• 한국표면공학회지
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• 제50권3호
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• pp.170-176
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• 2017

EPIG (Electroless Pd/immersion Au) process was studied to replace ENIG (electroless Ni/immersion Au) and ENEPIG (electroless Ni/electroless Pd/immersion Au) processes for bump surface treatment used in high reliable flip chip packages. The palladium and gold layers formed by EPIG process were uniform with thickness of 125 nm and 34.5 nm, respectively. EPAG (Electroless Pd/autocatalytic Au) also produced even layers of palladium and gold with the thickness of 115 nm and 100 nm. TEM results exhibited that the gold layer in EPIG surface had crystalline structure while the palladium layer was amorphous one. After annealing at 250 nm, XPS analysis indicated that the palladium layer with thickness more than 22~33 nm could act as a diffusion barrier of copper interconnects. As a result of comparing the chip shear strength obtained from ENIG and EPIG surfaces, it was confirmed that the bonding strength was similar each other as 12.337 kg and 12.330 kg, respectively.

• 한국염색가공학회지
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• 제22권1호
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• pp.77-82
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• 2010

Highly conductive yarn was successfully obtained using electroless nickel plating method with palladium activation. In the presence of palladium seed on surface of fibers as a catalyst, continuos nickel layer produced on surface of fibers by reducing $Ni${2+}$ ion in the electroless plating bath to $Ni^0$. It was found that the Pd-activation using $SnCl_2$ and $PdCl_2$ to deposit palladium seeds on the surface of fibers plays a key role in the subsequent electroless plating of nickel. It also found that electroless nickel plating on the fibers can induce the nickel-plated $ELEX^{(R)}$ fibers to improve the electrical conductivity of the fibers. The thickness of nickel coating layer on the Pd-activated $ELEX^{(R)}$ fibers and specific conductivity of the fiber were increased through electroless plating time. The temperature of nickel plating bath was very effective to enhance the nickel deposition rate.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
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• pp.86-86
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• 2003

Copper has attracted much attention in the deep submicron ULSI metallization process as a replacement for aluminum due to its lower resistivity and higher electromigration resistance. Electroless copper deposition method is appealing because it yields conformal, high quality copper at relatively low cost and a low processing temperature. In this work, it was investigated that effect of the microstructure of the substrate on the electroless deposition. The mechanism of the nucleation and growth of the palladium nuclei during palladium activation was proposed. Electroless copper deposition on TiN barriers using glyoxylic acid as a reducing agent was also investigated to replace toxic formaldehyde. Furthermore, electroless copper deposition on TaN$\sub$x/ barriers was examined at various nitrogen flow rate during TaN$\sub$x/ deposition. Finally, it was investigated that the effect of plasma treatment of as-deposited TaN$\sub$x/ harriers on the electroless copper deposition.

• 청정기술
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• 제19권2호
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• pp.84-89
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• 2013

무전해 니켈 팔라듐 금 표면처리 공정의 도금 번짐 불량의 근본적인 원인을 이해하고 이를 해결하기 위한 방법을 제시하였다. 이에 계산화학을 이용하여 공정을 정성적으로 설명하고 이를 바탕으로 가정을 검증하기 위한 실험을 계획하였다. 도금 번짐으로 발전되는 고분자 레진 위의 팔라듐 시드의 핵 생성을 막는 것에 초점을 맞추어 고분자 레진과 화학적으로 결합력이 약한 $PdCl_2$ 팔라듐 촉매를 도입하였으며 이 촉매가 수용액 중에서 추가적인 가수분해 반응으로 더 안정한 $Pd(OH)_2$를 형성함으로써 고분자 레진 위에 팔라듐 시드의 원천으로 작용하지 않도록 염산(HCl)의 농도를 높이거나 팔라듐 활성화 공정의 온도를 낮추어 보았다. 계산화학은 매 단계 실험의 이론적인 근거를 제시해 주었으며 실험 결과를 해석하는 데 큰 도움을 주었다. 이와 같이 실험과 이론을 접목시킨 본 연구의 접근법은 관련 공정에서 매우 유용하게 활용될 수 있을 것으로 기대된다.

• 한국에너지공학회:학술대회논문집
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• 한국에너지공학회 1999년도 춘계 학술발표회 논문집
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• pp.165-170
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• 1999

Palladium membranes have high selectivity of separation and removal of hydrogen to chemical process at high temperature. For the development of hydrogen permeable membrane, palladium was deposited on porous stainless steel support by electroless plating method. In this work, the activation effect on the surface of stainless steel support has been investigated for the effective palladium plating. The morphology and microstructure were characterized by SEM and the composition was analyzed by EDX. It is found that the composition of deposited nuclei on the stainless steel support was changed in accordance with activation cycles. It is also observed that Sn-enriched nuclei has been changed to Pd-enriched nuclei over the fifteenth activation. The uniform deposition of the dense palladium layer on porous stainless steel support has been performing with Sn-enriched nuclei and comparing with Pd-enriched nuclei.

• 한국표면공학회지
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• 제43권3호
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• pp.142-147
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• 2010

We evaluated characteristics of ENEPIG (Electroless Nickel Electroless Palladium Immersion Gold) surface treatment for mobile equipment that requires high reliability, in addition to investigating surface treatment processes for semiconductor boards that require high reliability such as regular PCB-package systems, board-on-chip, chip-scaled package (CSP), etc and application for semiconductor package board of SIP, BOC. As a result, it appeared that ENEPIG has superior properties compared to ENIG surface treatment in corrosion resistance, solder junction, wetting, etc. We anticipate that these results will be able to lend credibility to ENEPIG as a low-cost alternative for producing mobile devices such as the cell phones, especially when applied to mass production.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2014년도 추계학술대회 논문집
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• pp.77-77
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• 2014

솔더링과 와이어본딩이 가능한 ENEPIG (Electroless Nickel/Electroless Palladium/Immersion Gold) 를 중심으로 미세회로 기판에 적용할 수 있는 표면처리 및 공정 약품을 소개하고자 한다.

• 한국표면공학회지
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• 제29권6호
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• pp.714-719
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• 1996

For the fabrication of the circuits, contact or terminal areas are usually coated with nickel and gold. Usually, diluted palladium solution is applied to initiate electroless nickel plating on the copper circuits. However, the trace amounts of palladium remains on the resin and it causes the extraneous deposition. We confirmed that selectivity was greatly improved by the treatment with the strong reducing agents such as SBH or DMAB. Bondability was greatly influenced by the contents of phosphorus in the deposited nickel. Stabilizers in the electroless gold plating were also influenced the bonding strength. The baths containing cupferron or potassium nickel cyanide as a stabilizer showed superior bondability. The gold deposits having strong orientation with Au(220) and Au(311) showed good bond ability.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2017년도 춘계학술대회 논문집
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• pp.120.2-120.2
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• 2017

본 연구에서는 고신뢰성 인쇄회로기판이나 플립칩 패키지에 적용되는 범프 표면처리에서 널리 사용되는, ENIG나 ENEPIG 대체를 위한 electroless Pd/immersion Au(EPIG)에 대하여 연구하였다. Transmission electron microscopy(TEM) 분석 결과 형성된 Au layer는 crystalline, Pd layer는 amorphous 임을 확인하였으며, 열처리 후 X-Ray photoelectron spectroscopy(XPS)를 통하여 EPIG층이 하부 copper의 확산방지막으로서 효과가 있음을 알 수 있었다. 또한, 비정질 Pd layer가 확산을 방지하기 위하여는 일정수준 이상의 두께가 필요하며, 그 두께는 35~65nm 수준임을 알 수 있었다.

• 마이크로전자및패키징학회지
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• 제17권1호
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• pp.55-61
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• 2010

본 연구에서는 무연솔더볼 접합부의 신뢰성평가를 위해 굽힘충격 시험법을 사용하였다. 시험 방법의 표준화를 위하여 시험 시의 주파수, +/-진폭의 크기 등을 각각 변화하여 가면서 각 조건이 결과치에 미치는 영향을 분석하고 굽힘충격 시험을 위한 최적조건을 도출하였다. 굽힘충격 시험을 위한 최적조건은 주파수 10 Hz, 진폭은 (+12/-1)~(+15/-1)의 범위이었다. 시험에 사용된 PCB 표면처리는 Cu-OSP(Organic Solderability Preservative)와 ENIG(Electroless Nickel Immersion Gold) 및 ENEPIG(Electroless Nickel, Electroless Palladium, Immersion Gold)의 3종류를 사용하였고, 솔더 접합계면과 파단면을 관찰한 결과 Cu-OSP와 ENIG의 경우 금속간 화합물 층을 따라서 균열이 발생하여 파단이 일어났으나, ENEPIG의 경우에는 주로 솔더 영역에서만 균열이 생성되고 성장하였다.