• 한국해양공학회지
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• 제16권4호
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• pp.7-12
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• 2002

This study is aimed to find the scouring mechanism at the toe of rubble mound structures. To investigate the characteristics of scouring in front of the structure, experiments were performed with regular waves in a 2-D flume. The results of this study are as follows. 1) It can be said the characteristics of incident wave causes rolling and sliding of armour block. The difference of wave pressure on the slope, internal flow as well as settlement of armour block due to the weight cause scouring. 2) It is observed that scouring depth at the toe increased when wave height or period increased. The location of ultimate scouring and deposition depth moved seaward when wave period increased. 3) The failure of rubble mound structure was caused by waves or scouring. Failure by erosion increased with high waves and long waves. 4) Using surf-similarity parameter including characteristics of incident waves and structure, scouring and deposition pattern were found and their limit was formulated.

• 한국표면공학회지
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• 제20권3호
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• pp.106-117
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• 1987

The microhardness and the structural characteristics of the chemically vapor deposited TiN film on the 430 stainless steel substrate have been investigated with various deposition parameters such as the deposition time, the total flow rate, the flow rate ratio $(H_2/N_2)$, and the deposition temperature. The most important factor to affect the microhardness of the TiN film in this study was the denseness of the structure in connection with the degree of the lattice strain. The relationship between the lattice parameter changes and the grain size variation under all deposition conditions generally followed the grain boundary relaxation model. The (111) preferred orientation prevailed in the early stage of the deposition conditions, however, the (200) preferred orientation was developed in the later stage. The surface morphology at optimum conditions displayed a dense diamond shaped structure and the microhardness of the films was high (1700-2400Hv) regardless of the type of the substrates used.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1993년도 추계학술대회 논문집
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• pp.120-123
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• 1993

This paper describes the deposition and characteristics of electrochromic tungsten oxide thin films for electrochromic smart windows. Tungsten Oxide thin films(WO$_3$) are deposited by thermal evaporation techniques. By varying deposition parameters, WO$_3$ thin films exhibit different optical properties. The electrochromic devices are consist of ITO glass/ WO$_3$ thin films/ LiClO$_4$-propylene carbonate electrolyte/ counter electrode. The electrochromic properties of tungsten oxide thin films with different deposition condition ale investigated.

• 한국환경과학회지
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• 제4권2호
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• pp.151-158
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• 1995

A numerical model has been developed to predict the deposition of air pollutants considering canopy effect. In this model, the deposition velocity is calculated using the deposition resistances(aerodynamic resistance, viscosity resistance, surface resistance). Using the results, a comparative study was made between the model calculation and observation results. The calculated daily variation of deposition resistances and in daytime most of the model cases are well agreed with observation results, and a slight difference was found in nighttime. From the results, it is suggested that the present model is capable of estimating the deposition velocity of air Pollutants considering characteristics of canopy layer.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
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• pp.86-86
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• 2003

Copper has attracted much attention in the deep submicron ULSI metallization process as a replacement for aluminum due to its lower resistivity and higher electromigration resistance. Electroless copper deposition method is appealing because it yields conformal, high quality copper at relatively low cost and a low processing temperature. In this work, it was investigated that effect of the microstructure of the substrate on the electroless deposition. The mechanism of the nucleation and growth of the palladium nuclei during palladium activation was proposed. Electroless copper deposition on TiN barriers using glyoxylic acid as a reducing agent was also investigated to replace toxic formaldehyde. Furthermore, electroless copper deposition on TaN$\sub$x/ barriers was examined at various nitrogen flow rate during TaN$\sub$x/ deposition. Finally, it was investigated that the effect of plasma treatment of as-deposited TaN$\sub$x/ harriers on the electroless copper deposition.

• 한국대기환경학회지
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• 제21권6호
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• pp.657-666
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• 2005

The objectives of this study were to investigate atmospheric dry deposition of inorganic nitrogen-containing compounds to waterbody. Target waterbody is Juam reservoir functioning as one of the major water supply sources in Chollanamdo. Nitrate and ammonium dry deposition fluxes were directly measured using dry deposition plate (DDP) covered with greased strips and a water surface sampler (WSS). The daytime average $NO_{3}^{-}\;and\;NH_{4}^{+}$ fluxes measured with DDP and WSS were $1.7\∼2.6$ times higher than those at nighttime. The seasonal average flux of $NH_{4}^{+}$ showed the highest value in summer. The daytime and nighttime average dry deposition fluxes of particulate phase Nitogen-containing Compounds ($1.13,\;0.80\;mg/m^{2}$ day) were much higher than those of gas phase compounds ($0.50,\;0.24\;mg/m^{2}$ day).

• 한국대기환경학회지
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• 제15권5호
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• pp.625-638
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• 1999

Air quality modeling for coastal urban region has been composed of a complex system including meteorological, chemical and physical processes and emission characteristics in complex terrain. In this study, we studied about an effect prediction for deposition phenomenon affecting on air quality in Pusan metopolitan metropolitan city. In air quality modeling including ship sources, a situation considered deposition process habe better result than not considered when compared with observed value. Air pollutants emitted into urban air during the daytime nearly removed through urban atmosphere polluted. Also these phenomena correlated concentration variation connent with sea/land breezes and terrain effect. Therefore we conclude that the concentration was low at daytime when deposition flux is high, and deposition effect on industrial complex and Dongrae region is considerable in particular.

• 한국세라믹학회지
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• 제28권1호
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• pp.1-10
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• 1991

Zirconium dioxide(ZrO2) thin films have been deposited by chemical vapor deposition technique involving the application of gas mixture of ZrCl4, and H2O into silicon wafers. The relationships between the deposition rate and various reaction parameters such as the deposition time, the gas flow rate, the deposition temperature, and the composition of reactant gases were studied. The film was identified as nearly stoichiometric monoclinic ZrO2. The apparent activation energy is about 19Kcal/mole at surface chemical reaction controlled region. The deposition rate is mainly influenced by the H2O-forming reacting between CO2 and H2.

• 전자공학회논문지A
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• 제30A권12호
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• pp.69-76
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• 1993

The statistical methodology using RSM (response surface method) was used too ptimize the deposition conditions of selective CVD tungsten process for improving the deposition rate and the adhesion property. Temperature, flow rate of SiH$_4$ and WF$_6$ and H$_2$ and Ar carrier gases were chosen for the deposition variables and process characteristics due to carrier gas were intensively investigated. It was observed that temperature was the main factor influencingthe deposition rate in the case of H$_2$ carrier gas while the reactant ratio, $SiH_{4}/WF_{6}$, had the principal effect on the deposition rate in the case of Ar carrier gas. The increased deposition rate and the good adhesion to Si were obtained under Ar carrier gas compared to H$_2$ carrier gas. The optimum conditions for deposition rate and antipeeling property were found to be the temperature range of 300~32$0^{\circ}C$ and the reactant ratio, $SiH_{4}/WF_{6}$, of 0.5~0.6.

• 한국전기전자재료학회논문지
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• 제15권6호
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• pp.518-523
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• 2002

The influences of ion beam energy and reactive oxygen partial pressure on the physical and crystallographic characteristics of transition metal oxide compound(CrOx) film were studied in this paper. Chromium oxide films were deposited onto a cover-glass using ion Beam Sputter Deposition(IBSD) technique according to the various processing parameters. Crystallinity and grain size of as-deposited films were analyzed using XRD analysis. Thickness and Resistivity of the films were measured by $\alpha$-step and 4-point probe measurement. According to the XRD, XPS and resistivity results, the deposited films were the cermet type films which had crystal structure including amorphous oxide(a-oxide) phase and metal Cr phase simultaneously. The increment of the ion beam energy during the deposition process led to decreasing of metal Cr grain size and the rapid change of resistivity above the critical $O_2$ partial pressure.