• 제목/요약/키워드: Diamond Tip

검색결과 90건 처리시간 0.023초

Nanoscale Processing on Silicon by Tribochemical Reaction

  • Kim, J.;Miyake, S.;Suzuki, K.
    • 한국윤활학회:학술대회논문집
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    • 한국윤활학회 2002년도 proceedings of the second asia international conference on tribology
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    • pp.67-68
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    • 2002
  • The properties and mechanism of silicon protuberance and groove processing by diamond tip sliding using atomic force microscope (AFM) in atmosphere were studied. To control the height of protuberance and the depth of groove, the processed height and depth depended on load and diamond tip radius were evaluated. Nanoprotuberances and grooves were fabricated on a silicon surface by approximately 100-nm-radius diamond tip sliding using an atomic force microscope in atmosphere. To clarify the mechanical and chemical properties of these parts processed, changes in the protuberance and groove profiles due to additional diamond tip sliding and potassium hydroxide (KOH) solution etching were evaluated. Processed protuberances were negligibly removed, and processed grooves were easily removed by additional diamond tip sliding. The KOH solution selectively etched the unprocessed silicon area. while the protuberances, grooves and flat surfaces processed by diamond tip sliding were negligibly etched. Three-dimensional nanofabrication is performed in this study by utilizing these mechanic-chemically processed parts as protective etching mask for KOH solution etching.

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AFM 부착형 초미세 다이아몬드 팁 켄틸레버의 제작 및 응용 (Fabrication of Micro Diamond Tip Cantilever for AFM and its Applications)

  • 박정우;이득우
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 2005년도 춘계학술대회 논문집
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    • pp.395-400
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    • 2005
  • Nano-scale fabrication of silicon substrate based on the use of atomic force microscopy (AFM) was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate by a simple scratching process, has been applied instead of conventional silicon cantilever for scanning. A thin damaged layer forms in the substrate at the diamond tip-sample junction along scanning path of the tip. The damaged layer withstands against wet chemical etching in aqueous KOH solution. Diamond tip acts as a patterning tool like mask film for lithography process. Hence these sequential processes, called tribo-nanolithography, TNL, can fabricate 2D or 3D micro structures in nanometer range. This study demonstrates the novel fabrication processes of the micro cantilever and diamond tip as a tool for TNL using micro-patterning, wet chemical etching and CVD. The developed TNL tools show outstanding machinability against single crystal silicon wafer. Hence, they are expected to have a possibility for industrial applications as a micro-to-nano machining tool.

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AFM 기반 Tribo-Nanolithography 를 위한 초미세 다이아몬드 팁 켄틸레버의 제작 (Fabrication of Micro Diamond Tip Cantilever for AFM-based Tribo-Nanolithography)

  • 박정우;이득우
    • 한국정밀공학회지
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    • 제23권8호
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    • pp.39-46
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    • 2006
  • Nano-scale fabrication of silicon substrate based on the use of atomic force microscopy (AFM) was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate by a simple scratching process, has been applied instead of conventional silicon cantilever for scanning. A thin mask layer forms in the substrate at the diamond tip-sample junction along scanning path of the tip. The mask layer withstands against wet chemical etching in aqueous KOH solution. Diamond tip acts as a patterning tool like mask film for lithography process. Hence these sequential processes, called tribo-nanolithography, TNL, can fabricate 2D or 3D micro structures in nanometer range. This study demonstrates the novel fabrication processes of the micro cantilever and diamond tip as a tool for TNL using micro-patterning, wet chemical etching and CVD. The developed TNL tools show outstanding machinability against single crystal silicon wafer. Hence, they are expected to have a possibility for industrial applications as a micro-to-nano machining tool.

탐침과 시편의 위치를 역전시킨 주사 탐침 현미경용 다이아몬드 탐침의 제작 및 평가 (Design, Fabrication and Evaluation of Diamond Tip Chips for Reverse Tip Sample Scanning Probe Microscope Applications)

  • 김수길;;김진혁
    • 한국재료학회지
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    • 제34권2호
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    • pp.105-110
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    • 2024
  • Scanning probe microscopy (SPM) has become an indispensable tool in efforts to develop the next generation of nanoelectronic devices, given its achievable nanometer spatial resolution and highly versatile ability to measure a variety of properties. Recently a new scanning probe microscope was developed to overcome the tip degradation problem of the classic SPM. The main advantage of this new method, called Reverse tip sample (RTS) SPM, is that a single tip can be replaced by a chip containing hundreds to thousands of tips. Generally for use in RTS SPM, pyramid-shaped diamond tips are made by molding on a silicon substrate. Combining RTS SPM with Scanning spreading resistance microscopy (SSRM) using the diamond tip offers the potential to perform 3D profiling of semiconductor materials. However, damage frequently occurs to the completed tips because of the complex manufacturing process. In this work, we design, fabricate, and evaluate an RTS tip chip prototype to simplify the complex manufacturing process, prevent tip damage, and shorten manufacturing time.

다이아몬드 촉침의 이온 스파터 가공조건에 관한 연구 (A study on the machining condition of diamond stylus using ion sputter machining)

  • 한응교;노병옥;김병우
    • 대한기계학회논문집
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    • 제14권6호
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    • pp.1495-1508
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    • 1990
  • 본 연구에서는 전류밀도와 가공시간을 변화시켰을 때의 가공량, 가공상태를 검토해 보았으며, 촉침홀더의 가공각도를 달리하거나 재부착문제를 해결하기 위한 마 스크의 사용여부에 따른 촉침의 가공상태를 알아보기 위해 초기선단반경 2$\mu\textrm{m}$, 선단각 90˚의 다이아몬드 촉침을 이온스파터 가공기를 사용하고, 가공조건을 변화시켜서 초 정밀 가공품의 표면거칠기 측정에 적합한 0.5$\mu\textrm{m}$ 이하의 미세한 선단반경을 갖는 촉침 을 가공하기 위한 가공조건에 대한 실험을 하였다.

Tribo-Nanolithography 를 이용한 액중 나노가공기술 개발 (Nanoscale Fabrication in Aqueous Solution using Tribo-Nanolithography)

  • 박정우;이득우
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2004년도 추계학술대회 논문집
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    • pp.1315-1318
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    • 2004
  • Nano-scale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate easily by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin damaged layer rapidly forms in the substrate at the diamond tip-sample junction along scanning path of the tip and simultaneously the area uncovered with the damaged layer is being etched. This study demonstrates how the TNL parameters can affect the formation of damaged layer and the shape of 3-D structure, hence introducing a new process of proximal nanolithography in aqueous solution.

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Tribo-Nanolithography를 이용한 액중 나노가공기술 개발 (Nanoscale Fabrication in Aqueous Solution using Tribo-Nanolithography)

  • 박정우;이득우
    • 한국정밀공학회지
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    • 제22권2호
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    • pp.194-201
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    • 2005
  • Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate easily by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin damaged layer rapidly forms in the substrate at the diamond tip-sample junction along scanning path of the tip and simultaneously the area uncovered with the damaged layer is being etched. This study demonstrates how the TNL parameters can affect the formation of damaged layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.

Nanoscale Fabrication in Aqueous Solution using Tribo-Nanolithography

  • Park, Jeong-Woo;Lee, Deug-Woo;Kawasegi, Noritaka;Morita, Noboru
    • International Journal of Precision Engineering and Manufacturing
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    • 제7권4호
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    • pp.8-13
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    • 2006
  • Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with a diamond tip, allowing the formation of a mask layer on the silicon substrate by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of the conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin mask layer rapidly forms on the substrate at the diamond tip-sample junction along scanning path of the tip, and simultaneously, the area uncovered with the mask layer is etched. This study demonstrates how the TNL parameters can affect the formation of the mask layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.

마찰력현미경을 이용한 나노스케일 마멸시험 시 다이아몬드 탐침으로의 MoS2 마멸입자 전이현상 (Material Transfer of MoS2 Wear Debris to Diamond Probe Tip in Nanoscale Wear test using Friction Force Microscopy)

  • 송현준;임형우;성권일;안효석
    • Tribology and Lubricants
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    • 제35권5호
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    • pp.286-293
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    • 2019
  • In friction and wear tests that use friction force microscopy (FFM), the wear debris transfer to the tip apex that changes tip radius is a crucial issue that influences the friction and wear performances of films and coatings with nanoscale thicknesses. In this study, FFM tests are performed for bilayer $MoS_2$ film to obtain a better understanding of how geometrical and chemical changes of tip apex influence the friction and wear properties of nanoscale molecular layers. The critical load can be estimated from the test results based on the clear distinction of the failure area. Scanning electron microscopy and energy-dispersive spectroscopy are employed to measure and observe the geometrical and chemical changes of the tip apex. Under normal loads lower than 1000 nN, the reuse of tips enhances the friction and wear performance at the tip-sample interface as the contact pair changes with the increase of tip radius. Therefore, the reduction of contact pressure due to the increase of tip radius by the transfer of $MoS_2$ or Mo-dominant wear debris and the change of contact pairs from diamond/$MoS_2$ to partial $MoS_2$ or Mo/$MoS_2$ can explain the critical load increase that results from tip reuse. We suggest that the wear debris transfer to the tip apex should be considered when used tips are repeatedly employed to identify the tribological properties of ultra-thin films using FFM.

표면거칠기 측정용 다이아몬드 촉침의 마모에 관한 연구 (A Study on the Wear of Diamond Stylus for Surface Roughness Measurement)

  • 한응교;노병옥;박두원;김종억
    • 한국정밀공학회지
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    • 제8권3호
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    • pp.105-113
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    • 1991
  • The practicability of Ion-Sputter machining renders it possible to make diamond stylus for surface roughness measurement with micro stylus tip radius less than 2${\mu}mR$, and to measure surface roughness of fine-machined surface. In this study, we researched the wear or Ion-Sputtered stylus with 0.1${\mu}mR$ and 0.5${\mu}mR$ for micro-figure measurement and polished stylus with 0.5${\mu}mR$ according to measurement distance. As a result, we know that the case of Ion-Sputtered stylus is worn down easilier the case of polished stylus. And we know that in the evaluation of stylus wear, it is more useful method that examine the wear by measuring the variation of stylus tip radius than by evaluating the variation of Ra values.

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