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http://dx.doi.org/10.4313/JKEM.2007.20.6.481

The Optimal Condition for Scanning Large Area with a Micro-electron-column  

Park, Sung-Soon (선문대학교 신소재과학과, 차세대반도체연구소)
Kim, Ho-Seob (선문대학교 신소재과학과, 차세대반도체연구소)
Jang, Won-Kweon (한서대학교 컴퓨터응용물리학과)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.20, no.6, 2007 , pp. 481-486 More about this Journal
Abstract
In large area scanning with a micro-electron-column, the operating condition for the best resolution was investigated in factors of working distance and field of view. The resolution of a test sample was dependent on electron beam energy and scanning field size. The best resolution with single deflector was obtained at 300 V and 30 mm in the electron emitting tip voltage and a working distance, respectively. The scanning area at that condition was $13.9{\times}13.9mm^2$, linearly increased with the working distance. Double deflector was employed for larger scanning size without increasing working distance, but showed only 1.7 times larger than that of single deflector, and the resolution was inverse proportional to the scanning size.
Keywords
Micro-electron column; Resolution; Field of view; Scanning size;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
1 E. Kratschmer, H. S. Kim, M. G. R. Thomson, K. Y. Lee, S. A. Rishton, M. L. Yu, and T. H. P. Chang, 'Sub-40 nm resolution 1 keV scanning tunneling microscope filed-emission microcolumn', J. Vac. Sci. & Technol., Vol. B12, p. 3503, 1994
2 T. H. P. Chang, M. G. R. Thomson, E. Kraschmer, H. S. Kim, M. L. Yu, K. Y. Lee, S. A. Rishton, B. W. Hussey, and S. Zolgharnain, 'Electron-beam microcolumns for lithography and related applications', J. Vac. Sci. & Technol., Vol. B14, p. 3774, 1996
3 E. Kratschmer, H. S. Kim, M. G. R. Thomson, K. Y. Lee, S. A. Rishton, M. L. Yu, S. Zolgharnain, B. W. Hussey, and T. H. P. Chang, 'Experimental evaluation of a $20{\times}20$ mm footprint microcolumn', J. Vac. Sci. & Technol., Vol. B14, No.6, p. 3792, 1996
4 E. Kratschmer, H. S. Kim, M. G. R. Thomson, K. Y. Lee, S. A. Rishton, M. L. Yu, and T. H. P. Chang, 'An electron-beam microcolumn with improved resolution, beam current, and stability', J. Vac. Sci. & Technol., Vol. B13, p. 2498, 1995
5 박종선, 장원권, 김호섭, '마이크로 전자렌즈의 광학적 정렬과 조립' 한국광학회지, 17권,4호, p. 216, 2006   과학기술학회마을   DOI
6 M. G. R. Thomson and T. H. P. Chang, 'Compression of field-emission angular distribution using a cathode shield', J. Vac. Sci. & Technol., Vol. B13, p. 2445, 1995
7 C. Stebler, T. Pfeer, U. Staufer, and N. F. de Rooji, 'Microfabricated double layer octupoles for microcolumn applications', Microelectronic Eng., Vol. 46, p. 401, 1999   DOI   ScienceOn