• Title/Summary/Keyword: Dodecanethiol

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CMP 컨디셔닝 공정에서의 부식방지를 위한 자기조립 단분자막의 적용과 표면특성 평가

  • Jo, Byeong-Jun;Gwon, Tae-Yeong;Venkatesh, R. Prasanna;Kim, Hyeok-Min;Park, Jin-Gu
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.33.2-33.2
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    • 2011
  • CMP (Chemical-Mechanical Planarization) 공정이란 화학적 반응과 기계적 힘을 동시에 이용하여 표면을 평탄화하는 공정으로, 반도체 산업에서 회로의 고집적화와 다층구조를 형성하기 위해 CMP 공정이 도입되었으며 반도체 패턴의 미세화와 다층화에 따라 CMP 공정의 중요성은 더욱 강조되고 있다. CMP 공정은 압력, 속도 등의 공정조건과, 화학적 반응을 유도하는 슬러리, 기계적 힘을 위한 패드 등에 의해 복합적으로 영향을 받는다. CMP 공정에서, 폴리우레탄 패드는 많은 기공들을 포함한 그루브(groove)를 형성하고 있어 웨이퍼와 직접적으로 접촉을 하며 공정 중 유입된 슬러리가 효과적으로 연마를 할 수 있도록 도와주는 역할을 한다. 하지만, 공정이 진행 될수록 그루브는 손상이 되어 제 역할을 하지 못하게 된다. 패드 컨디셔닝이란 컨디셔너가 CMP 공정 중에 지속적으로 패드 표면을 연마하여 패드의 손상된 부분을 제거하고 새로운 표면을 노출시켜 패드의 상태를 일정하게 유지시키는 것을 말한다. 한편, 금속박막의 CMP 공정에 사용되는 슬러리는 금속박막과 산화반응을 하기 위하여 산화제를 포함하는데, 산화제는 금속 컨디셔너 표면을 산화시켜 부식을 야기한다. 컨디셔너의 표면부식은 반도체 수율에 직접적인 영향을 줄 수 있는 scratch 등을 발생시킬 뿐만 아니라, 컨디셔너의 수명도 저하시키게 되므로 이를 방지하기 위한 노력이 매우 중요하다. 본 연구에서는 컨디셔너 표면에 연마 잔여물 흡착을 억제하고, 슬러리와 컨디셔너 표면 간에 일어나는 표면부식을 방지하기 위하여 소수성 자기조립 단분자막(SAM: Self-assembled monolayer)을 증착하여 특성을 평가하였다. SAM은 2가지 전구체(FOTS, Dodecanethiol를 사용하여 Vapor SAM 방법으로 증착하였고, 접촉각 측정을 통하여 단분자막의 증착 여부를 평가하였다. 또한 표면부식 특성은 Potentiodynamic polarization와 Electrochemical Impedance Spectroscopy (EIS) 등의 전기화학 분석법을 사용하여 평가되었다. SAM 표면은 정접촉각 측정기(Phoenix 300, SEO)를 사용하여 $90^{\circ}$ 이상의 소수성 접촉각으로써 증착여부를 확인하였다. 또한, 표면에너지 감소로 인하여 슬러리 내의 연마입자 및 연마잔여물 흡착이 감소하는 것을 확인 하였다. Potentiodynamic polarization과 EIS의 결과 분석으로부터 SAM이 증착된 표면의 부식전위와 부식전류밀도가 감소하며, 임피던스 값이 증가하는 것을 확인하였다. 본 연구에서는 컨디셔너 표면에 SAM을 증착 하였고, CMP 공정 중 발생하는 오염물의 흡착을 감소시킴으로써 CMP 연마 효율을 증가하는 동시에 컨디셔너 금속표면의 부식을 방지함으로써 내구성이 증가될 수 있음을 확인 하였다.

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NDR Property and Energy Band Diagram of Nitro-Benzene Molecule Using STM (STM에 의한 니트로벤젠 분자의 NDR 특성과 에너지 밴드 구조)

  • Lee, Nam-Suk;Chang, Jeong-Soo;Kwon, Young-Soo
    • Proceedings of the KIEE Conference
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    • 2005.11a
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    • pp.139-141
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    • 2005
  • It is possble to study charge transfer property which is caused by height variation because we can see the organic materials barrier height and STM tip by organic materials energy band gap. Here, we investigated the negative differential resistance(NDR) and charge transfer property of self-assembled 4,4-Di(ethynylphenyl)-2'-nitro-1-(thioacetyl)benzene, which has been well known as a conducting molecule. Self-assembly monolayers(SAMs) were prepared on Au(111), which had been thermally deposited onto pre-treatment($H_{2}SO_{4}:H_{2}O_{2}$=3:1) Si. The Au substrate was exposed to a 1 mM/l solution of 1-dodecanethiol in ethanol for 24 hours to form a monolayer. After thorough rinsing the sample, it was exposed to a $0.1{\mu}M/1$ solution of 4,4-Di(ethynylphenyl)-2'-nitro-1-(thioacetyl)benzene in dimethylformamide(DMF) for 30 min and kept in the dark during immersion to avoid photo-oxidation. After the assembly, the samples were removed from the solutions, rinsed thoroughly with methanol, acetone, and $CH_{2}Cl_{2}$, and finally blown dry with $N_2$. Under these conditions, we measured electrical properties of self-assembly monolayers(SAMs) using ultra high vacuum scanning tunneling microscopy(UHV-STM). The applied voltages were from -1.50 V to -1.20 V with 298 K temperature. The vacuum condition is $6{\times}10^{-8}$ Torr. As a result, we found that NDR and charge transfer property by a little change of height when the voltage is applied between STM tip and electrode.

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Improved Luminescent Characterization and Synthesis of InP/ZnS Quantum Dot with High-Stability Precursor (고 안정성 전구체를 사용한 InP/ZnS 반도체 나노입자 합성 및 발광 특성 향상)

  • Lee, Eun-Jin;Moon, Jong-Woo;Kim, Yang-Do;Shin, Pyung-Woo;Kim, Young-Kuk
    • Journal of Powder Materials
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    • v.22 no.6
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    • pp.385-390
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    • 2015
  • We report a synthesis of non-toxic InP nanocrystals using non-pyrolytic precursors instead of pyrolytic and unstable tris(trimethylsilyl)phosphine, a popular precursor for synthesis of InP nanocrystals. In this study, InP nanocrystals are successfully synthesized using hexaethyl phosphorous triamide (HPT) and the synthesized InP nanocrystals showed a broad and weak photoluminescence (PL) spectrum. As synthesized InP nanocrystals are subjected to further surface modification process to enhance their stability and photoluminescence. Surface modification of InP nanocrystals is done at $230^{\circ}C$ using 1-dodecanethiol, zinc acetate and fatty acid as sources of ZnS shell. After surface modification, the synthesized InP/ZnS nanocrystals show intense PL spectra centered at the emission wavelength 612 nm through 633 nm. The synthesized InP/ZnS core/shell structure is confirmed with X-ray diffraction (XRD) and Inductively Coupled Plasma - Atomic Emission Spectrometer (ICP-AES). After surface modification, InP/ZnS nanocrystals having narrow particle size distribution are observed by Field Emission Transmission Electron Microscope (FE-TEM). In contrast to uncapped InP nanocrystals, InP/ZnS nanocrystals treated with a newly developed surface modified procedure show highly enhanced PL spectra with quantum yield of 47%.

Studies on diaminododecane Utilization by Bacteria Studies on Diaminododecane Utilization by Corynebacterium sp. DAD 2-3 (Diaminododecane 자화균에 관한 연구 제2보 Corynebacterium sp. DAD 2-3의 Diaminododecane자화에 관한 연구)

  • 이상준;이종근
    • Korean Journal of Microbiology
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    • v.21 no.4
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    • pp.191-196
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    • 1983
  • A Corynebacterium sp. capable of utilizing diaminododecane (DAD) were isolated from the soil by enrichment culture. Among 9 different kinds of substituted alkanes containing CN, $NH_2$, Cl, and SH groups (monoterminally or diterminally substituted) tested as carbon source, the isolate, designated as DAD 2-3, utilized DAD, putrescine dihydrochloride, dodecane and laurylamine. Dodecanethiol, thioanisole, decanedithiol, dicyanooctane, laurylcyanide,and dichlorodecane were not utilized. When emulgen 950 was added to the medium, the growth of DAD 2-3 was slightly accelerated. Isolate DAD 2-3 grown in the medium with DAD as carbon source formed .alpha.-ketoglutaric acid. Metabolic product of DAD 2-3 grown in a medium without nitrogen source was different from that of grown in a medium with $NH_4NO_3$. When glucose, putrescine, n-dodecane and other alkane derivatives were tested in place of DAD, isolate DAD 2-3 yielded products different from those they formed with DAD suggesting specificity of DAD as a carbon source.

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Study on Electrical Characteristic of Self-assembled Nitro Molecule Onto Au(111) Substrate by Using STM/STS (STM/STS에 의한 Au(111) 표면에 자기조립된 니트로분자의 전기적 특성 측정)

  • Lee Nam-Suk;Kwon Young-Soo
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.55 no.1
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    • pp.16-19
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    • 2006
  • The characteristic of negative differential resistance(NDR) is decreased current when the applied voltage is increased. The NDR is potentially very useful in molecular electronics device schemes. Here, we investigated the NDR characteristic of self-assembled 4,4'-di(ethynylphenyl)-2'-nitro-1-benzenethiolate, which has been well known as a conducting molecule. Self-assembly monolayers(SAMs) were prepared on Au(111), which had been thermally deposited onto $pre-treatment(H_2SO_4:H_2O_2=3:1)$ Si. The Au substrate was exposed to a 1 mM/1 solution of 1-dodecanethiol in ethanol for 24 hours to form a monolayer. After thorough rinsing the sample, it was exposed to a 0.1 ${\mu}M/l$ solution of 4.4'-di(ethynylphenyl)-2'-nitro-1-(thioacetyl)benzene in dimethylformamide(DMF) for 30 min and kept in the dark during immersion to avoid photo-oxidation. After the assembly, the samples were removed from the solutions, rinsed thoroughly with methanol, acetone, and $CH_2Cl_2,$ and finally blown dry with N_2. Under these conditions, we measured electrical properties of self-assembly monolayers(SAMs) using ultra high vacuum scanning tunneling microscopy(UHV-STM). The applied voltages were from -2 V to +2 V with 298 K temperature. The vacuum condition was $6{\time}10^{-8}$ Torr. As a result, we found the NDR voltage of the 4,4'-di(ethynylphenyl)-2'-nitro-1-benzenethiolate were $-1.61{\pm}0.26$ V(negative region) and $1.84{\pm}0.33$ V(positive region). respectively.

Study on electrical property of self-assembled nitro molecule onto Au(111) by Using STM/STS (STM/STS에 의한 Au (111)에 자기조립된 니트로분자의 전기적 특성 측정)

  • Lee, Nam-Suk;Choi, Won-Suk;Shin, Hoon-Kyu;Chang, Jeong-Soo;Kwon, Young-Soo
    • Proceedings of the KIEE Conference
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    • 2005.07c
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    • pp.1844-1846
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    • 2005
  • The characteristic of negative differential resistance(NDR) is decreased current when the applied voltage is increased. The NDR is potentially very useful in molecular electronics device schemes. Here, we investigated the NDR property of self-assembled 4,4- Di(ethynylphenyl)-2'-nitro-1-(thioacetyl)benzene, which has been well known as a conducting molecule. Self-assembly monolayers(SAMs) were prepared on Au(111), which had been thermally deposited onto pre-treatment$(H_2SO_4:H_2O_2=3:1)$ Si. The Au substrate was exposed to a 1mM/l solution of 1-dodecanethiol in ethanol for 24 hours to form a monolayer. After thorough rinsing the sample, it was exposed to a $0.1{\mu}M/l$ solution of 4,4-Di(ethynylphenyl)-2'-nitro-1-(thioacetyl)benzene in dimethylformamide(DMF) for 30 min and kept in the dark during immersion to avoid photo-oxidation. After the assembly, the samples were removed from the solutions, rinsed thoroughly with methanol, acetone, and $CH_2Cl_2$, and finally blown dry with $N_2$. Under these conditions, we measured electrical properties of self-assembly monolayers(SAMs) using ultra high vacuum scanning tunneling microscopy(UHV-STM). The applied voltages were from -2V to +2V with 299K temperature. The vacuum condition is $6{\times}10^{-8}$ Torr. As a result, we found the NDR voltage of the nitro-benzene is $-1.61{\pm}0.26$ V(negative region) and $1.84{\pm}0.33$ (positive region), respectively.

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Electrochemical Characterization of Anti-Corrosion Film Coated Metal Conditioner Surfaces for Tungsten CMP Applications (텅스텐 화학적-기계적 연마 공정에서 부식방지막이 증착된 금속 컨디셔너 표면의 전기화학적 특성평가)

  • Cho, Byoung-Jun;Kwon, Tae-Young;Kim, Hyuk-Min;Venkatesh, Prasanna;Park, Moon-Seok;Park, Jin-Goo
    • Journal of the Microelectronics and Packaging Society
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    • v.19 no.1
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    • pp.61-66
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    • 2012
  • Chemical Mechanical Planarization (CMP) is a polishing process used in the microelectronic fabrication industries to achieve a globally planar wafer surface for the manufacturing of integrated circuits. Pad conditioning plays an important role in the CMP process to maintain a material removal rate (MRR) and its uniformity. For metal CMP process, highly acidic slurry containing strong oxidizer is being used. It would affect the conditioner surface which normally made of metal such as Nickel and its alloy. If conditioner surface is corroded, diamonds on the conditioner surface would be fallen out from the surface. Because of this phenomenon, not only life time of conditioners is decreased, but also more scratches are generated. To protect the conditioners from corrosion, thin organic film deposition on the metal surface is suggested without requiring current conditioner manufacturing process. To prepare the anti-corrosion film on metal conditioner surface, vapor SAM (self-assembled monolayer) and FC (Fluorocarbon) -CVD (SRN-504, Sorona, Korea) films were prepared on both nickel and nickel alloy surfaces. Vapor SAM method was used for SAM deposition using both Dodecanethiol (DT) and Perfluoroctyltrichloro silane (FOTS). FC films were prepared in different thickness of 10 nm, 50 nm and 100 nm on conditioner surfaces. Electrochemical analysis such as potentiodynamic polarization and impedance, and contact angle measurements were carried out to evaluate the coating characteristics. Impedance data was analyzed by an electrical equivalent circuit model. The observed contact angle is higher than 90o after thin film deposition, which confirms that the coatings deposited on the surfaces are densely packed. The results of potentiodynamic polarization and the impedance show that modified surfaces have better performance than bare metal surfaces which could be applied to increase the life time and reliability of conditioner during W CMP.