• Title/Summary/Keyword: DC Magnetron Sputtering

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Morphology and Electro-Optical Property of Mo Back Electrode for CuInGaSe2 Solar Cells (CuInGaSe2 태양전지용 Mo 후면 전극의 조직 및 전기광학적 특성)

  • Chae, Su-Byung;Kim, Myung-Han
    • Korean Journal of Materials Research
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    • v.20 no.8
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    • pp.412-417
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    • 2010
  • Mo thin films were used for the back electrode because of the low resistivity in the Mo/$CuInGaSe_2$ contact in chalcopyrite solar cells. $1\;{\mu}m$ thick Mo thin films were deposited on soda lime glass by varying the Ar pressure with the dc-magnetron sputtering process. The effects of the Ar pressure on the morphology of the Mo back electrode were studied and the relationships between the morphology and electro-optical properties, namely, the resistivity as well as the reflectance of the Mo thin films, were investigated. The resitivity increased from $24\;{\mu}{\Omega}{\cdot}cm$ to $11833\;{\mu}{\Omega}{\cdot}cm$; this was caused by the increased surface defect and low crystallinity as the Ar pressure increased from $3{\times}10^{-3}$ to $3{\times}10^{-2}\;Torr$. The surface morphologies of the Mo thin films changed from somewhat coarse fibrous structures to irregular and fine celled structures with increased surface cracks along the cell boundaries, as the Ar pressure increased from $3{\times}10^{-3}$ to $3{\times}10^{-2}\;Torr$. The changes of reflectances in the visible light range with Ar pressures were mainly attributed to the surface morphological changes of the Mo thin films. The reflectance in the visible light range showed the highest value of 45% at $3{\times}10^{-3}\;Torr$ and decreased to 18.5% at $3{\times}10^{-2}\;Torr$.

Characteristics of Thin-Film Inductors Using EeZrBAg Magnetic Thin Films (FeZrBAg 자성막을 이용한 박막 인덕터의 임피던스 특성)

  • 송재성;민복기;허정섭;김현식
    • Journal of the Korean Magnetics Society
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    • v.10 no.5
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    • pp.250-255
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    • 2000
  • Double rectangular spiral thin-film inductors were fabricated using $Fe_{86.7}Zr_{3.3}B_{4}Ag_{6}$ thin film with high permeability and resistance, in which easy axis of magnetization of the thin-film was perpendicular or parallel to the current direction. The perpendicular geometry inductor revealed higher inductance than the parallel geometry one, because spin aligns of magnetic film were more easily along the field direction due to higher field intensity in the perpendicular geometry. The increase of the inductance, however, resulted in the decrease of resonance frequency. The permeability was monitored by annealing the thin-films at different temperatures. With increasing the permeability, the inductance increased, but total resistance also increased due to the increase in magnetic core loss. As the resonance frequency was higher in air-core inductor than in magnetic thin-film core inductor, it is suggested to increase the resonance frequency that the characteristic of air-core inductor rather than the magnetic properties of the thin-film should be enhanced..

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Synthesis of IZTO(Indium Zinc Tin Oxide) particle by spray pyrolysis and post-heat treatment and characterization of deposited IZTO film

  • Lim, Seong Taek;Kim, Sang Hern
    • Journal of the Korean Applied Science and Technology
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    • v.33 no.4
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    • pp.734-740
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    • 2016
  • The micron-sized indium zinc tin oxide (IZTO) particles were prepared by spray pyrolysis from aqueous precursor solution for indium, zinc, and tin and organic additives such as citric acid (CA) and ethylene glycol (EG) were added to aqueous precursor solution for indium, zinc, and tin. The obtained IZTO particles prepared by spray pyrolysis from the aqueous solution without organic additives had spherical and filled morphologies, whereas the IZTO particles obtained with organic additives had more hollow and porous morphologies. The micron-sized IZTO particles with organic additives were changed fully to nano-sized IZTO particles, whereas the micron-sized IZTO particles without organic additives were not changed fully to nano-sized IZTO particle after post-treatment at $700^{\circ}C$ for 2 hours and wet-ball milling for 24 hours. Surface resistances of micron-sized IZTO's before post-heat treatment and wet-ball milling were much higher than those of nano-sized IZTO's after post-heat treatment and wet-ball milling. From IZTO with composition of 80 wt. % $In_2O_3$, 10 wt. % ZnO, and 10 wt. % $SnO_2$ which showed a smallest surface resistance IZTO after post-heat treatment and wet-ball milling, thin films were deposited on glass substrates by pulsed DC magnetron sputtering, and the electrical and optical properties were investigated.

Influence of Post-deposition Annealing Temperature on the Properties of GZO/Al Thin Film (진공열처리 온도에 따른 GZO/Al 적층박막의 구조적, 전기적, 광학적 특성 변화)

  • Kim, Sun-Kyung;Kim, Seung-Hong;Kim, So-Young;Jeon, Jae-Hyun;Gong, Tae-Kyung;Yoon, DaeYoung;Choi, DongYong;Choi, Dong-Hyuk;Son, Dong-Il;Kim, Daeil
    • Journal of the Korean institute of surface engineering
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    • v.47 no.2
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    • pp.81-85
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    • 2014
  • Ga doped ZnO (GZO)/Al bi-layered films were deposited on the glass substrate by RF and DC magnetron sputtering and then vacuum annealed at different temperatures of 100, 200 and $300^{\circ}C$ for 30 minutes to consider the effects of annealing temperature on the structural, electrical and optical properties of the films. For all depositions, the thicknesses of the GZO and Al films were kept constant at 95 and 5 nm, respectively, by controlling the deposition time. As-deposited GZO/Al bi-layered films showed a relatively low optical transmittance of 62%, while the films annealed at $300^{\circ}C$ showed a higher transmittance of 81%, compared to the other films. In addition, the electrical resistivity of the films was influenced by annealing temperature and the lowest resistivity of $9.8{\times}10^{-4}{\Omega}cm$ was observed in the films annealed at $300^{\circ}C$. Due to the increased carrier mobility, 2.35 $cm^2V^{-1}S^{-1}$ of the films. From the experimental results, it can be concluded that increasing the annealing temperature enhanced the optical and electrical properties of the GZO/Al films.

Development of Mixed Conducting Ceramic Membrane for High Purity Hydrogen and Carbon Production from Methane Direct Cracking (복합전도성 세라믹 분리막의 탄화수소 직접분해에 의한 고순도 수소와 탄소 제조)

  • Kim, Ji-Ho;Choi, Duck-Kyun;Kim, Jin-Ho;Cho, Woo-Seok;Hwang, Kwang-Taek
    • Transactions of the Korean hydrogen and new energy society
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    • v.22 no.5
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    • pp.649-655
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    • 2011
  • Methane direct cracking can be utilized to produce $CO_x$ and $NO_x$-free hydrogen for PEM fuel cells, oil refineries, ammonia and methanol production. We present the results of a systematic study of methane direct cracking using a mixed conducting oxide, Y-doped $BaZrO_3$ ($BaZr_{0.85}Y_{0.15}O_3$), membrane. In this paper, dense $BaZr_{0.85}Y_{0.15}O_3$ membrane with disk shape was successfully sintered at $1400^{\circ}C$ with a relative density of more 93% via addition of 1 wt% ZnO. The ($BaZr_{0.85}Y_{0.15}O_3$) membrane is covered with Pd as catalyst for methane decomposition with an DC magnetron sputtering method. Reaction temperature was $800^{\circ}C$ and high purity methane as reactant was employed to membrane side with 1.5 bar pressure. The $H_2$ produced by the reaction was transported through mixed conducting oxide membrane to the outer side. In addition, it was observed that the carbon, by-product, after methane direct cracking was deposited on the Pd/ZnO-$BaZr_{0.85}Y_{0.15}O_3$ membrane. The produced carbon has a shape of sphere and nanosheet, and a particle size of 80 to 100 nm.

A Study on the Optical Characteristics of Multi-Layer Touch Panel Structure on Sapphire Glass (Sapphire Glass 기반 다층박막 터치패널구조의 광학특성 연구)

  • Kwak, Young Hoon;Moon, Seong Cheol;Lee, Ji Seon;Lee, Seong Eui
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.29 no.3
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    • pp.168-174
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    • 2016
  • A conductive oxide-based sapphire glass indium tin oxide/metal electrode and the optical coating, through patterning process was studied in excellent optical properties and integrated touch panel has a high strength. Indium tin oxide conductive oxides of the sapphire glass to 0.3 A at DC magnetron sputtering method of 10 min, gas flow Ar 10 Sccm Ar, $O_2$ 1.0 Sccm the formation conditions of the thin film after annealing at $550^{\circ}C$ for 30min was achieved through a 86% transmittance. In addition, the coating 130 nm hollow silica sol-gel was to improve the optical transmittance of the indium tin oxide to 91%. For the measurement by the modeling hollow silica sol by Macleod simulation and calculated the average values of silica part to the presence or absence in analogy to actual. Refractive index value and the actual value of the material on the simulation the transmittance difference is it does not completely match the air region similar to the actual value (transmission) could be confirmed that the measurement is set to a value of between 5 nm and 10 nm.

Exchange Bias Perpendicular Magnetic Anisotropy and Thermal Stability of (Pd/Co)N/FeMn Multilayer ((Pd/Co)N/FeMn 다층막에서의 교환바이어스 수직자기이방성과 열적안정성)

  • Joo, Ho-Wan;An, Jin-Hee;Kim, Bo-Keun;Kim, Sun-Wook;Lee, Kee-Am;Lee, Sang-Suk;Hwang, Do-Geun
    • Journal of the Korean Magnetics Society
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    • v.14 no.4
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    • pp.127-130
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    • 2004
  • Magnetic properties and thermal stability by exchange biased perpendicular magnetic anisotropy in (Pd/Co)$_{N}$FeMn multilayer deposited by do magnetron sputtering system are investigated. We measured the perpendicular magnetization curves of (Pd(0.8nm)/Co(0.8nm)$_{5}$FeMn multilayer as function of FeMn thickness and annealing temperature. As FeMn thickness increases from 0 to 21nm, the perpendicular exchange bias(Hex) obtained 127 Oe at FeMn thickness 15nm. As the annealing temperature increases to 24$0^{\circ}C$, the E$_{ex}$ increased from 115 Oe to 190 Oe and disappeared exchange biased perpendicular magnetic anisotropy effect at 33$0^{\circ}C$.

Electrical and Optical Properties of Transparent Conducting Films having GZO/Metal/GZO Hybrid-structure; Effects of Metal Layer(Ag, Cu, Al, Zn) (GZO/Metal/GZO 하이브리드 구조 투명 전도막의 전기적, 광학적 특성; Ag, Cu, Al, Zn 금속 삽입층의 효과)

  • Kim, Hyeon-Beom;Kim, Dong-Ho;Lee, Gun-Hwan;Kim, Kang-Ho
    • Journal of the Korean institute of surface engineering
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    • v.43 no.3
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    • pp.148-153
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    • 2010
  • Transparent conducting films having a hybrid structure of GZO/Metal/GZO were prepared on glass substrates by sequential deposition using DC magnetron sputtering. Silver, copper, aluminum and zinc thin films were used as the intermediate metal layers in the hybrid structure. The electrical and optical properties of hybrid transparent conducting films were investigated with varying the thickness of metal layer or GZO layers. With increasing the metal thickness, hybrid films showed a noticeable improvement of the electrical conductivity, which is mainly dependent on the electrical property of the metal layer. GZO(40 nm)/Ag(10 nm)/GZO(40 nm) film exhibits a resistivity of $5.2{\times}10^{-5}{\Omega}{\cdot}cm$ with an optical transmittance of 82.8%. For the films with Zn interlayer, only marginal reduction in the resistivity was observed. Furthermore, unlike other metals, hybrid films with Zn interlayer showed a decrease in the resistivity with increasing the GZO thickness. The optimal thickness of GZO layer for anti-reflection effect at a given thickness of metal (10 nm) was found to be critically dependent on the refractive index of the metal. In addition, x-ray diffraction analysis showed that the insertion of Ag layer resulted in the improvement of crystallinity of GZO films, which is beneficial for the electrical and optical properties of hybrid-type transparent conducting films.

Interfacial Reactions of Co/Ti Multilayer System (Co/Ti 다층 박막 구조 시스템에서의 계면 반응에 관한 연구)

  • Lee, Sang-Hoon;Park, Se-Jun;Ko, Dae-Hong
    • Applied Microscopy
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    • v.29 no.2
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    • pp.255-263
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    • 1999
  • We have investigated the interfacial reactions in Co/Ti multilayer thin films prepared by DC Magnetron sputtering system. We observed that the amorphous Co-Ti phase formed by SSAR (Solid State Amorphization Reaction) upon annealing at $200^{\circ}C$. Upon annealing treatments at $300^{\circ}C\;and\;400^{\circ}C$, a crystalline phase of CoTi formed at the Co/Ti interface. The sheet resistance of Co/Ti multilayer thin film increased by the formation of the amorphous phase at the Co/Ti interface, which decreased by the formation of new crystalline compound CoTi.

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Effect of Plasma Treatment on TiO2/TiO2-x Resistance Random Access Memory (플라즈마 표면처리가 TiO2/TiO2-x 저항 변화형 메모리에 미치는 영향)

  • Kim, Han-Sang;Kim, Sung-Jin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.33 no.6
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    • pp.454-459
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    • 2020
  • In this study, a TiO2/TiO2-x-based resistance variable memory was fabricated using a DC/RF magnetron sputtering system and ALD. In order to analyze the effect of oxygen plasma treatment on the performance of resistance random access memory (ReRAM), the TiO2/TiO2-x-based ReRAM was evaluated by applying RF power to the TiO2-x oxygen-holding layer at 30, 60, 90, 120, and 150 W, respectively. The ReRAM was fabricated, and the electrical and surface area performances were compared and analyzed. In the case of ReRAM without oxygen plasma treatment, the I-V curve had a hysteresis curve shape, but the width was very small, with a relatively high surface roughness of the oxygen-retaining layer. However, in the case of oxygen plasma treatment, the HRS/LRS ratio for the I-V curve improved as the applied RF power increased; stable improvement was also noted in the surface roughness of the oxygen-retaining layer. It was confirmed that the low voltage drive was not smooth due to charge trapping in the oxygen diffusion barrier layer owing to the high intensity ReRAM applied with an RF power of approximately 150 W.