• 제목/요약/키워드: Deposition time

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Binder-free Sn/Graphene Nanocomposites Prepared by Electrophoretic Deposition for Anode Materials in Lithium Ion Batteries

  • Bae, Eun Gyoung;Hwang, Yun-Hwa;Pyo, Myoungho
    • Bulletin of the Korean Chemical Society
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    • 제34권4호
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    • pp.1199-1204
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    • 2013
  • Nanocomposites consisting of Sn nanoparticles and graphene oxide (GO) were electrophoretically deposited onto Cu current collectors that was used for anodes in Li ion batteries (LIBs). In order to optimize the electrochemical performance of nanocomposites as an anode material by controlling the oxygen functionality, the GO was subjected to $O_3$ treatment prior to electrophoretic deposition (EPD). During thermal reduction of the GO in the nanocomposites, the Sn nanoparticles were reduced in size, along with the formation of SnO and/or $SnO_2$ at a small fraction, relying on the oxygen functionalities of the GO. The variation in the duration of time for the $O_3$ irradiation resulted in a small change in total oxygen content, but in a significantly different fraction of each functional group in the GO, which influenced the Sn nanoparticle size and the amount of SnO (and/or $SnO_2$). As a result, the EPD films prepared with the GO that possessed the least amount of carboxylic groups (made by treating GO in an $O_3$ environment for 3 h) showed the best performance, when compared with the nanocomposites composed of untreated GO or GO that was $O_3$-treated for a duration of less than 3 h.

재제조를 위한 레이저 직접 금속조형공정의 생산성 및 환경영향의 명가 (Evaluation of the Productivity and Environmental Effects of Laser Aided Direct Metal Deposition Process for Remanufacturing)

  • 장윤상
    • 청정기술
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    • 제13권3호
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    • pp.228-234
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    • 2007
  • 본 연구에서는 금형의 재활용을 촉진하기 위하여 성형공정을 소재의 제거공정과 부가공정으로 보고, 신속 성형 방법인 레이저 직접 금속조형(LADMD) 공정의 환경영향 및 생산성을 제거공정인 밀링가공과 비교하여 평가하였다. 두 가지 형상의 금형에 대하여 CAM 프로그램인 PowerMill을 이용하여 가공경로를 생성하고 가공시간을 예측하여 생산성을 알아본 결과 LADMD 공정의 생산성은 가공량이 유사한 경우에도 밀링공정에 비하여 월등히 우수한 결과를 보였다. 환경 친화적 가공방법으로 알려져 있는 LADMD 공정을 에너지의 사용에 초점을 맞추어 평가한 결과로는 레이저의 발생을 위하여 사용하는 전기에너지의 양이 전통적인 밀링가공법에 비하여 월등하게 많은 점이 앞으로 개선하여야 할 문제임을 알 수 있었다. 여러 가지 장점을 갖고 있는 LADMD 공정은 생산성 및 경제성이 우수하고 자원의 낭비를 줄일 수 있으며 친환경적인 가공법으로 재제조 분야에서 유용하게 사용될 수 있을 것이다.

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Pulsed Magnet ron Sputtering Deposit ion of DLC Films Part II : High-voltage Bias-assisted Deposition

  • Chun, Hui-Gon;Lee, Jing-Hyuk;You, Yong-Zoo;Ko, Yong-Duek;Cho, Tong-Yul;Nikolay S. Sochugov
    • 한국표면공학회지
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    • 제36권2호
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    • pp.148-154
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    • 2003
  • Short ($\tau$=40 $mutextrm{s}$) and high-voltage ($U_{sub}$=2~8 kV) negative substrate bias pulses were used to assist pulsed magnetron sputtering DLC films deposition. Space- and time-resolved probe measurements of the plasma characteristics have been performed. It was shown that in case of high-voltage substrate bias spatial non-uniformity of the magnetron discharge plasma density greatly affected DLC deposition process. By Raman spectroscopy it was found that maximum percentage of s $p^3$-bonded carbon atoms (40 ~ 50%) in the coating was attained at energy $E_{c}$ ~700 eV per deposited carbon atom. Despite rather low diamond-like phase content these coatings are characterized by good adhesion due to ion mixing promoted by high acceleration voltage. Short duration of the bias pulses is also important to prevent electric breakdowns of insulating DLC film during its growth.wth.

$CH_4/O_2$의 사이클릭 유량제어에 의한 다이아몬드 박막의 특성향상 (Cyclic on/off Modulation of $CH_4\;and/or\;O_2$ Flows for the Enhancement of the Diamond Film Characteristics)

  • 김태규;김성훈;윤수종
    • 한국표면공학회지
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    • 제39권2호
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    • pp.82-86
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    • 2006
  • Diamond films were deposited on 10.0$\times$10.0$mm^2$ pretreated (100) Si substrate using $CH_4$, $H_2$ and $O_2$ source gases in a horizontal-type microwave plasma enhanced chemical vapor deposition system. We introduced a cyclic on/off modulation of $CH_4$ and/or $O_2$ flows is a function of the reaction time during the initial deposition stage. Surface morphology and diamond quality of the films were investigated as a function of the different cyclic modulation process of the source gases flows: For the enhancement of the nucleation density, there is an optimal process for the incorporation of oxygen. Diamond qualities of the films were improved by introducing oxygen gas during the initial deposition stage.

미세 팁 기판 위에 전기영동법으로 성장시킨 탄소 나노튜브의 전계방출 특성 (Field emission properties of carbon nanotubes grown on micro-tip substrates using an electrophoretic deposition method)

  • 장한빛;노영록;김종필;박진석
    • 반도체디스플레이기술학회지
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    • 제9권4호
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    • pp.7-12
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    • 2010
  • Field-emission characteristics of carbon nanotubes(CNTs), which were grown on conical-type tungsten micro-tips by using an electrophoretic deposition(EPD) method, were examined. The EPD method proved to be convenient to manipulate and arrange CNTs from well dispersed suspensions onto such tip-type substrates. The growth rate of CNTs was proportional to the applied d.c. bias voltage and the process time. It was observed from the Raman study that the EPDproduced CNTs showed better crystal qualities with the Raman intensity ratio( $I_D$/$I_G$) of 0.41-0.42 than the CVD-produced CNTs and their crystal qualities could be further improved by thermal annealing. The electron emitters based on the EPDCNTs showed excellent field emission properties, such as the threshold voltage for electron emission of about 620 V and the maximum emission current of about 345 ${\mu}A$. In addition, the EPD-CNTs exhibited the stable long-term(up to 40 h) emission capability and the emission stability was enhanced by thermal annealing.

정전분무 장치를 이용한 C축 일방향 바륨페라이트(BaFe12O19) 박막형성 (Preparation of C-plane oriented BaFe12O19 film by electrospray deposition of colloidal precursor particles)

  • 이혜문;김용진
    • 한국입자에어로졸학회지
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    • 제6권1호
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    • pp.21-27
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    • 2010
  • New process consisting of electrospray and epitaxial crystal growth processes was applied to the preparation of c-plane oriented barium ferrite ($BaFe_{12}O_{19}$) thin film for high density magnetic recording media. Sodium citrate aided process was proper to preparation of amorphous $BaFe_{12}O_{19}$ nanoparticles with geometric mean diameter of 3 nm and geometric standard deviation of 1.1. The electrospray was applicable to the prepare of amorphous $BaFe_{12}O_{19}$ thin film on a substrate, and the film thickness could be controlled by adjusting the electrospray deposition time. The c-plane oriented $BaFe_{12}O_{19}$ thin film was successfully prepared by 3 step annealing process of the $BaFe_{12}O_{19}$ amorphous film on a sapphire($Al_2O_3$) substrate; annealing at $350^{\circ}C$ for 30 min, annealing at $500^{\circ}C$ for 30 min, and annealing at $700^{\circ}C$ for 60 min.

SmBCO 초전도 층착을 위한 RABiTS상의 CeO2 단일 버퍼 연구 (Study on CeO2 Single Buffer on RABiTS for SmBCO coated Conductor)

  • 김태형;김호섭;이남진;하홍수;고락길;하동우;송규정;오상수;박경채
    • 한국전기전자재료학회논문지
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    • 제20권6호
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    • pp.546-549
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    • 2007
  • As a rule, high temperature superconducting coated conductors have multi-layered buffers consisting of seed, diffusion barrier and cap layers. Multi-buffer layer deposition requires longer fabrication time. This is one of main reasons which increases fabrication cost. Thus, single buffer layer deposition seems to be important for practical coated conductor process. In this study, a single layered buffer deposition of $CeO_2$ for low cost coated conductors has been tried using thermal evaporation technique. 100 nm-thick $CeO_2$ layers deposited by thermal evaporation were found to act as a diffusion layer. $1\;{\mu}m-thick$ SmBCO superconducting layers were deposited by thermal co-evaporation on the $CeO_2$ buffered Ni-5%W substrate. Critical current of 90 A/cm was obtained for the SmBCO coated conductors.

순차 스퍼터 법과 증발 법으로 제작한 박막의 특성 (Characteristics of Thin Films Fabricated by Using the Layer-by-Layer Sputtering and Evaporation Method)

  • 천민우;박용필;김정호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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    • pp.571-574
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    • 2003
  • The thin films fabricated by using the layer-by-layer sputtering was compared with the thin film fabricated by using the evaporation method. Re-evaporation in the form of Bi atoms or $Bi_2O_3$ molecules easily bring out the deficiency of Bi atoms in thin film due to the long sputtering time of the layer-by-layer deposition. On the other hand, the respective atom numbers corresponding to BiSrCaCuO phase is concurrently supplied on the film surface in the evaporation deposition process and leads to BiSrCaCuO phase formation. Also, it is cofirmed that by optimizing the deposition condition, each single phase of the Bi2201 phase and the Bi2212 phase can be fabricated, the sticking coefficient of Bi element is clearly related to the changing of substrate temperature and the formation of the Bi2212 phase.

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Grid-Based Soil-Water Erosion and Deposition Modeling sing GIS and RS

  • Kim, Seong-Joon
    • 한국수자원학회:학술대회논문집
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    • 한국수자원학회 2001년도 학술발표회 논문집(I)
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    • pp.25-34
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    • 2001
  • A grid-based KIneMatic wave soil-water EROsion and deposition Model (KIMEROM) that predicts temporal variation and spatial distribution of sediment transport in a watershed was developed. This model uses ASCII-formatted map data supported from the regular gridded map of GRASS (U.S. Army CERL, 1993)-GIS (Geographic Information Systems), and generates the distributed results by ASCIIl-formatted map data. For hydrologic process, the kinematic wave equation and Darcy equation were used to simulate surface and subsurface flow, respectively (Kim, 1798; Kim et al., 1993). For soil erosion process, the physically-based soil erosion concept by Rose and Hairsine (1988) was used to simulate soil-water erosion and deposition. The model adopts sing1e overland flowpath algorithm and simulates surface and subsurface water depth, and sediment concentration at each grid element (or a given time increment. The model was tested to a 162.3 km$^2$ watershed located in the tideland reclaimed area of South Korea. After the hydrologic calibration for two storm events in 1999, the results of sediment transport were presented for the same storm events. The results of temporal variation and spatial distribution of overland flow and sediment areas are shown using GRASS.

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무전해 도금법으로 제조된 Ni-B 확산 방지막의 Cu 확산 거동 (Cu Diffusion Behavior of Ni-B Diffusion Barrier Fabricated by Electroless Deposition)

  • 최재웅;황길호;한원규;이완희;강성군
    • 한국재료학회지
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    • 제15권9호
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    • pp.577-584
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    • 2005
  • Thin Ni-B layer, $1{\mu}m$ thick, was electrolessly deposited on Cu electrode fabricated by electro-deposition. The purpose of the layer is to encapsulate Cu electrodes for preventing Cu oxidation and to serve as a diffusion barrier. The layers were annealed at $580^{\circ}C$ with and without pre-annealing at $300^{\circ}C$ for . 30minutes. In the layer with pre-annealing, the amount of Cu diffusion was lower about 5 times than the layer without pre-annealing. The difference in Cu concentration may be attributed to $Ni_3B$ formation prior to Cu diffusion. However, the difference in Cu concentration decreased during the annealing time of 5 h due to the grain growth of Ni.