Korean Journal of Materials Research (한국재료학회지)

Materials Research Society of Korea (한국재료학회)
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Effects of Addition of Sulfuric Acid on the Etching Behavior of Al foil for Electrolytic Capacitors II. Microstructures of Dielectric Layers and AC Impedance Analysis

전해 콘텐사용 알루미늄박의 애칭특성에 미치는 황산첨가의 영향 II. 유전층의 조직 및 임피던스 분석

  • Kim, Seong-Gap (School of Metallurgical and Materials Engineering, Kookmin University) ;
  • Yu, In-Jong (Agency for Defense Development) ;
  • Sin, Dong-Cheol (Dept, of Materialx Sungnam Polytechnec Col) ;
  • O, Han-Jun (Dept of Materials Engineering, Hanseo University) ;
  • Ji, Chung-Su (School of Metallurgical and Materials Engineering, Kookmin University)
  • 김성갑 (국민대학교 금속재료공학부) ;
  • 유인종 (국방과학연구소) ;
  • 신동철 (성남기능대학 재료과) ;
  • 오한준 (한서대학교 재료공학과) ;
  • 지충수 (국민대학교 금속재료공학부)
  • Published : 2000.05.01
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Abstract

Aluminium foil for electrolytic capacitors was anodized at the voltage of 100V and 140V for 10 minutes in ammonium adipate solution to form aluminum oxide layer on aluminum substrate as an dielectric film. The thickness, the stoichiometry and the crystal structure of the layer were investigated by using RBS and TEM . In addition EIS technique was employed to study the effects of addition of sulfuric acid on the increment of the foil surface area. It was found that the thickness values of the layers anodized at 100V and 140V were about 130 nm and 190 nm respectively and the stoichiometry of the elements of aluminum and oxygen was 2:3. The anodic oxide layer was shown to be amorphous. but the structure irradiated with electron beam resulted in the transformation into crystalline structure of $${\gamma}$-Al_2$$O_3$ . From a comparison of the impedance results and the capacitance variation to investigate the ef- fects of sulfuric acid addition to the etching bath of hydrochloric acid, the EIS techinque could be useful to analyze the capacitance variation.

전해콘텐서용 알루미늄박을 ammonium adipate 용액을 이용하여 $65^{\circ}C$에서 10분간 100V 및 140V로 각각 양극 산화시켜 산화 알루미늄 유전체를 만들었다. 유전층의 두께, 화학양론적 관계, 결정구조 등을 RBS 및 TEM을 이용하여 분석하였고, 알루미늄박의 에칭시 황산 첨가로 인한 표면적의 변화는 임피던스 분석법으로 조사 하였다. 생성된 유전피막은 100V 및 140V의 전압을 사용했을 경우 각각 약 130nm 및 190nm 두께의 비정질로 나타났으며 피막의 알루미늄과 산소원소의 화학양자론적 비는 약 2:3의 비율로 존재했다. 또한 유전피막은 전자빔은 조사에 의해 쉽게 $${\gamma}$-Al_2$$O_3$ 형태의 결정질로 변태 되었다. 염산 에칭욕에 황산 첨가시 나타나는 알루미늄박의 표면변화는 임피던스 분석결과와 정전 용략의 변화가 일치하는 경향을 나타냈다.

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