• The Optical Journal
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• v.7 no.2 s.36
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• pp.60-68
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• 1995

• The Journal of the Institute of Internet, Broadcasting and Communication
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• v.15 no.1
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• pp.261-267
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• 2015

The eigenvalue problems involving the diffraction of waves by multi-layered grating configurations can be explained by rigorous modal expansion terms. Such a modal solution can be represented by equivalent transmission-line networks, which are generalized forms of simple conventional circuits. This approach brings considerable physical insight into the grating diffraction process of the fields everywhere. In particular, the transmission-line representation can serve as a template for computational algorithms that systematically evaluate dispersion properties, radiation effects and other optical characteristics that are not readily obtained by other methods. To illustrate the validity of the present rigorous approach, the previous research works are numerically confirmed and the results agree well each other.

• Journal of the Korean Society for Precision Engineering
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• v.18 no.2
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• pp.152-160
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• 2001

Six degrees of freedom measurement systems are required in many fields: Precision machine control. precision assembly, vibration analysis, and so on. This paper presents a new six degrees of freedom measurement system utilizing typical features of a diffraction grating. It is composed of a laser source, three position sensitive detectors, a diffraction grating target, and several optical components. Six degrees of freedom displacement is calculated kinematically from the coordinates of diffracted rays on the detectors. Optical measurement error was caused by the fact that a laser source had a Gaussian intensity distribution. This error was analyzed and compensated using simple equations. The performance of the compensation equation was verified in the experiment. The experimental results showed that the compensation equation could reduce the optical measurement error remarkably and the error in six degrees of freedom measurement less than $\pm$10$\mu$m for translation and $\pm$0.012$^{\circ}$for rotation.

• Korean Journal of Optics and Photonics
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• v.13 no.3
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• pp.189-196
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• 2002

The components and alignment parameters of a flat-field soft x-ray spectrometer used in the wavelength range below 50 $\AA$ are determined, and the characteristics of the spectrometer are analyzed. It consists of a toroidal mirror, a slit, a varied line-spacing concave grating, and a soft x-ray detector. The space-resolved spectral image of a source is formed on a single plane using the tordidal mirror and the 2400-grooves/mm varied line-spacing concave grating. The former is used to compensate for the astigmatism caused by the grazing incidence of soft x-ray light on the concave grating. The spectral and spatial resolutions of the spectrometer are calculated by applying the wave front aberration theory, and the diffraction efficiency is calculated by applying the scalar diffraction theory.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1998.11a
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• pp.89-92
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• 1998

Amorphous chalcogenide thin films, especially a-(Se, S) based films, exhibit a number of photoinduced phenomena not observed in other types of amorphous thin films. The polarization holographic grating has been formed in amorphous As-Ge-Se-S thin films using two linearly polarized He-Ne laser light. In addition, dffraction efficiency has been measured by the same laser of a relative lower intensity at the same time.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.04b
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• pp.85-88
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• 2002

We have carried out two-beam interference experiments to form holographic gratings on chalcogenide $Ag/As_{40}Se_{15}S_{35}Ge_{10}$ multi-layer. In this study, holographic gratings have been formed using He-Ne laser(632.8nm) under different polarization combinations(intensity polarization holography, phase polarization holography). The diffraction efficiency was obtained by +1st order intensity and formed grating structure was investigated using atomic force microscopy.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.32A no.1
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• pp.200-205
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• 1995

The 1st and 2nd-order grating structure for long wavelength DFB(Distributed FeedBack) laser diodes are successfully fabricated on InP substrates by using electron beam lithography and reactive ion etch techniques, and also characterized non-destructively by diffraction analysis without removal of photo-resis layer. A new composite layer made by lifted-off Cr layer on thin SiO2 film is developed and used as an etch mask, because PMMA, the e-beamresist, is unsuitable for reactive ion etch of InP. In addition, it is experimentally confiremed that diffraction analysis makes it possible to predict the grating parameters, and the analysis can be used as a non-destructive on-line test to prevent incomplete gratings from being successively processed.

• Current Optics and Photonics
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• v.6 no.4
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• pp.375-380
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• 2022

We demonstrate two types of light field displays based on waveguide grating coupler arrays: a line beam type and a point source type. Ultra violet imprinting of an array of diffractive nanograting cells on the top surface of a 50-㎛-thin slab waveguide can deliver a line beam or a point beam to a multidirectional light field out of the waveguide slab. By controlling the grating vectors of the nanograting cells, the waveguide modes are externally coupled to specific viewing angles to create a multidirectional light field display. Nanograting cells with periods of 300 nm-518 nm and slanted angles of -8.5°~+8.5° are fabricated by two-beam interference lithography on a 40 mm × 40 mm slab waveguide for seven different viewpoints. It is expected that it will be possible to realize a very thin and flexible panel that shows multidirectional light field images through the waveguide-type diffraction display.

• Korean Journal of Optics and Photonics
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• v.14 no.6
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• pp.606-612
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• 2003

The self-imaging effect or lensless imaging effect of a phase line grating is theoretically analyzed by using Fresnel diffraction theory, then experimentally investigated. The self-imaging distance $z_{T,p}$, that is the imaging distance being perfectly copied from the phase distribution of the phase grating to its intensity distribution with the magnification of 1X, can be uniquely defined as the (4n-3) $z_{T,a}$/4(n=positive integers), where rte is the well-known self-imaging distance of an amplitude grating. When the coherent laser beam is illuminated at the phase grating, the self-imaged images were obtained at $z_{T,p}$= $z_{T,a}$/4 and $z_{T,p}$=5 $z_{T,a}$/4 without any optics. On the other side, the phase-reversed self-imaging was obviously observed at $z_{T,p}$ = 3 $z_{T,a}$/4. The visibility of self-imaged images of a phase line grating as a function of the number of slits of the input grating was measured by the FFT(Fast Fourier Transform) results of the self-imaging images. As a result a stationary maximum visibility of V = 0.10 can be obtained from a grating with more than 15 slit pairs.n 15 slit pairs.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.11a
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• pp.490-493
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• 2003

We have carried out two-beam interference experiment to form holographic grating on amorphous $As_{40}Ge_{10}Se_{15}S_{35}/Ag$ double-layer. In this study holographic grating formed using He-Ne laser(632.8nm) under non-polarization state and p-polarization state and we confirm that the diffraction efficiency depend on thickness of Ag. The diffraction efficiency was obtained by first order intensity. We got the maximum diffraction efficiency that thickness of Ag was $600{\AA}$. The maximum diffraction efficiency was 13.5% in (P:P) polarization state.