔을 주사하여 여러 가지 불량 화소에 대한 SEM 이미지를 획득하였다. 더불어 각각의 불량 화소에서 나타나는 현상과 전기적인 거동과의 연관성을 분석하여 검출 메카니즘을 해석하였다. 그 결과로서 저에너지 초소형 전자 컬럼을 이용하는 저에너지 전자빔에 의한 SEM 이미지는 전자간 반발효과에 크게 영향을 받는 일관성 있는 결과를 확인하였다.

• 한국표면공학회지
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• 제32권3호
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• pp.428-432
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• 1999

As metallic surface has its unique lustrous appearance and optical reflectance in visible range of light, the metallization of plastic surface has been an essential drive toward weight reduction for fuel economy and decorations in transportation industry and has been put into practiced from wet chemical-electrochemial to dry vacuum process in view of an environmental effect. Electron-beam metallization was used in this work with an aim at improving the scratchproof surface hardness of plastic substrate with metallic finish character. Thin film of Al ($1000\AA$) and $SiO_2$($7000\AA$) were metallized on substrate of PC and PMMA and the films were evaluated by pencil test for surface hardness and by cross-cut tape test for adhesion. The ion beam treatment improved around twice as hard as non-treat surface. The ion beam is effect on its hardness and adhesion to surface hardened PC substrate.

• Journal of Korean Vacuum Science & Technology
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• 제2권2호
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• pp.101-106
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• 1998

The poor wear and scratch properties of polycarbonate have limited its application in many fields. In order to improve the wear and scratch properties of polycarbonate we have deposited diamond like carbon (DLC) coatings. The diamond like carbon coatings were made using a high frequency ion beam gun by introducing H2 and CH4 gases. The coatings were characterized with Raman spectroscopy, scanning electron microscope, ellipsometer, microscratch tester and hazemeter. Polymeric hard coating was applied onto the polycarbonate substrate before depositing a DLC coating to investigate the effect of interlayer on the system's failure mode.

• Nuclear Engineering and Technology
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• 제48권3호
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• pp.785-794
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• 2016

The Argonne National Laboratory of the United States and the Kharkov Institute of Physics and Technology of the Ukraine have been collaborating on the design, development and construction of a neutron source facility at Kharkov Institute of Physics and Technology utilizing an electron-accelerator-driven subcritical assembly. The electron beam power is 100 kW using 100-MeV electrons. The facility was designed to perform basic and applied nuclear research, produce medical isotopes, and train nuclear specialists. The biological shield of the accelerator building was designed to reduce the biological dose to less than 5.0e-03 mSv/h during operation. The main source of the biological dose for the accelerator building is the photons and neutrons generated from different interactions of leaked electrons from the electron gun and the accelerator sections with the surrounding components and materials. The Monte Carlo N-particle extended code (MCNPX) was used for the shielding calculations because of its capability to perform electron-, photon-, and neutron-coupled transport simulations. The photon dose was tallied using the MCNPX calculation, starting with the leaked electrons. However, it is difficult to accurately tally the neutron dose directly from the leaked electrons. The neutron yield per electron from the interactions with the surrounding components is very small, ~0.01 neutron for 100-MeV electron and even smaller for lower-energy electrons. This causes difficulties for the Monte Carlo analyses and consumes tremendous computation resources for tallying the neutron dose outside the shield boundary with an acceptable accuracy. To avoid these difficulties, the SOURCE and TALLYX user subroutines of MCNPX were utilized for this study. The generated neutrons were banked, together with all related parameters, for a subsequent MCNPX calculation to obtain the neutron dose. The weight windows variance reduction technique was also utilized for both neutron and photon dose calculations. Two shielding materials, heavy concrete and ordinary concrete, were considered for the shield design. The main goal is to maintain the total dose outside the shield boundary less than 5.0e-03 mSv/h during operation. The shield configuration and parameters of the accelerator building were determined and are presented in this paper.

• 대한화학회지
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• 제47권3호
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• pp.250-256
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• 2003

본 연구에서는 이관능성 에폭시 수지의 전자선 (EB) 경화에 양이온 개시제 함량이 미치는 영향을 근적외선 분광기 (NIRS), 열중량 분석기 (TGA), 그리고 임계응력 인자 (KIC)를 사용하여 고찰하였다. 개시제로서 benzyl- quinoxalinium hexafluoroantimonate (BQH)을 사용하였으며, 함량은 0.5, 1, 2, 그리고 3 phr로 변화시켰다. NIRS 측정에 의해 BQH의 함량이 증가할수록 EB 경화된 에폭시 수지의 수산화기가 증가하는 것을 알 수 있었으며, 열안정성과 $K_{IC}$는 BQH 함량이 증가할수록 증가하다가 함량이 2 phr을 넘으면 감소함을 확인하였다. 이러한 결과들은 에폭시 수지의 경화반응 전환율과 경화도의 감소로 설명될 수 있었다. 다시 말하면, BQH의 함량이 2 phr 이상이 되면 에폭시 수지의 경화반응 전환율과 경화도가 높은 반응성에 기인한 불완전한 네트워크 구조로 인해서 제한되기 때문에 열안정성과 $K_{IC}$가 낮아진다고 생각된다.

• 한국인쇄학회지
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• 제22권1호
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• pp.53-64
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• 2004

The CRT(cathode ray tube) in oscilloscope consists of an electron gun, horizontal vertical deflection system and a phosphor screen. When the electron beam strikes the phosphor screen, the phosphor generates light. The phosphor screen has formed by CRT precipitation method. But, this method has some defects that are complex process, low yield, much consumption of raw-material, dirty working environment, waste problem, require of high cost. Moreover phosphor for oscilloscope used at present has been imported from Japan. Therefore developments of new phosphor and new method(the screen printing) top form phosphor screen for oscilloscope are required to improve these matters. This study was developed novel method(the screen printing) to form the phosphor screen for oscilloscope used new phosphor. This screen printing method has advantages of simple process, high yield, clean working environment, saving raw material and running-cost.

• 한국분말재료학회지
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• 제25권4호
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• pp.340-345
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• 2018

Additive manufacturing by electron beam melting is an affordable process for fabricating near net shaped parts of titanium and its alloys. 3D additive-manufactured parts have various kinds of voids, lack of fusion, etc., and they may affect crack initiation and propagation. Post process is necessary to eliminate or minimize these defects. Hot isostatic pressing (HIP) is the main method, which is expensive. The objective of this paper is to achieve an optimum and simple post heat treatment process without the HIP process. Various post heat treatments are conducted for the 3D-printed Ti-6Al-4V specimen below and above the beta transus temperature ($996^{\circ}C$). The as-fabricated EBM Ti-6Al-4V alloy has an ${\alpha}^{\prime}$-martensite structure and transforms into the ${\alpha}+{\beta}$ duplex phase during the post heat treatment. The fatigue strength of the as-fabricated specimen is 400 MPa. The post heat treatment at $1000^{\circ}C/30min/AC$ increases the fatigue strength to 420 MPa. By post heat treatment, the interior pore size and the pore volume fraction are reduced and this can increase the fatigue limit.