• Title/Summary/Keyword: Double deflector

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Double-deflector effects on a low voltage microcolumn (저전압 초소형 전자 칼럼에서 이중 편향기의 효과)

  • Jang, Won-Kweon
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.10 no.10
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    • pp.2628-2633
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    • 2009
  • In a double deflector employed microcolumn, the variation of FOV and scan field width was investigated in mode of conversely biased double deflector to eliminate barrel distortion caused by aberration. The relationship between biased voltage of each deflector and electron emission tip voltage was studied for the maximum FOV and scan field width. The limitation and the linearity of zooming current image are also estimated as a function of electron emission tip voltage.

Flow Computation over KSR-III Flume Deflector (KSR-III 화염 편향기의 유동해석)

  • Choi S. W.;Kim I. S.
    • 한국전산유체공학회:학술대회논문집
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    • 2001.10a
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    • pp.99-105
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    • 2001
  • Flow computations have been conducted to study the impingement flowfield over the KSR-III flume deflector To validate Euler solver for the jet impingement flowfieid, the jet flow over a double wedge deflector have been calculated and showed reasonable agreement with experimental data. The transient flow behavior of flume over deflector have been investigated and the flume from the rocket nozzle proved to be getting out of the deflector safely and the thermal effect on the base region of rocket was not considerable.

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Wind tunnel investigation on flutter and buffeting of a three-tower suspension bridge

  • Zhang, Wen-ming;Ge, Yao-jun
    • Wind and Structures
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    • v.24 no.4
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    • pp.367-384
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    • 2017
  • The Maanshan Bridge over Yangtze River in China is a new long-span suspension bridge with double main spans of $2{\times}1080m$ and a closed streamline cross-section of single box deck. The flutter and buffeting performances were investigated via wind tunnel tests of a full bridge aeroelastic model at a geometric scale of 1:211. The tests were conducted in both smooth wind and simulated boundary layer wind fields. Emphasis is placed on studying the interference effect of adjacent span via installing a wind deflector and a wind separating board to shelter one span of the bridge model from incoming flow. Issues related to effects of mid-tower stiffness and deck supporting conditions are also discussed. The testing results show that flutter critical wind velocities in smooth flow, with a wind deflector, are remarkably lower than those without. In turbulent wind, torsional and vertical standard deviations for the deck responses at midspan in testing cases without wind deflector are generally less than those at the midspan exposed to wind in testing cases with wind deflector, respectively. When double main spans are exposed to turbulent wind, the existence of either span is a mass damper to the other. Furthermore, both effects of mid-tower stiffness and deck supporting conditions at the middle tower on the flutter and buffeting performances of the Maanshan Bridge are unremarkable.

Study on the Scan Field of Modified Octupole and Quadrupole Deflector in a Microcolumn (마이크로칼럼에서 변형된 4중극 디플렉터와 8중극 디플렉터의 스캔 영역 비교)

  • Kim, Young Chul;Kim, Ho-Seob;Ahn, Seong Joon;Oh, Tae-Sik;Kim, Dae-Wook
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.19 no.11
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    • pp.1-7
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    • 2018
  • In a microcolumn, a miniaturized electrostatic deflector is often adopted to scan an electron beam. Usually, a double octupole deflector is used because it can avoid excessive spherical aberrations by controlling the electron beam path close to the optical axis of the objective lens and has a wide scan field. Studies on microcolumns have been performed to improve the low throughput of an electron column through multiple column applications. On the other hand, as the number of microcolumns increases, the number of wires connected to the components of the microcolumn increases. This will result in practical problems during the process of connecting the wires to electronic controllers outside of the vacuum chamber. To reduce this problem, modified quadrupole and octupole deflectors were examined through simulation analysis by selecting an ultraminiaturized microcolumn with the Einzel lens eliminated. The modified deflectors were designed changing the size of each electrode of the conventional Si octupole deflector. The variations of the scan field and electric field strength were studied by changing the size of active electrodes to which the deflection voltage was to be applied. The scan field increased linearly with increasing deflection voltage. The scan field of the quadrupole deflector and the electric field strength at the center were calculated to be approximately 1.3 ~ 2.0 times larger than those of the octupole deflector depending on the electrode size.

Scanning large area with a micro-electron column (마이크로 전자칼럼을 이용한 대면적 스캔)

  • Jang, Won-Kweon;Park, Seong-Soon;Kim, Ho-Seob
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.182-183
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    • 2007
  • In large area scanning with a micro-electron column, the optimal operation condition for the best visibility was studied. A micro-electron column can realize nearly unlimited scanning size with distribution of micro-electron columns, therefore applicable to large sized SEM or VSEM. The maximum scanning size with a micro-electron column was about $200cm^2$ when only one deflector was employed. However, a double deflector equipped micro-electron column provided 1.7 times larger scanning area with the same visibility as that of one deflector.

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The Optimal Condition for Scanning Large Area with a Micro-electron-column (초소형 전자칼럼의 대면적 주사 적정조건)

  • Park, Sung-Soon;Kim, Ho-Seob;Jang, Won-Kweon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.6
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    • pp.481-486
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    • 2007
  • In large area scanning with a micro-electron-column, the operating condition for the best resolution was investigated in factors of working distance and field of view. The resolution of a test sample was dependent on electron beam energy and scanning field size. The best resolution with single deflector was obtained at 300 V and 30 mm in the electron emitting tip voltage and a working distance, respectively. The scanning area at that condition was $13.9{\times}13.9mm^2$, linearly increased with the working distance. Double deflector was employed for larger scanning size without increasing working distance, but showed only 1.7 times larger than that of single deflector, and the resolution was inverse proportional to the scanning size.

The Double Asteroid Redirection Test: NASA's First Planetary Defense Test Mission

  • Rivkin, Andrew S.
    • The Bulletin of The Korean Astronomical Society
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    • v.46 no.2
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    • pp.35.4-35.4
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    • 2021
  • The Double Asteroid Redirection Test (DART) is NASA's first planetary defense test mission, designed to test the kinetic deflector technique by crashing into an asteroid and changing its orbit. DART's launch window opens in November, 2021, with arrival at its target less than a year later in late September or early October 2022. The target of the DART spacecraft is the moonlet Dimorphos, a 150-m moonlet orbiting the 780-m asteroid Dimorphos. By changing the orbit of Dimorphos around Didymos, the results can be detected much more easily than changing the orbit of an asteroid around the Sun. I will discuss what we know about Didymos and Dimorphos, the plans for the DART mission, the expected results, and how DART is important for planetary defense in general.

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Sputtering yield of the MgO thin film grown on the Cu substrate by using the focused ion beam (집속이온빔을 이용한 구리 기판위에 성장한 MgO 박막의 스퍼터링 수율)

  • 현정우;오현주;추동철;최은하;김태환;조광섭;강승언
    • Journal of the Korean Vacuum Society
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    • v.10 no.4
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    • pp.396-402
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    • 2001
  • MgO thin films with 1000 $\AA$ thickness were deposited on Cu substrates by using an electron gun evaporator at room temperature. A 1000 $\AA$ thick Al layer was deposited on the MgO for removing the charging effect of the MgO thin film during the measurements of the sputtering yields. A Ga ion liquid metal was used as the focused ion beam(FIB) source. The ion beam was focused by using double einzel lenses, and a deflector was employed to scan the ion beams into the MgO layer. Both currents of the secondary particle and the probe ion beam were measured, and they dramatically changed with varying the applied acceleration voltage of the source. The sputtering yield of the MgO layer was determined using the values of the analyzed probe current, the secondary particle current, and the net current. When the acceleration voltage of the FIB system was 15 kV, the sputtering yield of the MgO thin film was 0.30. The sputtering yield of the MgO thin film linearly increases with the acceleration voltage. These results indicate that the FIB system is promising for the measurements of the sputtering yield of the MgO thin film.

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