• Title/Summary/Keyword: Electrolytic Etching

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Formation of Aluminum Etch Tunnel Pits with Uniform Distribution Using UV-curable Epoxy Mask (UV-감응형 에폭시 마스크를 사용한 균일한 분포의 터널형 알루미늄 에치 피트 형성 연구)

  • Park, Changhyun;Yoo, Hyeonseok;Lee, Junsu;Kim, Kyungmin;Kim, Youngmin;Choi, Jinsub;Tak, Yongsug
    • Applied Chemistry for Engineering
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    • v.24 no.5
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    • pp.562-565
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    • 2013
  • The high purity Al foil, which has an enlarged surface area by electrochemical etching process, has been used as an anode for an aluminum electrolytic capacitor. Etch pits are randomly distributed on the surface because of the existence of surface irregularities such as impurity and random nucleation of pits. Even though a large surface area was formed on the tunnel-etched Al, its applications to various fields were limited due to non-uniform tunnel morphologies. In this work, the selective electrochemical etching of aluminum was carried out by using a patterned mask fabricated by photolithographic method. The formation of etch pits with uniform distribution has been demonstrated by the optimization of experimental conditions such as current density and etching solution temperature.

Effects of Addition of Sulfuric Acid on the Etching Behavior of Al foil for Electrolytic Capacitors II. Microstructures of Dielectric Layers and AC Impedance Analysis (전해 콘텐사용 알루미늄박의 애칭특성에 미치는 황산첨가의 영향 II. 유전층의 조직 및 임피던스 분석)

  • Kim, Seong-Gap;Yu, In-Jong;Sin, Dong-Cheol;O, Han-Jun;Ji, Chung-Su
    • Korean Journal of Materials Research
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    • v.10 no.5
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    • pp.375-381
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    • 2000
  • Aluminium foil for electrolytic capacitors was anodized at the voltage of 100V and 140V for 10 minutes in ammonium adipate solution to form aluminum oxide layer on aluminum substrate as an dielectric film. The thickness, the stoichiometry and the crystal structure of the layer were investigated by using RBS and TEM . In addition EIS technique was employed to study the effects of addition of sulfuric acid on the increment of the foil surface area. It was found that the thickness values of the layers anodized at 100V and 140V were about 130 nm and 190 nm respectively and the stoichiometry of the elements of aluminum and oxygen was 2:3. The anodic oxide layer was shown to be amorphous. but the structure irradiated with electron beam resulted in the transformation into crystalline structure of $${\gamma}$-Al_2$$O_3$ . From a comparison of the impedance results and the capacitance variation to investigate the ef- fects of sulfuric acid addition to the etching bath of hydrochloric acid, the EIS techinque could be useful to analyze the capacitance variation.

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Dielectric Characteristics of Alumina by Surface Etching Effects (표면에칭효과에 의한 산화알루미늄 유전체의 정전용량 특성)

  • Oh Han-Jun;Park Chi-Sun
    • Journal of the Microelectronics and Packaging Society
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    • v.11 no.4 s.33
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    • pp.61-67
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    • 2004
  • The structural, electrical properties of the electrolytic capacitors were examined. By the addition of additives to hydrochloric acid solution increased the dielectric aluminum surface layer. For etch tunnels formed in hydrochloric acid, the away and density of the tunnels was not uniform, while for those formed in hydrochloric acid with additives the distribution presented relative uniformity. When the etched surface formed in hydrochloric acid with $5\%$ ethylene glycol, the enlargement of specific surface area was more effective.

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Characterization of Titanium Implant Anodized in Various Electrolytes

  • Kim, Hyung-Sun;Cho, Won-Il;Cho, Byung-Won;Park, Joon-Bong;Hur, Yin-Sik
    • Journal of the Korean Electrochemical Society
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    • v.5 no.2
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    • pp.43-46
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    • 2002
  • Commercial titanium rod was anodized in three types of electrolytes such as 0.06 mol/L $\beta-glycerophosphate+0.3mol/L$ calcium acetate, 0.06mol/L $\beta-glycerophosphate+0.3mol/L$ sodium acetate and 0.06 mol/L $\beta-glycerophosphate+5mol/L$ calcium phosphate. The titanium oxide layer $(TiO_2)$ was characterized by scanning electron microscope (SEM), X-ray diffraction (XRD) and electron spectroscopy chemical analysis (ESCA). Numerous micropores were observed on the titanium oxide layer by SEM. The diameter of micropores increased with the increase of electrolytic voltage. The titanium oxide layer was composed of anatase structure. The phosphorous element was detected at 130 eV binding energy, but calcium was not found in the oxide layer because of lower contents. After anodizing the oxide layer was etched in the 30g/L NaOH solution at $80^{\circ}C$ for 1hr. The surroundings of micropores were much more smoothed and rounded than before alkaline etching.

AN EXPERIMENT STUDY ON THE BOND STRENGTH OF ADHESIVE RESINS TO SUEEXSSIVELY RECAST ALLOYS FOR REISN-BONDED RESTORATIONS (반복주조된 치과용 합금의 피착면 처리방법에 따른 접착성 수지와의 접착강도에 관한 실험적 연구)

  • Jung, Kum Tai;Yang, Jae Ho;Lee, Sun Hyung;Jung, Hun Yung
    • The Journal of Korean Academy of Prosthodontics
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    • v.28 no.2
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    • pp.53-76
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    • 1990
  • The purpose of this study was to evaluate the tensile bond strength of adhesive resins to successively recast Rexillium III and Degudent-U. Recasting was done 4times successively. Specimen $A_1$, were cast by new metal, and $A_2$ by surpus of $A_1$, $A_3$ by surplus of, $A_2$ $A_4$ by surplus of $A_3$, $A_5$ by surplus of $A_4$ plus 50% new metal. The types of surface treatment for resinbonded restoration in this experiment were electrolytic etching by OXY-ETCH(Oxy dental products, Inc., Hillside, New Jersey, U.S,A.), aluminum oxide blasting, anodic oxidation by EZ-OXISOR( Towagiken Co., Kyoto, Japan), electrotinplating by Kura Ace(Kuralay Co., Kyoto, Japan). Three kinds of cementing resin used in this study were Comspan(K.P. Cauil Co, Milford Delaware, U.S.A.), Super Bond C&B(Sun-Medical Co. Ltd., Kyoto,Japan), Panavia EX(Kuralay Co., Ltd., Osaka, Japan). Tensile bond strength was measured by Instron Universal testing machineModel 1125) and all the specimen were observed with SEM(JEOL, JSM-T2000) and mode of bond failure were recorded. The obtained results were as follows : 1. In electrolytic etched group, tensile bond strength was decreassed when recast alloy was used, and tensile bond strength of Compan and panavia EX were not significantly different(P>0.05). 2. In remaining group treated by aluminum oxide blasting, EZ-OXIOR, Kura Ace, tensile bond strength were not changed when recast alloy were used, and tensile bond strength of SuperBond(C&B and Panavia EX were not significantly different(P>0.05). 3. IN SEM evaluation, electrolytic etched group and electrotinplated group exhibited different image when recast alloy was used, and remaining groups treated by aluminum oxide blasting, EZ-OXISOR exhibited the same. 4. IN observation of bond failure, electrolytic etched group exhibited adhesive failure and remaing groups treated by aluminium oxid blasting, EZ-OXISOR, Kura Ace exhibited adhesive and cohesive failure.

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Influences of anodizing on improvement in reflection rate of aluminum surface (알루미늄 표면의 정반사율 향상에 미치는 양극산화의 영향)

  • Choi, Kyang-Kun;Kim, Dong-Hyoun;Kim, Hoon;Nam, In-Tak
    • Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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    • 2002.11a
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    • pp.207-211
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    • 2002
  • Anodizing film was prepared by anodic oxidation of pure aluminum(purity > 99.50) using DC power supply for constant current mode in an electrolytic solution of surface of sulfuric acid. Effects of pre-treatment process such as chemical polishing, acid cleaning, alkali etching before anodic oxidation, were studied to microstructures and surface morphologies. A roughness on surface of anodizing film had to be decreased for amorphous phase by anodic oxidation. A roughness on surface of anodizing film decrease as annealing temperature increased in chemical polishing.

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Study of reflection rate character of anodized aluminum thin film (알루미늄 양극산화피막의 반사율 특성연구)

  • Kim, Seung-Kyum;Kim, Dong-Hyun;Joo, In-Joong;Nam, In-Tak;Kim, Hoon
    • Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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    • 2003.11a
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    • pp.227-232
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    • 2003
  • Anodizing film was prepared by anodic oxidation of pure aluminum(purity > 99.50) using DC power supply for constant current mode in an electrolytic solution of surface of sulfuric acid. Effects of pre-treatment process such as chemical polishing, acid cleaning, alkali etching before anodic oxidation, were studied to microstructures and surface morphologies. A roughness on surface of anodizing film had to be decreased for amorphous phase by anodic oxidation. A roughness on surface of anodizing film decrease as annealing temperature increased in chemical polishing.

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Study On Effect of Fe Density on Electrolyte Exfoliation of Chromium Plating Layer (전해액의 Fe 농도에 의한 크롬도금 탈락 연구)

  • Park, Jin-Saeng
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.39 no.12
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    • pp.1297-1303
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    • 2015
  • The internal chromium plating of a long-axis tube is widely used in military and industrial application, with the thick hard plating formed using a mixed solution of Chromium acid and catalytic $H_2SO_4$. A large-caliber gun can endure a high explosive force as a result of the increased stiffness and wear resistance provided by this internal hard chromium surface. The internal chromium layer of a tube is prone to exfoliation caused by the high kinetic energy of the projectile and high pressure of the explosion. Therefore, we reviewed the plating process. Chromium plating comprises many steps, including the removal of Grease, water cleaning, electrolytic abrasion, etching, plating, water cleaning, and hydrogen brittleness removal. The exfoliated chromium plating layer is affected by the adhesion property of the plating. In particular, the Fe concentration of the electrolyte affects the adhesion property. The optimum Fe concentration for effectively suppressing the exfoliation of the plating layer was established by using a scanning electron microscope to determine the surface roughness, and the effectiveness was proved in an adhesion test, etc.

Fabrication of Aluminum Powder Disk by a Template Method and Its Etching Condition for an Electrode of Hybrid Supercapacitor (Template 방법을 이용한 Hybrid Supercapacitor 전극용 알루미늄 분말 디스크 제조와 에칭 조건 연구)

  • Jin, Chang-Soo;Lee, Yong-Sung;Shin, Kyung-Hee;Kim, Jong-Huy;Yoon, Soon-Gil
    • Journal of the Korean Electrochemical Society
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    • v.6 no.2
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    • pp.145-152
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    • 2003
  • Capacitance of a hybrid capacitor that has characteristics of both electrolyte capacitor and supercapacitor is determined by anode surface covered with oxide layer. In this study, optimal condition processes for anode to fabricate a high voltage hybrid capacitor was investigated. We mixed aluminum powder having mean particle size of $40{\mu}m$ with NaCl powders at weight ratio of 4 : 1 and prepared a disk type electrode after annealing at various temperature. After dissolving NaCl in $50^{\circ}C$ distilled water, heat treatment, eletropolishing, chemical treatment, and the first and the second etching of Al disk were conducted. In each process, capacitances and resistances of the disk measured by ac-impedance analyzer were compared to find its optimum treatment condition. Also, the surface morphology of treated disks were observed and compared by SEM. After the second etching, the Al disk was anodized at 365V to make an anode of hybrid supercapacitor that can be operated at 300V, Capacitance and resistance of the anodized Al disk electrode was compared with those of commercialized conventional aluminum electrolytic capacitor at different frequencies.

A STUDY ON THE TENSILE BOND STRENGTH OF ETCHED BASE METALS (식각된 비 귀금속 합금과 법랑질간의 접착 인장강도에 대한 연구)

  • Park, Sang-Won;Yang, Hong-So
    • The Journal of Korean Academy of Prosthodontics
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    • v.25 no.1
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    • pp.303-316
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    • 1987
  • The purpose f this study was to evaluate the effect of resin film thickness on the tensile bond strength and to compare the tensile bond strengths of 4 differently treated metal surfaces. For the experiment, seventy metal specimens were cast with Verabond and divided into I, II, III, groups. The metal specimens in group I were electrolytically etched and cemented with Panavia under finger pressure. Cement film thickness was regulated with metal spacers. The metal specimens in Group II were treated by 4 methods, such as electrolytic etching method, salt-roughened method, EZ-oxisor method , chemical etching method and cemented with Panavia. In group III, electrolytically etched metal specimens were cemented with Hy-Bond. The etched surface of metal specimens and the cement film thickness were examined under the scanning electron microscope. Results were as follows; 1. The tensile bond strength showed no significant difference between $30{\mu}m,\;80{\mu}m,\;130{\mu}m$ film thicknessspecimens. 2. There was no significant difference in the tensile bond strength between the 4 differently treated metal specimens. 3. The tensile bond strength showed significant difference between Panavia and Hy-Bond. 4. Scanning electron microscope photograph revealed that tile interdendritic eutectic was removed in electrolytically etched metal surfaces hilt even dendritic arm was removed in Chemically etched metal surfaces. 5. The metal surfaces which were air-abraded with $50{\mu}m$ aluminum oxide showed roughness and small crack on scanning electron microscope photograph.

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