• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.11a
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• pp.408-411
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• 2003

Al doped Zinc Oxide(ZnO:Al) films, which is widely used as a transparent conductor in optoelectronic devices such as solar cell, liquid crystal display, plasma display panel, thermal heater, and other sensors, were prepared by using the capacitively coupled DC magnetron sputtering method. The influence of the substrate temperature, working gas pressure, discharge power and doping amounts of Al on the electrical, optical and morphological properties were investigated experimentally. The effect of bias voltage on the electrical properties of ZnO thin film were also studied. Films with lowest resistivity of $5.4{\times}10^{-4}\;{\Omega}-cm$ have been achieved in case of films deposited at 1mtorr, $400^{\circ}C$ with a substrate bias of +10V for 840nm in film thickness.

• Korean Journal of Optics and Photonics
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• v.3 no.3
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• pp.178-182
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• 1992

An air-cooled discharge-heated copper-vapor laser system with its inter-electrode distance of 45 cm has been developed by utilizing an alumina ceramic plasma tube of 1.6 cm in diameter and 50 cm in lengih. For operating the laser, a dc high voltage power supply with output rating of 6 kV and 500 mA, a resonant charging circuitry consisting partly of an 1.8 H inductor assembly and a 5 nF storage capacitor, and a thyratron driver operating up to 7 kHz have also been developed. The present laser system starts lasing at the tube temperature of about $1350^{\circ}C$ and an maximum average output power of 0.7 W has been obtained at 12 kV, 4.5 kHz. 50 mbar of Ne buffer gas pressure, and at the tube temperature of $1460^{\circ}C$.

• Journal of the Korean Electrochemical Society
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• v.3 no.1
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• pp.44-48
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• 2000

Amorphous $V_2O_5$ cathode thin films were prepared by DC-magnetron sputtering at room temperature and the thin film rechargeable lithium batteries were fabricated with the configuration of $V_2O_5/LIPON/Li$ using sequential ex-situ thin film deposition techniques. The electrochemical characteristics of $V_2O_5$ cathode materials Prepared at 80/20 of $Ar/O_2$ ratio showed high capacity and cycling behaviors by half cell test. LIPON solid electrolytes films were prepared by RF-magnetron sputtering using the self-made $Li_3PO_4$ target in pure $N_2$ atmosphere, and it was very stable for lithium contact in the range of 1.2-4.0 V vs. Li. Metallic lithium were deposited on LIPON electrolyte by thermal evaporation methode in dry room. Vanadium oxide based full cell system showed the initial discharge capacity of $150{\mu}A/cm^2{\mu}m$ in the range of $1.2\~3.5V$.

• Korean Journal of Materials Research
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• v.11 no.8
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• pp.671-678
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• 2001

All solid-state thin film micro supercapacitor, which consists of $RuO_2$/LiPON/$RuO_2$ multi layer structure, was fabricated on Pt/Ti/Si substrate using a $RuO_2$ electrode. Bottom $RuO_2$ electrode was grown by dc reactive sputtering system with increasing $O_2/[Ar+O_2]$ ratio at room temperature, and a LiPON electrolyte film was subsequently deposited on the bottom $RuO_2$ electrode at pure nitrogen ambient by rf reactive sputtering system. Room temperature charge-discharge measurements based on a symmetric $RuO_2$/LiPON/$RuO_2$ structure clearly demonstrates the cyclibility dependence on the microstructure of the $RuO_2$ electrode. Using both glancing angle x-ray diffraction (GXRD) and transmission electron microscopy (TEM) analysis, it was found that the microstructure of the $RuO_2$ electrode was dependent on the oxygen flow ratio. In addition, x- ray photoelectron spectroscopy(XPS) examination shows that the Ru-O binding energy is affected by increasing oxygen flow ratio. Furthermore, TEM and AES depth profile analysis after cycling demonstrates that the interface layer formed by interfacial reaction between LiPON and $RuO_2$ act as a main factor in the degradation of the cyclibility of the thin film micro-supercapacitor.

• Journal of Advanced Marine Engineering and Technology
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• v.41 no.3
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• pp.238-244
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• 2017

Plasma ion nitriding has been widely used in various industries to improve the mechanical properties of materials, especially stainless steels by increasing the surface hardness. It has the particular advantages of less distortion compared to that in the case of hardening of steel, gas nitriding, and carburizing; in addition, it allows treatment at low-temperatures, and results in a high surface hardness and improved corrosion resistance. Many researchers have demonstrated that the plasma ion nitriding process should be carried out at temperatures of below $450^{\circ}C$ to improve corrosion resistance via the formation of the expanded austenite phase(S-phase). Most experimentals studied to date have been carried out in chloride solutions like HCl or NaCl. However, the electrochemical characteristics for the chloride solutions and natural seawater differ. Hence, in this work, plasma ion nitriding of 304 stainless steels was performed at various temperatures, and the electrochemical characteristics corresponding to the different process temperatures were analyzed for the samples in natural seawater. Finally the optimum plasma ion nitriding temperature that resulted in the highest corrosion resistance was determined.

• Korean Journal of Materials Research
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• v.11 no.5
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• pp.339-344
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• 2001

An all solid-state thin film supercapacitor (TFSC) with Co$_3$O$_4$/LiPON/Co$_3$O$_4$ structure was fabricated on Pt/Ti/Si substrate using Co$_3$O$_4$ thin film electrode. Each Co$_3$O$_4$ film was grown by reactive dc reactive magnetron sputtering with increasing $O_2$/[Ar+O$_2$] ratio. Amorphous LiPON electrolyte film was deposited on Co$_3$O$_4$/Pt/Ti/Si in pure nitrogen ambient by using reactive rf magnetron sputtering. The electrochemical behavior of the Co$_3$O$_4$/LiPON/Co$_3$O$_4$ multi-layer structures exhibits a behavior of a bulk-type supercapacitor, even though much lower capacity (from 5 to 25 mF/$\textrm{cm}^2$-$\mu\textrm{m}$) than that of the bulk one. It was found that the TFSC showed a fairly constant discharge capacity with a constant current of 50 $\mu\textrm{A}/\textrm{cm}^2$ at the cut-off voltage 0-2V during 400 cycles. It is shown that the electrochemical behavior of the Co$_3$O$_4$/LiPON/Co$_3$O$_4$ TFSC is dependent upon the sputtering gas ratio. The capacity dependency of electrode films on different gas ratios was explained by different structural, electrical, and surfacical properties.

• Journal of the Korean Electrochemical Society
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• v.3 no.4
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• pp.219-223
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• 2000

All-solid state lithium rechargeable thin film batteries were fabricated with the configuration of$Cu_{0.5}V_2O_5/Lipon/Li$ using sequential thin film techniques. Copper vanadium oxide thin films and Lipon thin films were prepared by DC reactive dual source magnetron sputtering and RF magnetron sputtering, respectively. According to XRD analysis, we found out that copper vanadium oxide thin films were amorphous. The electrochemical behaviour of them was examined in half cell system using EC : DMC(1:1 in IM $LiPF_5$) liquid electrolyte. The ionic conductivity of Lipon thin film was $1.02\times10^{-6}S/cm$ at $25^{\circ}C$ and $Cu_{0.5}V_2O_5/Lipon/Li$ cell showed that the discharge capacity was about $50{\mu}Ah/cm^2{\mu}m$ beyond 500cyc1es.

• Korean Chemical Engineering Research
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• v.43 no.3
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• pp.425-431
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• 2005

New type of supercapacitor using high surface area activated carbons mixed with high conductivity polypyrrole (Ppy) has been prepared in order to achieve low impedance and high energy density. Mixed carbons of BP-20 and MSP-20 were used as the active electrode material, and polypyrrole doped with 2-naphthalenesulfonic acid (2-NSA) and carbon black (Super P) as conducting agents were added to activated carbons in order to enhance good electric conductivity. Electrodes prepared with the activated electrode materials and the conducting agents were added to a solution of organic binder [P(VdF-co-HFP) / NMP]. The ratio of optimum electrode composition was 78 : 17 : 5 wt.％ of (MSP20 : BP-20=1 : 1), (Super P : Ppy=10 : 7) and P(VdF-co-HFP) respectively. The performance of unit cell with addition of 7 wt％ Ppy have shown specific capacitance of 28.02 F/g, DC-ESR of $1.34{\Omega}$, AC-ESR of $0.36{\Omega}$, specific energy of 19.87 Wh/kg and specific power of 9.77 kW/kg. With addition of Ppy, quick charge-discharge of unit cell was possible because of low ESR, low charge transfer resistance and quick reaction rate. And good stability up to 500 chargedischarge cycles were retained about 80％ of their original capacity. It was concluded that the specific capacitance originated highly from compound phenomena of the pseudocapacitance by oxidation-reduction of polypyrrole and the nonfaradaic capacitance by adsorption-desorption of activated carbons.

• Journal of Electrical Engineering and Technology
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• v.12 no.2
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• pp.594-600
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• 2017

HVDC transmission systems can be configured in many ways to take into account cost, flexibility and operational requirements. [1] For long-distance transmission, HVDC systems may be less expensive and suffer lower electrical losses. For underwater power cables, HVDC avoids the heavy currents required to charge and discharge the cable capacitance of each cycle. For shorter distances, the higher cost of DC conversion equipment compared to an AC system may still be warranted, due to other benefits of direct current links. HVDC allows power transmission between unsynchronized AC transmission systems. Since the power flow through an HVDC link can be controlled independently of the phase angle between the source and the load, it can stabilize a network against disturbances due to rapid changes in power. HVDC also allows the transfer of power between grid systems running at different frequencies, such as 50 Hz and 60 Hz. This improves the stability and economy of each grid, by allowing the exchange of power between incompatible networks. This paper proposed to establish Korean HVDC technology through a cooperative agreement between KEPCO and LSIS in 2010. During the first stage (2012), a design of the ${\pm}80kV$ 60MW HVDC bipole system was created by both KEPCO and LSIS. The HVDC system was constructed and an operation test was completed in December 2012. During the second stage, the pole#2 system was fully replaced with components that LSIS had recently developed. LSIS also successfully completed the operation test. (2014.3)

• Journal of the Korean Vacuum Society
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• v.21 no.3
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• pp.121-129
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• 2012

RF biased inductively coupled plasma (ICP) is widely used in semiconductor and display etch processes which are based on vacuum science. Up to now, researches on how rf-bias power affects have been focused on the controls of dc self-bias voltages. But, effect of RF bias on plasma parameters which give a crucial role in the processing result and device performance has been little studied. In this work, we studied the correlation between the RF bias and plasma parameters and the recent published results were included in this paper. Plasma density was changed with the RF bias power and this variation can be explained by simple global model. As the RF bias was applied to the ICP, increase in the electron temperature from the electron energy distribution was measured indicating electron heating. Plasma density uniformity was enhanced with the RF bias power. This study can be helpful for the control of the optimum discharge condition, as well as the basic understanding for correlation between the RF bias and plasma parameters.