• Bulletin of the Korean Chemical Society
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• v.31 no.1
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• pp.140-145
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• 2010

The simultaneous detection of Cd (II), Pb (II), Cu (II), and Hg (II) ions in aqueous medium using a BDD electrode with DPASV is described. XPS was used to characterize the chemical states of trace metal ions deposited on the BDD electrode surface. Experimental parameters that affect response, such as pH, deposition time, deposition potential, and pulse amplitude were carefully optimized. The detection limits for Cd (II), Pb (II), Cu (II), and Hg (II) ions were 3.5 ppb, 2.0 ppb, 0.1 ppb and 0.7 ppb, respectively. The application of the BDD electrode on the electrochemical pretreatment for the simultaneous metal detection in the dye waste water was also investigated.

• Journal of the Korean Electrochemical Society
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• v.7 no.1
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• pp.16-20
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• 2004

To electropolymerize Polypyrrole(ppy) film modified with fullerene $ions(full^-)$ the cell, Au/5 mM pyrrole, 1mM fullerene, 0.1M $TBABF_4,\;CH_2Cl_2/Pt$, was employed to Prepare the wafer-like type of $electrode/ppy(full^-)ppy(full^-){\ldots}$ electrodes. They were applied to deposit alkali metal ions with the cell of Au(quartz crystal analyzer; QCA)/ppy$(full^-)$, 0.01M metal ion(aq.)/Pt. The depositing rate constant of each ion for $Li^+,\;Na^+,\;K^+,\;Rb^+\;and\;Cs^+$, determined from the first order equation was $1.60\times10^{-8},\;3.13\times10^{-11},\;1.38\times10^{-9},\;2.71\times10^{-11}\;and\;2.98\times10^{-12}mo1.s^{-1}$ respectively. The calculated stoichiometry of the ions determined by quartz crystal microbalance(QCM) at the electrodes was $Li_7C_{60},\;Na_4C_{60},\;K_3C_{60},\;Rb_1C_{60}\;and\;Cs_1C_{60}$ respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.178-178
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• 2016

Every display is equipped with a cover glass to protect the underneath displaying devices from mechanical and environmental impact during its use. The strengthened glass such as Gorilla glass.$^{TM}$ has been exclusively adopted as a cover glass in many displays. Conventionally, the strengthened glass has been manufactured via ion-exchange process in wet salt bath at high temperature of around $500^{\circ}C$ for hours of treatment time. During ion-exchange process, Na ions with smaller diameter are substituted with larger-diameter K ions, resulting in high compressive stress in near-surface region and making the treated glass very resistant to scratch or impact during its use. In this study, PIIID (plasma immersion ion implantation and deposition) technique was used to implant metal ions into the glass surface for strengthening. In addition, due to the plasmonic effect of the implanted metal ions, the metal-ion implanted glass samples got colored. To implant metal ions, plasma immersion ion implantation technique combined with HiPIMS method was adopted. The HiPIMS pulse voltage of up to 1.4 kV was applied to the 3" magnetron sputtering targets (Cu, Ag, Au, Al). At the same time, the sample stage with glass samples was synchronously pulse-biased via -50 kV high voltage pulse modulator. The frequency and pulse width of 100 Hz and 15 usec, respectively, were used during metal ion implantation. In addition, nitrogen ions were implanted to study the strengthening effect of gas ion implantation. The mechanical and optical properties of implanted glass samples were investigated using micro-hardness tester and UV-Vis spectrometer. The implanted ion distribution and the chemical states along depth was studied with XPS (X-ray photo-electron spectroscopy). A cross-sectional TEM study was also conducted to investigate the nature of implanted metal ions. The ion-implanted glass samples showed increased hardness of ~1.5 times at short implantation times. However, with increasing the implantation time, the surface hardness was decreased due to the accumulation of implantation damage.

• Bulletin of the Korean Chemical Society
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• v.24 no.1
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• pp.49-54
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• 2003

TiO₂nanoparticles were synthesized using the metallorganic chemical vapor deposition process. Particles with and without metal ion dopants were obtained. X-ray photoelectron and energy dispersive X-ray spectroscopic measurements confirmed the stoichiometry of the TiO₂nanoparticles. X-ray diffraction patterns showed a polycrystalline anatase structure of TiO₂. Transmission electron microscopy revealed that these particles are of nanoscale dimensions. Exact particle size and size distribution analyses were carried out by dynamic light scattering. The average particle size was determined to be 22 nm. The nanosize particles provided large surface area for photocatalysis and a large number of free surface-charge carriers, which are crucial for the enhancement of photocatalytic activity. To improve the photocatalytic activity, metal ions, including transition metal ions $(Pd^{2+},\;Pt^{4+},\;Fe^{3+})$ and lanthanide ion $(Nd^{3+})$ were added to pure TiO₂nanoparticles. The effects of dopants on photocatalytic kinetics were investigated by the degradation of 2-chlorophenol under an ultraviolet light source. The results showed that the TiO₂nanoparticles with the metal ion dopants have higher photocatalytic activity than undoped TiO₂. The $Nd^{3+}$ ion of these dopant metal ions showed the highest catalytic activity. The difference in the photocatalytic activity with different dopants is related to the different ionic radii of the dopants.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.229-229
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• 2012

Adhesion of Copper film on the aluminum oxide layer formed by anodizing an aluminum plate was enhanced by applying ion beam mixing method. Forming an conductive metal layer on the insulating oxide surface without using adhesive epoxy bonds provide metal-PCB(Printed Circuit Board) better thermal conductivities, which are crucial for high power electric device working condition. IBM (Ion beam mixing) process consists of 3 steps; a preliminary deposition of an film, ion beam bombardment, and additional deposition of film with a proper thickness for the application. For the deposition of the films, e-beam evaporation method was used and 70 KeV N-ions were applied for the ion beam bombardment in this work. Adhesions of the interfaces measured by the adhesive tape test and the pull-off test showed an enhancement with the aid of IBM and the adhesion of the ion-beam-mixed films were commercially acceptable. The mixing feature of the atoms near the interface was studied by scanning electron microscopy, Auger electron spectroscopy, and X-ray photoelectron spectroscopy.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.319.1-319.1
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• 2013

Solid oxide fuel cells (SOFCs) have been recognized as one of emerging renewable energy sources, due to minimized pollutant production and high efficiency in operation. The performance of SOFCs is largely dependent on the electrode polarization which involves the oxidation/reduction in cathodes and anodes along with the charge transport of ions and electronic carriers. Atomic layer deposition is based on the alternate chemical surface reaction occurring at low temperatures with high uniformity and superior step coverage. Such features can be extended into the coating of metal oxide and/or metal layer onto the porous materials. In particular, the atomic layer deposition is can manipulated in controlling the charge transport in terms of triple phase boundaries, in order to control artificially the electrochemical polarization in electrodes of SOFC. The current work applied atomic layer deposition of metal oxides intro the electrodes of SOFCs. The corresponding effect was monitored in terms of the electrochemical characterization. The roles of atomic layer deposition in solid oxide fuel cells are discussed towards optimized towards long-term durability at intermediate temperature.

• Journal of Institute of Convergence Technology
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• v.3 no.2
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• pp.1-6
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• 2013

The ionic liquids are known to potential alternative solvents capable of replacing the commercial solvents in various processes including those in nuclear fuel cycle. As to the material, a number of studies have already reviewed the interesting results and addressed the spectroscopic as well as electrochemical behaviors of metal elements included in spent nuclear fuels. It has found that the important properties of metal ions in TBP dissolved ILs have led the development of alternative technologies to traditional solvent extraction processes. On the other hand, the electrochemical deposition of metal ions in ILs have been investigated for the application of the solvents to aqueous as well as to non-aqueous processes. In this work, a review on the application of ILs in nuclear fuel cycle is briefly presented to understand the notable researches on ILs focusing on aqueous processes.

• Transactions on Electrical and Electronic Materials
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• v.11 no.2
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• pp.54-60
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• 2010

Polymer-assisted deposition is a chemical solution route to high quality thin films. In this process, the polymer controls the viscosity and binds metal ions, resulting in a homogeneous distribution of metal precursors in the solution and the formation of crack-free and uniform films after thermal treatment. We review our recent effort to epitaxially grow metal-nitride thin films, such as hexagonal GaN, cubic TiN, AlN, NbN, and VN, mixed-nitride $Ti_{1-x}Al_xN$, ternary nitrides tetragonal $SrTiN_2$, $BaZrN_2$, and $BaHfN_2$, hexagonal $FeMoN_2$, and nanocomposite TiN-$BaZrN_2$.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.73-73
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• 1999

A large area negative metal ion beam source is developed. Kinetic ion beam of the incident metal ions yields a whole nucleation and growth phenomena compared to the conventional thin film deposition processes. At the initial deposition step one can engineer the surface and interface by tuning the energy of the incident metal ion beams. Smoothness and shallow implantation can be tailored according to the desired application process. Surface chemistry and nucleation process is also controlled by the energy of the direct metal ion beams. Each individual metal ion beams with specific energy undergoes super-thermodynamic reactions and nucleation. degree of formation of tetrahedral Sp3 carbon films and beta-carbon nitride directly depends on the energy of the ion beams. Grain size and formation of polycrystalline Si, at temperatures lower than 500deg. C is obtained and controlled by the energy of the incident Si-ion beams. The large area metal ion source combines the advantages of those magnetron sputter and SKIONs prior cesium activated metal ion source. The ion beam source produces uniform amorphous diamond films over 6 diameter. The films are now investigated for applications such as field emission display emitter materials, protective coatings for computer hard disk and head, and other protective optical coatings. The performance of the ion beam source and recent applications will be presented.

• Bulletin of the Korean Chemical Society
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• v.5 no.3
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• pp.108-112
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• 1984

Interactions between metal ions and chitosan in solution were studied by spectroscopic and viscometric measurements. $Cu^{++}$-chitosan complex exhibited an absorption band at 265 nm, whereas D-glucosamine complex showed one at 245 nm. The difference in ${\lambda}_{max}$ was attributed to the different amine to $Cu^{2+}$ ratios of the complexes, that is, 2 : 1 for chitosan and 1 : 1 for D-glucosamine. The molar absorptivities and binding constants of the complexes were evaluatatled. The binding of $Cu^{2+}$ to chitosan was cooperative near pH 5, and both intra- and intermolecular chelations depending on chitosan and $Cu^{2+}$concentrations were observed, The intermolecular chelation was stabilized by addition of salts. The cooperative intermolecular chelation of $Ni^{++}$ was also observed at pH 6.2. No significant binding of other divalent ions was observed. The reported high adsorption abilities of chitosan particles for these ions were attributed to the deposition of metal hydroxide aggregates in pores of chitosan particles rather than chelation to amine groups.