• 한국표면공학회:학술대회논문집
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• 한국표면공학회 1999년도 추계학술발표회 초록집
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• pp.60-61
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• 1999

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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• pp.1611-1614
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• 2007

This paper is concerned on design of organic flow deposition system and development of the deposition process for pentacene thin film by OFD and on electrical characteristics of pentacene films deposited by it. OFD will overcome vacuum thermal evaporator's limits and it will provide a large-scale mass, uniform and good electrical performance.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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• pp.668-672
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• 2005

Doosan DND, OLED manufacturing equipment maker, has developed the largest deposition system to produce $730{\times}920mm$ size AMOLED devices for the first time in the world. It is necessary for producing 40" AMOLED panels to develop the large-scaled vacuum technologies including ICP plasma, stretching glass chuck, organic deposition, metal deposition and hybrid encapsulation processes.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2006년도 춘계학술대회
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• pp.135-138
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• 2006

OLEDs are attractive because of possible application in display with low operating voltage, low power consumption, self-emission and capability of multicolor emission by the selection of emissive material. We investigated the effects of deposition rate on the electrical characteristics, physical characteristics and optical characteristics of OLEDs in the ITO(indium-tin-oxide)/N,N'-diphenyl-N,N'-bis(3-methyphenyl)-1,1'-biphenyl-4,4'-diamine(TPD)/tris(8-hydroxyquinoline)aluminum($Alq_3$)/Al device. We measured current density, luminous flux and luminance characteristics of devices with varying deposition rates of TPD and $Alq_3$. It has been found that optimal deposition rate of TPD and $Alq_3$ were respectively $1.5{\AA}/s$ from the device structure. An AFM measurement results, surface roughness of the deposited film was the lowest when deposition rate was $1.5{\AA}/s$.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2003년도 춘계학술대회 발표 논문집
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• pp.106-111
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• 2003

Tantalum nitride(TaN) films were deposited by atomic layer deposition(ALD) and plasma assisted atomic layer deposition(PAALD). The deposition of the TaN thin film has been performed using pentakis (ethylmethlyamino) tantalum (PEMAT) and ammonia($NH_3$) as precursors at temperature of $250^{\circ}C$, where the temperature was proven to be ALD window for TaN deposition from our previous experiments. The PAALD deposited TaN film shows better physical properties than thermal ALD deposited TaN film, due to its higher density$(~11.59 g/\textrm{cm}^3$) and lower carbon(~ 3 atomic %) and oxygen(~ 4 atomic %) concentration of impurities.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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• pp.548-550
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• 2002

본 장치는 다층막 스퍼터링 증착장치로써 박막을 증착시키는데 용이하게 설계하는 것이 목적이며, 박막두께가 균일하게 증착되고 진공조 내부의 압력을 일정하게 제어가 가능하고 배기시스템은 스퍼터실과 증착실의 진공배기를 공용으로 구조를 설계하여 장치의 스퍼터링 증착조건에 적합하도록 연구실험용으로 설계되어졌다.

• 한국산학기술학회논문지
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• 제21권5호
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• pp.28-38
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• 2020

반도체 증착장비는 일반적인 대량생산 제품과는 차별화되는 특징을 보이는 복합제품시스템(CoPS)의 주요 예시 중 하나로, 사용자 요구에 대한 충실한 이해가 필수적이다. 이에 본 연구에서는 Kano 모델을 활용하여 증착장비의 품질속성에 대한 사용자와 생산자의 만족 특성을 비교분석하고자 하였다. 사용자 및 생산자 기업의 엔지니어와 관리자들을 대상으로 Kano 설문을 수행하고 분석한 결과, 사용자 측과 생산자 측의 품질 만족 특성이 다르게 나타났다. 총 22개의 소분류 품질속성 가운데, 제조사 측은 22개 모두에 대해 매력적(A) 품질속성으로 평가한 반면, 사용자 측에서는 A 6개, 무관심(I) 10개, 당연적(M) 2개, 기타 경계치값 2개 등으로 평가하여 큰 차이를 보였다. 특히 제조사 측에서는 생산성능, 신뢰성, 편의성, 가격 및 원가 모두에 대해 매력적(A) 품질속성으로 평가한 반면, 사용자 측에서는 신뢰성에 대해서만 매력적 또는 당연적(M)으로 평가하고 나머지는 무관심(I)으로 평가하는 경우가 많았다. 이러한 결과는 이 분야 사용자와 생산자 간 품질속성에 대한 인식이 다르게 나타나고 있으며, 이에 대한 개선 및 전략적 활용의 필요성이 있음을 시사한다. 또한 상기의 결과는 CoPS는 규모의 경제와 비용절감보다는 제품 자체의 성능이 중요함을 시사한다. 따라서 증착장비 제조사들은 복합제품시스템의 특징을 반영한 혁신전략을 마련할 필요가 있다.

• 한국산업융합학회 논문집
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• 제25권4_2호
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• pp.699-706
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• 2022

In this study, Directed energy deposition (DED) among additive manufacturing is applied to repair damaged spindle key parts of planner miller. The material of the spindle key is SCM415, and the P21 Powder is used. In order to find the optimal deposition conditions for DED equipment, a single-line deposition experiment is conducted to analysis five parameters. The laser power affects the width, and the height is a parameter affected by coaxial gas and powder gas. In addition, laser power, powder feed rate, coaxial gas, and powder gas are parameters that affect dilution. Otimal deposition is that 400 W of laser power, 4.0 g/min of powder feed rate, 6.5 L/min of coaxial gas, 3.0 L/min of powder gas and 4.5 L/min of shield gas. By setting the optimum conditions, a uniform deposition cross section in the form of an ellipse can be obtained. Damage recovery process of spindle key consists of 3D shape design of the base and deposition parts, deposition path creation and deposition process, and post-processing. The hardness of deposited area with P21 powder on the SCM415 spindle key is 336 HV for the surface of the deposition, 260 HV for the boundary area, and 165 HV for the base material.

• 반도체디스플레이기술학회지
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• 제18권4호
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• pp.92-95
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• 2019

Automation control and the data for control of industrial equipment for the diagnosis and prediction is a key to success in the 4th industrial revolution. It increases process efficiency and productivity through data collection, realtime monitoring, and the data analysis. However, university and research environment are still suffering from logging the data in manual way, and we occasionally loss the equipment data logging due to the lack of automatic data logging system. State variable presents the current condition of the equipment operation which is closely related to process result, and it is valuable to monitor and analyze the data for the equipment health monitoring. In this paper, we demonstrate the collection of equipment state variable data via programmable logic controller (PLC) and the visualization of the collected data over the Web access supervisory control and data acquisition (SCADA). Test vehicle for the implementation of the suggested SCADA system is a relay switched physical vapor deposition system in the university environment.

• 반도체디스플레이기술학회지
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• 제7권2호
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• pp.63-67
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• 2008

The MgO protective layer plays an important role in plasma display panels (PDPs). Our previous work demonstrated that the properties of MgO thin film could be improved, which were deposited by ion beam assisted deposition (IBAD). However arc discharge always occurs during the IBAD process. To avoid this problem, oxygen neutral beam assisted deposition (NBAD) is used to deposit MgO thin films in this paper. The energy of the oxygen neutral beam was used as the parameter to control the deposition. The experimental results showed that the oxygen neutral beam energy was effective in determining in F/$F^+$ centers, crystal orientation, surface morphology of the MgO thin film, and the discharge characteristics of AC PDP. The lowest firing voltage $(V_f)$ and the highest secondary electron emission coefficient $(\gamma)$ were obtained when the neutral beam energy was 300 eV.