Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Polarization Holographic Grating Formation and Diffraction Efficiency Measurement in Amorphous Chalcogenide Thin Films

비정질 칼코게나이드 박막에서의 편광 홀로그라피 격자 형성 및 회절효율 측정

  • 전진영 (광운대학교 공대 전자재료공학과) ;
  • 여철호 (광운대학교 공대 전자재료공학과) ;
  • 이현용 (광운대학교 신기술연구소) ;
  • 정홍배 (광운대학교 공대 전자재료공학과)
  • Published : 1998.11.01
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Abstract

Amorphous chalcogenide thin films, especially a-(Se, S) based films, exhibit a number of photoinduced phenomena not observed in other types of amorphous thin films. The polarization holographic grating has been formed in amorphous As-Ge-Se-S thin films using two linearly polarized He-Ne laser light. In addition, dffraction efficiency has been measured by the same laser of a relative lower intensity at the same time.

Keywords