• Title/Summary/Keyword: Edge Mask

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Face Detection based on Matched Filtering with Mobile Device (모바일 기기를 이용한 정합필터 기반의 얼굴 검출)

  • Yeom, Seok-Won;Lee, Dong-Su
    • Journal of the Institute of Convergence Signal Processing
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    • v.15 no.3
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    • pp.76-79
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    • 2014
  • Face recognition is very challenging because of the unexpected changes of pose, expression, and illumination. Facial detection in the mobile environments has additional difficulty since the computational resources are very limited. This paper discusses face detection based on frequency domain matched filtering in the mobile environments. Face detection is performed by a linear or phase-only matched filter and sequential verification stages. The candidate window regions are selected by a number of peaks of the matched filtering outputs. The sequential stages comprise a skin-color test and an edge mask filtering tests, which aim to remove false alarms among selected candidate windows. The algorithms are built with JAVA language on the mobile device operated by the Android platform. The simulation and experimental results show that real-time face detection can be performed successfully in the mobile environments.

Infinitely high selectivity etching of SnO2 binary mask in the new absorber material for EUVL using inductively coupled plasma

  • Lee, S.J.;Jung, C.Y.;Lee, N.E.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.285-285
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    • 2011
  • EUVL (Extreme Ultra Violet Lithography) is one of competitive lithographic technologies for sub-30nm fabrication of nano-scale Si devices that can possibly replace the conventional photolithography used to make today's microcircuits. Among the core EUVL technologies, mask fabrication is of considerable importance since the use of new reflective optics having a completely different configuration compared to those of conventional photolithography. Therefore new materials and new mask fabrication process are required for high performance EUVL mask fabrication. This study investigated the etching properties of SnO2 (Tin Oxide) as a new absorber material for EUVL binary mask. The EUVL mask structure used for etching is SnO2 (absorber layer) / Ru (capping / etch stop layer) / Mo-Si multilayer (reflective layer) / Si (substrate). Since the Ru etch stop layer should not be etched, infinitely high selectivity of SnO2 layer to Ru ESL is required. To obtain infinitely high etch selectivity and very low LER (line edge roughness) values, etch parameters of gas flow ratio, top electrode power, dc self - bias voltage (Vdc), and etch time were varied in inductively coupled Cl2/Ar plasmas. For certain process window, infinitely high etch selectivity of SnO2 to Ru ESL could be obtained by optimizing the process parameters. Etch characteristics were measured by on scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) analyses. Detailed mechanisms for ultra-high etch selectivity will be discussed.

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Seam Carving based Occlusion Region Compensation Algorithm (심카빙 기반 가려짐 영역 보상 기법)

  • An, Jae-Woo;Yoo, Ji-Sang
    • Journal of Broadcast Engineering
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    • v.16 no.4
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    • pp.573-583
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    • 2011
  • In this paper, we propose an occlusion compensation algorithm which is used for virtual view generation. In general, since occlusion region is recovered from neighboring pixels by taking the mean value or median value of neighbor pixels, the visual characteristics of a given image are not considered and consequently the accuracy of the compensated occlusion regions is not guaranteed. To solve these problem, we propose an algorithm that considers primary visual characteristics of a given image to compensate the occluded regions by using seam carving algorithm. In the proposed algorithm, we first use Sobel mask to obtain the edge map of a given image and then make it binary digit 0 or 1 and finally thinning process follows. Then, the energy patterns of original and thinned edge map obtained by the modified seam carving method are used to compensate the occlusion regions. Through experiments with many test images, we verify that the proposed algorithm performed better than conventional algorithms.

Dempster-Shafer's Evidence Theory-based Edge Detection

  • Seo, Suk-Tae;Sivakumar, Krishnamoorthy;Kwon, Soon-Hak
    • International Journal of Fuzzy Logic and Intelligent Systems
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    • v.11 no.1
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    • pp.19-24
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    • 2011
  • Edges represent significant boundary information between objects or classes. Various methods, which are based on differential operation, such as Sobel, Prewitt, Roberts, Canny, and etc. have been proposed and widely used. The methods are based on a linear convolution of mask with pre-assigned coefficients. In this paper, we propose an edge detection method based on Dempster-Shafer's evidence theory to evaluate edgeness of the given pixel. The effectiveness of the proposed method is shown through experimental results on several test images and compared with conventional methods.

A Study on an Image Noise Erase Method By to be an Image Noise Frequent Occur for Raining, in Measurement Machine Vision System for using CCD Camera Of Pantograph Sliding Plate (팬터그래프 습판마모의 머신 비젼 측정에서 우천시 발생하는 영상의 노이즈 제거방법에 대한 연구)

  • Lee, Seong-Gwon;Lee, Dae-Won;Kang, Seung-Wook;Oh, Sang-Yoon
    • Proceedings of the KIEE Conference
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    • 2007.11c
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    • pp.191-193
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    • 2007
  • Pantograph sliding plate abrasion auto-detect system, one of the electric rail car auto-detecting devices, is a system that decides how much abrasion and when to replace without an inspector physically looking at the abrasion on the wet plate using machine vision, a cutting-edge technology. This paper covers the cause of deteriorating reliability that affects pantograph wet plate edge detection due to noise added to the video when it rains. In order to remove such noise, problems should be checked through Smoothing, Averaging mask and Median filter using filtering technique and stable edge detection without being affected by noise should be induced in video measurement used in machine vision technology.

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A Single Field Deinterlacing Algorithm Using Edge Map in the Image Block (영상 블록에서의 에지 맵을 이용한 단일 필드 디인터레이싱 알고리듬)

  • Kang, Kun-Hwa;Jeon, Gwang-Gil;Jeong, Je-Chang
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.34 no.4C
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    • pp.355-362
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    • 2009
  • A new intra field deinterlacing algorithm with edge map in the image block is introduced. Conventional deinterlacing methods usually employ edge-based line average algorithm within pixel-by-pixel approach. However, it is sensitive to variation of intensity. To reduce this shortcoming, we proposed edge direction vector computed by edge map, and also its interpolation technique. We first introduce an edge direction vector, which is computed by Sobel mask, so that finer resolution of the edge direction can be acquired. The proposed edge direction vector oriented deinterlacer operates by identifying small pixel variations in five orientations, while weighted averaging to estimate missing pixel. According to the edge direction of the direction vector, we calculate weights on each edge direction. These weight values multiplied by the candidate deinterlaced pixels in order to successively build approximations of the deinterlaced sequence.

Fabrication of the interface-treated ramp-edge Josephson junctions using Sr$_2AlTaO_6$ insulating layers (Sr$_2AlTaO_6$ 절연막을 이용한 계면처리된 경사형 모서리 조셉슨 접합의 제작)

  • Choi, Chi-Hong;Sung, Gun-Yong;Han, Seok-Kil;Suh, Jeong-Dae;Kang, Kwang-Yong
    • 한국초전도학회:학술대회논문집
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    • v.9
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    • pp.63-66
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    • 1999
  • We fabricated ramp-edge Josephson junctions with barriers formed by interface treatments instead of epitaxially grown barrier layers. Low-dielectric Sr$_2AITaO_6$(SAT) layer was used as an ion-milling mask as well as an insulating layer for the ramp-edge junctions. An ion-milled YBa$_2Cu_3O_{7-x}$ (YBCO)-edge surface was not exposed to solvent through all fabrication procedures. The barriers were produced by structural modification at the bottom YBCO edge using plasma treatment prior to deposition of the top YBCO electrode. We investigated the effects of pre-annealing and post-annealing on the characteristics of the interface-treated Josephson junctions. The junction parameters were improved by using in-situ RF plasma cleaning treatment.

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Noise Elimination and Edge Detection based on Fuzzy Logic (퍼지 논리를 이용한 잡음 제거 및 에지 검출)

  • 이혜정;정성태;정석태
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.7 no.3
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    • pp.506-512
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    • 2003
  • The edge detection has been so far under a lot of studies on its methods, as a very important part of image recognition. Never the less the correct detection of the edge has been yet a difficult problem because of the various scopes of detection according to the applied field. One of those problems to be solved is the edge detection in images with noise. This paper presents an efficient method which removes noise and detect edge in the same framework based on fuzzy logic. The method consists of two steps. First, an efficient filtering is applied to eliminate the noise from original image. The filtering is performed by utilizing fuzzy MIN-MAX operator in three directions such as vertical, horizontal and diagonal angle of 3${\times}$3 mask. Second, edges are detected by using extended fuzzy Shanon Function.

A Study on Edge Detection Algorithm Considering Pixel Distribution (화소분포를 고려한 에지 검출 알고리즘에 관한 연구)

  • Lee, Chang-Young;Kim, Nam-Ho
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2015.05a
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    • pp.919-921
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    • 2015
  • The edge is widely utilized as a preconditioning process in order to simplify the images in several fields such as the object recognition and detection. The edge detection methods which are generally known include the methods of Sobel, Roberts and Laplacian. However, such current methods have an advantage that the implementation is simple but bring more less an insufficient result since they use the fixed weighting mask. Therefore, an algorithm using the modified morphology is proposed in order to supplement such problems of the current edge detection methods and obtain the excellent edge detection, and also a simulation using this algorithm is conducted to compare with such current methods.

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Fabrication of interface-controlled Josephson junctions using Sr$_2$AlTaO$_6$ insulating layers

  • Kim, Jun-Ho;Choi, Chi-Hong;Sung, Gun-Yong
    • 한국초전도학회:학술대회논문집
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    • v.10
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    • pp.165-168
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    • 2000
  • We fabricated ramp-edge Josephson junctions with barriers formed by interface treatments instead of epitaxially grown barrier layers. A low-dielectric Sr$_2$AlTaO$_6$(SAT) layer was used as an ion-milling mask as well as an insulating layer for the ramp-edge junctions. An ion-milled YBa$_2$Cu$_3$O$_{7-x}$ (YBCO)-edge surface was not exposed to solvent through all fabrication procedures. The barriers were produced by structural modification at the edge of the YBCO base electrode using high energy ion-beam treatment prior to deposition of the YBCO counter electrode. We investigated the effects of high energy ion-beam treatment, annealing, and counter electrode deposition temperature on the characteristics of the interface-controlled Josephson junctions. The junction parameters such as T$_c$, I$_c$c, R$_n$ were measured and discussed in relation to the barrier layer depending on the process parameters.

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