• Title/Summary/Keyword: DC leakage current

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Electrical Stability of Zn-Pr-Co-Cr-Dy Oxides-based Varistor Ceramics (Zn-Pr-Co-Cr-Dy 산화물계 바리스터 세라믹스의 전기적 안정성)

  • 남춘우;박종아;김명준;류정선
    • Journal of the Korean Ceramic Society
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    • v.40 no.11
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    • pp.1067-1072
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    • 2003
  • The electrical stability of the varistor ceramics composed of Zn-Pr-Co-Cr-Dy oxides-based varistors was investigated at 0.0∼2.0 mol% Dy$_2$O$_3$ content under DC accelerated aging stress. The ceramic density was increased up to 0.5 mol% Dy$_2$O$_3$ whereas further addition of Dy$_2$O$_3$ decreased sintered ceramic density. The density sailently affected the stability due to the variation of conduction path. The nonlinearity of varistor ceramics was greatly improved above 45 in the nonlinear exponent and below nearly 1.0 ${\mu}$A by incorporating Dy$_2$O$_3$. Under 0.95 V$\_$1mA/150$^{\circ}C$/24 h stress state, the varistor ceramics doped with 0.5 mol% Dy$_2$O$_3$ exhibited the highest electrical stability, in which the variation rates of varistor voltage, nonlinear exponent, and leakage current were -0.9%, -14.4%, and +483.3%, respectively. The variation rates of relative permittivity and dissipation factor were +7.1% and +315.4%, respectively. The varistors with further addition of Dy$_2$O$_3$ exhibited very unstable state resulting in the thermal runaway due to low density.

The Reliability Evaluation about the Triode-Type CNT Emission Source (삼극형 CNT 전자원에 대한 신뢰성 평가)

  • Kang, J.T.;Kim, D.J.;Jeong, J.W.;Kim, D.I.;Kim, J.S.;Lee, H.R.;Song, Y.H.
    • Journal of the Korean Vacuum Society
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    • v.18 no.2
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    • pp.79-84
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    • 2009
  • The electron emission source of triode type has been fabricated using CNT paste. The nano Ag particle and photosensitive polymers were added to the CNT paste. The surface roughness of the CNT emitter was uniform by the back exposure method. The added nano Ag particle improves the adhesion and the electric conductance with small variation in the CNTs and between electrode. After the aging with heat-exhausting, the reliability of the triode CNT electron source was secured in the high voltage and current operation for 12 hours. At this time, the gate leakage current was about 10 % less than.

Effects of Seawater & Freshwater Soaking on the Cure Properties of Accelerated Thermally Aged CSPE (가속열화 된 CSPE의 경화특성에 미치는 해수 담수 침지의 영향)

  • Shin, Yong-Deok;Lee, Jeong-U
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.65 no.5
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    • pp.819-824
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    • 2016
  • The accelerated thermal aging of CSPE (chlorosulfonated polyethylene) was carried out for 33.64 and 67.27 days at 110[$^{\circ}C$], equivalent to 40 and 80 years of aging at 50[$^{\circ}C$], respectively. These samples were referred to as CSPE-0y, CSPE-40y and CSPE-80y, respectively. As the accelerated thermally aged years of the CSPE increase, the insulation resistance[$\Omega$] at 20[Hz], 500[Hz], and 2[KHz], and the percent elongation [%EL] of the CSPE decrease. However, the dissipation factor($tan{\delta}$) at 20[Hz], 500[Hz], and 2[KHz], the apparent density[$g/cm^3$], the glass transition temperature and the melting temperature of the CSPE were increased. The period of time that the voltage has to be applied until electric breakdown of the CSPE-0y is longer than that of the CSPE-40y, and the CSPE-80y, but the dielectric strength of the CSPE-80y is lower than that of the CSPE-0y and the CSPE-40y. The differential temperatures after the AC and DC voltages are applied to CSPE-0y, CSPE-40y and CSPE-80y are 0.026~0.028[$^{\circ}C$], 0.030~0.042[$^{\circ}C$], 0.018~0.045[$^{\circ}C$], respectively. The variations of temperature for the AC voltage are higher than those for the DC voltage when an AC voltage is applied to CSPE-0y, CSPE-40y and CSPE-80y. It is found that the dielectric loss owing to the dissipation factor[$tan{\delta}$] is related to the electric dipole conduction current. It is ascertained that the ionic (electron or hole) leakage current is increased by the separation of the branch chain of CSPE polymer from the main chain of the polyethylene as a result of thermal stress due to accelerated thermal aging as well as by conducting ions such as $Na^+$, $Cl^-$, $Mg^{2+}$, $SO_4^{2-}$, $Ca^{2+}$ and $K^+$ after seawater soaking.

Dielectric Properties of Continuous Composition Spreaded $BaTiO_3-SrTiO_3$ Thin Films Prepared by Off-Axis RF Magnetron Sputtering System

  • Kim, Yoon-Hoe;Jung, Keun;Yoon, Seok-Jin;Park, Kyung-Bong;Choi, Ji-Won
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.326-326
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    • 2010
  • The dielectric properties of continuous composition spreaded (CCS) $BaTiO_3-SrTiO_3$ (BST) thin filmsgrown at room temperature and annealed at different temperature ($350^{\circ}C$ and $550^{\circ}C$) were investigated. Moreover, electrical properties (leakage current and breakdown voltage) of CCS BST thin films were also investigated. The aluminum top-electrode, sized by $200{\times}200\;{\mu}m2$ and apart from each other by $300\;{\mu}m$, were deposited on the CCS BST thin films by the DC sputtering system. The dielectric properties of the CCS BST thin films were significantly influenced depending on the distance from $BaTiO_3$ and $SrTiO_3$ targets which was attributed to the $BaTiO_3-SrTiO_3$ composition ratio. The maps of dielectric constants and loss tangents were plotted via $1500\;{\mu}m$ - step measuring. The specific points showing the dielectric constant (k: ~300) and loss tangent (tand: ~0.008) at 1 MHz were found.

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Fabrications and Properties of Al/$VF_2$/$n^+$-Si(100) Structures by Dip Coating Methode (Dip Coating 법에 의한 Al/$VF_2$-TrFE/Si(100) 구조의 제작 특성)

  • Kim, Ka-Lam;Jeong, Sang-Hyun;Yun, Hyeong-Seon;Lee, Woo-Seok;Kwak, No-Won;Kim, Kwang-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.20-21
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    • 2008
  • Ferroelectric vinylidene fluoride-trifluoroethylene ($VF_2$-TrFE) copolymer films were directly deposited on degenerated Si ($n^+$, 0.002 $\Omega{\cdot}cm$) using by dip coating method. A 1 ~ 3 wt% diluted solution of purified vinylidene fluoride-trifluoroethylene ($VF_2$:TrFE=70:30) in a dimethylformamide (DMF) solvent were prepared and deposited on silicon wafers using dip coating method for 10 seconds. After Post-Annealing in a vacuum ambient at 100~200 $^{\circ}C$ for 60 min, upper aluminum electrodes were deposited by thermal evaporation through the shadow mask to complete the MFS structure. The ferroelectric $\beta$-phase peak of films, depending on the annealing temperature, started to show up around $125^{\circ}C$, and the intensity of the peak increased with increasing annealing temperature. Above $175^{\circ}C$, the peak started to decrease. The C-V characteristics were measured using a Precision LCR meter (HP 4284A) with frequency of 1MHz and a signal amplitude of 20 mV. The leakage-current versus electric-field characteristics was measured by mean of a pA meter/DC voltage source (HP 4140B).

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Improved Breakdown Voltage Characteristics of $In_{0.5}Ga_{0.5}P/In_{0.22}Ga_{0.78}As/GaAs$ p-HEMT with an Oxidized GaAs Gate

  • I-H. Kang;Lee, J-W.;S-J. Kang;S-J. Jo;S-K. In;H-J. Song;Kim, J-H.;J-I. Song
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.3 no.2
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    • pp.63-68
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    • 2003
  • The DC and RF characteristics of $In_{0.5}Ga_{0.5}P/In_{0.22}Ga_{0.78}As/GaAs$ p-HEMTs with a gate oxide layer of various thicknesses ($50{\;}{\AA},{\;}300{\;}{\AA}$) were investigated and compared with those of a Schottky-gate p-HEMT without the gate oxide layer. A prominent improvement in the breakdown voltage characteristics were observed for a p-HEMT having a gate oxide layer, which was implemented by using a liquid phase oxidation technique. The on-state breakdown voltage of the p-HEMT having the oxide layer of $50{\;}{\AA}$was ~2.3 times greater than that of a Schottky-gate p-HEMT. However, the p-HEMT having the gate oxide layer of $300{\;}{\AA}$ suffered from a poor gate-control capability due to the drain induced barrier lowering (DIBL) resulting from the thick gate oxide inspite of the lower gate leakage current and the higher on-state breakdown voltage. The results for a primitive p-HEMT having the gate oxide layer without any optimization of the structure and the process indicate the potential of p-HEMT having the gate oxide layer for high-power applications.

The Properties of Pb(Zr,Ti)$\textrm{O}_3$ Thin Films Fabricated by 2-Step Method (2단계 증착법으로 제조된 Pb(Zr,Ti)$\textrm{O}_3$ 박막의 특성)

  • Nam, Hyo-Jin;No, Gwang-Su;Lee, Won-Jong
    • Korean Journal of Materials Research
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    • v.8 no.12
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    • pp.1152-1157
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    • 1998
  • The PZT films were deposited on the Pt/Ti/$SiO_2$/Si substrates using multi- target DC magnetron reactive sputtering. The perovskite single phase with the composition close to the stoichiometric one, was obtained even at high substrate temperature of $540^{\circ}C$ by 2-step method, which is that PZT film was deposited for a short time at low substrate temperature ($480^{\circ}C$) to promote the nucleation of perovskite phase by reducing the volatility of Pb oxide molecules, followed by the deposition at the elevated temperature to suppress the excess incorporation of Pb component in the PZT film. This two-step method, in combination with the RTA treatment, gives rise to good electrical properties of the deposited PZT films: remanent polarifaion,$18\mu$C/$\textrm{cm}^2$; coercive field, 45kV/cm; leakage current of 10$^{-4}$ A/$\textrm{cm}^2$ at high electric field of -500kV/cm.

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Minimization of a CW CO2 Laser Output Ripple by using High Frequency Resonance Phenomena (고주파 공진현상을 이용한 CW CO2 레이저의 출력리플 최소화)

  • Sikander, Sakura;Kwon, Min-Jae;Kim, Hee-Je;Lee, Dong-Gil;Xu, Guo-Cheng
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.62 no.6
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    • pp.798-802
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    • 2013
  • In a conventional DC power supply used for CO2 laser, the circuit elements such as a rectifier bridge, a current-limiting resistor, a high voltage switch, energy storage capacitors ans a high-voltage isolation transformer using high turn ratio are necessary. Consequently, those supplies are expensive and require a large space. Thus, laser resonator and power supply should be optimally designed. In this paper, we propose a new power supply using high frequency resonance phenomena for CW(Continuous wave) CO2 laser (maximum output of 23W with discharge length of 450mm). It consists of a transformer including leakage inductance, magnetizing inductance and half-bridge converter, a three-stage Cockcroft-Walton and PFC(Power factor correction) circuit. The output ripple voltage can be controlled the minimum of 0.24% under the high frequency switching of 231kHz. Furthermore, the output efficiency was improved to 16.4% and the laser output stability of about 5.6% was obtained in this laser system.

Construction and Tests of the Vacuum Pumping System for KSTAR Current Feeder System (KSTAR 전류전송계통 진공배기계 구축 및 시운전)

  • Woo, I.S.;Song, N.H.;Lee, Y.J.;Kwag, S.W.;Bang, E.N.;Lee, K.S.;Kim, J.S.;Jang, Y.B.;Park, H.T.;Hong, Jae-Sik;Park, Y.M.;Kim, Y.S.;Choi, C.H.
    • Journal of the Korean Vacuum Society
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    • v.16 no.6
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    • pp.483-488
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    • 2007
  • Current feeder system (CFS) for Korea superconducting tokamak advanced research(KSTAR) project plays a role to interconnect magnet power supply (MPS) and superconducting (SC) magnets through the normal bus-bar at the room temperature(300 K) environment and the SC bus-line at the low temperature (4.5 K) environment. It is divided by two systems, i.e., toroidal field system which operates at 35 kA DC currents and poloidal field system wherein 20$\sim$26 kA pulsed currents are applied during 350 s transient time. Aside from the vacuum system of main cryostat, an independent vacuum system was constructed for the CFS in which a roughing system is consisted by a rotary and a mechanical booster pump and a high vacuum system is developed by four cryo-pumps with one dry pump as a backing pump. A self interlock and its control system, and a supervisory interlock and its control system are also established for the operational reliability as well. The entire CFS was completely tested including the reliability of local/supervisory control/interlock, helium gas leakage, vacuum pressure, and so on.

Preparation of $SrTiO_3$ Thin Film by RF Magnetron Sputtering and Its Dielectric Properties (RF 마그네트론 스퍼터링법에 의한 $SrTiO_3$박막제조와 유전특성)

  • Kim, Byeong-Gu;Son, Bong-Gyun;Choe, Seung-Cheol
    • Korean Journal of Materials Research
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    • v.5 no.6
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    • pp.754-762
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    • 1995
  • Strontium titanate(SrTiO$_3$) thin film was prepared on Si substrates by RF magnetron sputtering for a high capacitance density required for the next generation of LSTs. The optimum deposition conditions for SrTiO$_3$thin film were investigated by controlling the deposition parameters. The crystallinity of films and the interface reactions between SrTO$_3$film and Si substrate were characterized by XRD and AES respectively. High quality films were obtained by using the mixed gas of Ar and $O_2$for sputtering. The films were deposited at various bias voltages to obtain the optimum conditions for a high quality file. The best crystallinity was obtained at film thickness of 300nm with the sputtering gas of Ar+20% $O_2$and the bias voltage of 100V. The barrier layer of Pt(100nm)/Ti(50nm) was very effective in avoiding the formation of SiO$_2$layer at the interface between SrTiO$_3$film and Si substrate. The capacitor with Au/SrTiO$_3$/Pt/Ti/SiO$_2$/Si structure was prepared to measure the electric and the dielectric properties. The highest capacitance and the lowest leakage current density were obtained by annealing at $600^{\circ}C$ for 2hrs. The typical specific capacitance was 6.4fF/$\textrm{cm}^2$, the relative dielectric constant was 217, and the leakage current density was about 2.0$\times$10$^{-8}$ A/$\textrm{cm}^2$ at the SrTiO$_3$film with the thickness of 300nm.

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