• Title/Summary/Keyword: Electric Field Uniformity

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Simulation and Measurement of Characteristic in 450 mm CCP Plasma Source

  • Park, Gi-Jeong;Seo, Sang-Hun;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.508-508
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    • 2012
  • CST microwave studio is used to simulate the plasma profile of the 450mm CCP source. Standing wave effect becomes important at the high frequency as the electrode radius increases. To solve plasma non-uniformity problem, we designed multi electrode chamber to decreasing standing wave effect. Simulation showed the ratio of input power of each electrode is related with electric field strength. The multi electrode was constructed and measured by 2D probe arrays using floating harmonic method. Uniformity of 450 mm CCP was changed by the ratio of input power of each electrode. We described this dependence with circuit model.

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A study on the uniformity of the electrodeposits in Pb-Sn-Cu ternary alloy plating (Pb-Sn-Cu삼원 합금 전착층의 균일성 연구)

  • NamGoong, E.;Gwon, Sik-Cheol
    • Journal of the Korean institute of surface engineering
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    • v.18 no.3
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    • pp.105-115
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    • 1985
  • Lead-tin-copper ternary alloy electrodeposition is conducted onto the inner bore surface of plain bearings as an overlay in order to investigate the effect of slot width, current density and fluoboric acid concentration on the uniformity of overlay. The thickness of overlay is analyzed by means of current distribution resulting from the overvoltage of plating bath and the apparent distance between cathode and anode. The result demonstrate that the uniformity of overlay is remarkably dependent of the slot size and current density, but has little bearing on the fluoboric acid concentration over 100g/L. This present study indicates that uniform overlay is obtainable within the tolerable thickness of ${\pm}2{\mu}m$ by using the slot width of 22mm. The surface morphology examination also shows the important role of concentration polarization of the micro-uniformity of overlay. The micro-uniformity has improved at the low concentration polarization which resulted from operating at the low current density and high fluoboric acid concentration. The surface morphology of deposits exhibits the vivid pyramid crystalline in the plating condition of low concentration polarizatio and all deposits have columnar structure parallel to the applied electric field regardless of the electroplating condition used.

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Development and Validation of Reverberation Chamber Type Whole Body Exposure System fer Mobile Phone Frequency (이동전화 주파수에 대한 전자파 잔향실 형태의 전신 노출장치 개발 및 유효성 평가)

  • 정기범;고경배;도현정;백정기;정연춘;최재훈
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.15 no.3
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    • pp.291-300
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    • 2004
  • Due to the rapid growth of mobile communication services, many studies have been performed on the biological effects of EMF(Electromagnetic field) exposure. However, it is not easy to create the field uniformity in radio frequency. To overcome this difficulty, the electric field and SAR(Specific Absorption Rate) distribution is developed to measure the whole body exposure system. In this paper, we developed the whole body exposure system for in-vivo study utilizing reverberation chamber which has a high possibility of practical use by substituting previous the EMC chamber. The field uniformity in the test area of the designed reverberation chamber was satisfied by the simulation and measurement data. In animal study of the whole body exposure for a mouse, the results of FDTD simulation were compared with those of measurement to confirm SAR under the electromagnetic exposure. We analyze the electric field distribution in the interior of the reverberation chamber and treat these results in statistical manner. In the CDMA frequency band(PCS & Cellular band), an average value of the whole body SAR and local peak value for a experimental mouse were presented for various input power.

Discharge Characteristic of Surface Type FFL as LCD Backlighting according to Dielectric Layer (LCD 후면광원용 면방전형 FFL의 Dielectric Layer에 따른 방전 특성)

  • 임민수;정득영;윤성현;임기조;권순석
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.177-180
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    • 1999
  • In this paper, we studied Surface Discharge Type Flat Fluorescent Lamp(FFL) with High Luminance for LCD Backlighting. This lamp is Surface Discharge Type structure with a pair of Sodalime glass, insulator layer, phosphor layer, and Xe gas gap. There are two influences of Electric field on different dielectric thickness. The Electric field difference at the dielectric layer itself enhances minimum value of firing voltage and luminance uniformity. So, we measured the Electric filed at 0.5mm, 1mm gap length and discharge voltage for difference dielectric layer thickness. In experiment result, the thicker dielectric layer has higher firing voltage and lower current.

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Effect of applied Field on YBCO Superconductor in EPD Method (전기영동전착에서 YBCO 초전도 후막의 인가전계 영향)

  • Soh, Dea-Wha;Jeon, Yong-Woo;Choi, Sung-Jai;Park, Jung-Cheul
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.63-66
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    • 2003
  • The electrophoretic deposition method has the advantage of relatively few fabrication facilities and simple process procedure as well as the economical and technical merit of allowing various forms of deposition and easy control of deposition thickness and wire length. A study, especially electric field and additive, on the optimization method to increase the density of particles and uniformity of their orientation have been performed to overcome the cracking and the porosity problems in the fabricated superconductor.

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The electro-magnetic properties of Xe type flat lamp by discharge electrode structure (Xe형 평면광원의 방전 전극 구조 변화에 따른 전자계 특성)

  • Yang, Jong-Kyung;Pack, Kwang-Hyun;Lee, Jong-Chan;Choi, Yong-Sung;Park, Dae-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.05b
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    • pp.15-18
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    • 2005
  • As a display becomes large recently, Acquisition of high luminance and Luminance uniformity is becoming difficult in the existing CCFL or EEFL backlight system. So, study for a performance enhancement has enforced. but lamp development of flat type is asked for high luminance and a luminance uniformity security in of LCD and area anger trend ultimately. In this paper, we changed a tip shape of an electrode for production by the most suitable LCD backlight surface light source, and confirmed discharge characteristic along discharge gas pressure and voltage, and confirmed electric field distribution and discharge energy characteristic through a Maxwell 2D simulation. Therefore the discharge firing voltage characteristic showed a low characteristic than a rectangular type and round type in case of electrode which used tip of a triangle type, and displayed a discharge electric current as a same voltage was low.

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Design of an Inductively Coupled Plasma Source with Consideration of Electrical Properties and its Practical Issues (전기적 특성을 고려한 ICP Source 설계)

  • Lee, S.W.
    • Journal of the Korean Vacuum Society
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    • v.18 no.3
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    • pp.176-185
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    • 2009
  • The realization and the performance of ICP source are strongly affected by its electrical impedance and the electric/magnetic field distribution. The ICP source impedance is determined by the antenna impedance and the plasma one. It is preferred to keep the imaginary impedance between -100 ohm to 100 ohm, since it should be avoided the high voltage formation on the antenna and abrupt impedance variation during the thin film process. The plasma uniformity is affected by the electric and magnetic field which is formed by the antenna current and voltage. The influence of azimuthal symmetry are shown by the electromagnetic simulation and the measurement result of plasma density. The radial uniformity can be controlled by locating the concentric antennas which have different diameters. The power distribution ratio and its control method are presented in the case of parallel antenna connections.

The Characteristics of PZ-PT PMN Piezoelectric Ceramics for Application to High Power Device (고출력 압전 디바이스 응용을 위한 PZ-PT-PMN계 압전 세라믹의 특성)

  • ;洪鍾國
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.49 no.3
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    • pp.156-156
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    • 2000
  • The piezoelectric properties and the doping effect for $0.95Pb(Zr_xTi_{l-x})O_3+0.O5Pb(Mn_{1/3}Nb_{2/3})O_3$compositions were studied. Also, the heat generation and the change of electromechanical characteristics, the important problem in practical usage, were investigated under high electric field driving. As a experiment results under low electric field, the value of $k_p$ and ${\varepsilon}_{33}^T$ were maximized, but $Q_m$ was minimized $(k_p=0.57, Q_m=1550)$ in the composition of x=0.51. In order to increase the values of $Q_m$, $Nb_2O_5$ was used as a dopant. As the result of that, the grain size was suppressed and the uniformity of grain was improved. Also, the values of $k_p$ decreased, and the values of $Q_m$ increased with doping concentration of $Nb_2O_5$ . As a experiment results under high electric field driving, when vibration velocity was ower than 0.6[m/s], the temperature increase was 20[℃], and the change ratio of mechanical quality factor was less than 10[%]. So, its electromechanical characteristics was very stable. Conclusively, piezoelectric ceramic composition investigated at this paper is suitable for application to high power piezoelectric devices.

Finite Element Analysis for the Optimal Shape of the High Voltage Insulator for Power Transmission Lines (송전선로용 고전압 절연체의 최적 형상에 대한 유한요소 해석)

  • Kim, Taeyong;Sanyal, Simpy;Rabelo, Matheus;Yi, Junsin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.35 no.1
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    • pp.66-71
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    • 2022
  • The insulator used for the transmission line is a device that is bonded with a cap, pin, ceramic, and cement to withstand insulation capacity and mechanical load. The insulator design can help to reduce the dispersion of the electric field; thus, the optimization of today's design, especially as demanded power grows, is critical. The designs of four manufacturers were used to perform a comparative analysis. Under dry circumstances of the new product, an electric field distribution study was done with no pollutants attached. Manufacturer D's design has the best voltage uniformity of 24.33% and the arc length of 500 mm or more. Manufacturer C's design has an equalizing voltage of more than 2% higher than that of other manufacturers. The importance of the design of the insulator and the number of connections according to the installation conditions is very efficient for transmission lines that will increase in the future.

A study on the electromagnetic field distributions in a W-TEM cell having wire array as an inner conductor (와이어 어레이 형태의 내부 도체를 갖는 W-TEM cell의 전자계 분포 특성에 관한 연구)

  • 김명훈;이중근
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.21 no.6
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    • pp.1576-1586
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    • 1996
  • The subject of this paper is the analysis of a Wire-TEM cell(W-TEM cell) which has an inner wire array rather than a metallic septum;its basic structure is similiar to a NBS TEM cell. To verify improved performances of this W-TEM cell as a standard EM field generator, well-known quasi-static approximations are employed and their resultant ingegral equations are numerically analyzed by moment method. Although the electric field strength of a W-TEM cell is 1.4 dB lower than tht of a NBS TEM cell, the uniformity of EM field patterns in a W-TEM cell is improved. It is also shown that the EM field distortions resulting from loading by the conditing objects under test(loading effects), are decreased considerably. This paper also deals with the investigations about relationship between the EM field distributions and the number of wire composing the inner conductor. Finally, the experimental analysis is performed on the practical model which is built on the basis of the design variables brought out by the theoretical andnumerical analysis.

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