• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.11a
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• pp.300-301
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• 2006

We studied about new module technology to solve warpage problems that produce bending of cell in the LCD (Liquid crystal display). Characteristics of cell gap and glass bending of applying heat Panel's PAD part and cell at various temperature was investigated. When applies heat and compresses PAD party only in case of compressing COG(Chip on Glass), uniformity of cell gap that happen by glass bending by temperature of these compressing COG In the PAD party is decreased. However, in case of compress COG. glass bending of applying heat Panel's PAD part and cell at various temperature produced 20um. But, uniformity of cell gap was not decreased. Therefore, it is considered that applying heat Panel's PAD part and cell could decrease uniformity of cell gap and bending of glass.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.11a
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• pp.120-124
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• 2004

본 연구는 Diluted Ceria 입자를 사용한 $SiO_2$(Oxide) CMP 현상에 대한 내용이다. Ceria Slurry의 경우 Silica Slurry와 비교하였을 때 Oxide Wafer 표면과 축합 화학반응을 일으키며 Chemistry Dominant한 CMP Mechanism을 따르고, Wafer Center Removal Rate(RR) Fast 의 특성을 가진다. Ceria Slurry의 문제점인 연마 불균일도를 해결하기 위해 Tribological System을 이용하였다. CMP Tribology는 Pad-Slurry 유막-Wafer의 System을 가지며 윤활막에 작용하는 마찰계수(COF)가 주요 인자이다. Tribology에 적용되는 Stribeck Curve를 통해 Slurry 윤활막의 두께(h) 정도를 예상할 수 있으며, 이 윤활막의 두께를 조절함으로써 Uniformity 향상이 가능하다. 이 Ceria Slurry CMP의 연마 불균일도를 향상시킬 수 있는 방법으로 pH 조절 및 점도 증가가 있다. Ceria 입자 CMP는 분산액의 pH 변화에 강한 작용을 받게 되며 PH5 근방에서 최적화된 Uniformity가 가능하다. 점도를 증가시키는 경우 유막 h가 증가하게 되어 Ceria Slurry의 유동이 균일 분포 상태에 가까워지며 Wafer Uniformity 향상이 가능하다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.1
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• pp.12-16
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• 2005

Chemical mechanical polishing (CMP) process is one of the most useful methods for improving the surface roughness of films. The effects of CMP on the surface morphology of WO$_3$ films prepared by RF sputtering system were investigated in this paper. A removal rate of films increased, and the uniformity performance of surface decreased with the addition of an oxidizer to the tungsten slurry. Non-uniformity performance of surface was superior as its value was below 5 % when oxidizers of 5.0 vol% and 2.5 vol%, respectively, were added to the tungsten slurry. The optimized oxidizer concentration, reflected both the improved roughness values and hillock-free surface with the good uniformity performance, was 5.0 vol% as an atomic force microscopy(AFM) analysis of thin film topographies. Our CMP results will be a useful reference for advanced technology of thin films for gas sensor applications in the near future.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.38-39
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• 2005

We have investigated the effect of the pad surface characteristics such as roughness, groove density and wear of pad on within wafer non-uniformity(WIWNU) in chemical mechanical polishing(CMP). We found that WIWNU increases as pad surface roughness($R_{pk}$; Reduced peak height) increases in an early stage of polishing. But after polishing time goes to a certain extent, WIWNU decreases as uniformity of pad surface roughness. Also, groove of pad has effect on relative pad stiffness although original mechanical properties of pad are unchanged by grooving. WIWNU decreases as relative pad stiffness decreases. In addition, conditioning process causes non-uniform wear of pad during in CMP. The profile of pad wear has a significant effect on WIWNU.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.37 no.2
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• pp.148-153
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• 2024

As complementary metal-oxide semiconductor (CMOS) is scaled down to achieve higher chip density, thin-film layers have been deposited iteratively. The poor film uniformity resulting from deposition or chemical mechanical planarization (CMP) significantly affects chip yield. Therefore, the development of novel fabrication processes to enhance film uniformity is required. In this context, high-pressure deuterium annealing (HPDA) is proposed to reduce the surface roughness resulting from the CMP. The HPDA is carried out in a diluted deuterium atmosphere to achieve cost-effectiveness while maintaining high pressure. To confirm the effectiveness of HPDA, time-of-flight secondary-ion mass spectrometry (ToF-SIMS) and atomic force microscopy (AFM) are employed. It is confirmed that the absorbed deuterium gas facilitates the diffusion of silicon atoms, thereby reducing surface roughness.

• Journal of the Institute of Electronics Engineers of Korea TC
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• v.47 no.4
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• pp.18-24
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• 2010

This paper presents the improvement of the field uniformity in a reverberation chamber which can be substitute an anechoic chamber for the electromagnetic interference (EMI) and immunity test. Nowadays, there are many EMI issues due to the increasing use of wireless local area network (LAN), digital multimedia broadcasting (DMB), and mobile internet. With this reason, this paper studied the field characteristics in a reverberation chamber for 2.3 GHz band. In this paper, the finite difference time domain (FDTD) method is used to analyze the field characteristics in a reverberation chamber. To improve the field uniformity in the reverberation chamber, this paper adopted a 2D cubical residue diffuser (CRD) with varying the disposition and number of CRD. For each case, the tolerance and standard deviation of the electric field strength are evaluated. In comparison with the reverberation chamber without any CRD, the reverberation chamber with two CRDs showed improved results; 1.98 dB improvement in standard deviation and 3.6 dB improvement in tolerance.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.327-328
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• 2008

In this study, it was studied about the improved road light design for drivers and pedestrians using ray- or reverse ray-tracing method. Many of conventional road lights are not suitable for drivers and pedestrians because it has some serious problems such as glare effect or randomicity of illuminated areas. It was oriented from customary design method which was pointed at simple target such as luminance or electrical power. But it was not truth any more that the high luminance or electrical power consumption mean more bright and good road light. We studied ray-tracing method for road light reflector design to get the several goals. It means that good road light has easy for drivers and pedestrians eyes and illuminating objects on the road clearly. So, we set the design targets such as uniformity on the road area per one road light, shading angles and continuous luminance uniformity on the long distance road. We designed ideal road light conditions using ray-tracing method. We set the height of drivers and pedestrians eyes and calculated design guideline to make above design targets. Then we designed road light reflector using reverse ray-tracing method. And we achieved same luminance on the road almost half power consumption because we reduced loss of light. We achieved ideal design guide as 75 degrees of shading angles and 0.5 of luminance uniformity on the road area. Finally, we suggested reflector design for 250 watts power consumption CDM light source.

• Transactions on Electrical and Electronic Materials
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• v.11 no.4
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• pp.194-196
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• 2010

A study is presented of improved road light design for drivers and pedestrians with the use of a ray- or reverse ray-tracing method. Many existing road lights are unsuitable for drivers and pedestrians because of serious problems such as glare effect or randomicity of illuminated areas. This situation has arisen because in customary design methods the emphasis has been on simple factors such as luminance or electrical power. However a high luminance or electrical power consumption, alone, do not guarantee bright and good road lighting. So we have applied a ray-tracing method to the design of a road light reflector with the goals of ensuring that illuminated objects on the road can be seen more clearly and that the illuminating light is more comfortable for the eyes of drivers and pedestrians. We have set design targets for factors such as the uniformity of lighting on the road area per road light, the shading angles and the continuous luminance uniformity on long lengths of road. For set heights of the eyes of drivers and pedestrians eyes we have calculated a design guideline for the achievement of the above design targets. Then we designed a road light reflector using the reverse ray-tracing approach. Also we have achieved the same luminance on the road with almost half the power consumption, through the reduction of lighty loss. In an ideal design optimum parameters are suggested to be a shading angle of 75 degrees and a luminance uniformity of 0.5 on the road area. This reflector performance is achievable with a 250 watt power consumption ceramic discharge metal light source.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.38 no.5
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• pp.357-366
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• 2001

In this paper, computer generated holographic diffuser with high diffraction efficiency and uniformity was designed by the modified iterative Fourier transform algorithm. Newly proposed method to design a CGHD is to flip and to combine BPHs or MPHs, so it makes the computation time decreased and it makes the reconstructed signal area enlarged. The designed sixteen phase holographic diffuser had the high diffraction efficiency of 85.20%, the uniformity of 2.43%, and the average signal to noise ratio of 18.97［㏈］. Also, we compared the CGHD with a 128 level pseudo random phase diffuser about the diffraction efficiency and the uniformity. The proposed diffuser can be provided good performance for a holographic diffuser and a next-generation display device.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07a
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• pp.111-114
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• 2003

In order to improve the surface uniformity and the conduction properties of the fabricated YBCO thick films, a system that applies alternating field vertically to the EPD field has been developed for the first time and applied to the electrophoretic deposition process. The applied alternating electric field caused a force to be exerted on each YBCO particle and resulted in a shaking of the particle in the direction of applied electric field, accomplishing a uniform particle orientation. The usual commercial electrical power was used for the vertically applied alternating voltage and the induced electric field was 25-120 V/cm at 60Hz. The thick film fabricated by the method developed in this paper showed better surface uniformity without crack and porosity and improved film characteristics such as critical temperature ($T_{c,zero}$ : 90 K) and critical current density ($2354\;A/cm^2$). Therefore, it is expected that the shaky-aligned electrophoretic deposition method can be used to fabricate superconductor films through a simpler process and at less expense.