• Title/Summary/Keyword: Dielectric Materials

Search Result 2,119, Processing Time 0.028 seconds

Electro-optic Properties and Thermal Stabilities of Polyimide-DRI Side Chain Polymer for Photonic Devices (폴리이미드-DR1 옆사슬계 전기광학 고분자의 전기광학 특성 및 열적 안정성)

  • Lee, Myeong-Hyeon;Lee, Hyeong-Jong;O, Min-Cheol;An, Ju-Heon;Han, Seon-Gyu
    • Korean Journal of Materials Research
    • /
    • v.9 no.4
    • /
    • pp.355-361
    • /
    • 1999
  • We have synthesized the soluble polymide based side chain system with covalently attached NLO chromophore Disperse Red 1. The developed polymer is optically transparent in the range of optical communication wave-lengths. Its glass transition temperature$(T_g)$ and thermal decomposition temperature$(T_d)$ are $225^{\circ}C, 310^{\circ}C$ respectively. The poled film with the poling field of $100 V/\mu\textrm{m}$ shows that the dielectric constant is 3.37 at the 10-kHz frequency, the refractive indices of TM and TE modes are both 1.631 at $\lambda = 1300 nm$, and the Electro-optic coefficients are 4.6~9.2 pm/V at $\lambda = 1300 nm$. There are no decays of the EO coefficient in the poled polymer at $180^{\circ}C$ in one hour, and $90^{\circ}C$ in 500 hours.

  • PDF

Analysis of the Influence of Electrical Discharge Machining Parameters on Surface Roughness of CK45

  • Abedi, Esmail;Daneshmand, Saeed;Karimi, Iman;Neyestanak, A. A. Lotfi
    • Journal of Electrochemical Science and Technology
    • /
    • v.6 no.4
    • /
    • pp.131-138
    • /
    • 2015
  • Electrical discharge machining is an unconventional machining process in which successive sparks applied to machine the electrically conductive materials. Any changes in electrical discharge machining parameters lead to the pieces with distinct surface roughness. The electrical discharge machining process is well applied for high hardness materials or when it is difficult to use traditional techniques to do material removing. Furthermore, this method is widely applied in industries such as aerospace, automobile, molding, and tool making. CK45 is one of the important steels in industrial and electrical discharge machining can be considered as a proper way for its machining because of high hardness of CK45 after thermal operation of the electrical discharge machining process. Optimization of surface roughness as an output parameters as well as electrical discharge machining parameters including current, voltage and frequency for electrical discharge machining of CK45 has been studied using copper tools and kerosene as the dielectric. For such a purpose and to achieve the precise statistical analysis of the experiment results design of experiment was applied while non linear regression method was chosen to assess the response of surface roughness. Then, the results were analyzed by means of ANOVA method and machining parameters with more effects on the desired outputs were determined. Finally, mathematical model obtained for surface roughness.

The Evaluation for Reliability Characteristics of MOS Devices with Different Gate Materials by Plasma Etching Process (게이트 물질을 달리한 MOS소자의 플라즈마 피해에 대한 신뢰도 특성 분석)

  • 윤재석
    • Journal of the Korea Institute of Information and Communication Engineering
    • /
    • v.4 no.2
    • /
    • pp.297-305
    • /
    • 2000
  • It is observed that the initial properties and degradation characteristics on plasma of n/p-MOSFET with polycide and poly-Si as different gate materials under F-N stress and hot electron stress are affected by metal AR(Antenna Ratio) during plasma process. Compared to that of MOS devices with poly-Si gate material, reliability properties on plasma of MOS devices with polycide gate material are improved. This can be explained by that fluorine of tungsten polycide process diffuses through poly-Si into gate oxide and results in additional oxide thickness. The fact that MOS devices with polycide gate material can reduce damages of plasma process shows possibility that polycide gate material can be used as gate material for next generation MOS devices.

  • PDF

The Piezoelectric Properties of (Na0.5K0.5)NbO3-K4CuNb8O23 Ceramics with Various K4CuNb8O23 Doping and Sintering Temperatures

  • Yoon, Jung-Rag;Lee, Chang-Bae;Lee, Kyung-Min;Lee, Heun-Young;Lee, Serk-Won
    • Transactions on Electrical and Electronic Materials
    • /
    • v.11 no.3
    • /
    • pp.126-129
    • /
    • 2010
  • (1-X) $(Na_{0.5}K_{0.5})NbO_3-X$ $K_4CuNb_8O_{23}$ (NKN-X KCN) ceramics were produced using the conventional solid state sintering method, and their sinterability and electric properties were investigated. The density, dielectric constant (${\varepsilon}_r$), piezoelectric constant $d_{33}$, electromechanical coupling factor $k_p$ and mechanical quality factor $Q_m$ value of the NKN ceramics depended upon the KCN content and the sintering temperature. In particular, the KCN addition to the NKN greatly improved the mechanical quality factor $Q_m$ value. The ceramic with X = 2.0 mol% sintered at $1,150^{\circ}C$ possesses the optimum properties (${\varepsilon}_r=241$, $d_{33}=78$, $k_p=0.34$ and $Q_m=1,121$). These results indicate that the ceramic is a promising candidate material for applications in lead free piezoelectric transformer and filter materials.

Effect of Cr2O3-MgO-Y2O3 Addition on Mechanical Properties of Mullite Ceramics (Cr2O3-MgO-Y2O3 첨가에 따른 뮬라이트 세라믹스의 기계적 성질)

  • Lim, Jin-Hyeon;Kim, Shi Yeon;Yeo, Dong-Hun;Shin, Hyo-Soon;Jeong, Dae-Yong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.30 no.12
    • /
    • pp.762-767
    • /
    • 2017
  • Mullite ($3Al_2O_3{\cdot}2SiO_2$) has emerged as a promising candidate for high-temperature structural materials due to its erosion resistance, chemical and thermal stabilities, relatively low thermal expansion coefficient, excellent thermal shock and creep resistances, and low dielectric constant. However, since the pure mullite sintering temperature is as high as $1,600{\sim}1,700^{\circ}C$, there is an increasing need for a sintering additive capable of improving the strength characteristics while lowering the sintering temperature. Herein we have tried to obtain the optimal sintering additive composition by adding MgO, $Cr_2O_3$, and $Y_2O_3$ to mullite, followed by sintering at $1,325{\sim}1,550^{\circ}C$ for 2 h. With additives of 2 wt% of MgO, 2 wt% of $Cr_2O_3$, 4 wt% of $Y_2O_3$, A density of $3.23g/cm^3$ was obtained for the sintered body at $1,350^{\circ}C$ upon using 2 wt% MgO, 2 wt% $Cr_2O_3$, and 4 wt% $Y_2O_3$ as additives. The three-point flexural strength of that was 275 MPa and the coefficient of thermal expansion (CTE) was $4.15ppm/^{\circ}C$.

Bending Fatigue Characteristics of Surface-Antenna-Structure (복합재료 표면안테나 구조의 굽힘 피로특성 연구)

  • Kim D. H;Hwang W;Park H. C;Park W. S
    • Composites Research
    • /
    • v.17 no.6
    • /
    • pp.22-27
    • /
    • 2004
  • The objective of this work is to design Surface Antenna Structure (SAS) and investigate fatigue behavior of SAS that is asymmetric sandwich structure. This term, SAS, indicates that structural surface becomes antenna. Constituent materials are selected considering electrical properties, dielectric constant and tangent loss as well as mechanical properties. For the antenna performance, SSSFIP elements inserted into structural layers were designed fur satellite communication at a resonant frequency of 12.5 GHz and final demonstration article was $16{\;}{\tiems}{\;}8$ array antenna. From electrical measurements, it was shown that antenna performances were in good agreement with design requirements. In cyclic 4-point bending, flexure behavior was investigated by static and fatigue test. Fatigue life curve of SAS was obtained. The fatigue load was determined experimentally at a 0.75 (1.875kN) load level, Experimental results were compared with single load level fatigue life prediction equations (SFLPE) and in good agreement with SFLPE. SAS concept is the first serious attempt at integration fur both antenna and composite engineers and promises innovative future communication technology.

Study on the Scap-cure Behavior of Adhesive for Flip-chip Bonding (플립칩 본딩용 접착제의 속경화 거동 연구)

  • Lee, Jun-Sik;Min, Kyung-Eun;Kim, Mok-Sun;Lee, Chang-Woo;Kim, Jun-Ki
    • Proceedings of the KWS Conference
    • /
    • 2010.05a
    • /
    • pp.78-78
    • /
    • 2010
  • 모바일 정보통신기기를 중심으로 패키지의 초소형화, 고집적화를 위해 플립칩 공법의 적용이 증가되고 있고 있으며 접속피치의 미세화에 따라 솔더 및 언더필을 사용하는 C4 공법보다 ACA(Anisotropic Conductive Adhesive), NCA (Non-conductive Adhesive) 등의 접착제를 이용하는 칩본딩 공법에 대한 요구가 증가하고 있다. 특히, NCA 공법의 경우 산업 현장의 대량생산에 대응하기 위해서는 접착제의 속경화 특성이 요구되어 진다. 일반적으로 접착제의 경화거동은 DSC(Differential Scanning Calorimeter)를 사용해 확인하지만, 수초 이내에 경화되는 접착제의 경우는 적용되기 어렵다. 본 연구에서는 이러한 전자패키지용 접착제의 속경화 거동을 효과적으로 평가할 수 있는 방법을 조사 하였다. 실험에서 사용된 접착제는 에폭시계 레진 기반에 이미다졸계 경화제를 사용한 기본적인 포뮬레이션을 사용하였고, 경화시간은 160^{\circ}C에서 1분 이내에 경화되는 특성을 가지고 있다. 경화 거동을 확인하기 위해서 isothermal DSC와 DEA(Dielectric Analysis)의 두가지 방법을 사용해 비교하였다. 두 실험 방법 모두 $160^{\circ}C$를 유지하며 경화 거동을 확인하였고, DoC(Degree of Cure)의 측정오차를 비교 분석하였다. DEA는 이온 모빌리티 변화에 따른 유전손실율을 측정하는 방법으로 80~90% 이후의 경화도는 측정되지 않았지만, 수초 이내에 경화되는 속경화 특성을 평가하기에 적합한 것으로 확인되었다.

  • PDF

Analysis of FTIR Spectra in Organic Inorganic Hybrid Type SiOC Films (유무기 하이브리드 SiOC 박막의 화학적 이동에 대한 FTIR 스펙트라 분석)

  • Oh Teresa
    • Journal of the Institute of Electronics Engineers of Korea SD
    • /
    • v.42 no.6 s.336
    • /
    • pp.17-22
    • /
    • 2005
  • Organic-inorganic hybrid type thin films are the next generation candidates as low-k materials. SiOC films are analyzed the bonding structure by the red and blue chemical shift using the fourier transform infraredspectra. Conventional chemical shift of organic chemistry is a red shift, but hybrid type SiOC films were observed the red and blue shift. The chemical shift originates from the interaction between the C-H bond and high electronegative atoms, and the blue shift in SiOC films is caused by the porosity due to the increase of the electron rich group such as much methyl radicals. The bonding structures of SiOC films are also divided into the Si-O-C cross-link structure and the Si-O-C cage-link structure due to the chemical shifts. The Si-O-C cross-link structure progressed the adhesion attributed to the C-H bond elongation in the reason of the red shift, and the dielectric constant also decreases.

Effect of Low-Temperature Sintering on Electrical Properties and Aging Behavior of ZVMNBCD Varistor Ceramics

  • Nahm, Choon-Woo
    • Korean Journal of Materials Research
    • /
    • v.30 no.10
    • /
    • pp.502-508
    • /
    • 2020
  • This paper focuses on the electrical properties and stability against DC accelerated aging stress of ZnO-V2O5-MnO2-Nb2O5-Bi2O3-Co3O4-Dy2O3 (ZVMNBCD) varistor ceramics sintered at 850 - 925 ℃. With the increase of sintering temperature, the average grain size increases from 4.4 to 11.8 mm, and the density of the sintered pellets decreases from 5.53 to 5.40 g/㎤ due to the volatility of V2O5, which has a low melting point. The breakdown field abruptly decreases from 8016 to 1,715 V/cm with the increase of the sintering temperature. The maximum non-ohmic coefficient (59) is obtained when the sample is sintered at 875 ℃. The samples sintered at below 900 ℃ exhibit a relatively low leakage current, less than 60 mA/㎠. The apparent dielectric constant increases due to the increase of the average grain size with the increase of the sintering temperature. The change tendency of dissipation factor at 1 kHz according to the sintering temperature coincides with the tendency of the leakage current. In terms of stability, the samples sintered at 900 ℃ exhibit both high non-ohmic coefficient (45) and excellent stability, 0.8% in 𝚫EB/EB and -0.7 % in 𝚫α/α after application of DC accelerated aging stress (0.85 EB/85 ℃/24 h).

Ionic Doping Effect in Bi-layered Perovskite SrBi2Nb2O9 Ferroelectrics (비스무스 층구조형 페로브스카이트 SrBi2Nb2O9 강유전체의 이온 치환 효과)

  • Park, S.E.;Cho, J.A.;Song, T.K.;Kim, M.H.;Kim, S.S.;Lee, H.S.
    • Korean Journal of Materials Research
    • /
    • v.13 no.12
    • /
    • pp.846-849
    • /
    • 2003
  • Doping effect of various ions in Bi-layered ferroelectric $SrBi_2$$Nb_2$$O_{9}$ (SBN) ceramics was studied. Undoped SBN ceramic and SBN ceramics doped with $Ba^{2+}$, $Pb^{2+}$,$ Ca^{2+}$ , $Bi^{3+}$ , $La^{3+}$ , $Ti^{4+}$ , $Mo^{6+}$ , and $W^{6+}$ ions were made by a solid state reaction. Dielectric constants were measured with temperature. Ferroelectric transition temperature decreased with $Pb^{2+}$ , $Ba^{2+}$ , $La^{3+}$ doping, but the transition temperature increased with $Ca^{2+}$ , $Bi^{3+}$ , $Ti^{4+}$, $Mo^{6+}$ , or$ W^{6+}$ ionic doping. These results show that the ion size plays an important role in the ferroelectricity of SBN ceramic.