References
- EUV Stimulated Photo-Resist Outgassing, 4th International EUVL Symposium, San Diego, USA(7-9 Nov 2005), Anthony Keen, Carolyn Hughes, BOC Edwards
- Opportunities for optimizing vacuum and abatement systems for Extreme Ultra Violet Lithography, 2010 International Symposium on Extreme Ultra Violet Lithography, October 17-20, 2010, Kobe, Japan, Christopher Bailey, Neil Condon, Jos Donders, and Anthony Keen, Edwards Ltd. Manor Road, Crawley, West Sussex, RH10 9LW, UK
- Realistic method to quantify risks of resist outgassing, A Van de Runstraat, A.M.C.P.de Jong, A.G.T.M. Bastein
- Quantitative Measurement of EUV Resist Outgassing, Gregory Denbeaux, Rashi Garg, Justin Waterman, Yu-Jen Fan, Robert Brainard, Chimaobi Mbanaso, Kim Dean, College of Nanoscale Science and Engineering, University at Albany and SEMATECH, Austin, TX.
- Optics contamination in extreme ultraviolet lithography, Shannon B. Hill, N. Faradzhev, L.J. Richter, C. Tarrio, S. Grantham, R. Vest and T. Lucatorto, NIST
- Technical Note : Concepts for protection of EUVL masks from particle contamination, Christof Asbach, Heinze Fissan, Jung Yyeun Kim, Se-Jin Yook, and David Y. H. Pui, Journal of Nanoparticle Research(2006) 8 : 705-708 https://doi.org/10.1007/s11051-006-9080-y
- EUV Lithography - Vacuum Challenges, Paul A. Blackborow and Carolyn Hughes
- EUV Resist Outgassing Studies in SELETE, Julius J. Santillan, Shinji Kobayashi and Toshiro Itani, 29th October 2007, EUVL Symposium 2007
- Extreme Ultraviolet Resist Outgassing and Its Effect on Nearby Optics, Rashi Garg, 2008 International Workshop on EUV Lithography
- Update on EUV outgassing IMEC - Investigation of outgassing and contamination in multilayer scheme, I. Pollentier
- Resist-outgas testing and EUV optics contamination at NIST, Shannon Hill, Nadir Faradzhev, Charles Tarrio, Steve Grantham, Lee Richter and Tom Lucatorto, NIST, 2012 International Workshop on EUVL, Maui, HI
- Development of core technologies on EUV mask and resist for sub 20nm half pitch generation, Soichi Inoue, Tsuyoshi Amano, Toshiro Itani, Hidehiro Watanbe, Ichiro Mori, Takeo Watanabe, Hiroo Kinoshita, Hiroki Miyai and Masshiro Hatekeyama, Adv. Opt. Techn, 2012 ; 1(4): 269-278
- New approach for reducing the Out of Band effect and outgassing by applying top coat materials, Nissan Chemical Industries, ltd., 2013 International Workshop on EUV Lithography, in Maui
- Apparatus and Method for Measuring the Outgassing and EUV Lithography Apparatus, Dieter Kraus, Dirk Heinrich Ehm, Theodoor Bastiaan Wolschrijn, Johannes Hubertus Josephina Moors, Carl Zeiss SMT AG and AMSL Netherlands B.V.
- Radiation-generated Plasmas - A Challenge in Modern Lithography, Marc Hubertus Lorenz, Van der Velden, Eindhoven, Technishce Universiteit Eindhoven, 2008