• Title/Summary/Keyword: Due Process

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Analysis of Grinding Characteristics of Ceramic (SiC) Materials (세라믹 소재의 연삭가공 특성 분석)

  • Park, Hwi-Keun;Park, Sang-Hyeon;Park, In-Seung;Yang, Dong-Ho;Cha, Seung-Hwan;Ha, Byeong-Cheol;Lee, Jong-Chan
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.17 no.1
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    • pp.16-22
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    • 2018
  • Silicon carbide (SiC) is used in various semiconductor processes because it has superior thermal, mechanical, and electrical characteristics as well as higher chemical and corrosion resistance than existing materials. Due to these characteristics, various manufacturing technologies have been developed for SiC. A recent development among these technologies is Chemical Vapor Deposition SiC (CVD-SiC). Many studies have been carried out on the processing and manufacturing of CVD-SiC due to its different material characteristics compared to existing materials like RB-SiC or Sintered-SiC. CVD-SiC is physically stable and has excellent chemical and corrosion resistance. However, there is a problem with increasing the thickness, because it is manufactured through a deposition process. Additionally, due to its high strength and hardness, it is difficult to subject to machining.

Characteristics of organic light-emitting diodes with AI cathode prepared by ITS system (TTS로 성막한 Al 캐소드를 가진 유기발광소자의 특성 분석)

  • Moon, Jong-Min;Lee, Sang-Hyun;Kim, Han-Ki
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.74-75
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    • 2007
  • We report on the characteristics of organic light-emitting diodes with Al cathode deposited by specially designed twin target sputter(TTS) system. It was found that the Al cathode films grown by TTS system were amorphous structure with nanocrystallines due to low substrate temperature during sputtering process. Effective confinement of high-density plasma between two Al targets lead to low temperature sputtering process on organic layer. Moreover, organic light-emitting diodes with Al cathode deposited by TTS system exhibited low leakage current density of $4{\times}10^{-6}\;mA/cm2$ at -6 V indicating plasma damage due to bombardment of energetic particles such as ions and $\gamma$-electrons was effectively restricted in the ITS system. Sputtering method using ITS system is expected to be applied in organic electronics and flexible displays due to its low temperature and plasma damage free deposition process.

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Investigation of Through-thickness Microstructural Evolution in a 600 MPa-Grade Reinforced Steel Bar Manufactured by Tempcore Process (Tempcore 공정을 통해 제조된 600 MPa급 철근의 두께방향 미세구조 변화 분석)

  • Jiwon Park;Hyunji Kim;Singon Kang
    • Journal of the Korean Society for Heat Treatment
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    • v.36 no.6
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    • pp.367-373
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    • 2023
  • 600 MPa-grade deformed bar samples were manufactured by conventional hot rolling and subsequent Tempcore heat treatment processes. Considering the short-time water quenching step of the Tempcore process for hot-rolled steel, it is inevitable that the temperature profile of the deformed bar depends strongly on its position throughout the sample thickness. As a result, its microstructure can be easily divided into two regions, the surface and the core regions. The former is expected to have a fresh martensite microstructure under rapid cooling conditions, but self-tempering occurs due to the intense heat flow from the hot core region after the process. The latter is generally known to exhibit a mixed microstructure of ferrite and pearlite due to its slow cooling rate. In this study, detailed microstructural evolutions were examined through the thickness direction. The large variation of the microstructure through the thickness direction in the deformed bar samples is partly due to the easy carbon diffusion from the limited additions of alloying elements.

Measurement of Oxygen by FTIR in Silicon wafer process steps (실리콘 웨이퍼 공정스텝에서 FTIR에 의한 산소의 측정)

  • 김동수;정원채
    • Proceedings of the IEEK Conference
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    • 2000.06b
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    • pp.68-71
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    • 2000
  • In this paper, we have measured the oxygen contents by FTIR in silicon wafer various process technology(slicing, lapping, polishing). The measured data are also compared with the data of etching process(KOH, Bright etching). Also we have measured the surface morpology in backside silicon wafer after etching treatment and etch pit density due to OISF after 4 step high temperature annealing process with optical microscope.

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Development of integrated TCAD for VLSI process simulation (반도체 공정 시뮬레이션을 위한 통합 TCAD 개발)

  • 윤상호;이경일;공성원;이재희;원태영
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.33A no.5
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    • pp.108-116
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    • 1996
  • A semiconductor process imulator operated in windows$^{TM}$ environment has been developed. two-dimensional process simulation in personal computer has been enabled due to the improvement of CPU speed and the efficient use of memory. The process simulator in this paper is capable of calculating diffusion, oxidation, ion implantation, etching and deposition in two-dimensional manner. In addition, graphic-user-friendly editor, parser, and multi-dimensional graphical routine is also available in the devloped simulator.

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Understanding the Material Removal Mechanisms of Abrasive Water Jet Drilling Process by Acoustic Emission Technique

  • Kwak, Hyo-Sung;Kovacevic, Radovan
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 1998.03a
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    • pp.40-52
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    • 1998
  • Among the non-traditional machining methods, Abrasive waterjet machining process shows big promise in drilling difficult-to-machine materials due to its numerous advantages such as absence of heat affect zone and thermal distortion. Acoustic emission signal technique is used to understand about material removal mechanisms during abrasive waterjet drilling process. More information about the drilling process is derived through frequency decomposition of auto regressive moving average modeling representing acoustic emission signals.

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Properties of Fireproof Mortar Using Lightweight Fine Aggregate Using Air Cooling Process Bottom Ash (건식공정 바텀애시 경량 잔골재를 사용한 내화모르타르의 특성)

  • Kim, Myung-Hoon;Namkoong, Yeon
    • Proceedings of the Korean Institute of Building Construction Conference
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    • 2016.05a
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    • pp.225-226
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    • 2016
  • Bottom ash generated in thermoelectric power plants could be used as substitutional fine aggregate such as pearlite of fireproof mortar due to its lightweight and porosity. Development of substitutional materials is necessary because pearlite has several problems such as production of carbon dioxide during manufacturing process and high price. This study is to confirm the possibility of air cooling process bottom ash for fireproof mortar as substitutional material of pearlite through basic experiment.

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Widely Tunable Adaptive Resolution-controlled Read-sensing Reference Current Generation for Reliable PRAM Data Read at Scaled Technologies

  • Park, Mu-hui;Kong, Bai-Sun
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.17 no.3
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    • pp.363-369
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    • 2017
  • Phase-change random access memory (PRAM) has been emerged as a potential memory due to its excellent scalability, non-volatility, and random accessibility. But, as the cell current is reducing due to cell size scaling, the read-sensing window margin is also decreasing due to increased variation of cell performance distribution, resulting in a substantial loss of yield. To cope with this problem, a novel adaptive read-sensing reference current generation scheme is proposed, whose trimming range and resolution are adaptively controlled depending on process conditions. Performance evaluation in a 58-nm CMOS process indicated that the proposed read-sensing reference current scheme allowed the integral nonlinearity (INL) to be improved from 10.3 LSB to 2.14 LSB (79% reduction), and the differential nonlinearity (DNL) from 2.29 LSB to 0.94 LSB (59% reduction).

STOCHASTIC SINGLE MACHINE SCHEDULING WITH WEIGHTED QUADRATIC EARLY-TARDY PENALTIES

  • Zhao, Chuan-Li;Tang, Heng-Yong
    • Journal of applied mathematics & informatics
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    • v.26 no.5_6
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    • pp.889-900
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    • 2008
  • The problem of scheduling n jobs on a single machine is considered when the machine is subject to stochastic breakdowns. The objective is to minimize the weighted squared deviation of job completion times from a common due date. Two versions of the problem are addressed. In the first one the common due date is a given constant, whereas in the second one the common due date is a decision variable. In each case, a general form of deterministic equivalent of the stochastic scheduling problem is obtained when the counting process N(t) related to the machine uptimes is a Poisson process. It is proved that an optimal schedule must be V-shaped in terms of weighted processing time when the agreeable weight condition is satisfied. Based on the V-shape property, two dynamic programming algorithms are proposed to solve both versions of the problem.

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A Study on Defects Due to Air Bubbles in the PU-Coating Gloves and Enhanced Molds to Reduce the Defects (폴리우레탄 코팅 장갑의 기포로 인한 불량 현상에 대한 고찰과 개선)

  • Kim, Yong-Woo
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.16 no.5
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    • pp.55-62
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    • 2007
  • With the developments in knitting, manufacturing, and polymers, coated gloves have been evolved in a way to maximize occupational safety and functionality. In this paper, we have considered the PU-coating process for the glove knitted by Dyneema to reduce the occurrence of the defects due to air bubble. This paper classifies the types of defect due to air bubble and traces their forming mechanisms. The air between coating layer of glove and mold's surface forms the defects if it is not evacuated fully in the process of submerging into water. The defects can be suppressed or avoided by forming air-evacuating path on the surface of the molds.