• Title/Summary/Keyword: EUV

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Solar flare 발생시 GOES 위성의 X-ray flux자료를 이용한 이온권 변화

  • Kim, Jeong-Heon;Kim, Yong-Ha;Yun, Jong-Yeon;O, Seung-Jun
    • The Bulletin of The Korean Astronomical Society
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    • v.37 no.2
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    • pp.126.2-126.2
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    • 2012
  • 최근 태양 극대기를 맞아 우주기상의 변화에 대처하기 위한 연구가 많이 진행되고 있다. 본 연구에서도 저 중위도 이온권 모델인 SAMI2와 SAMI3를 이용하여 solar flare 발생에 따른 이온권의 변화를 지켜보고자 하였다. 하지만 SAMI 모델에서는 F74113 Solar EUV reference spectrum을 이용하여 EUV flux에 의한 이온화만 고려되었을 뿐, X-ray flux에 의한 이온화는 고려되지 않았다. 태양 극대기동안 solar flare가 발생하였을 때, solar X-ray가 전리층에 미치는 영향이 매우 중요한만큼 solar X-ray에 의한 이온권의 변화를 적용시킬 필요가 있었다. 따라서 우리는 보다 정확한 solar flare 발생에 따른 이온권의 변화를 보기 위해 $1{\AA}{\sim}8{\AA}$범위의 X-ray관측자료를 제공하는 GOES 위성의 데이터를 직접 이용하고, 해당하는 파장의 cross section을 추가하여 SAMI 모델에 적용시켰다. solar flare 효과를 선택적으로 활용하는 개정된 SAMI 모델을 통해 각 flare 등급과 지속시간에 따른 이온권의 변화를 모델로써 확인하였다.

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EUV Lithography Blank Mask Repair using a FIB

  • 채교석;김석구;김신득;안정훈;박재근
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2004.05a
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    • pp.129-131
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    • 2004
  • 극자외선 리소그래피(EUV lithography) 기술은 50nm 이하의 선폭을 가지는 차세대 소자 제작에 있어서 선도적인 기술 중 하나이다. EUVL 에서 필수적인 요소중의 하나가 mirror 로 사용되는 blank mask 이다. Blank mask 에 있어서 가장 중요한 요소는 반사도이다. 이 blank mask 는 Si substrate 위에 반사를 위한 Mo/Si pair 가 40pair 이상 적층되어있다. Blank mask 는 매우 청결해야한다. 만약 결함이 있다면 blank mask 에는 치명적이다 결함은 blank mask 에 있어서 반사도를 떨어뜨리는 주 요소이기 때문이다. 그 결함에는 amplitude defect 과 phase defect 이 있다. FIB 에서는 amplitude defect 을 수정하는 것이 가능하다. 우리는 FIB 를 이용하여 mage mode, spot mode, bar rotation mode 를 사용하여 amplitude defect을 수정하였다. 그리고, 그 결과 효과적으로 amplitude defect을 수정하였다.

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Vacuum Technology for EUV Lithography (EUV Lithography를 위한 진공 기술)

  • Joo, Jang Hun
    • Vacuum Magazine
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    • v.1 no.3
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    • pp.14-20
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    • 2014
  • Lithography is widely recognized as one of the key steps in the manufacture of ICs and other devices and/or structures. However, as the dimensions of features made using lithography become smaller, lithography is becoming a more critical factor for enabling miniature IC or other devices and/or structures to be manufactured. As explained above, to make it happen, many other important technologies will have to be addressed. The vacuum technology is one of them and the engineers and experts are paying attention on vacuum technology including vacuum pumps. Especially high Vacuum(HV) and Ultra high vacuum(UHV) are not easy and not simple one. So the manpower who can understand vacuum technology with long experience in vacuum industry is important with basic study.

Nano-cleaning of EUV Mask Using Amphoterically Electrolyzed Ion Water (화학양면성의 전해이온수를 이용한 극자외선 마스크의 나노세정)

  • Ryoo, Kun-kul;Jung, Youn-won;Choi, In-sik;Kim, Hyung-won;Choi, Byung-sun
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.2
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    • pp.34-42
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    • 2021
  • Recent cleaning technologies of mask in extremely ultraviolet semiconductor processes were reviewed, focused on newly developed issues such as particle size determination or hydrocarbon and tin contaminations. In detail, critical particle size was defined and proposed for mask cleaning where nanosized particles and its various shapes would result in surface atomic ratio increase vigorously. A new cleaning model also was proposed with amphoteric behavior of electrolytically ionized water which had already shown excellent particle removing efficiency. Having its non-equilibrium and amphoteric properties, electrolyzed ion water seemed to oxidize contaminant surface selectively in nano-scale and then to lift up oxidized ones from mask surface very effectively. This assumption should be further investigated in future in junction with hydrogen bonding and cluster of water molecules.

Observation of the Rebound Shock Waves and the EUV Brightening of a Light Bridge Jet

  • Yang, Heesu
    • The Bulletin of The Korean Astronomical Society
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    • v.45 no.1
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    • pp.44.1-44.1
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    • 2020
  • Hα jets of cool chromospheric plasma are protruding into the solar corona 10-100 Mm above the photosphere. The driving mechanisms of Hα jets have been widely studied for decades. However, the detailed process is still elusive. We observed shock signatures moving along a dark jet using 1.6 meter Goode Solar Telescope at Big Bear Solar Observatory. The first shock front of the jet shows sharp --- when it moves upward, while fuzzy and granulated when it moves downward. The jet itself extends upward when the second shock front of the jet reaches the top of the jet. We find abrupt EUV brightenings when the second shock front collides with the edge of the jet. The third front and the fouth front quasi-periodically. These phenomena might be the signs of the rebound shock waves triggered by p-mode wave leakages at the bottom of the jets. Our observation suggests that the jet can be triggered by the rebound shock waves generated by the p-mode waves leaked at the bottom of the jets.

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