• Title/Summary/Keyword: Diffraction and Grating

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Optical Analysis of Diffraction Grating and Fresnel Zone Plate Fabricated on Fused Silica Glass by a Femtosecond Laser (펨토초 레이저를 이용한 회절격자와 Fresnel Zone Plate 제작 및 광학적 분석)

  • Ryu, Jin-Chang;Kim, Jin-Tae;Sohn, Ik-Bu
    • Journal of the Korean Society for Precision Engineering
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    • v.27 no.3
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    • pp.18-26
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    • 2010
  • Diffraction gratings with precise spatial periods of 2 ${\mu}m$ and 5 ${\mu}m$ have been fabricated by using a femtosecond laser which does not have limits on materials of micromachining and small thermal effects due to high peak power. Diffraction angle and diffraction efficiency of those were measured. Simulation results of diffraction angle and diffraction efficiency of the diffraction grating calculated with the parameters such as line width, depth, and spatial period of the fabricated gratings were compared with experimental results measured with a He-Ne laser. Besides these, Fresnel Zone Plates (FZPs) with focal distances of 50 mm and 25 mm were fabricated and focal distances of fabricated FZP were measured. Those experimental results for diffraction gratings and FZPs match well with experimental results.

Implementation of Plasmonic Polarization Beam Splitter based on an Asymmetric Grating Profile (비대칭 격자구조에 기초한 플라즈마 편광 빔 분리기의 구현)

  • Kwang-Chun Ho
    • The Journal of the Institute of Internet, Broadcasting and Communication
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    • v.24 no.2
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    • pp.155-160
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    • 2024
  • The polarization-selective beam splitter grating can be widely used in numerous optical information processing systems. In this paper, to design a high-efficiency plasma polarization beam splitter (PBS), the structure composed of an Ag metal layer in Littrow mounting is implemented. To achieve high diffraction efficiency in the transmitted 0th-order TE polarization and the reflected 0th-order TM polarization, the grating depth and grating ratio of presented PBS is optimized by using rigorous Modal Transmission-Line Theory. From the optimized results, PBS has advantages of wide band properties for incident wavelength and angle, and the efficiency is higher than 95% for both TE and TM polarization. Therefore, this highly efficient PBS wideband grating with high extinction ratio can be used as an excellent optical diffraction device.

A Study on the Relief-type Grating Formation and Diffraction Efficiency of Amorphous (Se, S)-based Thin Films ((Se, S)를 기본으로 한 비정질 박막의 Relief-형격자 형성과 회절 효율에 관한 연구)

  • 최대영;박태성;정홍배;김종빈
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1988.10a
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    • pp.91-94
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    • 1988
  • This paper is investigated on the diffraction grating formation of the amorphous As-Se-S-Ge films. AS$\_$40/Se$\_$15/S$\_$36/Ge$\_$10/ film of thickness 0.76 $\mu\textrm{m}$ has achieved a high diffraction efficiency of 4.6%. In this film, high diffraction efficiency is increased to 18% by chemical etching.

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Etching characteristics of holographic grating on chalcogenide As-Ge-Se-S thin films (칼코게나이드 As-Ge-Se-S 박막에서 홀로그래픽 격자의 에칭 특성)

  • Park, Jong-Hwa;Park, Jeong-Il;Na, Sun-Woong;Son, Chul-Ho;Shin, Kyung;Lee, Young-Jong;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.644-647
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    • 2001
  • Amorphous As-Ge-Se-S thin films have been studied with the aim of identifying optimum etching condition which can be used to produce holographic grating structure for use as diffractive optical elements. In this study, holographic gratings have been formed using He-Ne laser(632.8nm), and fabricated by the method of wet etching using NaOH etchant with various concentration(0.26N, 0.33N, 0.40N). The diffraction efficiency was obtained by +1st order intensity of the diffracted beam. The formed grating profiles were observed by atomic force microscope and showed that the expected grating profile could be achieved by controlling the etching time. Over-etching resulted in under-cutting of the grating lines. The highest 1st order diffraction efficiency for these gratings was about 5.05%.

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The recording of surface relief grating on the chalcogenide thin film (비정질 칼코게나이드 박막에 Surface Relief 격자 형성)

  • 박종화;장선주;박정일;여철호;이영종;정홍배
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.299-302
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    • 2000
  • In this study, we have made the large holographic surface relief gratings on amorphous chalcogenide $As_{40}$$Ge_{10}$$Se_{15}$$S_{35}$ films by two beam interference using a He-Ne laser(632.8nm) light. The film thickness was about 0.6$\mu\textrm{m}$, we could magnify beam size by using beam expander. We made use $90^{\circ}$ holder which was made of reflection mirror and sample. Formed the surface relief structures were investigated using optical microscope. The diffraction efficiency was obtained by measuring +lst order intensity. In addition we investigated grating formation and diffraction efficiency as a function of polarization states which is linear or circular polarization. The results indicate that the grating was formed by linear polarized beam is better clear than that by circular polarized beam.

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DPSS laser를 이용한 비정질 칼코게나이드 박막의 회절격자 형성

  • Nam, Gi-Hyeon;Jeong, Won-Guk;Jeong, Hong-Bae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.246-246
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    • 2010
  • In this paper, we investigated the diffraction grating efficiency on AsSeS and Ag-doped amorphous chalcogenide Ag/AsSeS thin film for used to volume hologram. The Chalcogenide film thickness was 0.5um and Ag thin film was varied from 10nm and 20nm. Diffraction efficiency was obtained from (P:P) polarized Diode Pumped Solid State laser(DPSS, 532.0nm: 200mW) beam on AsSeS and Ag/AsSeS thin films. As a results, diffraction grating was not formed at AsSeS thin film but at Ag-doped AsSeS thin film, diffraction grating was formed well compare with the former.

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Polarization selective diffraction grating using birefringence of the liquid crystal polymer (액정폴리머의 복굴절 특성을 이용한 편광선택형 회절격자)

  • An, Jun-Won;Kim, Nam
    • Proceedings of the Optical Society of Korea Conference
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    • 2007.02a
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    • pp.163-164
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    • 2007
  • We have described a polarization selective diffraction grating using liquid crystal polymer and experimentally demonstrated. From the experimental results, intensity ratios of 1.171 for p-polarization and of 0.0072 for s-polarization are achieved by 650nm wavelength, respectively.

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Diffraction grating interferometer of large equivalent wavelength for flatness testing of rough surfaces (거친 표면 형상측정을 위한 큰 등가파장 회절격자 간섭계)

  • 황태준;김승우
    • Korean Journal of Optics and Photonics
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    • v.15 no.1
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    • pp.56-62
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    • 2004
  • We present a diffraction grating interferometer of large equivalent wavelength specially designed for flatness testing of rough surfaces. Two transmission diffraction gratings are illuminated on the object under test by use of two measurement beams with different angles of incidence, which yields a large equivalent wavelength. This interferometer design minimizes unnecessary diffraction rays and the systematic error caused by the diffraction gratings, and provides a large working distance and easy alignment. To improve the measurement accuracy, phase shifting technique is applied and the equivalent wavelength error caused by defocus is calibrated. Test results obtained from mirror surfaces and machined rough surfaces are discussed.

A new interpretation of two-beam energy coupling in terms of bragg diffraction in a photorefractive crystal

  • Lee, Yeon-Ho;Kim, You-Hyun;Kim, Jae-Cheo;Kim, Hyun-Sung
    • Journal of the Optical Society of Korea
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    • v.1 no.1
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    • pp.36-40
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    • 1997
  • Bragg diffraction of a strong reference beam from a steady-state photorefractive grating is measured experimentally and an analytic prediction is derived from the coupled wave equations of two-beam energy coupling. The relation between Bragg diffraction and two-beam coupling is used to check the mechanism of photorefractive grating formation.

A Study on thin relief phase holographic grating using photoresist. (Photoresist을 이용한 Thin relief 위상형 홀로그램 격자에 관한 연구.)

  • Shin, K.Y.;Choi, D.H.;Kim, N.;Park, H.K.
    • Proceedings of the KIEE Conference
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    • 1987.07a
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    • pp.47-50
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    • 1987
  • There are various holographic recording materials, such as Dichromated Gelatin, Silver Halide, Thermoplastic, Photoresist. In this paper especially, we used Photoresist to make the phase holographic grating. Deep-groove diffractive grating formed in relatively thin holographic recording material is to express high diffraction efficiency. Phase holographic grating recorded In photoresist can be used very practical because it has the high diffraction efficiency, and it is possible to make a replication easily. So, it has the merit in recording the optical holographic grating than any other materials.

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