• The Transactions of The Korean Institute of Electrical Engineers
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• v.57 no.10
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• pp.1807-1811
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• 2008

In this paper, the meniscus formation/deformation processes and conduction characteristics of the needle-centered ceramic nozzle electrode as an effective electrohydrodynamic (EHD) flow driving mechanisms for de-ionized water and silicone oil have been investigated. Results showed that the applied high voltage affected significantly on the processes, such as the drop formation mode, the deformation mode, the dripping mode, the jet mode, and the atomization mode. There was the EHD atomization mode for the de-ionized water while it was not occurred for the silicone oil, which, however, might be due to the lower electric conductivity and dielectric property of the oil than that of the water.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.52 no.12
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• pp.579-585
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• 2003

Recently the utilization of the ozone dissolved de-ionized water(DI-O3 water) in semiconductor wet cleaning process to replace the conventional RCA methods has been studied. In this paper, we propose the water-electrode type ozone generator which has the ozone gas characteristics of the high concentration and high purity to produce the high concentration DI-O3 water for the silicon wafer surface cleaning process. The ozone generator has the dual dielectric tube structure of silent discharge type and the water is both used to electrode and cooling water. We investigate the performance of the proposed ozone generator which has the design goal of the concentration of 7[wt%] and ozone generation quantity of 6[g/hr] at flow rate of 1[$\ell$/min). The experiment results show that the water electrode type ozone generator has the characteristics of 8.48[wt%] of concentration, 8.08[g/hr] of generation quantity and 76.2[g/kWh] of yield and it's possible to use the proposed ozone generator for the DI-O3 water cleaning process of silicon wafer surface.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.11a
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• pp.378-379
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• 2006

CMP(chemical mechanical polishing) process has been attracted as an essential technology of multi-level interconnection. However, the COO(cost of ownership) is very high, because of high consumable cost. Especially, among the consumables, slurry dominates more than 40 %. So, we focused how to reduce the consumption of raw slurry. In this paper, $ZrO_2$, $CeO_2$, and $MnO_2$ abrasives were added de-ionized water (DIW) and pH control as a function of KOH contents. We have investigate the possibility of new abrasive for the oxide CMP application.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.05a
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• pp.463-464
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• 2012

• Proceedings of the KIPE Conference
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• 1999.07a
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• pp.230-233
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• 1999

The design and implementation of thyristor water cooling control systems in considered in this pape Coolant water is pumped through the thyristor heat sinks where heat is transferred from the thyristo to the water. This water is then pumped through outdoor air-to-water heat exchangers where heat I transferred to the outside air. Since the water must be pure, it is filtered and de-ionized. Also the water temperature must be below dew-point temperature. Redundant pumps, outdoor heat exchangers, power supply system, controller monitoring system are provided for system reliability and availability.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.19 no.9
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• pp.518-525
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• 2018

In the 21st century, human beings are becoming increasingly concerned about greenhouse gas emissions as the environment changes due to climate change become serious. The temperature of Korea has risen by approximately $1.5^{\circ}C$ from 1904 to 2000, and the climate is changing gradually to a subtropical climate. As a result, the frequency of floods and droughts increases, so that the water available to humans is decreasing every year, and the cost of using city water is rising every year. The reuse of wastewater that is normally abandoned is inevitable. This study examined the monthly data for 6 months of operation by installing a reuse system of concentrated wastewater (Re R/O System) that is generated during the process of manufacturing de-ionized water (DI-Water System) used in semiconductor processing. As a result of the survey, the city water supply saved approximately $2,767m^3$ per month. The average annual greenhouse gas emissions was $1,329.07kg-CO_2$ per month due to the electricity consumption of the water reuse system. On the other hand, because of the reduction in city water supply, the average monthly average of $918.64kg-CO_2$ was reduced, and the greenhouse gas emissions were increased to $410.43kg-CO_2$ per month. If it improves some processes in the water reuse system, the amount of greenhouse gas emissions can be reduced by an average of $254.41kg-CO_2$ per month.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.9
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• pp.707-713
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• 2001

As the integrated circuit device shrinks to smaller dimensions, chemical mechanical polishing (CMP) process was requirdfo the global planarization of inter-metal dielectric (IMD) layer with free-defect. However, as the IMD layer gest thinner, micro-scratches are becoming as major defects. However, as the IMD layer gets thinner, micro-scratches are becoming as major defects. Micro-scratches are generated by agglomerated slurry, solidified and attached slurry in pipe line of slurry supply system. To prevent agglomerated slurry particle from inflow, we installed 0.5${\mu}{\textrm}{m}$ point of use (POU) filter, which is depth-type filter and has 80% filtering efficiency for the 1.0${\mu}{\textrm}{m}$ size particle. In this paper, we studied the relationship between defect generation and polished wafer counts to understand the exact efficiency fo the slurry filteration, and to find out the appropriate pad usage. Our experimental results showed that it sis impossible to prevent defect-causing particles perfectly through the depth-type filter. Thus, we suggest that it is necessary to optimize the slurry flow rate, and to install the high spray bar of de-ionized water (DIW) with high pressure, to overcome the weak-point of depth type filter.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.9
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• pp.703-703
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• 2001

• The Journal of Advanced Prosthodontics
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• v.12 no.3
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• pp.114-123
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• 2020

PURPOSE. The aim of this study was to evaluate the corrosion resistance of the specimens produced by five different commercial metal laser sintering (MLS) systems with their recommended Co-Cr alloy powders. MATERIALS AND METHODS. The MLS machines and the alloy powders used were, ProX 100-ST2724G (St-Pro), Mysint 100-EOS SP2 (SP2-Mys), EOSINT 270-EOS SP2 (SP2-EOS), SLM 100-Starbond CoS (SB-SLM), and MLab Cusing-Remanium^® Star (RS-MLab), respectively. Eight specimens from each group were prepared. Open circuit potential (E_ocp) and electrochemical impedance spectroscopy (EIS) measurements of polished surfaces of the specimens were conducted in a three-electrode cell using a potentiostat-galvanostat in Fusayama-Meyer artificial saliva (AS). Specimens from each group were immersed in AS and de-ionized water for seven days. E_ocp, charge transfer resistance (R_ct) values, and released ions (㎍/㎠ × 7d) in different solutions were determined. The specimen surfaces were observed with SEM/EDS. Results were analyzed statistically. RESULTS. E_ocp values have shifted to potentials that are more positive over time. Steady-state E_ocp values were from high to low as follows, SB-SLM, SP2-Mys, SP2-EOS, RS-MLab, and ST-Pro, respectively. After 60 mins, RS-MLab specimens had the highest R_ct value, followed by SP2-Mys, SB-SLM, SP2-EOS, and ST-Pro. In all groups, ion release was higher in AS than that in de-ionized water. CONCLUSION. There were small differences among the corrosion resistances of the Co-Cr alloy specimens produced with MLS systems; meanwhile, the corrosion resistances were quite high for all specimens.

• Journal of Powder Materials
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• v.20 no.3
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• pp.197-202
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• 2013

A novel route to prepare Nd-Fe-B magnetic particles by utilizing both spray drying and reduction/diffusion processes was investigated in this study. Precursors were prepared by spray drying method using the aqueous solutions containing Nd salt, Fe salt and boric acid with stoichiometric ratios. Precursor particles could be obtained with various sizes from 2 to $10{\mu}m$ by controlling concentrations of the solutions and the average size of $2{\mu}m$ of precursors were selected for further steps. After heat treatment of precursors in air, Nd and Fe oxides were formed through desalting procedure, followed by reduction processes in Hydrogen ($H_2$) atmosphere and with Calcium (Ca) granules in Argon (Ar) successively. Moreover, diffusion between Nd and Fe occurred during Ca reduction and $Nd_2Fe_{14}B$ particles were formed. With Ca amount added to particles after $H_2$ reduction, intrinsic coercivity was changed from 1 to 10 kOe. In order to remove and leach CaO and residual Ca, de-ionized water and dilute acid were used. Acidic solutions were more effective to eliminate impurities, but Fe and Nd were dissolved out from the particles. Finally, $Nd_2Fe_{14}B$ magnetic particles were synthesized after washing in de-ionized water with a mean size of $2{\mu}m$ and their maximum energy product showed 9.23 MGOe.