• Title/Summary/Keyword: Diffraction efficiency

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Diffraction Behaviors of New Photopolymers Containing the Dendritic Molecule

  • Kim Go Woon;Jun Woong Gi;Lee Sang Kyu;Cho Min Ju;Jin Jung-Il;Choi Dong Hoon
    • Macromolecular Research
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    • v.13 no.6
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    • pp.477-482
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    • 2005
  • Photopolymers are attractive materials for holographic 3-D data storage because of their high photosensitivity and large refractive index modulation. We synthesized the six-armed dendrimer for fabricating the new photopolymer. It was prepared using the initiating mixture of hexaarylbiimidazole (HABI), mercapto-benzoxazole (MOBZ), and 2,6-bis(4-diethylaminobenzylidene)cyclopentanone (DEAW), which is sensitive to 514 nm wavelength. The holographic gratings were fabricated successfully in these photopolymer samples by conventional optical interference method. We investigated the effect of dendrimer, either as a binder or as a plasticizer in the cellulose acetate butyrate (CAB), on the diffraction behavior. The addition of only 1 wt$\%$ of dendrimer-I into the CAB significantly increased the diffraction efficiency. The sample doped with dendrimer showed around 80-83$\%$ of the diffraction efficiency.

Holographic grating formation in AsGeSeS(10,20,40,80nm) thin films (AsGeSeS(10,20,40,80nm) 박막에서의 홀로그래픽 격자 형성)

  • Lee, Ki-Nam;Yoo, Chul-Ho;Kim, Jong-Bin;Lee, Yeong-Jong;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.05a
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    • pp.119-122
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    • 2004
  • This paper discovers that we form holographic grating in AsGeSeS thin film. Holographic grating is not developed in the length of 10,20,40nm, while it is formed in the thin film of 80nm though it shows very low diffraction efficiency. On the contrary, holographic grating is established in every thin film of Ag(10nm)/AsGeSeS(10,20,40,80nm). Lattice in 10,20 nm thin film builds up, and immediately disappears. In the case of 40nm thin film, even if holographic grating is made up, it seems to have a low diffraction efficiency. Apart from 10,20,40nm, it shows the highest diffraction efficiency in the thin film of 80nm.

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Holographic grating formation of Ag/AsGeSeS multi layer (Ag/AsGeSeS 다층 박막의 홀로그래픽 격자 형성)

  • Na, Sun-Woong;Park, Jong-Hwa;Yeo, Cheol-Ho;Shin, Kyoung;Lee, Young-Jong;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.133-136
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    • 2001
  • In this paper, we investigated the diffraction efficiency of polarization holography using by amorphous $Ag/As_{40}Ge_{10}Se_{15}S_{35}$ multi-layer thin films by He-Ne laser. Multi-layer structures were formed by alternating a layer of meta1(Ag) and chalcogenide( $Ag/As_{40}Ge_{10}Se_{15}S_{35}$ ). The holographic grating in these thin flims has been formed using a linealy polarized He-Ne laser light (633nm). The diffraction efficiency was investigated the two sample of $Ag/As_{40}Ge_{10}Se_{15}S_{35}-7$ layers and $Ag/As_{40}Ge_{10}Se_{15}S_{35}-15$ layers. As the results, we found that the diffraction efficiency of $Ag/As_{40}Ge_{10}Se_{15}S_{35}-7$ layers and $Ag/As_{40}Ge_{10}Se_{15}S_{35}-15$ layers were 1.7% and 2.5% respectively.

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The Properties of Diffraction Efficiency in Polarization Holography using the Ag and MgF2/AsGeSeS Multi-layer (Ag 및 MgF2/AsGeSeS 다층박막에서의 편광 홀로그래피 회절효율 특성)

  • 나선웅;여철호;정홍배;김종빈
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.12
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    • pp.1070-1074
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    • 2002
  • We have carried out two-beam interference experiments to form holographic gratings on As$_{40}$ Se$_{15}$ S$_{35}$Ge$_{10}$ single layer, Ag/As$_{40}$ Se$_{15}$ S$_{35}$Ge$_{10}$ multi-layer. In this study, holographic gratings have been formed using He-Ne laser(632.8nm) under different polarization combinations(intensity polarization holography, phase polarization holography). The diffraction efficiency was obtained by the +lst order intensity. The maximum diffraction efficiency of As$_{40}$ Se$_{15}$ S$_{35}$Ge$_{10}$ single layer, As$_{40}$ Se$_{15}$ S$_{35}$Ge$_{10}$ and MgF$_2$/As$_{40}$ Se$_{15}$ S$_{35}$Ge$_{10}$ multi-layer were 0.8%, 1.4% and 3.1% under intensity polarization holography, respectively.

Holographic Grating Formation of AsSeS Thin Films with the Incident Beam Wavelength (서로 다른 빔에 의한 AsSeS 박막의 홀로그래픽 데이터 격자형성)

  • Kim, Jae-Hoon;Shin, Ki-Jun;Kim, Hyun-Koo;Koo, Sang-Mo;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.445-446
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    • 2008
  • In this paper, we investigated the diffraction grating efficiency on Ag-doped amorphous chalcogenide Ag/AsSeS thin film for used to volume hologram. The film thickness was 2 um and diffraction efficiency was obtained from He-Ne (632.8nm) and DPSS(532nm) (P:P) polarized laser beam on Ag/AsSeS thin films. As a result, for the films, the maximum grating diffraction efficiency using He-Ne laser(632nm) is 0.15%[2000sec]. And then The recording speed of DPSS laser was about 40s which of batter than He-Ne lasers.

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Holographic grating formation of Ag/AsGeSeS multi layer (Ag/AsGeSeS 다층 박막의 홀로그래픽 격자 형성)

  • Na, Sun-Woong;Park, Jong-Hwa;Yeo, Cheol-Ho;Shin, Kyong;Lee, Young-Jong;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.133-136
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    • 2001
  • In this paper, we investigated the diffraction efficiency of polarization holography using by amorphous Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/ multi-layer thin films by He-Ne laser. Multi-layer structures were formed by alternating a layer of metal(Ag) and chalcogenide(As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/). The holographic grating in these thin films has been formed using a lineally polarized He-Ne laser light (633nm). The diffraction efficiency was investigated the two sample of Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-7 layers and Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-15 layers. As the results, we found that the diffraction efficiency of Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-7 layers and Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-15 layers were 1.7% and 2.5% respectively

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A Study on Holographic Grating Formation in Se-base Amorphous Chalcogenide Thin Films (Se-base로 한 비정질 칼코게나이드 박막의 훌로그래픽 격자 형성)

  • Ju, Long-Yun;Choi, Hyuk;Nam, Ki-Hyeon;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.181-182
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    • 2007
  • In this paper, we investigated the diffraction grating efficiency on $Ge_{75}Se_{25}$ and Ag-doped amorphous chalcogenide $Ag/Ge_{75}Se_{25}$ thin film for used to volume hologram. The film thickness was 2 um and diffraction efficiency was obtained from He-Ne (632.8nm) and DPSS(532nm) (P:P) polarized laser beam on $Ge_{75}Se_{25}$ and Ag/$Ge_{75}Se_{25}$ thin films. As a result. for the films, the diffraction efficiency on Ag/$Ge_{75}Se_{25}$ double layer, was better than single $Ge_{75}Se_{25}$ thin films. The recording speed of DPSS laser is higher than that of He-Ne laser.

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Feasibility Study of the Light-outcoupling Characteristics of a Diffraction-grating-imprinted Light-guide Plate for an LCD Backlight Unit (LCD 백라이트 유닛의 서브 마이크론 회절 격자 도광판의 광 출사 특성 연구)

  • Choi, Hwan Young
    • Korean Journal of Optics and Photonics
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    • v.31 no.4
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    • pp.176-182
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    • 2020
  • The possibility of replacing the condensing-prism film used in conventional backlight units with a light-guide plate engraved with a submicrometer-periodic diffraction grating was investigated. The optimal period for the diffraction grating was determined through simulation and experiment, and the transmission-mode efficiency of the diffraction grating was calculated in terms of the polar angle and azimuthal angle of the incident light. In addition, the effects of the two methods of optimizing the polar angle and the directional angle were compared by simulation, by suggesting the shape and configuration of the light-guide plate, so that more light could be extracted by diffraction. By using a ray-tracing program, the luminance angular distribution of the light-guide plate engraved with the diffraction grating was calculated and compared to the luminance angular distribution for each actual prototype.

Characteristics of the Polarization Dependence Holographic Diffraction Efficiency using the $MgF_{2}/As_{40}Ge_{10}Se_{15}S_{35}$ Multi-Layer ($MgF_{2}/As_{40}Ge_{10}Se_{15}S_{35}$ 다층박막에서 편광상태에 따른 회절효율 특성)

  • Lee, Jung-Tae;Yeo, Cheol-Ho;Shin, Kyung;Lee, Ki-Nam;Kim, Jong-Bin;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.04a
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    • pp.127-130
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    • 2003
  • We have carried out two-beam interference experiment to form holographic grating on amorphous $As_{40}Ge_{10}Se_{15}S_{35}$ single-laver, $MgF_{2}/As_{40}Ge_{10}Se_{15}S_{35}$ muliti-layer. In this study holographic grating formed using He-Ne laser(632.8nm) under different polarization state(intensity, phase polarization holography). The diffraction efficiency was obtained by first order intensity. The maximum diffraction efficiency of $As_{40}Ge_{10}Se_{15}S_{35}$ single-laver was 0.8% and The maximum diffraction efficiency of $MgF_{2}/As_{40}Ge_{10}Se_{15}S_{35}$ multi-layer(multi-layer I, multi-layer II) were 1.4% and 3.1%.

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The characteristic of diffraction efficiency depending on Ag doping on film of amorphous AsGeSeS (비정질 As-Ge-Se-S 박막에서의 Ag 도핑에 따른 회절효율 특성 연구)

  • Lee, Ki-Nam;Yeo, Cheol-Ho;Kyung, Shin;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.1066-1069
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    • 2004
  • This paper shows the characteristic of diffraction efficiency on film of amorphous AsGeSeS according to Ag doping. We compare amorhous AsGeSeS with the characteristics of AsGeSeS/Ag (10nm) and AsGeSeS/Ag (20m). We made film such as $\lambda$, $\lambda/2$, $\lambda/4$, $\lambda/8on$ the basis of 633nm, which is wavelength of recording laser(He-Ne). The highest diffraction efficiency on AsGeSeS film is $\lambda/4$, followed by $\lambda/2$, $\lambda$, $\lambda/8$. In the case of Ag 10nm, it is followed by $\lambda/4$, $\lambda/2$, $\lambda$, $\lambda/8$. On the occasion of Ag 20nm, it seems that the highest is $\lambda/2$, followed by $\lambda$, $\lambda/4$, $\lambda/8$. In other words, it appears that the highest point on AsGeSeS(158nm) single layer is 0.09%, the one of AsGeSeS(158nm)/Ag(10nm) is 1.6%, and the point of AsGeSeS(316nm)/Ag(20nm) is3.2%. Comparing the highest point in each case, we conclude that there is a distinctive increase in diffraction efficiency according the effect on Ag doping.

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