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Analysis of FTIR Spectra in Organic Inorganic Hybrid Type SiOC Films  

Oh Teresa (School of Nano and Advanced Materials Engineering, Changwon National University)
Publication Information
Journal of the Institute of Electronics Engineers of Korea SD / v.42, no.6, 2005 , pp. 17-22 More about this Journal
Abstract
Organic-inorganic hybrid type thin films are the next generation candidates as low-k materials. SiOC films are analyzed the bonding structure by the red and blue chemical shift using the fourier transform infraredspectra. Conventional chemical shift of organic chemistry is a red shift, but hybrid type SiOC films were observed the red and blue shift. The chemical shift originates from the interaction between the C-H bond and high electronegative atoms, and the blue shift in SiOC films is caused by the porosity due to the increase of the electron rich group such as much methyl radicals. The bonding structures of SiOC films are also divided into the Si-O-C cross-link structure and the Si-O-C cage-link structure due to the chemical shifts. The Si-O-C cross-link structure progressed the adhesion attributed to the C-H bond elongation in the reason of the red shift, and the dielectric constant also decreases.
Keywords
high electronegative oxygen; Si-O-Si cross-link; Si-O-C cross-link; Si-O-C cage-link;
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1 T. Oh, K. M. Lee, S. T. Ko, K. S. Kim, K. J. Ahn and C. K. Choi, ' Bonding Structure of the Cross-link in Organosilicate Films Using 02/BTMSM Precursors,' Jpn. J. Appl. Phys. Vol. 42, pp.1517-1520, 2003   DOI
2 A. Grill and D. A. Neumayer, 'Structure of low dielectric constant to extreme low dielectric constant SIOCH films: Fourier transform infrared spectroscopy characterization,' J. Appl. Phys. Vol. 94, pp. 6697-6707, 2003   DOI   ScienceOn
3 J. H. Yun, E. S. Choi, C. M. Jang and C. S. Lee, 'Effect of post-treatments on atomic layer deposition of TiN thin films using tetrakis (dimethylamido) titanium and ammonia,' Jpn. J. Appl. Phys. Vol. 41, pp. L418-L421, 2002   DOI   ScienceOn
4 M. A. Tamor, C. H. Wu, R. O Carter and N. E. Lindsay, 'Pendant benzene in hydrogenated diamond-link carbon,' Appl. Phys. Lett. Vol. 55(14), pp. 1388-1390, 1989   DOI
5 G. Galli and R. M. Martin, 'Structural and electronic properties of amorphous carbon,' Phys. Rev. Lett. Vol. 62, No. 5, pp. 555-558, 1989   DOI   ScienceOn
6 K. S. OH, S. Y. JlNG, C. K. Choi, K. M. Lee and H. J. Lee, 'Formation and caracteristic of fluorinated amorphous carbon films deposited by CF4/CH4 ICPCVD,' Journal of the Korean Physical Society, Vol. 39, No. 2, pp. 291-295, 2001
7 T. Oh, H. S. Kim, S. B. Oh and M. S. Won, 'The Chemical Shift According To The flow Rate Ratio 02/BTMSM by FTIR and XPS,' Jpn. J. Appl. Phys. Vol. 42, pp. 6292-6295, 2003   DOI
8 X. Li, L. Liu and H. B. Schlegel, 'On the physical origin of blue shifted hydrogen bonds,' J. AM. CHEM. SOC. Vol. 124, pp. 9639-9647, 2000   DOI   ScienceOn
9 H. J. Kim, Q. Shao and Y. H. Kim, 'Characterizaion of low-dielectric-constant SiOC thin films deposited by PECVD for interlayer dielectrics of multilevel interconnection,' Surface and Coatings Technology, Vol. 171, pp. 39-45, 2003   DOI   ScienceOn
10 P. Masri, 'Silicon carbide and silicon carbide -based structures,' The physics of epitaxy, Surface science reports, Vol. 48, pp. 1-5, 2002