• 제목/요약/키워드: Doping Rate

검색결과 210건 처리시간 0.029초

감압화학증착법으로 성장된 실리콘-게르마늄 반도체 에피층에서 붕소의 이차원 도핑 특성 (Two Dimensional Boron Doping Properties in SiGe Semiconductor Epitaxial Layers Grown by Reduced Pressure Chemical Vapor Deposition)

  • 심규환
    • 한국전기전자재료학회논문지
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    • 제17권12호
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    • pp.1301-1307
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    • 2004
  • Reduced pressure chemical vapor deposition(RPCYD) technology has been investigated for the growth of SiGe epitaxial films with two dimensional in-situ doped boron impurities. The two dimensional $\delta$-doped impurities can supply high mobility carriers into the channel of SiGe heterostructure MOSFETs(HMOS). Process parameters including substrate temperature, flow rate of dopant gas, and structure of epitaxial layers presented significant influence on the shape of two dimensional dopant distribution. Weak bonds of germanium hydrides could promote high incorporation efficiency of boron atoms on film surface. Meanwhile the negligible diffusion coefficient in SiGe prohibits the dispersion of boron atoms: that is, very sharp, well defined two-dimensional doping could be obtained within a few atomic layers. Peak concentration and full-width-at-half-maximum of boron profiles in SiGe could be achieved in the range of 10$^{18}$ -10$^{20}$ cm$^{-3}$ and below 5 nm, respectively. These experimental results suggest that the present method is particularly suitable for HMOS devices requiring a high-precision channel for superior performance in terms of operation speed and noise levels to the present conventional CMOS technology.

Verneuil법에 의한 $SiO_2$를 첨가한 Sapphire 단결정 성장 (SiO2 Doped Sapphire single Crystal Growth by Verneuil Method)

  • 조현;오근호;최종건;박한수
    • 한국세라믹학회지
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    • 제29권10호
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    • pp.822-826
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    • 1992
  • SiO2 doped sapphire single crystals were grown by Verneuil method using feed material which prepared by adding SiO2 in Al2O3. Crystal growing were attempted with varing doping amount of SiO2 from 0.01 to 1.0 wt% and when the doping amount of SiO2 were 0.01~0.04 wt%, single crystals could be attained. Starting materials for feed powder were 99.99% purity alumina and extra pure SiO2 powder. Mixing these two materials by wet milling for 24 hours and drying the mixture and then was calcined at 900~110$0^{\circ}C$ for 2~4 hours. The grown crystals had yellowish color and were somewhat transparent. During growing process the flow range of oxygen was 5~7.5ι/min and of hydrogen was 13~25ι/min, the average growth rate was 7.0~11 mm/hr. The pressure of gases were fixed at 5psi. The color of crystal was appeared and mechanical property of sapphire was developed by doping of SiO2.

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ZnO 투명 전도막의 전기적 특성에 미치는 Al2O3 의 도핑 농도 및 방전전력의 효과 (Effect of Doping Amounts of Al2O3 and Discharge Power on the Electrical Properties of ZnO Transparent Conducting Films)

  • 박민우;박강일;김병섭;이세종;곽동주
    • 한국재료학회지
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    • 제14권5호
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    • pp.328-333
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    • 2004
  • Transparent ZnO:Al conductor films for the optoelectronic devices were deposited by using the capacitively coupled DC magnetron sputtering method. The effect of Al doping concentration and discharge power on the electrical and optical properties of the films was studied. The film resistivity of $8.5${\times}$10^{-4}$ $\Omega$-cm was obtained at the discharge power of 40 W with the ZnO target doped with 2 wt% $Al_2$$_O3$. The transmittance of the 840 nm thick film was 91.7% in the visible waves. Increasing doping concentration of 3 wt% $Al_2$$O_3$ in ZnO target results in significant decrease of film resistivity, which may be due to the formation of $Al_2$$O_3$ particles in the as-deposited ZnO:Al film and the reduced ZnO grain sizes. Increasing DC power from 40 to 60 W increases deposition rate by more than 50%, but can induce high defect density in the film, resulting in higher film resistivity.

p 형 반도체 층의 Mg 델타 도핑을 이용한 센서 광원 용 LED의 성능 향상 (Improvement of the LED Performance Using Mg Delta-doing in p Type Cladding Layer for Sensor Application)

  • 김유경;이승섭;전주호;김만경;장수환
    • 센서학회지
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    • 제31권1호
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    • pp.31-35
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    • 2022
  • The efficacy improvement of the light emitting diode (LED) was studied for the realization of small-size, low power consumption, and highly sensitive bio-sensor instrument. The performance of the LED with Mg delta-doping at the interface of AlGaN/GaN super-lattice in p type cladding layer was simulated. The device with Mg delta-doping showed improved current, radiative recombination rate, electroluminescence, and light output power compared to the conventional LED structure. Under the bias condition of 5 V, the improved device exhibited 20.8% increase in the light output power. This is attributed to the increment of hole concentration from stable ionization of Mg in p type cladding layer. This result is expected to be used for the miniaturization, power saving, and sensitivity improvement of the bio-sensor system.

Simultaneous Liquid Chromatography Tandem Mass Spectrometric Determination of 35 Prohibited Substances in Equine Plasma for Doping Control

  • Kwak, Young Beom;Yu, Jundong;Yoo, Hye Hyun
    • Mass Spectrometry Letters
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    • 제13권4호
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    • pp.158-165
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    • 2022
  • Many therapeutic class drugs such as beta-blocker, corticosteroids, NSAIDs, etc are prohibited substances in the horse racing industry. Liquid chromatography-tandem mass spectrometry (LC-MS/MS) technology makes it possible to isolate drugs from interference, enables various drug analyses in complex biological samples due to its sensitive sensitivity, and has been successfully applied to doping control. In this paper, we describe a rapid and sensitive method based on solid-phase extraction (SPE) using solid phase cartridge and LC-MS/MS to screen for different class's 35 drug targets in equine plasma. Plasma samples were pretreated by SPE with the NEXUS cartridge consisted non-polar carbon resin and minimum buffer solvent. Chromatographic separation of the analytes was performed on ACQUITY HSS C18 column (2.1 × 150 mm, 1.8 ㎛). The elution gradient was conducted with 5 mM ammonium formate (pH 3.0) in distilled water and 0.1% formic acid in acetonitrile at a flow rate of 0.25 mL/min. The selected reaction monitoring (SRM) mode was used for drug screening with multiple transitions in the positive ionization mode. The specificity, limit of detection, recovery, and stability was evaluated for validation. The method was found to be sensitive and reproducible for drug screening. The method was applied to plasma sample analysis for the proficiency test from the Association of Racing Chemist.

회분식 반응기에서 TiO2 광촉매의 MEK 분해특성-금속담지영향 (Characteristics of MEK Degradation using TiO2 Photocatalyst in the Batch-type Reactor-Metal Doping Effect)

  • 장현태;차왕석
    • 한국산학기술학회논문지
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    • 제16권2호
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    • pp.1579-1584
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    • 2015
  • 광촉매반응에서 티타니아에 금속물질을 담지하면 광촉매표면이 변화되며 담지된 금속물질은 반응속도를 증가시킨다. 회분식 광반응기를 이용하여 $TiO_2$ 광촉매에 대한 금속물질 담지와 담지된 촉매의 소성조건 영향을 조사하였다. 광분해 효율을 증진시키기 위해 $TiO_2$ 촉매에 여러 종류의 금속물질을 담지하였다. 모든 실험에서의 수분함량은 3wt%, 반응기 온도는 $40^{\circ}C$이었다. $TiO_2$에 팔라듐을 담지한 경우가 가장 우수하였으며, Pt와 W을 첨가한 경우도 양호하였다. Pd/$TiO_2$ 촉매에 백금 또는 텅스텐을 부가적으로 담지하여도 제거효율에서의 증가는 없었다. 적절한 소성조건을 얻기위해 소성온도와 소성시간에 대하여 다양하게 실험을 수행하였으며, 실험결과 최적의 소성조건은 소성온도 $400^{\circ}C$, 소성시간 1시간이었다.

MgO 및 TiO2가 첨가된 알루미나의 치밀화와 입성장 거동 (Densification and Grain Growth Behavior of MgO and TiO2-doped Alumina)

  • 이정아;김정주
    • 한국세라믹학회지
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    • 제39권11호
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    • pp.1083-1089
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    • 2002
  • 알루미나 세라믹스에 MgO와 $TiO_2$를 각각 단독으로 첨가했을 때의 치밀화와 소결 거동을 수축률-소결 밀도 관계를 통해 비교 조사하였다. MgO가 첨가되었을 때는 소결 전과정을 통해 입성장은 억제되고 치밀화는 촉진되었으나, $TiO_2$가 첨가되었을 때는 입성장은 촉진된 반면 치밀화는 떨어졌다. 또한 입자 크기, 밀도, 수축률등을 통해 수축률-소결 밀도 관계를 구하여 최대 수축률을 나타내는 밀도값(Density of Maximum Shrinkage Rate:${\rho}$J.S.R)을 조사해 보았다. 이때 최대 수축률을 나타내는 밀도값보다 낮은 밀도를 보이는 영역에서는 치밀화가 입성장보다 우세하게 진행되었으며 최대 수축률을 나타내는 밀도값보다 높은 밀도의 영역에서는 입성장이 보다 우세하게 진행되는 것으로 추정하였다. 이때 최대 수축률을 나타내는 밀도값은 $TiO_2$가 첨가된 알루미나 < 순수 알루미나 < MgO가 첨가된 알루미나의 순서로 높은 값을 보였다.

도핑 비율에 따른 하이브리드 백색 OLED의 효율 향상에 관한 연구 (Improvement of Efficiency Varying Ratio in Hybrid White OLED)

  • 김남규;신훈규;권영수
    • 한국전기전자재료학회논문지
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    • 제27권9호
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    • pp.571-575
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    • 2014
  • We synthesized new materials of $Zn(HPB)_2$ and Ir-complexes as blue or red emitting material. We fabricated white Organic Light Emitting Diodes (OLED) by using $Zn(HPB)_2$ for the blue emitting layer, Ir-complexes for the red emitting layer and $Alq_3$ for the green emitting layer. We fabricated white OLED by using double emitting layers of $Zn(HPB)_2$:Ir-complexes and $Alq_3$. The doping rate of Ir-complexes was varied, such as 0.2%, 0.4%, 0.6%, and 0.8%, respectively. When the doping rate of $Zn(HPB)_2$:Ir-complexes was 0.6%, white emission was achieved. The Commission Internationale de l'Eclairage (CIE) coordinates of the white emission was (0.322, 0.312).

NEW EVALUATION METHODS FOR RADIAL UNIFORMITY IN NEUTRON TRANSMUTATION DOPING

  • Kim, Hak-Sung;Lim, Jae-Yong;Pyeon, Cheol-Ho;Misawa, Tsuyoshi;Shiroya, Seiji;Park, Sang-Jun;Kim, Myong-Seop;Oh, Soo-Youl;Jun, Byung-Jin
    • Nuclear Engineering and Technology
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    • 제42권4호
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    • pp.442-449
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    • 2010
  • Recently, the neutron irradiation for large diameter silicon (Si)-ingots of more than 8" diameter is requested to satisfy the demand for the neutron transmutation doping silicon (NTD-Si). By increasing the Si-ingot diameter, the radial non-uniformity becomes larger due to the neutron attenuation effect, which results in a limit of the feasible diameter of the Si-ingot. The current evaluation method has a certain limit to precisely evaluate the radial uniformity of Si-ingot because the current evaluation method does not consider the effect of the Si-ingot diameter on the radial uniformity. The objective of this study is to propose a new evaluation method of radial uniformity by improving the conventional evaluation approach. To precisely predict the radial uniformity of a Si-ingot with large diameter, numerical verification is conducted through comparison with the measured data and introducing the new evaluation method. A new concept of a gradient is introduced as an alternative approach of radial uniformity evaluation instead of the radial resistivity gradient (RRG) interpretation. Using the new concept of gradient, the normalized reaction rate gradient (NRG) and the surface normalized reaction rate gradient (SNRG) are described. By introducing NRG, the radial uniformity can be evaluated with one certain standard regardless of the ingot diameter and irradiation condition. Furthermore, by introducing SNRG, the uniformity on the Si-ingot surface, which is ignored by RRG and NRG, can be evaluated successfully. Finally, the radial uniformity flattening methods are installed by the stainless steel thermal neutron filter and additional Si-pipe to reduce SNRG.

Fatigue characteristics of $Pb(Zr,Ti)O_3$ capacitors on donor doping

  • Yang, Bee Lyong
    • 열처리공학회지
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    • 제15권3호
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    • pp.113-117
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    • 2002
  • Fatigue characteristics of ferroelectric $Pb(Zr,Ti)O_3$ (PZT) based capacitors through donor doping is reported in this paper. La substitution up to 10% were carried out to study systematically the fatigue behaviors of epitaxial ferroelectric capacitors grown on Si using $(Ti_{0.9}Al_{0.1})N/Pt$ conducting barrier composite. Ferroelectric capacitors substituted with 10% La show sufficient low voltage switched polarization and fatigue free performance. Systematic decrease in the tetragonality of the ferroelectric phase (i.e., c/a ratio) results in the corresponding reduction in coercive voltage, sufficient remnant polarization at 1.5-3V, and good fatigue property.