• Title/Summary/Keyword: Deposition Mechanism

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Electrical characteristics of Au/3C-SiC/Si/Al Schottky, diode (Au/3C-SiC/Al 쇼터키 다이오드의 전기적 특성)

  • Shim, Jae-Cheol;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.65-65
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    • 2009
  • High temperature silicon carbide Schottky diode was fabricated with Au deposited on poly 3C-SiC thin film grown on p-type Si(100) using atmospheric pressure chemical vapor deposition. The charge transport mechanism of the diode was studied in the temperature range of 300 K to 550 K. The forward and reverse bias currents of the diode increase strongly with temperature and diode shows a non-ideal behavior due to the series resistance and the interface states associated with 3C-SiC. The charge transport mechanism is a temperature activated process, in which, the electrons passes over of the low barriers and in turn, diode has a large ideality factor. The charge transport mechanism of the diode was analyzed by a Gaussian distribution of the Schottky barrier heights due to the Schottky barrier inhomogeneities at the metal-semiconductor interface and the mean barrier height and zero-bias standard deviation values for the diode was found to be 1.82 eV and $s_0$=0.233 V, respectively. The interface state density of the diode was determined using conductance-frequency and it was of order of $9.18{\times}10^{10}eV^{-1}cm^{-2}$.

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Development of a Safety Assessment System on Aging Management in Existing CANDU Steam Generators (가압중수로 증기발생기의 경년열화 관리를 위한 안전성 평가 시스템 개발)

  • Shin, So Eun;Lee, Jeong Hun;Park, Tong Kyu;Jung, Jong Yeob
    • Journal of the Korean Society of Systems Engineering
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    • v.10 no.1
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    • pp.49-56
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    • 2014
  • Since steam generator (SG) tubes are located in the boundary between the primary and secondary systems of nuclear power plant (NPP), the SG is one of the most important components in the aspects of the safety of NPP. The magnetite ($Fe_30_4$) deposition, so-called fouling, is generally known as a major aging mechanism of CANDU SGs, and this aging mechanism makes the heat transfer efficiency between the primary and secondary systems of NPP reduced. Therefore, the development of SG safety assessment system which can evaluate the effect of the SG aging degradation mechanism should be needed for safety of NPP. In this study, through the suggestion of the guideline for SG safety assessment, it is possible to strengthen the basic of establishing the effective SG aging management technique. The SG safety assessment is carried out by CATHENA(Canadian Algorithm for THErmalhydraulic Network Analysis). It is possible to determine the integrity of SGs by identifying the main safety parameters which can be changed by the aging degradation of CANDU SGs.

The Effect of Dispersoid on Yield Strength of Dispersion Strengthened Cu Alloys Fabricated by Spray Forming and Reactive Spray Forming (분무성형 및 반응분무성형법으로 제조된 분산강화 동합금의 항복강도에 미치는 분산상의 영향)

  • Lee Jongsang;Jung J. Y.;Lee Eon-Sik;Park W. J.;Ahn S.;Kim Nack J.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 1999.05a
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    • pp.38-46
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    • 1999
  • Dispersion strengthened Cu alloys have been manufactured by spray forming and also by reactive spray forming, followed by hot extrusion of the spray deposited billets. The size of dispersed particles in the reactive spray formed alloy was much finer than that in the spray formed alloy. That was because the dominant chemical reaction between Ti and B had occurred in Cu-Ti-B alloy melt in spray forming while it had occurred after deposition of droplets in reactive spray forming. The yield strength of the reactive spray formed alloy was greater than that of the spray formed alloy. To understand the mechanism responsible for this observed strengthening, the yield strength of two Cu alloys were analyzed using the dislocation pile-up model and Orowan mechanism, which were fairly consistent with the experimental results. Increase in yield strength of reactive spray formed alloy relative to spray formed alloy was largely attributed to nano-scale TiB dispersoids.

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AEM on Growth Mechanism of Synthesized Graphene on Ni Catalyst

  • Park, Min-Ho;Lee, Jae-Uk;Bae, Ji-Hwan;Song, Gwan-U;Kim, Tae-Hun;Yang, Cheol-Ung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.579-579
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    • 2012
  • Graphene has recently been a subject of much interest as a potential platform for future nanodevices such as flexible thin-film transistors, touch panels, and solar cells. And chemical vapor deposition (CVD) and related surface segregation techniques are a potentially scalable approach to synthesizing graphite films on a variety of metal substrates. The structural properties of such films have been studied by a number of methods, including Raman scattering, x-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and transmission electron microscopy (TEM). An understanding of the structural quality and thickness of the graphite films is of paramount importance both in improving growth procedures and understanding the resulting films' electronic properties. In this study, we synthesized the few-layered grapheneunder optimized condition to figure out the growth mechanism seen in CVD-grown graphenee by using various electron microscope. Especially, we observed directly film thickness, quality, nucleation site, and uniformity of grpahene by using AEM. The details will be discussed in my presentation.

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Growth Mechanism of Self-Catalytic Ga2O3 Nano-Burr Grown by RF Sputtering

  • Park, Sin-Yeong;Choe, Gwang-Hyeon;Gang, Hyeon-Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.462-462
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    • 2013
  • Gallium Oxide (Ga2O3) has been widely investigated for the optoelectronic applications due to its wide bandgap and the optical transparency. Recently, with the development of fabrication techniques in nanometer scale semiconductor materials, there have been an increasing number of extensive reports on the synthesis and characterization of Ga2O3 nano-structures such as nano-wires, nanobelts, and nano-dots. In contrast to typical vaporliquid-solid growth mode with metal catalysts to synthesis 1-dimensional nano-wires, there are several difficulties in fabricating the nanostructures by using sputtering techniques. This is attributed to the fact that relatively low growth temperatures and higher growth rate compared with chemical vapor deposition method. In this study, Ga2O3 chestnut burr were synthesized by using radio-frequency magnetron sputtering method. In contrast to typical sputtering method with sintered ceramic target, a Ga2O3 powder (99.99% purity) was used as a sputtering target. Several samples were prepared with varying the growth parameters, especially he growth time and the growth temperature to investigate the growth mechanism. Samples were characterized by using XRD, SEM, and PL measurements. In this presentation, the details of fabrication process and physical properties of Ga2O3 nano chestnut burr will be reported.

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Effect of double pinning mechanism in BSO-added GdBa2Cu3O7-x thin films

  • Oh, J.Y.;Jeon, H.K.;Lee, J.M.;Kang, W.N.;Kang, B.
    • Progress in Superconductivity and Cryogenics
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    • v.19 no.3
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    • pp.13-17
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    • 2017
  • We investigated the effect of self-assembled BSO nano-defects as pinning centers in BSO-added GdBCO films when the thicknesses of films were varied. 3.5 vol. % BSO-added GdBCO films with varying thicknesses from 200 nm to 1000 nm were deposited on $SrTiO_3$ (STO) substrate by using pulsed laser deposition (PLD) process. For the films with thicknesses of 400 nm and 600 nm, 'anomaly shoulders' in $J_c-H$ characteristic curves were observed near the matching field. The anomaly shoulders appeared in the field dependence of $J_c$ may be attributed to the existence of double pinning mechanisms in thin films. The fit to the pinning force density as a function of reduced field h ($H/H_{irr}$) using the Dew-Hughes' scaling law shows that both the 400 nm- and the 600 nm-thick films have double pinning mechanisms while the other films have a single pinning mechanism. These results indicate that the self-assembled property of BSO result in different role as pinning centers with different thickness.

Controlled Growth of Large-area Mono-, Bi-, and Few-layer Graphene by Chemical Vapor Deposition on Copper Substrate

  • Kim, Yooseok;Lee, Su-il;Jung, Dae Sung;Cha, Myoung-Jun;Kim, Ji Sun;Park, Seung-Ho;Park, Chong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.380.2-380.2
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    • 2014
  • Direct synthesis of graphene using a chemical vapor deposition (CVD) has been considered a facile way to produce large-area and uniform graphene film, which is an accessible method from an application standpoint. Hence, their fundamental understanding is highly required. Unfortunately, the CVD growth mechanism of graphene on Cu remains elusive and controversial. Here, we present the effect of graphene growth parameters on the number of graphene layers were systematically studied and growth mechanism on copper substrate was proposed. Parameters that could affect the thickness of graphene growth include the pressure in the system, gas flow rate, growth pressure, growth temperature, and cooling rate. We hypothesis that the partial pressure of both the carbon sources and hydrogen gas in the growth process, which is set by the total pressure and the mole fraction of the feedstock, could be the factor that controls the thickness of the graphene. The graphene on Cu was grown by the diffusion and precipitation mode not by the surface adsorption mode, because similar results were observed in graphene/Ni system. The carbon-diffused Cu layer was also observed after graphene growth under high CH4 pressure. Our findings may facilitate both the large-area synthesis of well-controlled graphene features and wide range of applications of graphene.

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Thermoelectric Properties of Bi2Te3 Films Grown by Modified MOCVD with Substrate Temperatures (개조된 MOCVD법으로 성장한 Bi2Te3 박막의 기판온도에 따른 열전 특성)

  • You, Hyun-Woo;Kwon, O-Jong;Kim, Kwang-Chon;Choi, Won-Chel;Park, Chan;Kim, Jin-Sang
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.4
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    • pp.340-344
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    • 2011
  • Thermoelectric bismuth telluride ($Bi_2Te_3$) films were deposited on $4^{\circ}$ off oriented (001) GaAs substrates using a modified metal organic chemical vapor deposition (MOCVD) system. The effects of substrate temperature on surface morphologies, crystallinity, electrical properties and thermoelctric properties were investigated. Two dimensional growth mode (2D) was observed at substrate temperature lower than $400^{\circ}C$. However, three dimensional growth mode (3D) was observed at substrate temperature higher than $400^{\circ}C$. Change of growth mechanism from 2D to 3D was confirmed with environmental scanning electron microscope (E-SEM) and X-ray diffraction analysis. Seebeck coefficients of all samples have negative values. This result indicates that $Bi_2Te_3$ films grown by modified MOCVD are n-type. The maximum value of Seebeck coefficient was -225 ${\mu}V/K$ and the power factor was $1.86{\times}10^{-3}\;W/mK^2$ at the substrate temperature of $400^{\circ}C$. $Bi_2Te_3$ films deposited using modified MOCVD can be used to fabricate high-performance thermoelectric devices.

The Effect of Thermal Stability of Cu(I) Precursors on the Deposition in the Metal Organic Chemical Vapor Deposition (MOVCD에 있어서 구리(l)전구체들의 열적 안정성이 증착에 미치는 영향)

  • Park, Man-Young;Lee, Shi-Woo
    • Korean Journal of Materials Research
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    • v.8 no.4
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    • pp.345-353
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    • 1998
  • Metal organic chemical vapor deposition (MOCVD) of copper using three Cu( I ) precursors. (hfac)Cu (VTMS) (hfac= hexafluoroacetylacetonate, VTMS= vinyltrimethylsilane), (hfac)Cu(VTMOS) (VTMOS= vinyltri¬methoxysilane) and (hfac)Cu(A TMS) (A TMS= allyltrimethylsilane) was studied. The thermal stability and the gase¬ous phase reaction mechanism of Cu( I ) precursors were identified using $^1H$-, $^I3C$-NMR and Fourier transform infra¬red spectroscopy. It was found out that thermal stability of liquid phase (hfac)Cu(VTMS) and (hfac)Cu(VTMOS) were better than that of (hfac)Cu(A TMS) using FT - NMR. From in-situ FT - IR experiments, the disproportion reaction of Cu(hfac). the decomposition reaction of Cu(hfac), and cracking of free hfac ligand were observed. Also the effect of gaseous phase reaction on the deposition rates and film properties was investigated. The minimum temperature that deposition of copper films from (hfac)Cu(A TMS) was as low as 60$^{\circ}$C and such a low deposition temperature compared with those of other Cu( I ) precursors is believed to be related with weaken Cu- A TMS bond.

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Study on manufacturing mechanism of functional carbon membrane (기능성 카본막의 제조 Mechanism에 관한 연구)

  • Bae, Sang-Dae
    • The Journal of the Convergence on Culture Technology
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    • v.4 no.2
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    • pp.211-216
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    • 2018
  • Separation technology combining adsorption and membrane is expected to be applied in many fields such as water treatment. In this fusion technique, a functional carbon membrane having a carbon whisker grown on the surface of the membrane was developed to inhibit membrane fouling, which is a problem in the membrane separation process. In this study, to elucidate the mechanism of manufacturing the functional carbon membrane, the membrane was pretreated with the polymer latex of each mixing ratio and the membrane was formed by the CVD (Chemical Vapor Deposition) method. The membrane was analyzed by scanning electron microscope (SEM), CHN analyzer (Elemental Analyzer), and X-ray diffraction (XRD). As a result, the diameter and density of carbon whiskers were higher in case of polyvinyl di-chloride (PVdC): polyvinyl chloride (PVC) = 4.5: 55. It seems possible to control the diameter and density of the carbon whiskers according to the hydrogen content of the polymer latex.