• Title/Summary/Keyword: DBD process

검색결과 48건 처리시간 0.025초

무성방전내에서 오존 발생에 미치는 운전변수의 영향 (Effect of Operating Parameters on Ozone Generation in Dielectric Barrier Discharge Process)

  • 이현돈;이은영;이용환;최유리;정재우
    • 한국대기환경학회:학술대회논문집
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    • 한국대기환경학회 2003년도 춘계학술대회 논문집
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    • pp.383-384
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    • 2003
  • 오존은 산업적으로 널리 활용되고 있으며 특히, 매우 넓은 환경공학적 응용분야를 가지고 있다. 오존의 산업적 적용은 1900년대 초부터 음용수 처리를 위해 시작되었으며 현재까지 폐수처리, 화학물질 합성, 재료의 부식 정도 측정, 수영장 소독, 치료용 목적, 냉각수 살균, pulp bleaching, 악취 및 대기 오염물질 처리 등의 광범위한 산업적 응용분야를 가지고 있다. 오존을 생성시키기 위한 대표적인 공정으로는 무성방전(dielectric barrier discharge, DBD) 공정, 전기 분해법(electrolysis), 자외선 조사법(UV irradiation)을 들 수 있으며 가장 널리 활용되고 있는 공정은 1857년 Simens에 의해 개발된 DBD 공정이다. (중략)

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Effects of Hydrophilic Surface Treatment on SUS Substrates by Using Dielectric Barrier Discharge

  • Joa, Sang-Beom;Kang, In-Je;Yang, Jong-Keun;Lee, Heon-Ju
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.458-458
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    • 2012
  • Fuel Cell is used stacking metal or polymer substrate. This hydro property of substrate surface is very important. Usually, surface property is hydrophilic. The surface oxidation of SUS is investigated through plasma treatments with an atmospheric-pressure dielectric barrier discharge (DBD) for increasing hydrophilic property. The plasma process makes an experiment under various operating conditions of the DBD, which operating conditions are treatment time, plasma gas mixture ratio, the plasma source supply frequency. Two kinds of SUS substrate, SUS-304 and SUS 316L, were used. Discharge frequency has a crucial impact on equipment performance and gas treatment. After the plasma treatment of a SUS plate, highly improved wettability was noted. But, when high oxygen supply, the substrate damaged seriously.

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패키지 기판 디스미어 공정의 대기압 플라즈마 처리 특성 (Process Characteristics of Atmospheric Pressure Plasma for Package Substrate Desmear Process)

  • 유선중
    • 한국진공학회지
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    • 제18권5호
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    • pp.337-345
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    • 2009
  • 패키지 기판의 지름 $100{\mu}m$ 이하 미세 드릴 구멍의 경우 습식 디스미어 공정만으로는 구멍 내부의 스미어를 효과적으로 제거할 수 없다. 본 연구에서는 습식 디스미어 공정의 이전 단계에서 대기압 플라즈마를 처리하여 소수성의 기판 표면을 친수성으로 개질하고자 하였다. 대기압 플라즈마 공정은 리모트 DBD 방식의 전극을 이용하여 패키지 제조 공정에 적합한 인라인 형태의 장비로 구성되었다. 대기압 플라즈마를 처리한 결과 접촉각 기준으로 $71^{\circ}$의 소수성 절연 필름 표면이 $30^{\circ}$ 정도의 친수성 표면으로 개질되었다. 대기압 플라즈마 처리 유무에 따른 습식 디스미어 공정의 특성을 평가하기 위하여 절연 필름의 두께, 드릴 구멍 지름, 표면 조도의 변화를 측정하였는데, 대기압 플라즈마 처리 시 기판 전면에서 공정 특성의 균일도가 향상되는 것을 확인하였다. 또한 대기압 플라즈마 처리 유무에 따른 드릴 구멍의 SEM 사진 분석 결과 대기압 플라즈마 처리 시 구멍 내부의 스미어가 효과적으로 제거됨을 실험적으로 확인하였다.

Evaluation of Acceptor Binding Energy of Nitrogen-Doped Zinc Oxide Thin Films Grown by Dielectric Barrier Discharge in Pulsed Laser Deposition

  • Lee, Deuk-Hee;Chun, Yoon-Soo;Lee, Sang-Yeol;Kim, Sang-Sig
    • Transactions on Electrical and Electronic Materials
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    • 제12권5호
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    • pp.200-203
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    • 2011
  • In this research, nitrogen (N)-doped zinc oxide (ZnO) thin films have been grown on a sapphire substrate by dielectric barrier discharge (DBD) in pulsed laser deposition (PLD). DBD has been used as an effective way for massive in-situ generation of N-plasma under conventional PLD process conditions. Low-temperature photoluminescence spectra of N-doped ZnO thin films provided near-band-edge emission after a thermal annealing process. The emission peak was resolved by Gaussian fitting and showed a dominant acceptor-bound excitation peak ($A^{\circ}X$) that indicated acceptor doping of ZnO with N. The acceptor binding energy of the N acceptor was estimated to be approximately 145 MeV based on the results of temperature-dependent photoluminescence (PL) measurements.

머신비전 기반의 가전제품 표면결함 자동검출 시스템 (Automatic detection system for surface defects of home appliances based on machine vision)

  • 이현준;정희자;이장군;김남호
    • 스마트미디어저널
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    • 제11권9호
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    • pp.47-55
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    • 2022
  • 스마트팩토리 제조공정에서의 품질관리는 중요한 요소이다. 현재, 금형 공정으로 생산되는 생활가전 제조부품의 품질검사는 대부분 작업자의 육안으로 진행되고 있으며 이로 인한 검사의 오류율이 높은 실정이다. 이러한 품질공전 개선을 위하여 결함 자동검출 시스템을 설계하여 구현하였다. 제안 시스템은 특정 위치에서 고성능 스캔 카메라로 대상물을 촬영하여 영상을 획득하고, 비전검사 알고리즘에 따라 긁힘, 찍힘, 이물질에 의한 불량품을 판독한다. 본 연구에서는 긁힘에 대한 불량 인식율을 높이기 위하여 깊이 정보 기반 분기 판단 알고리즘(Depth-based branch decision algorithm, DBD)을 개발하여 정확도를 높였다.

촉매 물질을 적용한 유전체 장벽 방전 플라즈마의 페놀 분해 특성 및 생분해도 향상 (Degradation characteristics and upgrading biodegradability of phenol by dielectric barrier discharge plasma using catalyst)

  • 신관우;최승규;김진수;원경자;이상일
    • 상하수도학회지
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    • 제34권1호
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    • pp.75-83
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    • 2020
  • This study investigated the degradation characteristics and biodegradability of phenol, refractory organic matters, by injecting MgO and CaO-known to be catalyst materials for the ozonation process-into a Dielectric Barrier Discharge (DBD) plasma. MgO and CaO were injected at 0, 0.5, 1.0, and 2 g/L, and the pH was not adjusted separately to examine the optimal injection amounts of MgO and CaO. When MgO and CaO were injected, the phenol decomposition rate was increased, and the reaction time was found to decrease by 2.1 to 2.6 times. In addition, during CaO injection, intermediate products combined with Ca2+ to cause precipitation, which increased the COD (chemical oxygen demand) removal rate by approximately 2.4 times. The biodegradability of plasma treated water increased with increase in the phenol decomposition rate and increased as the amount of the generated intermediate products increased. The biodegradability was the highest in the plasma reaction with MgO injection as compared to when the DBD plasma pH was adjusted. Thus, it was found that a DBD plasma can degrade non-biodegradable phenols and increase biodegradability.

유전체장벽방전에 의한 질소함유 활성종의 개발 및 저온 GaN 박막 성장 (Development of Atomic Nitrogen Source Based on a Dielectric Barrier Discharge and Low Temperature Growth GaN)

  • 김주성;변동진;김진상;금동화
    • 한국재료학회지
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    • 제9권12호
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    • pp.1216-1221
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    • 1999
  • TMGa와 유전체 장벽방전에 기초한 질소함유 활성종을 이용하여 (0001) 사파이어 기판위에 GaN 박막을 저온에서 성장시켰다. III-V 질소화합물 반도체의 에피막 성장에 있어서 암모니아는 유기금속 화학증착법에서 지금까지 알려진 가장 보편적인 질소 공급원이며 충분한 질소공급을 위해 $1000^{\circ}C$ 이상의 고온 성장이 필수적이다. GaN 박막을 비교적 저온에서 성장시키기 위하여 질소 공급원으로 암모니아 대신 유전체 장벽방전을 이용하였다. 유전체 장벽방전은 전극사이에 유전체 장벽을 설치하여 arc를 조절하는 방전이며 수 기압의 높은 공정압력보다 훨씬 높으므로 기판표면까지 전달하는데도 이점이 있다. GaN 박막의 결정성과 표면형상은 성장온도, 완충층에 따라 변화하였으며, $700^{\circ}C$의 저온에서도 우수한 (0001) 배향성을 갖는 GaN 박막을 성장할 수 있었다.

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플라즈마 공정을 이용한 고추역병균(Phytophthora capsici) 불활성화 모델의 적용 (Application of Inactivation Model on Phytophthora Blight Pathogen (Phytophthora capsici) using Plasma Process)

  • 김동석;박영식
    • 한국환경과학회지
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    • 제24권11호
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    • pp.1393-1404
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    • 2015
  • Ten empirical disinfection models for the plasma process were used to find an optimum model. The variation of model parameters in each model according to the operating conditions (first voltage, second voltage, air flow rate, pH, incubation water concentration) were investigated in order to explain the disinfection model. In this experiment, the DBD (dielectric barrier discharge) plasma reactor was used to inactivate Phytophthora capsici which cause wilt in tomato plantation. Optimum disinfection models were chosen among ten models by the application of statistical SSE (sum of squared error), RMSE (root mean sum of squared error), $r^2$ values on the experimental data using the GInaFiT software in Microsoft Excel. The optimum models were shown as Log-linear+Tail model, Double Weibull model and Biphasic model. Three models were applied to the experimental data according to the variation of the operating conditions. In Log-linear+Tail model, $Log_{10}(N_o)$, $Log_{10}(N_{res})$ and $k_{max}$ values were examined. In Double Weibull model, $Log_{10}(N_o)$, $Log_{10}(N_{res})$, ${\alpha}$, ${\delta}_1$, ${\delta}_2$, p values were calculated and examined. In Biphasic model, $Log_{10}(N_o)$, f, $k_{max1}$ and $k_{max2}$ values were used. The appropriate model parameters for the calculation of optimum operating conditions were $k_{max}$, ${\alpha}$, $k_{max1}$ at each model, respectively.

수중 플라즈마 공정을 이용한 Rhodamine B 염료의 제거 (Removal of Rhodamine B Dye Using a Water Plasma Process)

  • 김동석;박영식
    • 한국환경보건학회지
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    • 제37권3호
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    • pp.218-225
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    • 2011
  • Objectives: In this paper, a dielectric barrier discharge (DBD) plasma reactor was investigated for degrading the dye Rhodamine B (RhB) in aqueous solutions. Methods: The DBD plasma reactor system in this study consisted of a plasma component [titanium discharge (inner), ground (outer) electrode and quartz dielectric tube], power source, and gas supply. The effects of various parameters such as first voltage (input power), gas flow rate, second voltage (output power), conductivity and pH were investigated. Results: Experimental results showed that a 99% aqueous solution of 20 mg/l Rhodamine B is decolorized following an eleven minute plasma treatment. When comparing the performance of electrolysis and plasma treatment, the RhB degradation of the plasma process was higher that of the electrolysis. The optimum first voltage and air flow rate were 160 V (voltage of trans is 15 kV) and 3 l/min, respectively. With increased second voltage (4 kV to 15 kV), RhB degradation was increased. The higher the pH and the lower conductivity, the more Rhodamine B degradation was observed. Conclusions: OH radical generation of dielectric plasma process was identified by degradation of N, N-dimethyl-4-nitrosoaniline (RNO, indicator of OH radical generation). It was observed that the effect of UV light, which was generated as streamer discharge, on Rhodamine B degradation was not high. Rhodamine B removal was influenced by real second voltage regardless of initial first and second voltage. The effects of pH and conductivity were not high on the Rhodamine B degradation.

Development of an advanced atmospheric pressure plasma source with high spatial uniformity and selectiveness for surface treatment

  • 임유봉;최원호;이승훈;한우용;이종현;이상균;하정민;김종훈
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.176-177
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    • 2016
  • In the last few decades, attention toward atmospheric pressure plasma (APP) has been greatly increased due to the numerous advantages of those applications, such as non-necessity of high vacuum facility, easy setup and operation, and low temperature operation. The practical applications of APP can be found in a wide spectrum of fields from the functionalization of material surfaces to sterilization of medical devices. In the secondary battery industry, separator film has been typically treated by APP to enhance adhesion strength between adjacent films. In this process, the plasma is required to have high stability and uniformity for better performance of the battery. Dielectric barrier discharge (DBD) was usually adopted to limit overcurrent in the plasma, and we developed the pre-discharge technology to overcome the drawbacks of streamer discharge in the conventional DBD source which makes it possible to produce a super-stable plasma at atmospheric pressure. Simulations for the fluid flow and electric field were parametrically performed to find the optimized design for the linear jet plasma source. The developed plasma source (Plasmapp LJPS-200) exhibits spatial non-uniformity of less than 3%, and the adhesion strength between the separator and electrode films was observed to increase 17% by the plasma treatment.

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