• 한국조명전기설비학회:학술대회논문집
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• 한국조명전기설비학회 1993년도 추계학술발표회논문집
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• pp.58-62
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• 1993

This paper shows the discharge characteristics of liquid nitrogen under plane to plane electrode, needle to plance electrode, inserting teflon insulator in plane to plane electrode at atmospheric pressure. The main experimental device of this paper is cryostat. The important results obtained from this study are sa follows. Breakdown voltage of LN2 under N-P electrode is higher than that of under P-P electrode at atmospheric pressure. Breakdown duration time is longer with increase of electode gap under the P-P, N-P electrodes. The formation of bubbles by evaporation is observed in spite of non-applying source at atmospheric pressure and the creation of corona confirmed. Breakdown voltage and breakdown duration time are in proportion to increase of diameter in case of inserting teflon insulator. Partial discharge characteristics of thickness 0.5[mm] is that 채굼 voltage of teflon insulator rose with increase of diameter in each [pps].

• Bulletin of the Korean Chemical Society
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• 제29권7호
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• pp.1323-1325
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• 2008

The acetylene black (AB) was dispersed into water in the presence of dihexadecyl hydrogen phosphate (DHP) via ultrasonication, resulting in a stable and well-distributed AB/DHP suspension. After evaporation of water, an AB/DHP composite film-modified electrode was prepared. The electrochemical responses of $K_3$[Fe$(CN)_6$] at the unmodified electrode, DHP film-modified electrode and AB/DHP film-modified electrode were investigated. It is found that the AB/DHP film-modified electrode possesses larger surface area and electron transfer rate constant. Furthermore, the electrochemical behaviors of 1-naphthylacetic acid (NAA) were examined. At the AB/DHP film-modified electrode, the oxidation peak current of NAA remarkably increases. Based on this, a sensitive and convenient electrochemical method was proposed for the determination of NAA. The linear range is in the range from $4.0 {\times} 10^{-8}\;to\;5.0 {\times} 10^{-6}$ mol $L^{-1}$, and the detection limit is $1.0 {\times} 10^{-8}$ mol $L^{-1}$. Finally, this new sensing method was employed to determine NAA in several soil samples.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1996년도 춘계학술대회 논문집
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• pp.295-298
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• 1996

In this study, we have fabricated all solid state electrochromic devices using WO$_3$ film as the working electrode, V$_2$O$\_$5/ film as the counter electrode and PEO-LiClO$_4$-PC film as the solid electrolyte. The WO$_3$ thin films for working electrode and V$_2$O$\_$5/ thin films for counter electrode were deposited onto ITO glass by vacuum evaporation and were shown good electrochromic and state properties after 1x10$\^$5/ cycles. PEO-LiClO$_4$-PC polymer electrolyte can easily be formed into thin films, do not absorb in the visible region of the light. Therefore, such electrolyte have electrochromic properties suitable for large-scale all solid-state electrochromic devices. All solid-staeelectrochromic devices fabricated in this polymer electrolyte have optical modulation of 20%∼30% at 1.5 V.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 제5회 영호남 학술대회 논문집
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• pp.94-97
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• 2003

This study uses ZnO thin film as a piezoelectric material and Pt as bottom electrode for FBAR (film bulk acoustic resonator) device. ZnO thin film and Pt were deposited by RF-magnetron sputtering method. ZnO thin film and Pt were oriented to c-axis. Top electrode Al was deposited by thermal evaporation. The membrane was formed of bulk micromachining. The FBAR was evaluated by XRD, SEM and electrical characterization. The resonant frequency was measured by HP 8753C Network Analyzer. A fabricated FBAR device exhibited a resonant frequency of 700 MHz ~ 1.5 GHz. When bottom electrode and top electrode thickness were fixed, the resonant frequency was increased as decreasing ZnO thin film thickness.

• 한국진공학회지
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• 제9권3호
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• pp.207-215
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• 2000

진공증착 및 이온플레이팅 방법을 이용하여 냉간 압연된 강판상에 알루미늄피막을 형성시킨 후, 증발율 및 증기분포 변화를 측정하고 각 증착방법에서의 증발율에 따른 증기분포 변화를 비교 및 검토하였다. 본 실험에서의 이온플레이팅은 증발원 근처에 이온화 전극을 설치하는 방법으로 고전류 아크방전을 유도하여 $10^{-4}$ Torr 이하에서도 기존의 이온플레이팅에 비해 높은 이온화율을 얻을 수 있는 아크방전 유도형 이온플레이팅(Arc-induced ion Plating; AIIP) 방법을 이용하였다. 전자빔을 이용하면서 알루미나 크루시블을 사용하여 알루미늄을 증발시킬 경우 분당 2.0 $\mu\textrm{m}$이상의 높은 증발율을 얻을 수 있었으며, 이온플레이팅의 경우 이온화된 증기의 상호작용에 따른 산란 효과로 증발율이 다소 낮아짐을 알 수 있었다. $cos^{n/\phi}$로 이루어지는 증기분포의 결정인자(n)의 값이 진공증착의 경우는 1에 근접하는 것으로 나타났고 AIIP의 경우는 2 또는 그보다 더 큰 값으로 이루어지는 것을 확인하였다. 이로부터 이온플레이팅의 경우 이온화율 또는 기판 바이어스 전압의 효과가 다른 조건에 비해 증기분포에 더 크게 영향을 미치는 것을 확인할 수 있었다.

• 한국전기전자재료학회논문지
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• 제21권5호
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• pp.468-473
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• 2008

A MgO layer is used as electrode protective film in the alternating current plasma display panel (AC PDP). The properties of MgO layer are thought to be one of the most important factors that affects the panel reliability through the firing voltage variation. In this study, we investigated the relations between the surface characteristics and e-beam evaporation process parameters such as deposition rate, temperature of substrate and distance between the MgO pellet and substrate. To produce the MgO layer of (200) crystal orientation, we suggest the high temperature of the substrate, the long distance between the pellet and substrate and the high deposition rate.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2000년도 춘계학술대회 논문집
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• pp.735-738
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• 2000

The characteristics of wire electrical discharge machining (WEDM) are governed by many factors such as the power supply type, operating condition and electrode material. This work deals with the effect of wire electrode materials on the machining characteristics such as, metal removal rate, surface characteristics and surface roughness during WEDM A wire's thermal physical properties are melting point, electrical conductivity and vapor pressure. One of the desired qualities of wire is a low melting point and high vapor pressure to help expel the contaminants from the gap. They are determined by the mix of alloying elements (in the case of plain brass and coated wire) or the base core material(i.e. molybdenum). Experiments have been conducted regarding the choice of suitable wire electrode materials and influence of the properties of these materials on the machinability and surface characteristics in WEDM, the experimental results are presented and discussed from their metallurgical aspect. And the coating effect of various alloying elements(Au, Ag, Cu, Zn, Cr, Mn, etc.) to the Cu or 65-35 brass core on them was reviewed also. The removal rate of some coated wires are higher than that of 65-35 brass electrode wire because the wire is difficult to break due to the wire cooling effect of Zn evaporation latent heat and the Zn oxide on the surface is effective in preventing short circuit. The removal rate increases with increasing Zn content from 35, 40 and Zn coated wire

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권2호
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• pp.93-99
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• 2006

In this paper, we fabricated and evaluated polydimethylsiloxane(PDMS)-based flexible and implantable micro electrodes. The electrode patterning was carried out with the photolithography and chemical etching process after e-beam evaporation of 100 ATi and 1000 A Au. The PDMS substrate was treated by oxygen plasma using reactive ion etching(RIE) system to improve the adhesiveness of PDMS and metal layers. The minimum line width of fabricated micro electrode was 20 $\mu$m. After finished patterning, we did packaging with PDMS and then brought up the electrode's part about 40 $\mu$m with gold electroplating. The Hank's balanced salt solution(HBSS) test was carried out for 6 month for endurance of fabricated micro electrode. We carried out in-vivo test for the evaluation of biocompatibility by implanting electrodes under the ICR mouse skin for 42 days.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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• pp.91-93
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• 2008

The organic field-effect transistors with step-edge structure were fabricated. Source and drain electrodes were obliquely deposited by vacuum evaporation. The step-edge of the gate electrode serve as a shadow mask, and the short channel is formed at the step-edge. The excellent device performances were obtained.

• 열처리공학회지
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• 제14권5호
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• pp.292-296
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• 2001

In this work, an ultra-high vacuum activated reactive evaporation equipment was built. With reaction of Al and oxygen plasma, $Al_2O_3$ was deposited on the surface of etched Al foil. The chamber was evacuated down to $2{\times}10^{-7}$ torr initially. The Ar and $O_2$ gas introduced into the chamber to maintain $5{\times}10^{-5}$ torr during deposition. Ar gas prevents recombining of the ionized oxygen. Evaporation was maintained by electron beam evaporator continuously. Heating filament and electrode were used in order to generate plasma. The substrate bias of -300V was introduced to accelerate deposition of evaporated Al atoms. The composition and morphology of deposited $Al_2O_3$ films were analyzed by x-ray photoelectron spectroscopy(XPS) and atomic force microscopy (AFM), respectively. The Al oxide was formed on the surface of etched Al foil. According to AFM results, the surface morphology of $Al_2O_3$ film indicates uniform feature. Dielectric characteristic was measured as a function of frequency. Measured withstanding voltage and capacitance were 52V and $24{\mu}F/cm^2$, respectively. The obtained $Al_2O_3$ film shows clean condition without contaminants, which could be adapted to capacitor production.