• 한국윤활학회:학술대회논문집
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• 한국윤활학회 1998년도 제28회 추계학술대회
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• pp.67-74
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• 1998

Two kinds of polished and unpolished freestanding films prepared by DC plasma CVD method were impacted by SiC particles to understand erosion mechanism. Erosion damage caused by solid impact was characterized by surface profilometer, scanning electron microscopy and Raman spectroscopy. Gradually decrease of surface roughness and sharp reduction of crystallinity for unpolished CVD films were observed with increasing erosion time. It was found that smaller grains of the diamond were removed in early stage of erosion process and larger grains were eroded with further impingement. By introduction of re-growth method on polished diamond, further understanding of erosion mechanism was achieved. Most of the surface fractures were initiated at the grain boundary.

• 한국결정성장학회지
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• 제14권1호
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• pp.27-32
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• 2004

RF-PECVD 방법을 이용하여 DLC(diamond-like carbon)박막을 메탄-수소 가스 혼합비 및 바이어스 전압에 따라 실리콘 웨이퍼 위에 증착하였다. DLC 박막의 결합구조적 특성 및 기계적 성질은 FT-IR, Raman, 그리고 nano-indenter를 이용하여 평가하였다. 혼합가스내 메탄의 유량과 바이어스 전압이 증가함에 따라 증착속도가 증가하였다. 박막내 탄소의 $sp^3/sp^2$ 결합비와 경도는 반응가스내 수소의 유량 및 바이어스 전압이 증가함에 따라 증가하였다.

• The Korean Journal of Ceramics
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• 제1권4호
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• pp.185-190
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• 1995

Tribological behavior of the diamond-like carbon (DLC) films sliding on floppy disk has been investigated. Hydrogenated DLC films have been prepared by plasma enhanced chemical vapor deposition (PECVD) using methane and hydrogen mixture in different volume ratios on ferrite substrates. DLC films show lower friction coefficients (0.2~0.4) than those of the uncoated ferrite(0.4~0.5). DLC films containing more hydrogen exhibit higher wear resistance. To investigate the roughness effect on wear, the substrates were polished with SiC papers prior to deposition. Too fine or too rough DLC surfaces result in poor wear resistance. Wear resistance of annealed DLC films at higher temperature slightly increases with respect to as-deposited film.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1998년도 춘계학술대회 논문집
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• pp.289-292
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• 1998

The methastable state diamond films have been deposited on Si substrates using MWPCVD. Effects of each experimental parameters of MWPCVD including CH$_4$ concentrations, Oxygen additions, Operating pressure, deposition time, etc. on the growth rate and crystallinity were investigated. The best crystallinity of the finn at 3% methane concentration addition of oxygen to the CH$_4$-$H_2O$ mixture gave an improved film crystallinity at 50% oxygen concentration. Upon increasing the operating pressure and time, the growth rate and crystallinity were increased simultaneously.

• 한국원자력학회:학술대회논문집
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• 한국원자력학회 1997년도 춘계학술발표회논문집(2)
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• pp.223-230
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• 1997

최근들어 그 활용도가 점점 증대되고 있는 DLU(Diamond-like Carbon) /Diamond 박막(thin film)의 합성기술을 개발하여 원자력분야에 응용하고자 시도하였다. 이를 위하여 13.56 MHz의 고주파(RF: radio-frequency)를 사용하는 플라즈마 화학증착(PECVD: Plasma Enhanced Chemical Vapor Deposition) 장치를 직접 제작하여 탄소함유(CH$_4$, $CO_2$...등) 기체로부터 기본적인 DLC 박막증착시험을 수행하였다. 실험은 진공증착기(vacuum chamber)내의 압력(pressure), 탄소함유 기체의 조성비, 그리고 바이어스전압(negative self-bias voltage)둥을 변화시키면서 수행하였다. 증착속도(deposition rate)는 증착층의 두께를 알파스템($\alpha$-step)으로 측정하여 결정하였으며, 이로부터 증착속도가 압력 및 바이어스 전압의 증가에 따라 증가함을 알 수 있었다. 또한 바이어스 전압 300V 이상에서 $CO_2$량 증가가 증착속도를 촉진시킨다는 사실도 확인하였다. 그리고 EPMA(electron probe micro-analyser) 및 Raman 스펙트럼분석을 통하여 증착층의 구조가 DLC 임을 확인하였다.

• Journal of Electrochemical Science and Technology
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• 제14권3호
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• pp.215-221
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• 2023

A rapid and environment-friendly electrochemical sensor to determine the chemical oxygen demand (COD) has been developed. The boron-doped diamond (BDD) thin-film electrode is employed as the anode, which fully oxidizes organic pollutants and provides a current response in proportion to the COD values of the sample solution. The BDD-based amperometric COD sensor is optimized in terms of the applied potential and the solution pH. At the optimized conditions, the COD sensor exhibits a linear range of 0 to 80 mg/L and the detection limit of 1.1 mg/L. Using a set of model organic compounds, the electrochemical COD sensor is compared with the conventional dichromate COD method. The result shows an excellent correlation between the two methods.

• 한국표면공학회지
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• 제46권4호
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• pp.139-144
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• 2013

c-BN(cubic boron nitride) is known to have extremely high hardness next to diamond, as well as very high thermal and chemical stability. The c-BN in the form of film is useful for wear resistant coatings where the application of diamond film is restricted. However, there is less practical application because of difficult control of processing variables for synthesis of c-BN film as well as unclear mechanism on formation of c-BN. Therefore, in the present study, the structural characterization of c-BN thin film were investigated using $B_4C$ target in r.f. magnetron sputtering system as a function of processing variables. c-BN films were coated on Si(100) substrate using $B_4C$ (99.5% purity). The mixture of nitrogen and argon was used for carrier gas. The deposition processing conditions were changed with substrate bias voltage, substrate temperature and base pressure. Fourier transform infrared microscopy (FT-IR) and X-ray photoelectron spectroscopy (XPS) were used to analyze crystal structures and chemical binding energy of the films. In the case of the BN film deposited at room temperature, c-BN was formed in the substrate bias voltage range of -400 V~ -600 V. Less c-BN fraction was observed as deposition temperature increased and more c-BN fraction was observed as base pressure increased.

• 한국진공학회지
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• 제13권4호
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• pp.175-181
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• 2004

미소인장시험을 통해 304 스테인리스 스틸 판재 위에 증착된 DLC 박막의 안정성을 평가하였다. 모재의 소성 변형과 함께 코팅 층의 손상이 발생하기 시작하는데, 작은 규모의 모재 변형 시에는 인장축의 수직방향으로 박막의 균열이 발생하지만, 모재의 슬립변형이 발생하기 시작하면 인장 축과 $45^{\circ}C$의 각도를 갖는 슬립 면을 따라 필름의 박리가 발생하였다. DLC박막의 박리면적으로부터 필름의 접착력을 평가할 수 있었으며, 필름의 합성 전에 실시하는 Ar 플라즈마 스퍼터링 세척시간이 길수록 그리고 세척시 기판에 인가되는 전압이 높을수록 필름의 접착력은 향상되었다. 이러한 변화는 스테인리스 스틸 모재와 Si 접합 층간의 계면특성이 향상되면, 필름의 전체 접착력을 증진시킬 수 있음을 보여주고 있다.

• 한국표면공학회지
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• 제46권4호
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• pp.145-152
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• 2013

The growth behavior of nanocrystalline diamond (NCD) film has been studied for three different substrates, i.e. bare Si wafer, 1 ${\mu}m$ thick W and Ti films deposited on Si wafer by DC sputter. The surface roughness values of the substrates measured by AFM were Si < W < Ti. After ultrasonic seeding treatment using nanometer sized diamond powder, surface roughness remained as Si < W < Ti. The contact angles of the substrates were Si ($56^{\circ}$) > W ($31^{\circ}$) > Ti ($0^{\circ}$). During deposition in the microwave plasma CVD system, NCD particles were formed and evolved to film. For the first 0.5h, the values of NCD particle density were measured as Si < W < Ti. Since the energy barrier for heterogeneous nucleation is proportional to the contact angle of the substrate, the initial nucleus or particle densities are believed to be Si < W < Ti. Meanwhile, the NCD growth rate up to 2 h was W > Si > Ti. In the case of W substrate, NCD particles were coalesced and evolved to the film in the short time of 0.5 h, which could be attributed to the fact that the diffusion of carbon species on W substrate was fast. The slower diffusion of carbon on Si substrate is believed to be the reason for slower film growth than on W substrate. The surface of Ti substrate was observed as a vertically aligned needle shape. The NCD particle formed on the top of a Ti needle should be coalesced with the particle on the nearby needle by carbon diffusion. In this case, the diffusion length is longer than that of Si or W substrate which shows a relatively flat surface. This results in a slow growth rate of NCD on Ti substrate. As deposition time is prolonged, NCD particles grow with carbon species attached from the plasma and coalesce with nearby particles, leaving many voids in NCD/Ti interface. The low adhesion of NCD films on Ti substrate is related to the void structure of NCD/Ti interface.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.177-179
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• 2011

The purpose of this study is to enhance an adhesion between substrate and Diamond-like Carbon (DLC) film. DLC has many outstanding properties such as low friction, high wear resistance and corrosion resistance. However, it is difficult to achieve enough adhesion because of weak bonding between DLC film and the substrate. For improvement adhesion, a layer between DLC film and the substrate was prepared by dual post plasma. DLC film was deposited on nitrided layer by linear ion source. The composed compound layer between substrate and DLC film was investigated by Glow Discharge Spectrometer (GDS) and Scanning Electron Microscope (SEM). The synthesized bonding structure of DLC film was analyzed using a micro raman spectrometer. Mechanical properties were measured by nano-indentation. In order to clarify the mechanism for improvement in adhesive strength, it was observed by scratch test.