• Title/Summary/Keyword: Electroless-Plating

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Effect of Phase Transformation Behavior of Electroless Nickel Plating Layer on Corrosion and Cavitation-Erosion with Heat Treatment (열처리에 따른 무전해 니켈 도금 층의 상변태 거동이 부식과 캐비테이션 침식에 미치는 영향)

  • Il-Cho Park;Seong-Jong Kim
    • Corrosion Science and Technology
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    • v.23 no.1
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    • pp.64-71
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    • 2024
  • The objective of this study was to investigate corrosion and cavitation-erosion characteristics of the electroless nickel plating layer with heat treatment. The crystallization temperature of the electroless nickel plating layer was about 410 ℃. The phase transformation energy was confirmed to be 12.66 J/g. With increasing heat treatment temperature, the amorphous electroless nickel plating layer gradually changed to crystalline Ni and Ni3P. At the same time, the crystal grain size was also increased. Additionally, when heat treatment was performed at a temperature above 400 ℃, NiO phase was observed due to oxidation phenomenon. As a result of the electrochemical polarization experiment, the corrosion resistance of the heat-treated electroless nickel plating layers was superior to that of the as-deposited plating layer. This was because crystal grains became larger and grain boundaries decreased during heat treatment. The cavitation-erosion resistance of heat-treated plating layers tended to be superior to that of as-deposited plating layers due to increased microhardness.

Electroless Nickel Plating (무전해 니켈도금에 대하여(I))

  • 지태촌;여운관
    • Journal of the Korean institute of surface engineering
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    • v.15 no.1
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    • pp.1-10
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    • 1982
  • Electroless plating is the continious formation of metallic coatings from metal ions by che-mical reduction without the use of electrical current. This is, however, more expansive than the conventional electroplating but is often used because of certain adventage. Here, general description of past research on electroless nickel plating, especially about the merits of each research was given. Part(Ⅰ) is for the conposition of solution, pretreatment and facilities of electroless nickel plating.

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Tribological Characteristics of Silver Electroless-Plating Process According to Thicknesses Variation (무전해 도금 코팅 공정을 이용한 은 박막의 두께 변화에 따른 트라이볼로지 특성)

  • Lee, Hyun-Dai;Kim, Dae-Eun
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.37 no.2
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    • pp.219-225
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    • 2013
  • In this study, the tribological characteristics of silver films that were deposited on a glass substrate by electroless plating were investigated. The electroless-plating method has many notable advantages. It is easy and economical to obtain solid films using this coating process, and it can be applied to both nonconducting and conducting substrates. In this study, silver was selected as the electroless-plating material because it is one of the most common materials used as a solid lubricant. The mechanical properties of silver electroless-plated specimens were investigated for various coating conditions. The thickness of the coating could be controlled by varying the electroless-plating time. The properties of the coatings were investigated using AFM, SEM, and a tribotester.

Novel Environmentally Benign and Low-Cost Pd-free Electroless Plating Method Using Ag Nanosol as an Activator

  • Kim, Jun Hong;Oh, Joo Young;Song, Shin Ae;Kim, Kiyoung;Lim, Sung Nam
    • Journal of Electrochemical Science and Technology
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    • v.8 no.3
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    • pp.215-221
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    • 2017
  • The electroless plating process largely consists of substrate cleaning, seed formation (activator formation), and electroless plating. The most widely used activator in the seed formation step is Pd, and Sn ions are used to facilitate the formation of this Pd seed layer. This is problematic because the Sn ions interfere with the reduction of Cu ions during electroless plating; thus, the Sn ions must be removed by a hydrochloric acid cleaning process. This method is also expensive due to the use of Pd. In this study, Cu electroless plating was performed by forming a seed layer using a silver nanosol instead of Pd and Sn. The effects of the Ag nanosol concentration in the pretreatment solution and the pretreatment time on the thickness and surface morphology of the Cu layer were investigated. The degrees of adhesion to the substrate were similar for the electroless-plated Cu layers formed by conventional Pd activation and those formed by the Ag nanosol.

Electroless Nickel Plating on Fibers for the Highly Porous Electrode

  • Cheon, So-Young;Park, So-Yeon;Rhym, Young-Mok;Kim, Doo-Hyun;Koo, Yeon-Soo;Lee, Jae-Ho
    • Journal of Electrochemical Science and Technology
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    • v.1 no.2
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    • pp.117-120
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    • 2010
  • Materials used as fuel cell electrode should be light, high conductive, high surface area for reaction, catalytic surface and uniformity of porous structure. Nickel is widely used in electrode materials because it itself has catalytic properties. When used as electrode materials, nickel of only a few im on the surface may be sufficient to conduct the catalytic role. To manufacture the nickel with porous structure, Electroless nickel plating on carbon fiber be conducted. Because electroless nickel plating is possible to do uniform coating on the surface of substrate with complex shape. Acidic bath and alkaline bathe were used in electroless nickel plating bath, and pH and temperature of bath were controlled. The rate of electroless plating in alkaline bath was faster than that in acidic bath. As increasing pH and temperature, the rate of electrolee plating was increased. The content of phosphorous in nickel deposit was higher in acidic bath than that in alkaline bath. As a result, the uniform nickel deposit on porous carbon fiber was conducted.

Electroless Ni Plating on Pb-base Ceramics (Pb계 Ceramics 기지상의 무전해 Ni 도금)

  • 민봉기;유종수;최순돈;신현준
    • Journal of the Korean institute of surface engineering
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    • v.32 no.4
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    • pp.487-495
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    • 1999
  • In order to form metallic electrodes on PZT (Pb (Zr, Ti)O$_3$) ceramics, plating conditions for optimal electroless Ni deposition were investigated. Pb in PZT is the major component to inhibit the electroless deposition, because it plays a active role of catalytic poison in plating solution. Adhesion of the electroless Ni deposits is measured by push-pull scale test and peel test. Results such as deposition ability, deposition rate, and thickness of deposits showed in terms of concentration of etchant, composition of catalyzing solution, and composition and pH of electroless bath solution.

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Study on Improvement of Thermal Stability of Dendrite-shape Copper Particles by Electroless Silver Plating (Dendrite 형상 구리 입자의 무전해 은 도금에 의한 열적 안정성 향상에 관한 연구)

  • Hwang, In-Seong;Nam, Kwang Hyun;Chung, Dae-won
    • Applied Chemistry for Engineering
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    • v.33 no.6
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    • pp.574-580
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    • 2022
  • While in the process of electroless plating of dendrite-shape copper with silver, various silver-coated copper (Ag@Cu) particles were prepared by using both displacement plating and reducing electroless plating. The physicochemical properties of Ag@Cu particles were analyzed by scanning electron microscope- energy-dispersive X-ray spectroscopy (SEM-EDS), thermogravimetric analysis (TGA), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) and Brunauer-Emmett-Teller analysis (BET), and it was confirmed that the silver coated by the reducing electroless plating was formed as nano-particles on the copper surface. Ag@Cu particles were compounded with an epoxy resin to prepare a conductive film, and its thermal stability was evaluated. We investigated the effect of the difference between the displacement plating and reducing electroless plating on the initial resistance and thermal stability of conductive films.

A Study on Composite Electroless Nikel Plating with Ceramic Dispersive (비금속 분체를 이용한 무전해 니켈 복합도금에 관한 연구)

  • 김용규;박수훈
    • Journal of the Korean institute of surface engineering
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    • v.22 no.1
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    • pp.43-51
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    • 1989
  • The characteristion of composite electroless Nikel palting on the condition of adding 3kinds ceramic dispersives, Al2O3, Si3O4 and artificial diamond powder were studied. Decreasing solution temperature for composite plating was required to depress the spontaneous decomposition caused by dispersive including enlargement of reaction surface. The rate of composite plating was faster than that of general electroless-Nickel plating without dispersive. this increasing tendency of plating rate was remarkable for the active catalysis, like diamond powder.

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Electroless Nickel Plating (무전해 니켈도금에 대하여(II))

  • 지태촌;여운관
    • Journal of the Korean institute of surface engineering
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    • v.15 no.2
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    • pp.57-67
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    • 1982
  • Electroless Ni-plating is often utilized in industries due to its physical and mechanical characteristics in contrast to conventional electroplatings. Thus, electroless Ni-plating will be broadly applicated in many fields. However, The physial and mechanical properties of this depositss depend largely on the structure and P content of film and heat treatment. And here discused about the important results of those past research.

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DMAB Effects in Electroless Ni Plating for Flexible Printed Circuit Board (DMAB첨가량에 따른 연성회로기판을 위한 무전해 Ni 도금박막에 관한 연구)

  • Kim, Hyung-Chul;Rha, Sa-Kyun;Lee, Youn-Seoung
    • Korean Journal of Materials Research
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    • v.24 no.11
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    • pp.632-638
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    • 2014
  • We investigated the effects of DMAB (Borane dimethylamine complex, C2H10BN) in electroless Ni-B film with addition of DMAB as reducing agent for electroless Ni plating. The electroless Ni-B films were formed by electroless plating of near neutral pH (pH 6.5 and pH 7) at $50^{\circ}C$. The electroless plated Ni-B films were coated on screen printed Ag pattern/PET (polyethylene terephthalate). According to the increase of DMAB (from 0 to 1 mole), the deposition rate and the grain size of electroless Ni-B film increased and the boron (B) content also increased. In crystallinity of electroless Ni-B films, an amorphization reaction was enhanced in the formation of Ni-B film with an increasing content of DMAB; the Ni-B film with < 1 B at.% had a weak fcc structure with a nano crystalline size, and the Ni-B films with > 5 B at.% had an amorphous structure. In addition, the Ni-B film was selectively grown on the printed Ag paste layer without damage to the PET surface. From this result, we concluded that formation of electroless Ni-B film is possible by a neutral process (~green process) at a low temperature of $50^{\circ}C$.