• 제목/요약/키워드: Disordered carbon

검색결과 35건 처리시간 0.024초

Preparation of Biomass Based Carbon for Electrochemical Energy Storage Application

  • Harshini Priyaa, V.S.;Saravanathamizhan, R.;Balasubramanian, N.
    • Journal of Electrochemical Science and Technology
    • /
    • 제10권2호
    • /
    • pp.159-169
    • /
    • 2019
  • The activated carbon materials were prepared from waste biomass by ultrasonic assisted chemical activation method (UCA), ultrasonic assisted physical activation method (UPA) and Manganese nitrogen doped carbon (Mn/N-C). The XRD result shows the turbostatic (fully disordered) structure. The cyclic voltammetry test was done at 50 mV/s using 1M sodium sulfate and the values of specific capacitance were found to be 93, 100 and 115 F/g for UCA, UPA and Mn/N-C respectively. The power density values for the samples UCA, UPA and Mn/N-C were found to be 46.04, 87.97 and 131.42 W/kg respectively. The electrochemical impedance spectroscopy was done at low frequency between 1 to 10 kHz. The Nyquist plot gives the resistant characteristics of the materials due to diffusional resistance at the electrode-electrolyte interface. The Energy Dispersive X-Ray Spectroscopyanalysis (EDAX) analysis showed that the percentage doping of nitrogen and manganese were 3.53 wt% and 9.44 wt% respectively. It is observed from the experiment Mn/N-C doped carbon show good physical and electrochemical properties.

The Characteristics of Plasma Polymerized Carbon Hardmask Film Prepared by Plasma Deposition Systems with the Variation of Temperature

  • Yang, J.;Ban, W.;Kim, S.;Kim, J.;Park, K.;Hur, G.;Jung, D.;Lee, J.
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
    • /
    • pp.381.1-381.1
    • /
    • 2014
  • In this study, we investigated the deposition behavior and the etch resistivity of plasma polymerized carbon hardmask (ppCHM) film with the variation of process temperature. The etch resistivity of deposited ppCHM film was analyzed by thickness measurement before and after direct contact reactive ion etching process. The physical and chemical properties of films were characterized on the Fourier transform infrared (FT-IR) spectroscope, Raman spectroscope, stress gauge, and ellipsometry. The deposition behavior of ppCHM process with the variation of temperature was correlated refractive index (n), extinction coefficient (k), intrinsic stress (MPa), and deposition rate (A/s) with the hydrocarbon concentration, graphite (G) and disordered (D) peak by analyzing the Raman and FT-IR spectrum. From this experiment we knew an optimal deposition condition for structure of carbon hardmask with the higher etch selectivity to oxide. It was shown the density of ppCHM film had 1.6~1.9 g/cm3 and its refractive index was 1.8~1.9 at process temperature, $300{\sim}600^{\circ}C$. The etch selectivity of ppCHM film was shown about 1:4~1:8 to undoped siliconoxide (USG) film (etch rate, 1300 A/min).

  • PDF

용해 납 흐름 배터리용 여러 카본 전극의 에너지 효율 특성 비교

  • 민형섭;양민규;김상식;이전국
    • 한국재료학회:학술대회논문집
    • /
    • 한국재료학회 2009년도 춘계학술발표대회
    • /
    • pp.59.1-59.1
    • /
    • 2009
  • 레독스 흐름 배터리 (Redox Flow Battery)는 외부의 탱크 등에 저장해 둔 활성물질(이온 가수가 변화는 금속) 의 용액을 펌프로 전해셀에 공급하여 충전 방전하는 배터리로 신재생 에너지인 풍력과 태양광 발전, 야간의 잉여 전력 저장 등 대용량 전력 저장 장치로 관심이 높아지고 있다. 대표적인 레독스 흐름 배터리로 알려진 바나듐 레독스 흐름 배터리는 이온 교환막 사용으로 인하여 전기전도도, 기계적 강도, 투과도 및 전해질 내의 화학적 안정성 등 여러 가지 문제점과 함께 비용 문제점을 야기한다. 하지만 새로운 용해 납 레독스 흐름 배터리는 이온 교환막을 사용하지 않아 바나듐 레독스 흐름 배터리의 문제점 및 시설비가 절약되는 장점이 있어 새로이 연구되지고 있다. 본 연구는 레독스 흐름 배터리에 주로 이용되는 카본 전극재료의 따라 형성되는 Pb, $PbO_2$ 박막의 미세 구조를 및 에너지 효율 특성을 분석하였다. 실험은 half-cell로 이루어졌으며 작업전극은 Carbon felt, Ordered Graphite, Disordered Graphite, Glassy Carbon 등을 여러 카본 재료를 사용하였고, 상대전극은 Pt, 기준전극으로 Ag/AgCl를 사용하여 Cyclic Voltammetry특성과 충방전 특성을 연구하였다. 전해질은 Lead Carbonate ($PbCO_3$)+Methanesulfonic acid ($CH_3SO_3H$) 들어간 수용성 전해질을 교반을 통해 이용하였다. 여러 carbon 전극재료와 생성된 Pb, $PbO_2$ 막의 표면구조, 미세구조, 상들의 변화는 XRD, SEM, EDX, Raman등을 통하여 분석하였으며, 전기화학 공정의 변수와 전극에 따른 에너지 효율특성에 대하여 고찰해 보았다.

  • PDF

X-ray Diffraction Patterns of Activated Carbons Prepared under Various Conditions

  • Girgis, Badie S.;Temerk, Yassin M.;Gadelrab, Mostafa M.;Abdullah, Ibrahim D.
    • Carbon letters
    • /
    • 제8권2호
    • /
    • pp.95-100
    • /
    • 2007
  • A series of activated carbons (ACs) were derived from sugarcane bagasse under two activation schemes: steam-pyrolysis at $600-800^{\circ}C$ and chemical activation with $H_3PO_4$ at $500^{\circ}C$. Some carbons were treated at 400, $600^{\circ}C$, or for 1-3 h, and/or in flowing air during pyrolysis of acid-impregnated mass. XRD profiles displayed two broad diffuse bands centered around $2{\theta}=23$ and $43^{\circ}$, currently associated with diffraction from the 002 and 100/101 set of planes in graphite, respectively. These correspond to the interlayer spacing, Lc, and microcrystallite lateral dimensions, La, of the turbostratic (fully disordered) graphene layers. Steam pyrolysis-activated carbons exhibit only the two mentioned broad bands with enhancement in number of layers, with temperature, and small decrease in microcrystallite diameter, La. XRD patterns of $H_3PO_4$-ACs display more developed and separated peaks in the early region with maxima at $2{\theta}=23$, 26 and $29^{\circ}$, possibly ascribed to fragmented microcrystallites (or partially organized structures). Diffraction within the $2{\theta}=43^{\circ}$ is still broad although depressed and diffuse, suggesting that the intragraphitic layers are less developed. Varying the conditions of chemical activation inflicts insignificant structural alterations. Circulating air during pyrolysis leads to enhancement of the basic graphitic structure with destruction and degradation in the lateral dimensions.

Raman Spectroscopical Evaluations of Carbonization and Graphitization of Coal Tar Pitch

  • Kim, Y.M.;An, K.L.;Kim, C.;Choi, Y.O.;Park, S.H.;Yang, K.S.;Lee, W.E.
    • Carbon letters
    • /
    • 제1권1호
    • /
    • pp.22-26
    • /
    • 2000
  • Raman spectroscopy has been used to investigate the structure of coal tar pitch heat-treated up to $3000^{\circ}C$ by using 514.5 run Ar ion laser line. Four critical temperature ranges were found on pyrolyzing coal tar pitch, which correspond to four distinct processes from disordered carbons to the well-ordered graphite structure. The range of heat treat temperature (HTT) below $1000^{\circ}C$ corresponds to gas evolution during the pyrolysis of coal tar pitch. Above the HTT are correlated to rearrangements of enlarged molecules, growth of the molecules along the direction of plane, finally stacking in the normal direction of the plane, in the respective HTT ranges of 1000-2000, above 2000 and $2500-3000^{\circ}C$.

  • PDF

활성탄 담지 몰리브덴 촉매를 이용한 합성가스 직접 메탄화 반응 (Direct Methanation of Syngas over Activated Charcoal Supported Molybdenum Catalyst)

  • 김성수;이승재;박성열;김진걸
    • 한국수소및신에너지학회논문집
    • /
    • 제31권5호
    • /
    • pp.419-428
    • /
    • 2020
  • The kinetics of direct methanation over activated charcoal-supported molybdenum catalyst at 30 bar was studied in a cylindrical fixed-bed reactor. When the temperature was not higher than 400℃, the CO conversion increased with increasing temperature according to the Arrhenius law of reaction kinetics. While XRD and Raman analysis showed that Mo was present as Mo oxides after reduction or methanation, TEM and XPS analysis showed that Mo2C was formed after methanation depending on the loading of Mo precursor. When the temperature was as high as 500℃, the CO conversion was dependent not only on the Arrhenius law but also on the catalyzed reaction by nanoparticles, which came off from the reactor and thermocouple by metal dusting. These nanoparticles were made of Ni, Fe, Cr and alloy, and attributed to the formation of carbon deposit on the wall of the reactor and on the surface of the thermocouple. The carbon deposit consisted of amorphous and disordered carbon filaments.

고온합성 Si-DLC에서의 표면물성연구 (Structure changes in Si-containing Diamond-like Carbon (DLC) film at high-temperature)

  • 김상권;김성완
    • 한국표면공학회:학술대회논문집
    • /
    • 한국표면공학회 2008년도 추계학술대회 초록집
    • /
    • pp.37-37
    • /
    • 2008
  • 고온에서 안정적인 DLC막을 성막하기 위해 PECVD공정에서 실리콘을 첨가하여 제조하였다. 기존의 실리콘첨가 DLC막과는 다르게 고온에서 생성됨으로 마이크로 클러스터 형태의 DLC구조로서 disordered 영역이 넓게 존재하고 있어 I(D)/I(G)비에서의 변화가 있는 것이 관찰되었다. 실리콘 양이 증가할수록 값이 낮아지는 것이 관찰되는데 이는 실리콘량이 증가하면서 수소의 위치에 실리콘이 결합하면서 sp3 단일구조형태의 코팅 막을 만드는 것이 관찰된다. 고온 어닐링효과로 내부구조에서 다량의 sp2구조가 관찰되는 것으로서 DLC막이 어느 정도 흑연화되지만, 실리콘이 SiC에서 SiOx로 $SiO_2$와 SiOH막으로 바뀌는 면서 마찰계수가 낮은 DLC막을 유지할 것으로 기대되며, XPS와 FT-IR분석에 의해 이러한 상들의 존재를 관찰할 수 있었다. 특히 공정상 TMS이 증가하면 첨가된 Si에 의해 형성되는 막이 초기부터 OH기를 다량 포함하고 있는 것을 알 수 있었고, 온도 상승에 의해서 실리콘표층에 더욱 많은 SiOx계열의 물질이 생성되는 것이 명확하게 발견되었다.

  • PDF

RF and Optical properties of Graphene Oxide

  • 임주환;;윤형서;오주영;정영모;박형구;전성찬
    • 한국재료학회:학술대회논문집
    • /
    • 한국재료학회 2012년도 춘계학술발표대회
    • /
    • pp.68.1-68.1
    • /
    • 2012
  • The best part of graphene is - charge-carriers in it are mass less particles which move in near relativistic speeds. Comparing to other materials, electrons in graphene travel much faster - at speeds of $10^8cm/s$. A graphene sheet is pure enough to ensure that electrons can travel a fair distance before colliding. Electronic devices few nanometers long that would be able to transmit charge at breath taking speeds for a fraction of power compared to present day CMOS transistors. Many researches try to check a possibility to make it a perfect replacement for silicon based devices. Graphene has shown high potential to be used as interconnects in the field of high frequency electrical devices. With all those advantages of graphene, we demonstrate characteristics of electrical and optical properties of graphene such as the effect of graphene geometry on the microwave properties using the measurements of S-parameter in range of 500 MHz - 40 GHz at room temperature condition. We confirm that impedance and resistance decrease with increasing the number of graphene layer and w/L ratio. This result shows proper geometry of graphene to be used as high frequency interconnects. This study also presents the optical properties of graphene oxide (GO), which were deposited in different substrate, or influenced by oxygen plasma, were confirmed using different characterization techniques. 4-6 layers of the polycrystalline GO layers, which were confirmed by High resolution transmission electron microscopy (HRTEM) and electron diffraction analysis, were shown short range order of crystallization by the substrate as well as interlayer effect with an increase in interplanar spacing, which can be attributed to the presence of oxygen functional groups on its layers. X-ray photoelectron Spectroscopy (XPS) and Raman spectroscopy confirms the presence of the $sp^2$ and $sp^3$ hybridization due to the disordered crystal structures of the carbon atoms results from oxidation, and Fourier Transform Infrared spectroscopy (FTIR) and XPS analysis shows the changes in oxygen functional groups with nature of substrate. Moreover, the photoluminescent (PL) peak emission wavelength varies with substrate and the broad energy level distribution produces excitation dependent PL emission in a broad wavelength ranging from 400 to 650 nm. The structural and optical properties of oxygen plasma treated GO films for possible optoelectronic applications were also investigated using various characterization techniques. HRTEM and electron diffraction analysis confirmed that the oxygen plasma treatment results short range order crystallization in GO films with an increase in interplanar spacing, which can be attributed to the presence of oxygen functional groups. In addition, Electron energy loss spectroscopy (EELS) and Raman spectroscopy confirms the presence of the $sp^2$ and $sp^3$ hybridization due to the disordered crystal structures of the carbon atoms results from oxidation and XPS analysis shows that epoxy pairs convert to more stable C=O and O-C=O groups with oxygen plasma treatment. The broad energy level distribution resulting from the broad size distribution of the $sp^2$ clusters produces excitation dependent PL emission in a broad wavelength range from 400 to 650 nm. Our results suggest that substrate influenced, or oxygen treatment GO has higher potential for future optoelectronic devices by its various optical properties and visible PL emission.

  • PDF

부양증발응축법으로 제조된 Ni과 Ni@C의 자성특성 및 Biginelli 합성 촉매 적용연구 (Magnetic Properties and Application of Caltalysts in Biginelli Reaction for the Ni and Ni@C Synthesized by Levitational Gas Condensation (LGC))

  • 엄영랑
    • 한국자기학회지
    • /
    • 제27권3호
    • /
    • pp.87-91
    • /
    • 2017
  • 물리적 기상합성법인 부양증발가스응축법을 이용하여 분말 제조 장치 내 아르곤(Ar)가스와 메탄($CH_4$)의 비를 조정하여 니켈(Ni) 금속분말과 탄소가 니켈(Ni) 금속 표면에 코팅 된 Ni@C 나노분말을 제조하였다. 제조된 금속분말은 약 20 nm의 평균입도를 가지는 반면, 탄소막이 코팅된 경우 10 nm 정도의 평균 입도를 가지며, 2~3 nm 두께의 그라파이트 다층막(multi-shell graphite)이 표면에 코팅된 분말이 제조되었다. Ni@C는 1 T 가해준 상태에서도 자화값이 포화되지 못하였다. Ni의 경우 표면에 부동태 산화피막(NiO)이 존재한다. 제조된 나노입자를 심혈관 질환 치료제인 디하이드로미리미딘(3,4-dihydropyrimidine)의 제조시 촉매제로 반응시켰으며, 자성분말 특성을 이용하여 촉매제를 회수하였다. Ni의 경우 S-이성질체(en-antiomer)가 ${\Delta}{\sim}7.4%$ 더 생성 되었으며, Ni@C의 경우 ${\Delta}{\sim}19.6%$였다. 탄소막이 코팅 된 Ni은 재활용 시에도 3,4-DHPM 수득율(yield)이 68 %로 양호하였다.

탄소계 경질 박막의 연구 및 산업 적용 동향 (Trend in Research and Application of Hard Carbon-based Thin Films)

  • 이경황;박종원;양지훈;정재인
    • 한국표면공학회:학술대회논문집
    • /
    • 한국표면공학회 2009년도 춘계학술대회 논문집
    • /
    • pp.111-112
    • /
    • 2009
  • Diamond-like carbon (DLC) is a convenient term to indicate the compositions of the various forms of amorphous carbon (a-C), tetrahedral amorphous carbon (ta-C), hydrogenated amorphous carbon and tetrahedral amorphous carbon (a-C:H and ta-C:H). The a-C film with disordered graphitic ordering, such as soot, chars, glassy carbon, and evaporated a-C, is shown in the lower left hand corner. If the fraction of sp3 bonding reaches a high degree, such an a-C is denoted as tetrahedral amorphous carbon (ta-C), in order to distinguish it from sp2 a-C [2]. Two hydrocarbon polymers, that is, polyethylene (CH2)n and polyacetylene (CH)n, define the limits of the triangle in the right hand corner beyond which interconnecting C-C networks do not form, and only strait-chain molecules are formed. The DLC films, i.e. a-C, ta-C, a-C:H and ta-C:H, have some extreme properties similar to diamond, such as hardness, elastic modulus and chemical inertness. These films are great advantages for many applications. One of the most important applications of the carbon-based films is the coating for magnetic hard disk recording. The second successful application is wear protective and antireflective films for IR windows. The third application is wear protection of bearings and sliding friction parts. The fourth is precision gages for the automotive industry. Recently, exciting ongoing study [1] tries to deposit a carbon-based protective film on engine parts (e.g. engine cylinders and pistons) taking into account not only low friction and wear, but also self lubricating properties. Reduction of the oil consumption is expected. Currently, for an additional application field, the carbon-based films are extensively studied as excellent candidates for biocompatible films on biomedical implants. The carbon-based films consist of carbon, hydrogen and nitrogen, which are biologically harmless as well as the main elements of human body. Some in vitro and limited in vivo studies on the biological effects of carbon-based films have been studied [$2{\sim}5$].The carbon-based films have great potentials in many fields. However, a few technological issues for carbon-based film are still needed to be studied to improve the applicability. Aisenberg and Chabot [3] firstly prepared an amorphous carbon film on substrates remained at room temperature using a beam of carbon ions produced using argon plasma. Spencer et al. [4] had subsequently developed this field. Many deposition techniques for DLC films have been developed to increase the fraction of sp3 bonding in the films. The a-C films have been prepared by a variety of deposition methods such as ion plating, DC or RF sputtering, RF or DC plasma enhanced chemical vapor deposition (PECVD), electron cyclotron resonance chemical vapor deposition (ECR-CVD), ion implantation, ablation, pulsed laser deposition and cathodic arc deposition, from a variety of carbon target or gaseous sources materials [5]. Sputtering is the most common deposition method for a-C film. Deposited films by these plasma methods, such as plasma enhanced chemical vapor deposition (PECVD) [6], are ranged into the interior of the triangle. Application fields of DLC films investigated from papers. Many papers purposed to apply for tribology due to the carbon-based films of low friction and wear resistance. Figure 1 shows the percentage of DLC research interest for application field. The biggest portion is tribology field. It is occupied 57%. Second, biomedical field hold 14%. Nowadays, biomedical field is took notice in many countries and significantly increased the research papers. DLC films actually applied to many industries in 2005 as shown figure 2. The most applied fields are mold and machinery industries. It took over 50%. The automobile industry is more and more increase application parts. In the near future, automobile industry is expected a big market for DLC coating. Figure 1 Research interests of carbon-based filmsFigure 2 Demand ratio of DLC coating for industry in 2005. In this presentation, I will introduce a trend of carbon-based coating research and applications.

  • PDF