• 대한인간공학회지
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• 제29권4호
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• pp.661-665
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• 2010

Current subway station's office employee must perform safety management tasks by monitoring the various safety management systems. But these monitoring systems are limited in effective situational awareness and response to a state of emergency immediately. It is necessary to develop an integrated safety management system display. In this study, we developed subway station safety management system's (CCTV, fire detection & alarm system, screen door control equipment) integrated prototype display with ecological interface design framework and evaluated prototype display interface's usability with GOMS model. The result was that the ecological interface's performance was better than existing safety management system's interface.

• 한국정보통신학회논문지
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• 제14권12호
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• pp.2698-2706
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• 2010

기존 타일드 디스플레이 시스템들이 주로 사람들이 함께 모여 작업하는 공용 작업 모델을 지원한 것과 다르게 본 연구에서는 대형 타일드 디스플레이 시스템에서 혼합형 협업 응용프로그램의 개발을 쉽게 도와주는 ICE 디스플레이 프레임워크 기술을 개발하였다. 혼합형 협업이란 다중 사용자들의 공동 작업과 개인 작업이 동시에 자연스럽게 전환 가능한 협력 모델이다. 본 프레임워크를 사용하면 공동작업 뿐만 아니라 다른 사용자들을 방해하지 않는 개인 작업을 위한 콘텐츠를 제공할 수 있는 프로그램의 개발이 가능하다. 본 논문에서는 ICE 디스플레이 프레임워크를 기존의 연구와 비교하고, 세부 구현 내용을 설명한다. 그리고 이를 적용시켜 개발한 응용 프로그램을 소개하고 프레임워크의 성능을 평가 및 분석한 결과를 보여준다.

• 반도체디스플레이기술학회지
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• 제12권1호
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• pp.1-7
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• 2013

Grey-level statistical models have been widely used in many applications for object location and identification. However, conventional models yield some problems in model refinement when training images are not properly aligned, and have difficulties for real-time recognition of arbitrarily rotated models. This paper presents improved grey-level statistical models that align training images using image or feature matching to overcome problems in model refinement of conventional models, and that enable real-time recognition of arbitrarily rotated objects using efficient hierarchical search methods. Edges or features extracted from a mean training image are used for accurate alignment of models in the search image. On the aligned position and orientation, fitness measure based on grey-level statistical models is computed for object recognition. It is demonstrated in various experiments in PCB inspection that proposed methods are superior to conventional methods in recognition accuracy and speed.

• Current Optics and Photonics
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• 제2권1호
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• pp.69-78
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• 2018

This paper presents a precise edge detection algorithm for the critical dimension (CD) measurement of a Thin-Film Transistor Liquid-Crystal Display (TFT-LCD) pattern. The sigmoid surface function is proposed to model the blurred step edge. This model can simultaneously find the position and geometry of the edge precisely. The nonlinear least squares fitting method (Levenberg-Marquardt method) is used to model the image intensity distribution into the proposed sigmoid blurred edge model. The suggested algorithm is verified by comparing the CD measurement repeatability from high-magnified blurry and noisy TFT-LCD images with those from the previous Laplacian of Gaussian (LoG) based sub-pixel edge detection algorithm and error function fitting method. The proposed fitting-based edge detection algorithm produces more precise results than the previous method. The suggested algorithm can be applied to in-line precision CD measurement for high-resolution display devices.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.714-717
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• 2003

We have suggested several plasma display panel (PDP) cell structures for high luminance and low power consumption by our two-and three-dimensional fluid simulation codes. Generally, to improve luminous efficiency and discharge efficiency, it is known that it is lucrative to use long discharge path and to form low electric field. However, the problems are how to implement them effectively in the small PDP cell. Therefore, unlike conventional model, we suggest Front Three Electrodes (FTE) model. In this model, we tried to make long and V-shaped discharge path by geometry changes and driving pulse variations. Consequently, from our simulation results based on the model above, luminous efficiency has improved about 2.6 times.

• 반도체디스플레이기술학회지
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• 제6권3호
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• pp.25-33
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• 2007

A computationally efficient and accurate Monte Carlo (MC) simulator of electron beam lithography process, which is named SCNU-EBL, has been developed for semiconductor nanometer pattern design and fabrication. The simulator is composed of a MC simulation model of electron trajectory into solid targets, an Gaussian-beam exposure simulation model, and a development simulation model of photoresist using a string model. Especially for the trajectories of incident electrons into the solid targets, the inner-shell electron scattering of an target atom and its discrete energy loss with an incident electron is efficiently modeled for multi-layer resists and heterogeneous multi-layer targets. The simulator was newly applied to the development profile simulation of ZEP520 positive photoresist for NGL(Next-Generation Lithography). The simulation of ZEP520 for electron-beam nanolithography gave a reasonable agreement with the SEM experiments of ZEP520 photoresist.

• 반도체디스플레이기술학회지
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• 제10권3호
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• pp.75-81
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• 2011

This paper presents a novel method for image classification based on a hybrid genetic algorithm (GA) and support vector machine (SVM) approach which can significantly improve the classification performance for content-based image retrieval (CBIR). Though SVM has been widely applied to CBIR, it has some problems such as the kernel parameters setting and feature subset selection of SVM which impact the classification accuracy in the learning process. This study aims at simultaneously optimizing the parameters of SVM and feature subset without degrading the classification accuracy of SVM using GA for CBIR. Using the hybrid GA and SVM model, we can classify more images in the database effectively. Experiments were carried out on a large-size database of images and experiment results show that the classification accuracy of conventional SVM may be improved significantly by using the proposed model. We also found that the proposed model outperformed all the other models such as neural network and typical SVM models.

• 반도체디스플레이기술학회지
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• 제19권2호
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• pp.26-30
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• 2020

In this paper, we studied the problem if the experiment number occurring in order to identify defect in scaffold. We need to change each of the 5 print factor to predict defect when printing disk type scaffold using FDM 3d printer. So then the number of scaffold print will be more than 100,000 times. This experiment number is difficult to perform in the field. In order to solve this problem, we have produced a prediction model based on machine learning multiple linear regression using print conditions and defect scaffold data for print conditions. The prediction model produced was verified through experiments. The verification confirmed that the error was less than 0.5 %. We have confirmed that satisfied within the target margin of error 5 %.

• 반도체디스플레이기술학회지
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• 제9권3호
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• pp.71-74
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• 2010

In this study the optical properties, such as relative transmittance and reflectance of PDP were analyzed with 3D optical code. Because of the electrode structure, the reference model shows 21.3 % higher transmittance than the test model and the reference model shows 16.6 % higher reflectance than the test model. The calculated reflectance of reference and test models is compared to the measured reflectance and the difference between calculation and measurement is 4.9 %.

• 반도체디스플레이기술학회지
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• 제18권4호
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• pp.46-50
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• 2019

In this paper, We used the regression model of machine learning for improve the print quantity problem when which print scaffold with 400 ㎛ pore using FDM 3d printer. We have difficult to experiment with changing all factors in the field. So we reduced print quantity by selected two factors that most impact the pore size. We printed and measured scaffold 5 times under same conditions. We created regression model using scaffold pore size and print conditions. We predicted pore size of untested print condition using the regression model. After print scaffold with 400 ㎛ pore, we printed scaffold 5 times under same conditions. We compare the predicted scaffold pore size and the measured scaffold pore size. We confirmed that error is less than 1 % and we verified the results quantitatively.